Abstract:
There are provided a bonding wire and a method of manufacturing the bonding wire. The bonding wire includes 90.0 to 99.0 wt% of silver (Ag); 0.2 to 2.0 wt% of gold (Au); 0.2 to 4.0 wt% of palladium (Pd), platinum (Pt) or rhodium (Rh), or a combination thereof; 10 to 1000 ppm of dopants; and inevitable impurities, in which a ratio of (a)/(b) is 3 to 5. The (a) refers to the amount of crystal grains having orientation in crystalline orientations in a wire lengthwise direction, and the (b) refers to the amount of crystal grains having orientation in crystalline orientations in the wire lengthwise direction.
Abstract:
An integrated circuit package comprising a substrate having terminal pads arranged in at least one row along a perimeter of a surface of the substrate, vias connecting the terminal pads directly to connectors on an opposite side of the substrate, a semiconductor chip mounted on the substrate, inside the perimeter, the chip having bond pads located on a surface of the chip, and a plurality of insulated bond wires, each of the bond wires extending from a bond pad on the chip to a terminal pad on the substrate, the substrate being sized and shaped to provide a sufficient number of rows of terminal pads and associated vias so that horizontal traces through the substrate are not required.
Abstract:
The invention is related to a bonding wire, comprising a core (2) with a surface, wherein the core comprises copper as a main component, and a coating layer (3) superimposed over the surface of the core (2), wherein the coating layer (3) comprises palladium as a main component, wherein the core (2) comprises at least 5 wt.ppm silver and at least 20 wt. ppm phosphorus as further components, wherein the wire meets the relation 0.0008
Abstract:
A bond pad (25) for an electronic device (10) such as an integrated circuit makes electrical connection to an underlying device (14) via an interconnect layer (16). The bond pad has a first layer (24) of a material that is aluminum and copper and a second layer (26), over the first layer (26), of a second material that is aluminum and is essentially free of copper. The second layer (26) functions as a cap to the first layer (24) for preventing copper in the first layer (24) from being corroded by residual chemical elements. A wire (32) such as a gold wire may be bonded to the second layer (26) of the bond pad.
Abstract:
A metal alloy composite comprising a phase of a highly-conductive base metal in the form of a matrix and a phase of another metal positioned within the matrix, the base metal being present in a major amount and the other metal being present in a minor amount, the metal alloy composite being capable of being formed into a very thin wire for use in a semiconductor application which includes a terminal assembly comprising an electrically conductive terminal in conductive contact with a conductive member and another electrically conductive terminal in conductive contact with a semiconductor, said terminals being joined by said alloy composite wire, examples of the base metal being gold, copper, and aluminum.
Abstract:
A ball-bond arrangement comprising an aluminum bond pad of a semiconductor device and a wire ball-bonded to the aluminum bond pad, wherein the wire has a diameter of 10 to 80 pm and comprises a core consisting of a copper alloy consisting of 0.05 to 3 wt.-% of palladium and/or platinum with copper as the remainder to make up 100 wt.-%.
Abstract:
The invention relates to a ribbon, preferably a bonding ribbon for bonding in microelectronics, comprising a first layer (2) comprising copper with a surface and at least a coating layer (3) superimposed over the surface of the first layer (2), wherein the coating layer (3) comprises aluminium, and an intermediate layer (7), wherein in a cross-sectional view of the ribbon the area share of the first layer (2) is in the range of from 50 to 96 %, based on the total area of the cross-section of the ribbon, wherein the aspect ratio between the width and the height of the ribbon in a cross-sectional view is in the range of from 0.03 to less than 0.8, wherein the ribbon has a cross-sectional area in the range of from 25Ό00 μιη 2 to 800Ό00 μιη 2 , wherein the intermediate layer (7) is arranged between the first layer (2) and the coating layer (7), wherein the intermediate layer (7) comprises at least one intermetallic phase comprising material of the first layer (2) and material of the coating layer (3). The invention further relates to a process for making a wire, to a wire obtainable by said process, to an electric device comprising at least two elements and at least aforementioned wire, to a propelled device comprising said electric device and to a process of connecting two elements through aforementioned wire by wedge-bonding.