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    METHOD OF DESIGNING LITHOGRAPHY FEATURES BY SELF-ASSEMBLY OF BLOCK COPOLYMER
    1.
    发明申请
    METHOD OF DESIGNING LITHOGRAPHY FEATURES BY SELF-ASSEMBLY OF BLOCK COPOLYMER 审中-公开
    自组装嵌段共聚物设计光刻特征的方法

    公开(公告)号：US20160178999A1

    公开(公告)日：2016-06-23

    申请号：US14909057

    申请日：2014-07-09

    Applicant: ASML NETHERLANDS B.V.

    Inventor： Sander Frederik WUISTER ,  Bart LAENENS ,  David AMBESI

    IPC: G03F1/70 ,  G06F17/50

    CPC classification number: G03F1/70 ,  B81C1/00031 ,  B81C2201/0149 ,  G03F7/0002 ,  G06F17/5072 ,  G06F17/5081

    Abstract: A method of design or verification for a self-assemblable block copolymer feature, the block copolymer feature including a first domain having a first polymer type and a second domain having a second polymer type, the method including, based on the length of the second polymer type or on an uncertainty in position of the first domain within the block copolymer feature calculated based on the length of the second polymer type, adjusting a parameter of the self-assembly process of a block copolymer feature or verifying a placement of a block copolymer feature.

    Abstract translation: 一种用于可自组装嵌段共聚物特征的设计或验证方法，所述嵌段共聚物特征包括具有第一聚合物类型的第一结构域和具有第二聚合物类型的第二结构域，所述方法包括基于第二聚合物的长度 类型或基于第二聚合物类型的长度计算的嵌段共聚物特征中的第一结构域的不确定性，调节嵌段共聚物特征的自组装过程的参数或验证嵌段共聚物特征的放置 。

    METHODS FOR PROVIDING LITHOGRAPHY FEATURES ON A SUBSTRATE BY SELF-ASSEMBLY OF BLOCK COPOLYMERS
    2.
    发明申请
    METHODS FOR PROVIDING LITHOGRAPHY FEATURES ON A SUBSTRATE BY SELF-ASSEMBLY OF BLOCK COPOLYMERS 有权
    通过嵌段共聚物自组装提供基板上的刻蚀特征的方法

    公开(公告)号：US20150380266A1

    公开(公告)日：2015-12-31

    申请号：US14769426

    申请日：2014-02-26

    Applicant: ASML NETHERLANDS B.V.

    Inventor： Sander Frederik WUISTER ,  Emiel PEETERS

    IPC: H01L21/3105 ,  H01L21/768 ,  H01L21/027

    CPC classification number: H01L21/31058 ,  B81C1/00031 ,  B81C2201/0149 ,  G03F7/0002 ,  H01L21/0271 ,  H01L21/0274 ,  H01L21/0337 ,  H01L21/76802

    Abstract: Causing a self-assemblable block copolymer (BCP) having first and second blocks to migrate from a region surrounding a lithography recess of the substrate and a dummy recess on the substrate to within the lithography recess and the dummy recess, causing the BCP to self-assemble into an ordered layer within the lithography recess, the layer having a first block domain and a second block domain, and selectively removing the first domain to form a lithography feature having the second domain within the lithography recess, wherein a width of the dummy recess is smaller than the minimum width required by the BCP to self-assemble, the dummy recess is within the region of the substrate surrounding the lithography recess from which the BCP is caused to migrate, and the width between portions of a side-wall of the lithography recess is greater than the width between portions of a side-wall of the dummy recess.

    Abstract translation: 导致具有第一和第二嵌段的自组装嵌段共聚物（BCP）从基板的光刻凹槽周围的区域和基板上的虚设凹槽迁移到光刻凹槽和虚设凹槽内，使得BCP自对准， 组装成光刻凹槽内的有序层，该层具有第一块区域和第二块区域，并且选择性地去除第一区域以形成在光刻凹槽内具有第二区域的光刻特征，其中虚设凹槽 小于BCP自组装所需的最小宽度，虚拟凹槽在围绕光刻凹槽的基底的区域内，BCP从其移动，并且侧壁的部分之间的宽度在 光刻凹槽大于虚拟凹槽的侧壁的部分之间的宽度。

    SYSTEMS AND METHODS FOR REDUCING RESIST MODEL PREDICTION ERRORS
    3.
    发明申请
    SYSTEMS AND METHODS FOR REDUCING RESIST MODEL PREDICTION ERRORS 审中-公开

    公开(公告)号：US20200348598A1

    公开(公告)日：2020-11-05

    申请号：US16771343

    申请日：2018-12-20

    Applicant: ASML NETHERLANDS B.V.

    Inventor： Marleen KOOIMAN ,  David Marie RIO ,  Sander Frederik WUISTER

    IPC: G03F7/20 ,  G06F30/13

    Abstract: A method for calibrating a resist model. The method includes: generating a modeled resist contour of a resist structure based on a simulated aerial image of the resist structure and parameters of the resist model, and predicting a metrology contour of the resist structure from the modeled resist contour based on information of an actual resist structure obtained by a metrology device. The method includes adjusting one or more of the parameters of the resist model based on a comparison of the predicted metrology contour and an actual metrology contour of the actual resist structure obtained by the metrology device.

    IMPRINT LITHOGRAPHY
    4.
    发明申请
    IMPRINT LITHOGRAPHY 有权

    公开(公告)号：US20160377997A1

    公开(公告)日：2016-12-29

    申请号：US15258903

    申请日：2016-09-07

    Applicant: ASML NETHERLANDS B.V.

    Inventor： Arie Jeffrey DEN BOEF ,  Andre Bernardus JEUNINK ,  Sander Frederik WUISTER ,  Yvonne Wendela KRUIJT-STEGEMAN

    IPC: G03F9/00 ,  G03F7/00

    CPC classification number: G03F7/0002 ,  B82Y10/00 ,  B82Y40/00 ,  G03F9/7042

    Abstract: A method of determining a position of an imprint template in an imprint lithography apparatus is disclosed. In an embodiment, the method includes illuminating an area of the imprint template in which an alignment mark is expected to be found by scanning an alignment radiation beam over that area, detecting an intensity of radiation reflected or transmitted from the area, and identifying the alignment mark via analysis of the detected intensity.

    Abstract translation: 公开了一种在压印光刻设备中确定压印模板的位置的方法。 在一个实施例中，该方法包括通过扫描在该区域上的对准辐射束来照射其中期望找到对准标记的压印模板的区域，检测从该区域反射或发射的辐射的强度，以及识别对准 通过分析检测到的强度来标记。

    METHODS FOR PROVIDING SPACED LITHOGRAPHY FEATURES ON A SUBSTRATE BY SELF-ASSEMBLY OF BLOCK COPOLYMERS
    5.
    发明申请
    METHODS FOR PROVIDING SPACED LITHOGRAPHY FEATURES ON A SUBSTRATE BY SELF-ASSEMBLY OF BLOCK COPOLYMERS 审中-公开
    通过块状共聚物自组装提供基板上的间距平面特征的方法

    公开(公告)号：US20150380299A1

    公开(公告)日：2015-12-31

    申请号：US14768423

    申请日：2014-02-26

    Applicant: ASML NETHERLANDS B.V.

    Inventor： Jozef Maria FINDERS ,  Sander Frederik WUISTER ,  Eddy Cornelis Antonius VAN DER HEIJDEN ,  Henri Marie Joseph BOOTS

    IPC: H01L21/768 ,  G03F7/20 ,  H01L21/3105 ,  H01L21/268 ,  H01L21/02 ,  H01L21/311

    CPC classification number: H01L21/76816 ,  B81C1/00031 ,  B81C2201/0149 ,  B82Y40/00 ,  G03F7/0002 ,  G03F7/2002 ,  G03F7/2004 ,  H01L21/02345 ,  H01L21/268 ,  H01L21/31058 ,  H01L21/31133

    Abstract: A method of forming a plurality of regularly spaced lithography features, e.g. contact holes, including: providing a trench on a substrate, the trench having opposing side-walls and a base, with the side-walls having a width therebetween, wherein the trench is formed by photolithography including exposing the substrate using off-axis illumination whereby a modulation is provided to the side-walls of the trench; providing a self-assemblable block copolymer having first and second blocks in the trench; causing the self-assemblable block copolymer to self-assemble into an ordered layer in the trench, the layer having first domains of the first block and second domains of the second block; and selectively removing the first domain to form at least one regularly spaced row of lithography features having the second domain along the trench.

    Abstract translation: 一种形成多个规则间隔的光刻特征的方法，例如。 接触孔，包括：在衬底上提供沟槽，所述沟槽具有相对的侧壁和底座，其中所述侧壁之间具有宽度，其中所述沟槽通过光刻形成，包括使用离轴照明曝光所述衬底，由此 向沟槽的侧壁提供调制; 提供在沟槽中具有第一和第二嵌段的自组装嵌段共聚物; 使自组装嵌段共聚物自组装成沟槽中的有序层，该层具有第一嵌段的第一区域和第二嵌段的第二区域; 以及选择性地移除所述第一区域以形成沿着所述沟槽具有所述第二结构域的至少一个规则间隔的光刻特征行。

    METHODOLOGY TO GENERATE GUIDING TEMPLATES FOR DIRECTED SELF-ASSEMBLY
    8.
    发明申请
    METHODOLOGY TO GENERATE GUIDING TEMPLATES FOR DIRECTED SELF-ASSEMBLY 审中-公开
    为指导自组织生成指导模板的方法

    公开(公告)号：US20160210397A1

    公开(公告)日：2016-07-21

    申请号：US14913670

    申请日：2014-08-08

    Applicant: ASML NETHERLANDS B.V.

    Inventor： Bart LAENENS ,  Sander Frederik WUISTER

    IPC: G06F17/50 ,  G03F1/36

    CPC classification number: G06F17/5081 ,  G03F1/36 ,  G03F7/0002 ,  G06F17/5009

    Abstract: A method of determining a characteristic of a guiding template for guiding self-assembly of block copolymer to form an entirety of a design layout, or a portion thereof, including a plurality of design features, each design feature including one or more elemental features, the method including selecting a characteristic of a guiding template for each of the one or more elemental features of the plurality of design features from a database or a computer readable non-transitory medium, the database or the computer readable non-transitory medium storing a characteristic of a guiding template for each of the one or more elemental features, and determining the characteristic of the guiding template to form the entirety of the design layout, or the portion thereof, by combining the selected characteristic of the guiding template for the one or more elemental features for each of the plurality of design features.

    Abstract translation: 一种确定引导模板的特征的方法，用于引导嵌段共聚物的自组装以形成包括多个设计特征的整个设计布局或其一部分，每个设计特征包括一个或多个元素特征， 方法，包括从数据库或计算机可读的非暂时介质中选择所述多个设计特征中的所述一个或多个元素特征中的每一个的指导模板的特征，所述数据库或所述计算机可读非暂时介质存储 用于所述一个或多个元素特征中的每一个的引导模板，以及通过组合用于所述一个或多个元素的所述引导模板的所选特征来确定所述引导模板的特征以形成所述设计布局的整体或其部分 用于多个设计特征中的每一个的特征。

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