公开(公告)号：US20140377707A9

公开(公告)日：2014-12-25

申请号：US14032528

申请日：2013-09-20

Applicant: JSR CORPORATION

Inventor： Shinya MINEGISHI ,  Kiyoshi TANAKA ,  Kazunori KUSABIRAKI

IPC: G03F7/11 ,  G03F7/20

CPC classification number: G03F7/11 ,  C08F214/18 ,  C08F214/182 ,  C08F214/186 ,  C08F220/26 ,  C08L33/16 ,  C09D133/14 ,  G03F7/0046 ,  G03F7/2041 ,  C08F220/24 ,  C08F228/02 ,  C08F220/38

Abstract: A composition for forming a liquid immersion upper layer film includes a polymer component including a polymer having a structural unit represented by a formula (1); and a solvent. R1 represents a carboxy group or a group represented by a formula (2); X represents a single bond, a divalent hydrocarbon group having 1 to 20 carbon atoms or a divalent fluorinated hydrocarbon group having 1 to 20 carbon atoms; R2 represents a hydrocarbon group having 1 to 20 carbon atoms and a valency of (n+1), a fluorinated hydrocarbon group having 1 to 20 carbon atoms and a valency of (n+1), or one of these groups each including between adjacent two carbon atoms thereof —CO—, —COO—, —O—, —NR′—, —CS—, —S—, —SO—, —SO2— or a combination thereof; and R3 represents a hydrogen atom or a monovalent organic group having 1 to 20 carbon atoms.

公开(公告)号：US20190241695A1

公开(公告)日：2019-08-08

申请号：US16385341

申请日：2019-04-16

Applicant: JSR CORPORATION

Inventor： Yuji NAMIE ,  Shinya MINEGISHI ,  Tomoki NAGAI ,  Takuo SONE

IPC: C08F297/02 ,  C08L53/00 ,  B81C1/00 ,  H01L21/3213 ,  H01L21/308 ,  G03F7/00 ,  H01L21/033 ,  H01L21/027 ,  G03F7/20

CPC classification number: C08F297/026 ,  B81C1/00031 ,  B81C2201/0149 ,  C08L53/005 ,  G03F7/0002 ,  G03F7/0035 ,  G03F7/70 ,  H01L21/0273 ,  H01L21/0337 ,  H01L21/3086 ,  H01L21/32139

Abstract: A directed self-assembling composition for pattern formation includes a block copolymer. The block copolymer includes a polystyrene block having a styrene unit, and a polyalkyl (meth)acrylate block having an alkyl (meth)acrylate unit. The block copolymer has a group that is bound to at least one end of a main chain of the block copolymer and that includes a hetero atom.

公开(公告)号：US20190310551A1

公开(公告)日：2019-10-10

申请号：US16449720

申请日：2019-06-24

Applicant: JSR CORPORATION

Inventor： Shinya MINEGISHI ,  Motohiro SHIRATANI ,  Yusuke ASANO ,  Hisashi NAKAGAWA ,  Takehiko NARUOKA

IPC: G03F7/004 ,  G03F7/038 ,  G03F7/32

Abstract: Provided is a radiation-sensitive composition superior in sensitivity. A radiation-sensitive composition incudes a metal oxide having a structural unit represented by formula (1), and a solvent. In the formula (1), M represents germanium, tin or lead; R1 represents a monovalent organic group having no greater than 30 carbon atoms which includes at least one of an electron attractive group and an unsaturated bond-containing group, and bonds to M via a carbon atom.

公开(公告)号：US20150323870A1

公开(公告)日：2015-11-12

申请号：US14702139

申请日：2015-05-01

Applicant: JSR CORPORATION

Inventor： Hiroyuki KOMATSU ,  Shinya MINEGISHI ,  Takehiko NARUOKA ,  Tomoki NAGAI

IPC: G03F7/20 ,  G03F7/16 ,  C08F293/00

CPC classification number: C08F297/026 ,  C08F293/00 ,  C08L53/00 ,  G03F7/0002 ,  G03F7/039 ,  G03F7/16 ,  G03F7/168 ,  G03F7/20

Abstract: A composition for pattern formation includes a block copolymer. The block polymer includes a first labile group at an end of a main chain of the block copolymer. The first acid liable group is capable of being dissociated by an acid or heat. The composition preferably further contains an acid generator that generates an acid upon application of an energy. The block copolymer is preferably capable of forming a phase separation structure through directed self-assembly. The first labile group is preferably represented by formula (a). R represents a monovalent organic group having 1 to 20 carbon atoms; R′ represents a hydrogen atom or a monovalent organic group having 1 to 20 carbon atoms; and * denotes a binding site to an atom at the end of the main chain of the block copolymer.

Abstract translation: 用于图案形成的组合物包括嵌段共聚物。 嵌段聚合物包括在嵌段共聚物的主链末端的第一不稳定基团。 第一个易酸性基团能够被酸或热解离。 组合物优选还包含在施加能量时产生酸的酸发生剂。 嵌段共聚物优选能够通过定向自组装形成相分离结构。 第一不稳定基团优选由式（a）表示。 R表示碳原子数1〜20的1价有机基团。 R'表示氢原子或碳原子数1〜20的1价有机基团。 和*表示与嵌段共聚物主链末端的原子的结合位点。

公开(公告)号：US20150253671A1

公开(公告)日：2015-09-10

申请号：US14638610

申请日：2015-03-04

Applicant: JSR CORPORATION

Inventor： Hiroyuki KOMATSU ,  Shinya MINEGISHI ,  Yuji NAMIE ,  Tomoki NAGAI

IPC: G03F7/20 ,  G03F7/038

CPC classification number: G03F7/038 ,  G03F7/0002 ,  G03F7/0388

Abstract: A composition for pattern formation includes a polymer or a polymer set including a plurality of polymers. The polymer or the polymer set is capable of forming a phase separation structure through directed self-assembly. The polymer or at least one polymer in the polymer set includes a crosslinkable group in a side chain thereof. A pattern-forming method includes providing a directed self-assembling film on a substrate using the composition. The directed self-assembling film includes a phase separation structure.

Abstract translation: 用于图案形成的组合物包括聚合物或包含多种聚合物的聚合物组。 聚合物或聚合物组能够通过定向自组装形成相分离结构。 聚合物组中的聚合物或至少一种聚合物包含其侧链中的可交联基团。 图案形成方法包括使用该组合物在衬底上提供定向的自组装膜。 定向自组装膜包括相分离结构。

公开(公告)号：US20150253663A1

公开(公告)日：2015-09-10

申请号：US14638521

申请日：2015-03-04

Applicant: JSR CORPORATION

Inventor： Hiroyuki KOMATSU ,  Shinya MINEGISHI ,  Yuji NAMIE ,  Tomoki NAGAI

IPC: G03F7/038 ,  G03F7/20

CPC classification number: G03F7/0397 ,  G03F7/0002

Abstract: A composition for pattern formation includes a polymer or a polymer set including a plurality of polymers, and an acid generator. The polymer or the polymer set is capable of forming a phase separation structure through directed self-assembly. The polymer or at least one polymer in the polymer set includes an acid-labile group in a side chain thereof. The acid generator generates an acid upon application of energy. A pattern-forming method includes providing a directed self-assembling film on a substrate using the composition. The directed self-assembling film includes a phase separation structure.

Abstract translation: 用于图案形成的组合物包括聚合物或包含多种聚合物的聚合物组和酸产生剂。 聚合物或聚合物组能够通过定向自组装形成相分离结构。 聚合物组中的聚合物或至少一种聚合物包括侧链中的酸不稳定基团。 酸发生器在施加能量时产生酸。 图案形成方法包括使用该组合物在衬底上提供定向的自组装膜。 定向自组装膜包括相分离结构。

公开(公告)号：US20130344249A1

公开(公告)日：2013-12-26

申请号：US13923176

申请日：2013-06-20

Applicant: JSR CORPORATION

Inventor： Shinya MINEGISHI ,  Yuji NAMIE ,  Tomoki NAGAI

IPC: C08L25/06 ,  C08L33/14 ,  C08L33/16 ,  B05D5/00

CPC classification number: C08L25/06 ,  B05D5/00 ,  C08L33/14 ,  C08L33/16 ,  C09D133/066 ,  C09D133/08 ,  C09D133/16 ,  G03F7/0002 ,  C08L33/06

Abstract: A directed self-assembly composition for pattern formation, includes two or more kinds of polymers. The two or more kinds of polymers each do not have a silicon atom in a main chain thereof. At least one of the two or more kinds of polymers has a group binding to the polymerizing end of the main chain and having a hetero atom.

Abstract translation: 用于图案形成的定向自组装组合物包括两种或更多种聚合物。 两种或更多种聚合物在其主链中不具有硅原子。 两种或更多种聚合物中的至少一种具有与主链的聚合端结合且具有杂原子的基团。

公开(公告)号：US20190354010A1

公开(公告)日：2019-11-21

申请号：US16519420

申请日：2019-07-23

Applicant: JSR CORPORATION

Inventor： Shinya MINEGISHI ,  Motohiro SHIRATANI ,  Hisashi NAKAGAWA

IPC: G03F7/004 ,  G03F7/32 ,  G03F7/30 ,  G03F7/031

Abstract: A radiation-sensitive composition contains: a metal oxide having a first structural unit represented by formula (1), formula (2) or a combination thereof, and a second structural unit represented by formula (3); and a solvent. In the formulae (1) to (3), M1, M2 and M3 each independently represent germanium, tin or lead; and R1, R2 and R3 each independently represent a monovalent organic group having 1 to 40 carbon atoms which bonds to M1 or M2 via a carbon atom. A proportion of the first structural unit with respect to total structural units constituting the metal oxide is preferably no less than 50 mol %.

公开(公告)号：US20170248847A1

公开(公告)日：2017-08-31

申请号：US15595030

申请日：2017-05-15

Applicant: JSR CORPORATION

Inventor： Hiroyuki KOMATSU ,  Takehiko NARUOKA ,  Shinya MINEGISHI ,  Kaori SAKAI ,  Tomoki NAGAI

IPC: G03F7/038 ,  H01L21/311 ,  G03F7/039 ,  G03F7/004 ,  C09D153/00 ,  G03F7/20 ,  G03F7/32 ,  G03F7/38 ,  G03F7/11 ,  H01L21/027 ,  G03F7/16

CPC classification number: G03F7/038 ,  B05D3/064 ,  C08L2201/56 ,  C09D125/14 ,  C09D153/00 ,  G03F7/0002 ,  G03F7/0045 ,  G03F7/0046 ,  G03F7/0048 ,  G03F7/039 ,  G03F7/11 ,  G03F7/16 ,  G03F7/168 ,  G03F7/2006 ,  G03F7/322 ,  G03F7/38 ,  H01L21/027 ,  H01L21/0271 ,  H01L21/0332 ,  H01L21/3065 ,  H01L21/31138

Abstract: A composition for a base of a directed self-assembling film includes a compound including an oxo acid group, and a solvent. The compound is preferably represented by formula (1). A represents an organic group having 10 or more carbon atoms and having a valency of n. B represents an oxo acid group. n is an integer of 1 to 200. In a case where n is 2 or greater, a plurality of Bs are identical or different. AB)n   (1)

公开(公告)号：US20150277223A1

公开(公告)日：2015-10-01

申请号：US14668335

申请日：2015-03-25

Applicant: JSR CORPORATION

Inventor： Hiroyuki KOMATSU ,  Takehiko NARUOKA ,  Shinya MINEGISHI ,  Tomoki NAGAI

IPC: G03F7/004 ,  G03F7/20 ,  H01L21/027

CPC classification number: G03F7/0002 ,  C08F297/026 ,  C08K5/42 ,  C08L53/00 ,  G03F7/0035 ,  G03F7/2041 ,  G03F7/322 ,  G03F7/36 ,  G03F7/38 ,  G03F7/40 ,  H01L21/0271 ,  H01L21/0274 ,  H01L21/31133 ,  H01L21/31138

Abstract: A composition for pattern formation includes a block copolymer and a solvent. The block copolymer includes a group including a reactive group on at least one end of a main chain of the block copolymer. A pattern-forming method includes providing a directed self-assembling film directly or indirectly on a substrate using the composition. The directed self-assembling film includes a phase separation structure which includes a plurality of phases. A part of the plurality of phases of the directed self-assembling film is removed.

Abstract translation: 用于图案形成的组合物包括嵌段共聚物和溶剂。 嵌段共聚物包括在嵌段共聚物的主链的至少一个末端具有反应性基团的基团。 图案形成方法包括使用该组合物直接或间接地在基底上提供定向的自组装膜。 定向自组装膜包括包括多个相的相分离结构。 去除定向自组装膜的多个相的一部分。