公开(公告)号：US07927933B2

公开(公告)日：2011-04-19

申请号：US11060105

申请日：2005-02-16

申请人： Jan Willem Maes ,  Annelies Delabie ,  Yashuhiro Shimamoto

发明人： Jan Willem Maes ,  Annelies Delabie ,  Yashuhiro Shimamoto

IPC分类号： H01L21/84 ,  H01L21/8238 ,  H01L21/4763

CPC分类号： H01L21/32051 ,  C23C14/024 ,  C23C16/0272 ,  C23C16/345 ,  H01L21/02181 ,  H01L21/0228 ,  H01L21/02304 ,  H01L21/28088 ,  H01L21/28194 ,  H01L21/31616 ,  H01L21/31637 ,  H01L21/31641 ,  H01L21/31645 ,  H01L21/318 ,  H01L21/3185 ,  H01L21/76841 ,  H01L29/513 ,  H01L29/517

摘要： The present invention relates generally to integrated circuit (IC) fabrication processes. The present invention relates more particularly to the treatment of surfaces, such as silicon dioxide or silicon oxynitride layers, for the subsequent deposition of a metal, metal oxide, metal nitride and/or metal carbide layer. The present invention further relates to a high-k gate obtainable by a method of the invention.

摘要翻译： 本发明一般涉及集成电路（IC）制造工艺。 本发明更具体地涉及用于随后沉积金属，金属氧化物，金属氮化物和/或金属碳化物层的表面的处理，例如二氧化硅或氮氧化硅层。 本发明还涉及通过本发明的方法获得的高k栅极。

公开(公告)号：US07629270B2

公开(公告)日：2009-12-08

申请号：US11212503

申请日：2005-08-24

申请人： Johan Swerts ,  Hilde De Witte ,  Jan Willem Maes ,  Christophe F. Pomarede ,  Ruben Haverkort ,  Yuet Mei Wan ,  Marinus J. De Blank ,  Cornelius A. Van Der Jeugd ,  Jacobus Johannes Beulens

发明人： Johan Swerts ,  Hilde De Witte ,  Jan Willem Maes ,  Christophe F. Pomarede ,  Ruben Haverkort ,  Yuet Mei Wan ,  Marinus J. De Blank ,  Cornelius A. Van Der Jeugd ,  Jacobus Johannes Beulens

IPC分类号： H01L21/31

CPC分类号： H01L21/28194 ,  C23C16/345 ,  C23C16/452 ,  C23C16/45523 ,  C23C16/45578 ,  C23C16/515 ,  H01L21/02381 ,  H01L21/02422 ,  H01L21/02532 ,  H01L21/0262 ,  H01L21/28202 ,  H01L21/28211 ,  H01L21/3141 ,  H01L21/3144 ,  H01L21/3145 ,  H01L21/3148 ,  H01L21/3185 ,  H01L29/518

摘要： A nitrogen precursor that has been activated by exposure to a remotely excited species is used as a reactant to form nitrogen-containing layers. The remotely excited species can be, e.g., N2, Ar, and/or He, which has been excited in a microwave radical generator. Downstream of the microwave radical generator and upstream of the substrate, the flow of excited species is mixed with a flow of NH3. The excited species activates the NH3. The substrate is exposed to both the activated NH3 and the excited species. The substrate can also be exposed to a precursor of another species to form a compound layer in a chemical vapor deposition. In addition, already-deposited layers can be nitrided by exposure to the activated NH3 and to the excited species, which results in higher levels of nitrogen incorporation than plasma nitridation using excited N2 alone, or thermal nitridation using NH3 alone, with the same process temperatures and nitridation durations.

摘要翻译： 通过暴露于远程激发的物质而活化的氮前体被用作形成含氮层的反应物。 远程激发的物质可以是例如已经在微波自由基发生器中激发的N 2，Ar和/或He。 在微波自由基发生器的下游和衬底的上游，受激物质的流动与NH 3流混合。 激发的物质激活NH3。 底物暴露于活化的NH 3和被激发的物质。 衬底也可以暴露于另一物质的前体，以在化学气相沉积中形成化合物层。 此外，已经沉积的层可以通过暴露于活化的NH 3和被激发的物质而被氮化，这导致比等离子体氮化更高的氮掺入水平，使用单独的使用激发的N 2，或者使用单独的NH 3进行热氮化，具有相同的工艺温度 和氮化时间。

公开(公告)号：US09136180B2

公开(公告)日：2015-09-15

申请号：US13359385

申请日：2012-01-26

申请人： Vladimir Machkaoutsan ,  Jan Willem Maes ,  Qi Xie

发明人： Vladimir Machkaoutsan ,  Jan Willem Maes ,  Qi Xie

IPC分类号： H01L21/8238 ,  H01L21/28 ,  H01L29/49 ,  H01L29/66 ,  H01L29/78

CPC分类号： H01L21/823842 ,  H01L21/28088 ,  H01L29/4966 ,  H01L29/66545 ,  H01L29/7833

摘要： According to some embodiments, an electrode have a high effective work function is formed. The electrode may be the gate electrode of a transistor and may be formed on a high-k gate dielectric by depositing a first layer of conductive material, exposing that first layer to a hydrogen-containing gas, and depositing a second layer of conductive material over the first layer. The first layer may be deposited using a non-plasma process in which the substrate is not exposed to plasma or plasma-generated radicals. The hydrogen-containing gas to which the first layer is exposed may include an excited hydrogen species, which may be part of a hydrogen-containing plasma, and may be hydrogen-containing radicals. The first layer may also be exposed to oxygen before depositing the second layer. The work function of the gate electrode in the gate stack may be about 5 eV or higher in some embodiments.

摘要翻译： 根据一些实施例，形成具有高有效功函数的电极。 电极可以是晶体管的栅极，并且可以通过沉积第一层导电材料，将第一层暴露于含氢气体，并将第二层导电材料沉积在高k栅极电介质上形成 第一层。 可以使用其中衬底不暴露于等离子体或等离子体产生的自由基的非等离子体工艺来沉积第一层。 第一层露出的含氢气体可以包括可以是含氢等离子体的一部分的被激发的氢物质，并且可以是含氢基团。 在沉积第二层之前，第一层也可能暴露于氧气。 在一些实施例中，栅极堆叠中的栅电极的功函数可以为约5eV或更高。

公开(公告)号：US09117773B2

公开(公告)日：2015-08-25

申请号：US12547911

申请日：2009-08-26

申请人： Eric J. Shero ,  Mohith Verghese ,  Jan Willem Maes

发明人： Eric J. Shero ,  Mohith Verghese ,  Jan Willem Maes

IPC分类号： H01L21/31 ,  H01L21/314 ,  C23C16/40 ,  C23C16/455 ,  H01L21/02 ,  H01L21/316

CPC分类号： H01L21/3141 ,  C23C16/405 ,  C23C16/45527 ,  H01L21/02181 ,  H01L21/0228 ,  H01L21/31645

摘要： Methods are provided herein for forming thin films comprising oxygen by atomic layer deposition. The thin films comprising oxygen can be deposited by providing higher concentration water pulses, a higher partial pressure of water in the reaction space, and/or a higher flow rate of water to a substrate in a reaction space. Thin films comprising oxygen can be used, for example, as dielectric oxides in transistors, capacitors, integrated circuits, and other semiconductor applications.

摘要翻译： 本文提供了通过原子层沉积形成包含氧的薄膜的方法。 包含氧的薄膜可以通过提供较高浓度的水脉冲，在反应空间中较高的水分压力和/或较高的反应空间中的基质流速来沉积。 包含氧的薄膜可以用作例如晶体管，电容器，集成电路和其它半导体应用中的电介质氧化物。

公开(公告)号：US20100022099A1

公开(公告)日：2010-01-28

申请号：US12573008

申请日：2009-10-02

申请人： Sebastian E. Van Nooten ,  Jan Willem Maes ,  Steven Marcus ,  Glen Wilk ,  Petri Räisänen ,  Kai-Erik Elers

发明人： Sebastian E. Van Nooten ,  Jan Willem Maes ,  Steven Marcus ,  Glen Wilk ,  Petri Räisänen ,  Kai-Erik Elers

IPC分类号： H01L21/302

CPC分类号： H01J37/32082 ,  C23C16/045 ,  C23C16/403 ,  C23C16/448 ,  C23C16/45519 ,  C23C16/45525 ,  C23C16/45542 ,  C23C16/45565 ,  C23C16/50 ,  C23C16/5096 ,  C23C16/52 ,  H01J37/3244 ,  H01J37/32935 ,  H01L21/02178 ,  H01L21/02274 ,  H01L21/0228 ,  H01L21/3141 ,  H01L21/3162 ,  H01L29/66181

摘要： In one aspect, non-conformal layers are formed by variations of plasma enhanced atomic layer deposition, where one or more of pulse duration, separation, RF power on-time, reactant concentration, pressure and electrode spacing are varied from true self-saturating reactions to operate in a depletion-effect mode. Deposition thus takes place close to the substrate surface but is controlled to terminate after reaching a specified distance into openings (e.g., deep DRAM trenches, pores, etc.). Reactor configurations that are suited to such modulation include showerhead, in situ plasma reactors, particularly with adjustable electrode spacing. In another aspect, alternately and sequentially contacting a substrate, the substrate including openings, with at least two different reactants, wherein an under-saturated dose of at least one of the reactants has been predetermined and the under-saturated dose is provided uniformly across the substrate surface, deposits a film that less than fully covers surfaces of the openings, leading to depletion effects in less accessible regions on the substrate surface

摘要翻译： 在一个方面，通过等离子体增强原子层沉积的变化形成非共形层，其中脉冲持续时间，分离，RF功率导通时间，反应物浓度，压力和电极间距中的一个或多个从真实的自饱和反应变化 以耗尽效应模式运行。 因此，沉积物靠近基底表面发生，但是在到达开口（例如，深的DRAM沟槽，孔隙等）中的特定距离之后被控制终止。 适用于这种调制的反应器配置包括喷头，原位等离子体反应器，特别是具有可调节的电极间距。 在另一方面，交替地和顺序地接触基底，包括开口的基底与至少两种不同的反应物接触，其中至少一种反应物的饱和剂量已被预先确定，并且不饱和剂量被均匀地提供在 衬底表面沉积小于完全覆盖开口表面的膜，导致在衬底表面上较不易接近的区域中的耗尽效应

公开(公告)号：US07629267B2

公开(公告)日：2009-12-08

申请号：US11370228

申请日：2006-03-06

申请人： Yuet Mei Wan ,  René de Blank ,  Jan Willem Maes

发明人： Yuet Mei Wan ,  René de Blank ,  Jan Willem Maes

IPC分类号： H01L21/31 ,  H01L21/469

CPC分类号： H01L21/02321 ,  C23C16/345 ,  C23C16/45523 ,  H01L21/02115 ,  H01L21/0217 ,  H01L21/02205 ,  H01L21/3115 ,  H01L21/3185 ,  H01L21/67017 ,  H01L21/67115 ,  H01L29/7833 ,  H01L29/7843

摘要： A silicon nitride film is formed on a substrate in a reaction chamber by introducing trisilane and a reactive nitrogen species into the chamber in separate pulses. A carbon precursor gas is also flowed into the chamber during introduction of the trisilane and/or during introduction of the reactive nitrogen species, or in pulses separate from the trisilane and reactive nitrogen species pulses. The carbon is used as a dopant in the silicon nitride film and advantageously allows a high stress silicon nitride film to be formed.

摘要翻译： 通过将丙硅烷和反应性氮物质以分开的脉冲引入室中，在反应室中的基板上形成氮化硅膜。 在引入丙硅烷期间和/或在引入反应性氮物质期间或在与丙硅烷和反应性氮物质脉冲分开的脉冲中，碳前体气体也流入室中。 碳在氮化硅膜中用作掺杂剂，有利地形成高应力氮化硅膜。

公开(公告)号：US10513772B2

公开(公告)日：2019-12-24

申请号：US13502925

申请日：2010-10-14

申请人： Tom E. Blomberg ,  Eva E. Tois ,  Robert Huggare ,  Jan Willem Maes ,  Vladimir Machkaoutsan ,  Dieter Pierreux

发明人： Tom E. Blomberg ,  Eva E. Tois ,  Robert Huggare ,  Jan Willem Maes ,  Vladimir Machkaoutsan ,  Dieter Pierreux

IPC分类号： C23C16/44 ,  C23C16/34 ,  C23C16/36 ,  C23C16/40 ,  C23C16/455

摘要： Methods are disclosed herein for depositing a passivation layer comprising fluorine over a dielectric material that is sensitive to chlorine, bromine, and iodine. The passivation layer can protect the sensitive dielectric layer thereby enabling deposition using precursors comprising chlorine, bromine, and iodine over the passivation layer.

公开(公告)号：US09238865B2

公开(公告)日：2016-01-19

申请号：US13367010

申请日：2012-02-06

申请人： Christophe Pomarede ,  Eric Shero ,  Mohith Verghese ,  Jan Willem Maes ,  Chang-Gong Wang

发明人： Christophe Pomarede ,  Eric Shero ,  Mohith Verghese ,  Jan Willem Maes ,  Chang-Gong Wang

IPC分类号： C23C14/24 ,  C23C16/04 ,  C23C16/448 ,  C23C16/455 ,  C23C16/52 ,  H01J37/32 ,  H01L21/02 ,  H01L21/314 ,  H01L21/316 ,  H01L21/28

CPC分类号： C23C16/45525 ,  C23C14/246 ,  C23C16/045 ,  C23C16/448 ,  C23C16/4482 ,  C23C16/4485 ,  C23C16/4486 ,  C23C16/45527 ,  C23C16/45561 ,  C23C16/52 ,  F17C2205/0142 ,  F17C2205/0146 ,  F17C2270/0518 ,  H01J37/32449 ,  H01L21/02148 ,  H01L21/02172 ,  H01L21/02181 ,  H01L21/0228 ,  H01L21/28194 ,  H01L21/3142 ,  H01L21/31645 ,  H01L27/10861

摘要： A vapor deposition method and apparatus including at least two vessels containing a same first source chemical. A controller is programmed to simultaneously pulse to the reaction space doses or pulses of a gas from the vessels, each of the doses having a substantially consistent concentration of the first source chemical. The apparatus may also include at least two vessels containing a same second source chemical. The controller can be programmed to simultaneously pulse to the reaction space doses or pulses of a gas from the vessels containing the second source chemical, each of the doses having a substantially consistent concentration of the second source chemical. The second source chemical can be pulsed to the reaction space after the reaction space is purged of an excess of the first source chemical.

摘要翻译： 一种气相沉积方法和装置，包括至少两个含有相同的第一源化学物质的容器。 控制器被编程为同时脉冲到来自容器的气体的反应空间剂量或脉冲，每个剂量具有基本上一致的第一源化学品浓度。 该装置还可以包括含有相同的第二源化学品的至少两个容器。 控制器可被编程为同时脉冲到来自含有第二源化学物质的容器的反应空间剂量或脉冲，每个剂量具有基本一致的第二源化学品浓度。 在反应空间被清除过量的第一源化学品之后，第二源化学品可以被脉冲到反应空间。

公开(公告)号：US20130203267A1

公开(公告)日：2013-08-08

申请号：US13367010

申请日：2012-02-06

申请人： Christophe Pomarede ,  Eric Shero ,  Mohith Verghese ,  Jan Willem Maes ,  Chang-Gong Wang

发明人： Christophe Pomarede ,  Eric Shero ,  Mohith Verghese ,  Jan Willem Maes ,  Chang-Gong Wang

IPC分类号： H01L21/314 ,  C23C16/52

CPC分类号： C23C16/45525 ,  C23C14/246 ,  C23C16/045 ,  C23C16/448 ,  C23C16/4482 ,  C23C16/4485 ,  C23C16/4486 ,  C23C16/45527 ,  C23C16/45561 ,  C23C16/52 ,  F17C2205/0142 ,  F17C2205/0146 ,  F17C2270/0518 ,  H01J37/32449 ,  H01L21/02148 ,  H01L21/02172 ,  H01L21/02181 ,  H01L21/0228 ,  H01L21/28194 ,  H01L21/3142 ,  H01L21/31645 ,  H01L27/10861

摘要： A vapor deposition method and apparatus including at least two vessels containing a same first source chemical. A controller is programmed to simultaneously pulse to the reaction space doses or pulses of a gas from the vessels, each of the doses having a substantially consistent concentration of the first source chemical. The apparatus may also include at least two vessels containing a same second source chemical. The controller can be programmed to simultaneously pulse to the reaction space doses or pulses of a gas from the vessels containing the second source chemical, each of the doses having a substantially consistent concentration of the second source chemical. The second source chemical can be pulsed to the reaction space after the reaction space is purged of an excess of the first source chemical.

摘要翻译： 一种气相沉积方法和装置，包括至少两个含有相同的第一源化学物质的容器。 控制器被编程为同时脉冲到来自容器的气体的反应空间剂量或脉冲，每个剂量具有基本上一致的第一源化学品浓度。 该装置还可以包括含有相同的第二源化学品的至少两个容器。 控制器可被编程为同时脉冲到来自含有第二源化学物质的容器的反应空间剂量或脉冲，每个剂量具有基本一致的第二源化学品浓度。 在反应空间被清除过量的第一源化学品之后，第二源化学品可以被脉冲到反应空间。

公开(公告)号：US08334218B2

公开(公告)日：2012-12-18

申请号：US12573008

申请日：2009-10-02

申请人： Sebastian E. Van Nooten ,  Jan Willem Maes ,  Steven Marcus ,  Glen Wilk ,  Petri Räisänen ,  Kai-Erik Elers

发明人： Sebastian E. Van Nooten ,  Jan Willem Maes ,  Steven Marcus ,  Glen Wilk ,  Petri Räisänen ,  Kai-Erik Elers

IPC分类号： H01L21/31 ,  H01L21/469

CPC分类号： H01J37/32082 ,  C23C16/045 ,  C23C16/403 ,  C23C16/448 ,  C23C16/45519 ,  C23C16/45525 ,  C23C16/45542 ,  C23C16/45565 ,  C23C16/50 ,  C23C16/5096 ,  C23C16/52 ,  H01J37/3244 ,  H01J37/32935 ,  H01L21/02178 ,  H01L21/02274 ,  H01L21/0228 ,  H01L21/3141 ,  H01L21/3162 ,  H01L29/66181

摘要： In one aspect, non-conformal layers are formed by variations of plasma enhanced atomic layer deposition, where one or more of pulse duration, separation, RF power on-time, reactant concentration, pressure and electrode spacing are varied from true self-saturating reactions to operate in a depletion-effect mode. Deposition thus takes place close to the substrate surface but is controlled to terminate after reaching a specified distance into openings (e.g., deep DRAM trenches, pores, etc.). Reactor configurations that are suited to such modulation include showerhead, in situ plasma reactors, particularly with adjustable electrode spacing. In another aspect, alternately and sequentially contacting a substrate, the substrate including openings, with at least two different reactants, wherein an under-saturated dose of at least one of the reactants has been predetermined and the under-saturated dose is provided uniformly across the substrate surface, deposits a film that less than fully covers surfaces of the openings, leading to depletion effects in less accessible regions on the substrate surface.

摘要翻译： 在一个方面，通过等离子体增强原子层沉积的变化形成非共形层，其中脉冲持续时间，分离，RF功率导通时间，反应物浓度，压力和电极间距中的一个或多个从真实的自饱和反应变化 以耗尽效应模式运行。 因此，沉积物靠近基底表面发生，但是在到达开口（例如，深的DRAM沟槽，孔隙等）中的特定距离之后被控制终止。 适用于这种调制的反应器配置包括喷头，原位等离子体反应器，特别是具有可调节的电极间距。 在另一方面，交替地和顺序地接触基底，包括开口的基底与至少两种不同的反应物接触，其中至少一种反应物的饱和剂量已被预先确定，并且不饱和剂量被均匀地提供在 衬底表面沉积小于完全覆盖开口表面的膜，导致在衬底表面上较不易接近的区域中的耗尽效应。