摘要:
Provided are an exposure apparatus and a prevention method and system for image offset of the exposure apparatus. The dust cover which is made of transparent material and arranged and arranged at one end of the bearing connected to the lifter enables to check whether the bearing is abraded via manual vision or machine vision, thereby enhancing the yield of the glass substrates achieved by photoetching in the photo process and thus improving the production efficiency of the photo process.
摘要:
Disclosed herein a vacuum ultra violet light source device that is capable of suppressing an amount of ozone generation when the vacuum ultra violet light is emitted into an atmosphere containing oxygen, a light irradiation device incorporating the vacuum ultra violet light device, and a method of patterning a self-assembled monolayer employing the light irradiation device. The light irradiation device is configured to irradiate a self-assembled monolayer (SAM) formed on a workpiece with light containing vacuum ultra violet light through a mask M on which a prescribed pattern is formed so as to perform a patterning process of the SAM. The light containing the vacuum ultra violet light to be irradiated onto the SAM is light that is pulsed light and has a duty ratio of light emission equal to or greater than 0.00001 and equal to or less than 0.01.
摘要:
An ignition facilitated electrodeless sealed high intensity illumination device is configured to receive a laser beam from a continuous wave (CW) laser light source. A sealed chamber is configured to contain an ionizable medium. The chamber has an ingress window disposed within a wall of a chamber interior surface configured to admit the laser beam into the chamber, a plasma sustaining region, and a high intensity light egress window configured to emit high intensity light from the chamber. The CW laser beam is producible by a CW laser below 250 Watts configured to produce a wavelength below 1100 nm. The device is configured to focus the laser beam to a full width at half maximum (FWHM) beam waist of 1-15 microns2 and a Rayleigh length of 6 microns or less, and the plasma is configured to be ignited by the CW laser beam.
摘要:
A cooling apparatus for cooling a light source unit is provided. The cooling apparatus includes a cooling unit provided outside a path of light from the light source unit, and a heat pipe configured to connect a heat generating portion of the light source unit and the cooling unit. The heat pipe also serves as an electrode wire of the light source unit.
摘要:
A method of lighting a light source apparatus that has a discharge lamp, a reflection mirror for reflecting light emitted from the discharge lamp, a light emission optical system for irradiating a work piece with light, one or more laser oscillator for emitting a laser beam to the discharge lamp, and a discharge starting unit for starting discharge. The method includes removing deposits adhering to an inner face of the discharge lamp by irradiating a discharge vessel with the laser beam from the first laser oscillator, starting discharge in the discharge vessel by the discharge starting unit, and condensing the laser beam from a second laser oscillator, into the discharge vessel.
摘要:
A discharge lamp lighting apparatus includes a transformer unit, a casing for housing the transformer unit, and a circuit board including circuit components. In the casing, the circuit board is joined to the casing and the transformer unit is fixed to the circuit board through a heat conductive member having thermal conductivity of more than 0.1 W/(m·k). Heat produced by the transformer unit is transferred to the casing through the heat conductive member and released through the casing effectively. In the lighting apparatus, therefore, while the transformer unit is arranged relatively close to the circuit components, the heat can be prevented from affecting the circuit components.
摘要:
A multi-spectral uniform light source provides a single light source for a variety of applications. The gas or gases inside the light source may be exchanged for another gas or gases depending on the desired application and need for a particular wavelength of emitted light.
摘要:
A protective cover for a lamp is flexible and made of a material that has a tensile strength so that the protective cover is impermeable to fragments produced from the lamp when the lamp breaks when covered by the protective cover. The protective cover is used to install the discharge lamp in a source and removed from the lamp after installing the lamp.
摘要:
A semiconductor manufacturing apparatus includes a light source and a lighting device that lights the light the light source A connector connects the light source and the lighting device with a metal piece to provide control of generation of noise accompanying increased electrical power supplied to the lamp and control of the space required for installation in a single housing having outer walls with electromagnetic shielding. Temperature of the light source and the lighting device is adjusted using air of the ambient atmosphere from outside the housing.
摘要:
A lighting unit with discharge lamps, particularly for spotlights and the like, comprising a discharge lamp inside a containment enclosure and ventilation elements for cooling the lamp, a control unit that drives a lamp power supply to supply variable power levels to the lamp and a fan power supply for actuating the ventilation elements at a variable speed. The control unit is controlled by signals imparted from outside and/or by signals that can be derived from measurements taken inside the lighting unit.