METHOD FOR FABRICATING AN INTERPOSER
    11.
    发明申请
    METHOD FOR FABRICATING AN INTERPOSER 有权
    用于制作间隔器的方法

    公开(公告)号:US20160020190A1

    公开(公告)日:2016-01-21

    申请号:US14744464

    申请日:2015-06-19

    Abstract: A method for fabricating an interposer is provided, which includes the steps of: providing a substrate body having a chip mounting side and an opposite external connection side and a plurality of conductive through holes communicating the chip mounting side and the external connection side, wherein the chip mounting side of the substrate body is covered with a protection layer; performing a singulation process on the external connection side of the substrate body; bonding the substrate body to a carrier via the external connection side thereof; removing the protection layer; and removing the carrier to form a plurality of interposers, thereby simplifying the fabrication process and improving the product yield.

    Abstract translation: 提供了一种制造插入件的方法,其包括以下步骤:提供具有芯片安装侧和相对的外部连接侧的基板主体和连接芯片安装侧和外部连接侧的多个导电通孔,其中, 衬底主体的芯片安装侧被保护层覆盖; 在所述基板主体的外部连接侧进行切割处理; 通过其外部连接侧将衬底本体连接到载体上; 去除保护层; 并移除载体以形成多个插入物,从而简化制造工艺并提高产品产率。

    Interconnection structure for package and fabrication method thereof
    17.
    发明授权
    Interconnection structure for package and fabrication method thereof 有权
    封装的互连结构及其制造方法

    公开(公告)号:US09076796B2

    公开(公告)日:2015-07-07

    申请号:US13894687

    申请日:2013-05-15

    Abstract: An interconnection structure for a package is disclosed. The interconnection structure includes a substrate body having a conductive portion formed on a surface thereof; a first photosensitive dielectric layer formed on the surface of the substrate body and having a via for exposing the conductive potion; a conductive via formed in the via; a second photosensitive dielectric layer formed on the first photosensitive dielectric layer and having a opening for exposing the conductive via and a portion of the first photosensitive dielectric layer; and a conductive trace layer formed in the opening of the second photosensitive dielectric layer so as to be electrically connected to the conductive portion through the conductive via, thereby simplifying the fabrication process and reducing the fabrication cost and time.

    Abstract translation: 公开了一种用于封装的互连结构。 互连结构包括在其表面上形成有导电部分的基板主体; 形成在所述基板主体的表面上并且具有用于使所述导电部暴露的通孔的第一光敏介电层; 在通孔中形成的导电通孔; 形成在所述第一光敏介电层上并具有用于使所述导电通孔和所述第一光敏介电层的一部分暴露的开口的第二光敏介电层; 以及形成在第二感光介电层的开口中的导电迹线层,以便通过导电通孔电连接到导电部分,从而简化制造工艺并降低制造成本和时间。

    PACKAGE STRUCTURE AND FABRICATION METHOD THEREOF
    18.
    发明申请
    PACKAGE STRUCTURE AND FABRICATION METHOD THEREOF 审中-公开
    包装结构及其制造方法

    公开(公告)号:US20140117538A1

    公开(公告)日:2014-05-01

    申请号:US13949557

    申请日:2013-07-24

    Abstract: A fabrication method of a package structure is provided, which includes the steps of: providing an interposer having a plurality of recess holes; forming a conductive bump in a lower portion of each of the recess holes; forming a conductive through hole on the conductive bump in each of the recess holes; removing a portion of the interposer so as for the conductive bumps to protrude from the interposer; and mounting at least a first external element on the conductive bumps, thereby simplifying the fabrication process, shortening the process time and reducing the material cost.

    Abstract translation: 提供一种封装结构的制造方法,其包括以下步骤:提供具有多个凹陷孔的插入件; 在每个凹槽的下部形成导电凸块; 在每个凹孔中的导电凸块上形成导电通孔; 去除所述插入件的一部分,以使所述导电凸起从所述插入件突出; 并且至少将第一外部元件安装在导电凸块上,从而简化制造工艺,缩短处理时间并降低材料成本。

    FABRICATION METHOD OF SUBSTRATE HAVING ELECTRICAL INTERCONNECTION STRUCTURES

    公开(公告)号:US20200370184A1

    公开(公告)日:2020-11-26

    申请号:US16991999

    申请日:2020-08-12

    Abstract: A method for fabricating a substrate having an electrical interconnection structure is provided, which includes the steps of: providing a substrate body having a plurality of conductive pads and first and second passivation layers sequentially formed on the substrate body and exposing the conductive pads; forming a seed layer on the second passivation layer and the conductive pads; forming a first metal layer on each of the conductive pads, wherein the first metal layer is embedded in the first and second passivation layers without being protruded from the second passivation layer; and forming on the first metal layer a second metal layer protruded from the second passivation layer. As such, when the seed layer on the second passivation layer is removed by etching using an etchant, the etchant will not erode the first metal layer, thereby preventing an undercut structure from being formed underneath the second metal layer.

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