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    Three-dimensional micro-truss structure
    24.
    发明授权
    Three-dimensional micro-truss structure 有权

    公开(公告)号：US10189226B1

    公开(公告)日：2019-01-29

    申请号：US14156299

    申请日：2014-01-15

    Applicant: HRL LABORATORIES, LLC

    Inventor： Joanna A. Kolodziejska ,  Alan J. Jacobsen

    IPC: B32B3/12 ,  B81B7/04 ,  G02B6/138

    Abstract: A three-dimensional micro-truss structure includes: a plurality of first struts extending along a first direction; a plurality of second struts extending along a second direction; a plurality of third struts extending along a third direction; and a plurality of fourth struts extending along a fourth direction, wherein the first, second, third, and fourth struts interpenetrate one another at a plurality of nodes and wherein at least one of the first, second, and third directions extends at a non-perpendicular angle with respect to a plane, the plane being substantially perpendicular to the fourth direction.

    Self-forming diffraction gratings
    28.
    发明授权
    Self-forming diffraction gratings 有权
    自成像衍射光栅

    公开(公告)号：US09377567B1

    公开(公告)日：2016-06-28

    申请号：US13918711

    申请日：2013-06-14

    Applicant: HRL LABORATORIES, LLC

    Inventor： Alan J. Jacobsen ,  Oleg M. Efimov ,  William Carter ,  Sophia S. Yang

    IPC: G02B5/18

    CPC classification number: G02B5/1847 ,  G02B5/18 ,  G02B5/1857 ,  G03F7/0005

    Abstract: A diffraction grating and a method for fabricating the diffraction grating. In one embodiment, a layer of photo-monomer is applied to a substrate and the photomonomer is exposed to a collimated beam of light to form the diffraction grating. The intensity of the collimated beam of light incident on the layer of photo-monomer may have substantially no spatial variation across the first collimated beam of light.

    Abstract translation: 衍射光栅和衍射光栅的制造方法。 在一个实施方案中，将一层光单体施加到基底上，并将光单体暴露于准直光束以形成衍射光栅。 入射在光单体层上的准直光束的强度可能在第一准直光束上基本上没有空间变化。

    STACKED MICROLATTICE MATERIALS AND FABRICATION PROCESSES
    29.
    发明申请
    STACKED MICROLATTICE MATERIALS AND FABRICATION PROCESSES 有权
    堆叠微晶材料和制造工艺

    公开(公告)号：US20160047980A1

    公开(公告)日：2016-02-18

    申请号：US14461841

    申请日：2014-08-18

    Applicant: HRL LABORATORIES, LLC

    Inventor： David Page ,  Sophia S. Yang ,  Alan J. Jacobsen ,  Zak C. Eckel ,  Christopher S. Roper ,  William Carter

    IPC: G02B6/122 ,  B29C67/20 ,  G02B6/138

    CPC classification number: G02B6/1225 ,  B29C64/129 ,  B29C64/286 ,  B29K2096/00 ,  B33Y10/00 ,  B33Y30/00 ,  B33Y80/00 ,  G02B1/002 ,  G02B6/138 ,  G02B2006/12173 ,  G03F7/0037 ,  G03F7/2012 ,  G03F7/70416

    Abstract: A system and method for forming microlattice structures of large thickness. In one embodiment, a photomonomer resin is secured in a mold having a transparent bottom, the interior surface of which is coated with a mold-release agent. A substrate is placed in contact with the top surface of the photomonomer resin. The photomonomer resin is illuminated from below by one or more sources of collimated light, through a photomask, causing polymer waveguides to form, extending up to the substrate, forming a microlattice structure connected with the substrate. After a layer of microlattice structure has formed, the substrate is raised using a translation-rotation system, additional photomonomer resin is added to the mold, and the photomonomer resin is again illuminated through the photomask, to form an additional layer of microlattice structure. The process is repeated multiple times to form a stacked microlattice structure.

    Abstract translation: 一种用于形成大厚度的微晶格结构的系统和方法。 在一个实施方案中，将光单体树脂固定在具有透明底部的模具中，其内表面涂覆有脱模剂。 将基底放置成与光单体树脂的顶表面接触。 通过一个或多个准直光源通过光掩模从下面照射光单体树脂，导致聚合物波导形成，延伸到衬底，形成与衬底连接的微晶格结构。 在形成一层微晶格结构之后，使用平移 - 旋转系统升高基板，向模具中加入额外的光单体树脂，并且通过光掩模再次照射光单体树脂，以形成附加的微格子结构层。 该过程重复多次以形成堆叠的微格子结构。

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