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公开(公告)号：US20160042913A1
公开(公告)日：2016-02-11
申请号：US14819402
申请日：2015-08-05
Applicant: Intevac, Inc.
Inventor： Babak Adibi , Vinay Prabhakar , Terry Bluck
IPC: H01J37/20 , H01J37/18 , H01J37/317
CPC classification number: H01J37/20 , H01J37/185 , H01J37/3045 , H01J37/3171 , H01J2237/2007 , H01J2237/202 , H01J2237/204 , H01J2237/31701 , H01J2237/31711
Abstract: System and method to align a substrate under a shadow mask. A substrate holder has alignment mechanism, such as rollers, that is made to abut against an alignment straight edge. The substrate is then aligned with respect to the straight edge and is chucked to the substrate holder. The substrate holder is then transported into a vacuum processing chamber, wherein it is made to abut against a mask straight edge to which the shadow mask is attached and aligned to. Since the substrate was aligned to an alignment straight edge, and since the mask is aligned to the mask straight edge that is precisely aligned to the alignment straight edge, the substrate is perfectly aligned to the mask.
Abstract translation: 将底物对准荫罩的系统和方法。 衬底保持器具有对准机构，例如辊，其抵靠对准直边缘。 然后将衬底相对于直边对准，并被夹持到衬底保持器。 然后将衬底保持器输送到真空处理室中，其中它与邻接荫罩直线边缘抵接，荫罩直线边缘与阴罩对准。 由于衬底与对准直边对准，并且由于掩模与精确地对准直线对准的掩模直边对准，所以基板与掩模完全对准。
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公开(公告)号：US20140332376A1
公开(公告)日：2014-11-13
申请号：US14185867
申请日：2014-02-20
Applicant: INTEVAC, INC.
Inventor： Vinay Shah , Alex Riposan , Terry Bluck
IPC: H01J37/34
CPC classification number: C23C14/351 , C23C14/35 , C23C14/56 , H01J37/32779 , H01J37/32899 , H01J37/3405 , H01J37/3417 , H01J37/3452 , H01J37/3455 , H01J2237/202 , H01J2237/3323
Abstract: A system for depositing material from a target onto substrates, comprising a processing chamber; a sputtering target having length L and having sputtering material provided on front surface thereof; a magnet operable to reciprocally scan across the length L in close proximity to rear surface of the target; and a counterweight operable to reciprocally scan at same speed but opposite direction of the magnet.
Abstract translation: 一种用于将材料从靶材沉积到基材上的系统，包括处理室; 具有长度L并在其前表面上设置有溅射材料的溅射靶; 一个磁铁可操作以在紧邻目标的后表面的整个长度L上往复扫描; 以及配重可操作以在与磁体相同的速度但相反的方向上往复扫描。
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公开(公告)号：US20130287526A1
公开(公告)日：2013-10-31
申请号：US13871871
申请日：2013-04-26
Applicant: INTEVAC, INC.
Inventor： Terry Bluck , Vinay Shah , Alex Riposan
IPC: H01L21/677
CPC classification number: H01L21/67709 , H01L21/67173 , H01L21/67736 , H01L21/67739 , H01L21/67754 , H01L21/67769 , H01L21/67775 , H01L21/67778 , H01L21/67781 , H01L21/68742 , H01L21/68785
Abstract: A system for processing substrates in plasma chambers, such that all substrates transport and loading/unloading operations are performed in atmospheric environment, but processing is performed in vacuum environment. The substrates are transported throughout the system on carriers. The system's chambers are arranged linearly, such that carriers move from one chamber directly to the next. A conveyor, placed above or below the system's chambers, returns the carriers to the system's entry area after processing is completed. Loading and unloading of substrates may be performed at one side of the system, or loading can be done at the entry side and unloading at the exit side.
Abstract translation: 用于处理等离子体室中的衬底的系统，使得在大气环境中执行所有衬底的输送和加载/卸载操作，但是在真空环境中进行处理。 基板在载体上通过系统传送。 系统的室线性布置，使得载体从一个室直接移动到下一个室。 放置在系统腔室上方或下方的输送机在处理完成后将载体返回到系统的进入区域。 可以在系统的一侧进行基板的装载和卸载，或者可以在入口侧进行装载并在出口侧卸载。
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公开(公告)号：US20230176256A1
公开(公告)日：2023-06-08
申请号：US18076644
申请日：2022-12-07
Applicant: INTEVAC, INC.
Inventor： Samuel D. Harkness, IV , Tom Nolan , Jae Ha Choi , Alexander Vassilievich Demtchouk , Terry Bluck
CPC classification number: G02B1/115 , B29D11/0073 , B29D11/00884 , G02B1/14
Abstract: A system and method for fabricating protective coating for transparent panels, especially beneficial for transparent panels covering digital displays. The protective coating includes an adhesion layer formed on a surface of the transparent panel, a stress grading intermediate layer formed over the adhesion layer, a protective layer formed over the stress grading intermediate layer, and an anti-reflective layer formed over the protective layer. Also provided is a sputtering system for fabricating the protective coating.
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公开(公告)号：US10446430B2
公开(公告)日：2019-10-15
申请号：US15410634
申请日：2017-01-19
Applicant: Intevac, Inc.
Inventor： Terry Bluck , Babak Adibi , Vinay Prabhakar , William Eugene Runstadler, Jr.
IPC: H01L21/683 , H01L21/66 , H01L21/67 , H01L21/687
Abstract: A chuck for wafer processing that counters the deleterious effects of thermal expansion of the wafer. Also, a combination of chuck and shadow mask arrangement that maintains relative alignment between openings in the mask and the wafer in spite of thermal expansion of the wafer. A method for fabricating a solar cell by ion implant, while maintaining relative alignment of the implanted features during thermal expansion of the wafer.
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Patent Agency Ranking
公开(公告)号：US20190027636A1
公开(公告)日：2019-01-24
申请号：US16040423
申请日：2018-07-19
Applicant: Intevac, Inc.
Inventor： William Eugene Runstadler, JR. , Babak Adibi , Terry Bluck
IPC: H01L31/18 , H01L31/068 , H01J37/20 , H01J37/304 , H01J37/317
Abstract: A system for transporting substrates and precisely alignment the substrates to shadow masks. The system decouples the functions of transporting the substrates, vertically aligning the substrates, and horizontally aligning the substrates. The transport system includes a carriage upon which plurality of pedestals are loosely positioned, each of the pedestals includes a base having vertical alignment wheels to place the substrate in precise vertical alignment. Two sidebars are configured to freely slide on the base. Each of the sidebars includes a set of horizontal alignment wheels that precisely align the substrate in the horizontal direction. Substrate support claws are attached to the sidebars in precise alignment to the vertical alignment wheels and the horizontal alignment wheels.
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公开(公告)号：US20190027635A1
公开(公告)日：2019-01-24
申请号：US16040387
申请日：2018-07-19
Applicant: Intevac, Inc.
Inventor： Hoang Huy Vu , Babak Adibi , Terry Bluck
IPC: H01L31/18 , H01J37/317 , H01J37/20 , H01L31/0203
Abstract: A system for transporting substrates and precisely align the substrates horizontally and vertically. The system decouples the functions of transporting the substrates, vertically aligning the substrates, and horizontally aligning the substrates. The transport system includes a carriage upon which plurality of chuck assemblies are loosely positioned, each of the chuck assemblies includes a base having vertical alignment wheels to place the substrate in precise vertical alignment. A pedestal is configured to freely slide on the base. The pedestal includes a set of horizontal alignment wheels that precisely align the pedestal in the horizontal direction. An electrostatic chuck is magnetically held to the pedestal.
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公开(公告)号：US20180348409A1
公开(公告)日：2018-12-06
申请号：US15996323
申请日：2018-06-01
Applicant: Intevac, Inc.
Inventor： Terry Bluck , Gaurav Saraf , James Craig Hunter , Changwan Hwang , Paul R. Markoff Johnson , Jae Ha Choi
Abstract: An optical coating, such as anti-reflective coating (ARC) or colored coating for optical devices, suitable especially for mobile devices. The ARC is made up of alternating layers of low refractive index and high refractive index. At least one of the layers, preferably the top layer, is made up of nano-laminate. The nano-laminate is a structure of alternating nano-layers, each nano-layer made out of a material having refractive index similar to the layer it replaces. Optionally, each of the layers are made up of nano-laminates, such that a layer having low refractive index is made up of nano-laminates of nano-layers having low refractive index, while high index layers are made up of nano-lamonate of nano-layers having high refractive index. Each of the nano-layers is of 2-10 nanometer thickness.
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公开(公告)号：US10106883B2
公开(公告)日：2018-10-23
申请号：US14185859
申请日：2014-02-20
Applicant: Intevac, Inc.
Inventor： Vinay Shah , Alexandru Riposan , Terry Bluck , Vladimir Kudriavtsev
Abstract: A sputtering system having a processing chamber with an inlet port and an outlet port, and a sputtering target positioned on a wall of the processing chamber. A movable magnet arrangement is positioned behind the sputtering target and reciprocally slides behind the target. A conveyor continuously transports substrates at a constant speed past the sputtering target, such that at any given time, several substrates face the target between the leading edge and the trailing edge. In certain embodiments, the movable magnet arrangement slides at a speed that is at least several times faster than the constant speed of the conveyor. A rotating zone is defined behind the leading edge and trailing edge of the target, wherein the magnet arrangement decelerates when it enters the rotating zone and accelerates as it reverses direction of sliding within the rotating zone. In certain embodiments, magnet power and/or speed varies as function of direction of magnet travel.
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公开(公告)号：US10062600B2
公开(公告)日：2018-08-28
申请号：US14627667
申请日：2015-02-20
Applicant: Intevac, Inc.
Inventor： Terry Bluck , Vinay Shah , Ian Latchford , Alexandru Riposan
IPC: H01L21/677 , H01L21/687 , H01L21/67
CPC classification number: H01L21/68785 , H01L21/67173 , H01L21/67736 , H01L21/67754
Abstract: A system for processing substrates in plasma chambers, such that all substrates transport and loading/unloading operations are performed in atmospheric environment, but processing is performed in vacuum environment. The substrates are transported throughout the system on carriers. The system's chambers are arranged linearly, such that carriers move from one chamber directly to the next. A conveyor, placed above or below the system's chambers, returns the carriers to the system's entry area after processing is completed. The carriers are configured for supporting substrates of different sizes. The carriers are also configured for flipping the substrates such that both surfaces of the substrates may be processed.
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