公开(公告)号：US20090317937A1

公开(公告)日：2009-12-24

申请号：US12200117

申请日：2008-08-28

申请人： Atul Gupta ,  Nicholas Bateman ,  Paul Murphy ,  Anthony Renau ,  Charles Carlson

发明人： Atul Gupta ,  Nicholas Bateman ,  Paul Murphy ,  Anthony Renau ,  Charles Carlson

IPC分类号： H01L21/00

CPC分类号： H01J37/3172 ,  H01J2237/31701 ,  H01L21/265 ,  H01L31/022425 ,  H01L31/068 ,  H01L31/1804 ,  Y02E10/547 ,  Y02P70/521

摘要： A improved, lower cost method of producing solar cells utilizing selective emitter design is disclosed. The contact regions are created on the substrate without the use of lithography or masks. The method utilizes ion implantation technology, and the relatively low accuracy requirements of the contact regions to reduce the process steps needed to produce a solar cell. In some embodiments, the current of the ion beam is selectively modified to create the highly doped contact regions. In other embodiments, the ion beam is focused, either through the use of an aperture or via adjustments to the beam line components to create the necessary doping profile. In still other embodiments, the wafer scan rate is modified to create the desired ion implantation pattern.

摘要翻译： 公开了一种利用选择性发射极设计制造太阳能电池的成本较低的方法。 在不使用光刻或掩模的情况下，在基板上形成接触区域。 该方法利用离子注入技术，并且接触区域的相对低的精度要求减少了生产太阳能电池所需的工艺步骤。 在一些实施例中，选择性地修改离子束的电流以产生高度掺杂的接触区域。 在其他实施例中，离子束通过使用孔径或通过调整到束线分量来聚焦以产生必要的掺杂分布。 在其他实施例中，晶片扫描速率被修改以产生期望的离子注入图案。

公开(公告)号：US20090227097A1

公开(公告)日：2009-09-10

申请号：US12397542

申请日：2009-03-04

申请人： Nicholas Bateman ,  Atul Gupta ,  Christopher Hatem ,  Deepak Ramappa

发明人： Nicholas Bateman ,  Atul Gupta ,  Christopher Hatem ,  Deepak Ramappa

IPC分类号： H01L21/22

CPC分类号： H01L33/025 ,  H01L21/26513 ,  H01L31/022441 ,  H01L31/0236 ,  H01L31/03529 ,  H01L31/0682 ,  H01L31/1864 ,  Y02E10/547 ,  Y02P70/521

摘要： A method of tailoring the dopant profile of a substrate by utilizing two different dopants, each having a different diffusivity is disclosed. The substrate may be, for example, a solar cell. By introducing two different dopants, such as by ion implantation, furnace diffusion, or paste, it is possible to create the desired dopant profile. In addition, the dopants may be introduced simultaneously, partially simultaneously, or sequentially. Dopant pairs preferably consist of one lighter species and one heavier species, where the lighter species has a greater diffusivity. For example, dopant pairs such as boron and gallium, boron and indium, phosphorus and arsenic, and phosphorus and antimony, can be utilized.

摘要翻译： 公开了通过利用两种不同的掺杂剂来调整衬底的掺杂剂分布的方法，每种掺杂剂具有不同的扩散率。 衬底可以是例如太阳能电池。 通过引入两种不同的掺杂剂，例如通过离子注入，炉扩散或糊状物，可以产生所需的掺杂剂分布。 此外，掺杂剂可以同时，部分同时或顺序地引入。 掺杂剂对优选由一种较轻的物质和一种较重的物质组成，其中较轻的物质具有较大的扩散系数。 例如，可以使用诸如硼和镓，硼和铟，磷和砷的掺杂物对，以及磷和锑。

公开(公告)号：US20080237496A1

公开(公告)日：2008-10-02

申请号：US11693308

申请日：2007-03-29

申请人： Atul Gupta

发明人： Atul Gupta

IPC分类号： G21K5/10

CPC分类号： H01J37/08 ,  H01J37/3171 ,  H01J2237/022

摘要： Techniques improving the performance and extending the lifetime of an ion source with gas mixing are disclosed. In one particular exemplary embodiment, the techniques may be realized as a method for improving performance and extending lifetime of an ion source in an ion implanter. The method may comprise introducing a predetermined amount of dopant gas into an ion source chamber. The dopant gas may comprise a dopant species. The method may also comprise introducing a predetermined amount of diluent gas into the ion source chamber. The diluent gas may dilute the dopant gas to improve the performance and extend the lifetime of the ion source. The diluent gas may further comprise a co-species that is the same as the dopant species.

摘要翻译： 公开了通过气体混合改善离子源的性能和延长寿命的技术。 在一个特定的示例性实施例中，可以将技术实现为用于改善离子注入机中的离子源的性能和延长寿命的方法。 该方法可以包括将预定量的掺杂剂气体引入到离子源室中。 掺杂剂气体可以包括掺杂剂物质。 该方法还可以包括将预定量的稀释气体引入离子源室。 稀释气体可以稀释掺杂气体以改善性能并延长离子源的寿命。 稀释气体还可以包含与掺杂剂物质相同的共同物质。

公开(公告)号：US20080073550A1

公开(公告)日：2008-03-27

申请号：US11477335

申请日：2006-06-29

申请人： Atul Gupta ,  Joseph C. Olson ,  Gregg A. Norris

发明人： Atul Gupta ,  Joseph C. Olson ,  Gregg A. Norris

IPC分类号： G01K1/08

CPC分类号： H01J37/3171 ,  G01J1/04 ,  G01J1/0437 ,  G01J1/0448 ,  G01J1/4257 ,  G01J2001/4261 ,  H01J37/244 ,  H01J2237/2446 ,  H01J2237/24507 ,  H01J2237/24542 ,  H01J2237/24578 ,  H01J2237/30472 ,  H01J2237/31703

摘要： A beam density measurement system includes a shield, a beam sensor, and an actuator. The beam sensor is positioned downstream from the shield in a direction of travel of a beam. The beam sensor is configured to sense an intensity of the beam, and the beam sensor has a long dimension and a short dimension. The actuator translates the shield relative to the beam sensor, wherein the shield blocks at least a portion of the beam from the beam sensor as the shield is translated relative to the beam sensor, and wherein measured values of the intensity associated with changes in a position of the shield relative to the beam sensor are representative of a beam density distribution of the beam in a first direction defined by the long dimension of the beam sensor.

摘要翻译： 光束密度测量系统包括屏蔽，光束传感器和致动器。 光束传感器沿着光束的行进方向定位在屏蔽的下游。 光束传感器被配置为感测光束的强度，并且光束传感器具有长尺寸和短尺寸。 执行器相对于光束传感器平移屏蔽，其中当屏蔽件相对于光束传感器平移时，屏蔽件阻挡来自光束传感器的光束的至少一部分，并且其中与位置变化相关联的强度的测量值 屏蔽物相对于光束传感器的光束密度分布代表由光束传感器的长尺寸限定的第一方向上的光束的光束密度分布。

公开(公告)号：US20070170369A1

公开(公告)日：2007-07-26

申请号：US11537011

申请日：2006-09-29

申请人： Kenneth H. Purser ,  Atul Gupta

发明人： Kenneth H. Purser ,  Atul Gupta

IPC分类号： H01J37/153

CPC分类号： H01J37/147 ,  H01J37/3007 ,  H01J2237/1501 ,  H01J2237/152 ,  H01J2237/30477 ,  H01J2237/31701

摘要： A technique for improving uniformity of a ribbon beam is disclosed. In one particular exemplary embodiment, an apparatus may comprise a first corrector-bar assembly and a second corrector-bar assembly, wherein the second corrector-bar assembly is located at a predetermined distance from the first corrector-bar assembly. Each of a first plurality of coils in the first corrector-bar assembly may be individually excited to deflect at least one beamlet in the ribbon beam, thereby causing the beamlets to arrive at the second corrector-bar assembly in a desired spatial spread. Each of a second plurality of coils in the second corrector-bar assembly may be individually excited to further deflect one or more beamlets in the ribbon beam, thereby causing the beamlets to exit the second corrector-bar assembly at desired angles.

摘要翻译： 公开了一种用于提高带状束的均匀性的技术。 在一个特定示例性实施例中，装置可以包括第一校正杆组件和第二校正杆组件，其中第二校正杆组件位于距离第一校正杆组件预定距离处。 第一校正棒组件中的第一组多个线圈中的每一个可以被单独地激发以偏转带束束中的至少一个子束，从而使子束以期望的空间扩展到达第二校正器组件。 可以单独地激励第二校正棒组件中的第二组多个线圈中的每一个以进一步偏转带状束中的一个或多个子束，从而使子束以期望的角度离开第二校正棒组件。

公开(公告)号：US20060208203A1

公开(公告)日：2006-09-21

申请号：US11146064

申请日：2005-06-07

申请人： Atul Gupta ,  Joseph Olson

发明人： Atul Gupta ,  Joseph Olson

IPC分类号： H01J37/302 ,  H01J37/317

CPC分类号： H01L21/26586 ,  H01J37/304 ,  H01J37/3171 ,  H01J2237/24528 ,  H01J2237/30455 ,  H01J2237/30472 ,  H01J2237/31703 ,  H01L29/66803 ,  H01L29/785

摘要： A technique for ion beam angle process control is disclosed. In one particular exemplary embodiment, the technique may be realized as a method for ion beam angle process control in an ion implanter system. The method may comprise directing one or more ion beams at a substrate surface. The method may also comprise determining an average spread of incident angles at which the one or more ion beams strike the substrate surface. The method may further comprise adjusting the one or more ion beams based at least in part on the average spread of incident angles to produce a desired spread of ion beam incident angles.

摘要翻译： 公开了一种用于离子束角过程控制的技术。 在一个特定的示例性实施例中，该技术可以被实现为离子注入机系统中的离子束角度过程控制的方法。 该方法可以包括在衬底表面处引导一个或多个离子束。 该方法还可以包括确定一个或多个离子束撞击衬底表面的入射角的平均扩展。 该方法还可以包括至少部分地基于入射角的平均扩展来调整一个或多个离子束，以产生期望的离子束入射角的扩展。

公开(公告)号：US20050267899A1

公开(公告)日：2005-12-01

申请号：US10956665

申请日：2004-10-01

申请人： Atul Gupta ,  Amar Singh

发明人： Atul Gupta ,  Amar Singh

IPC分类号： G06F7/00 ,  G06F17/30

CPC分类号： G06F17/30315 ,  Y10S707/99942

摘要： The present invention includes an apparatus, method and system for loading data into a database. The invention includes a spreadsheet dataset, having data in the form of one or more records, a control file containing a set of rules, each rule having a condition and a spreadsheet loader. The spreadsheet dataset and the control file are inputs to the spreadsheet loader. Each rule in the control file is evaluated for each record to determine if the condition is true for the record, and the records are parsed if the condition is true. The spreadsheet loader sends the parsed data to the database. The invention includes a user interface to facilitate creation of the control file.

摘要翻译： 本发明包括用于将数据加载到数据库中的装置，方法和系统。 本发明包括具有一个或多个记录形式的数据的电子数据表数据集，包含一组规则的控制文件，每个规则具有条件和电子表格加载器。 电子数据表数据集和控制文件是电子表格加载程序的输入。 为每个记录评估控制文件中的每个规则，以确定该条件是否为该记录，如果条件为真，记录将被解析。 电子表格加载器将解析的数据发送到数据库。 本发明包括用于简化控制文件的创建的用户界面。

公开(公告)号：US20050254567A1

公开(公告)日：2005-11-17

申请号：US11187267

申请日：2005-07-22

申请人： Apu Sivadas ,  Atul Gupta ,  Kenneth Lazaris-Brunner ,  Vasilis Papanikolaou ,  Rajiv Shukla ,  Bharat Tailor

发明人： Apu Sivadas ,  Atul Gupta ,  Kenneth Lazaris-Brunner ,  Vasilis Papanikolaou ,  Rajiv Shukla ,  Bharat Tailor

IPC分类号： H04L25/03 ,  H03H7/30 ,  H03H21/00 ,  H04B3/04 ,  H04L25/00 ,  H04L27/08

CPC分类号： H04L25/03885

摘要： Transmit amplitude independent adaptive equalizers are provided that compensate for transmission losses in an input signal when the transmit signal amplitude is unknown. Several embodiments are provided, including a first embodiment having an equalizer core, a controllable-swing slicer and an amplitude control loop, a second embodiment having an equalizer core, a fixed-swing slicer and a control loop, a third embodiment having an equalizer core, a variable gain amplifier, and a variable gain amplifier control loop, and a fourth embodiment having an equalizer core, a fixed-swing slicer, a variable gain amplifier, and a variable gain amplifier control loop.

公开(公告)号：US20050047500A1

公开(公告)日：2005-03-03

申请号：US10930933

申请日：2004-08-31

申请人： Atul Gupta ,  Wesley d'Haene

发明人： Atul Gupta ,  Wesley d'Haene

IPC分类号： H03H17/08 ,  H03H21/00 ,  H03K5/159 ,  H03L7/00 ,  H03L7/085 ,  H04L7/02 ,  H04L25/03 ,  H04L27/01

CPC分类号： H04L25/03885 ,  H03L7/085 ,  H04L7/033 ,  H04L7/044 ,  H04L25/03038

摘要： In accordance with the teachings described herein, systems and methods are provided for a precision adaptive equalizer. A variable gain equalizer may be used to apply a variable gain to an input signal to generate an equalized output signal. A phase and pattern detector circuit may be coupled in a feedback loop with the variable gain equalizer. The phase and pattern detector circuit may be used to identify a high frequency data pattern in the equalized output signal and compare the high frequency data pattern with a clock signal to detect a high frequency phase error. The phase and pattern detector circuit may be further operable to generate an automatic gain control signal as a function of the high frequency phase error, the automatic gain control signal being fed back to the variable gain equalizer to control the variable gain applied to the input signal.

摘要翻译： 根据本文所述的教导，为精度自适应均衡器提供了系统和方法。 可变增益均衡器可用于向输入信号施加可变增益以产生均衡的输出信号。 相位和图案检测器电路可以与可变增益均衡器在反馈回路中耦合。 相位和模式检测器电路可用于识别均衡输出信号中的高频数据模式，并将高频数据模式与时钟信号进行比较，以检测高频相位误差。 相位和模式检测器电路还可以用于产生作为高频相位误差的函数的自动增益控制信号，自动增益控制信号被反馈到可变增益均衡器以控制施加到输入信号的可变增益 。

公开(公告)号：US08735234B2

公开(公告)日：2014-05-27

申请号：US13028562

申请日：2011-02-16

申请人： Atul Gupta ,  Nicholas Bateman

发明人： Atul Gupta ,  Nicholas Bateman

IPC分类号： H01L21/338 ,  H01L21/8238 ,  H01L21/8242

CPC分类号： H01L21/2254 ,  H01L21/26513 ,  H01L21/266 ,  H01L31/1804 ,  Y02P70/521

摘要： An improved method of doping a substrate is disclosed. The method is particularly beneficial to the creation of interdigitated back contact (IBC) solar cells. A paste having a dopant of a first conductivity is applied to the surface of the substrate. This paste serves as a mask for a subsequent ion implantation step, allowing ions of a dopant having an opposite conductivity to be introduced to the portions of the substrate which are exposed. After the ions are implanted, the mask can be removed and the dopants may be activated. Methods of using an aluminum-based and phosphorus-based paste are disclosed.

摘要翻译： 公开了改进的掺杂衬底的方法。 该方法特别有利于产生叉指式背接触（IBC）太阳能电池。 将具有第一导电性的掺杂剂的糊剂施加到基板的表面。 该糊剂用作随后的离子注入步骤的掩模，允许具有相反电导率的掺杂剂的离子被引入到暴露的衬底的部分。 离子注入后，可以去除掩模，并且可以激活掺杂剂。 公开了使用铝基和磷基糊的方法。