公开(公告)号：US20180350557A1

公开(公告)日：2018-12-06

申请号：US15992862

申请日：2018-05-30

Applicant: SUMITOMO HEAVY INDUSTRIES ION TECHNOLOGY CO., LTD.

Inventor： Hiroshi Matsushita

IPC: H01J37/304 ,  H01J37/317 ,  H01J37/08

CPC classification number: H01J37/304 ,  H01J37/08 ,  H01J37/3171 ,  H01J2237/0473 ,  H01J2237/30472 ,  H01J2237/31703

Abstract: An ion implanter includes an ion source configured to generate an ion beam including an ion of a nonradioactive nuclide, a beamline configured to support an ion beam irradiated target, and a controller configured to calculate an estimated radiation dosage of a radioactive ray generated by a nuclear reaction between the ion of the nonradioactive nuclide incident into the ion beam irradiated target and the nonradioactive nuclide accumulated in the ion beam irradiated target as a result of ion beam irradiation performed previously.

公开(公告)号：US20180286633A1

公开(公告)日：2018-10-04

申请号：US15760994

申请日：2015-09-25

Applicant: HITACHI HIGH-TECHNOLOGIES CORPORATION

Inventor： Kengo ASAI ,  Toru IWAYA ,  Hisayuki TAKASU ,  Hiroyasu SHICHI

IPC: H01J37/31 ,  H01J37/28 ,  H01J37/20 ,  H01J37/09 ,  H01J37/08

CPC classification number: H01J37/31 ,  H01J37/08 ,  H01J37/09 ,  H01J37/20 ,  H01J37/28 ,  H01J37/3056 ,  H01J2237/0262 ,  H01J2237/0264 ,  H01J2237/04732 ,  H01J2237/082 ,  H01J2237/31745

Abstract: To provide an ion milling system that can suppress an orbital shift of an observation electron beam emitted from an electron microscope column, the ion milling system includes: a Penning discharge type ion gun 100 that includes a permanent magnet 114 and that generates ions for processing a sample; and a scanning electron microscope for observing the sample, in which a magnetic shield 172 for reducing a leakage magnetic field from the permanent magnet 114 to the electron microscope column is provided.

公开(公告)号：US20180254168A1

公开(公告)日：2018-09-06

申请号：US15448445

申请日：2017-03-02

Applicant: FEI Company

Inventor： Alexander Henstra ,  Peter Christiaan Tiemeijer

IPC: H01J37/26 ,  H01J37/147 ,  H01J37/08

CPC classification number: H01J37/265 ,  H01J37/08 ,  H01J37/1472 ,  H01J37/153 ,  H01J2237/1534

Abstract: A method of operating a charged particle microscope comprising the following steps: Providing a specimen on a specimen holder; Using a source to produce a beam of charged particles; Passing said beam through an illuminator comprising: A source lens, with an associated particle-optical axis; A condenser aperture, which is disposed between the source lens and specimen and is configured to define a footprint of said beam upon the specimen; Irradiating the specimen with the beam emerging from said illuminator; Using a detector to detect radiation emanating from the specimen in response to said irradiation, and producing an associated image, specifically comprising the following steps: Choosing a set of emission angles from said source; For each emission angle in said set, selecting a corresponding sub-beam that emits from the source at that emission angle, and storing a test image formed by that sub-beam, thereby compiling a set of test images corresponding to said set of emission angles; Analyzing said set of test images to evaluate illuminator aberrations generated prior to said condenser aperture.

公开(公告)号：US10043635B2

公开(公告)日：2018-08-07

申请号：US15320104

申请日：2014-09-25

Applicant: Mitsubishi Electric Corporation

Inventor： Sunao Aya

IPC: H01J37/317 ,  H01J37/18 ,  H01J37/08

CPC classification number: H01J37/3171 ,  H01J27/08 ,  H01J37/08 ,  H01J37/18 ,  H01J2237/006 ,  H01J2237/08

Abstract: A vacuum is maintained inside a vacuum partition (1). The whole of the solid packed container (3) is disposed inside the vacuum partition (1). A heater (7) sublimates the aluminum chloride (8) packed in the solid packed container (3) to generate an aluminum chloride gas (9). An arc chamber (6) ionizes the aluminum chloride gas (9) and emits an ion beam (11) of the ionized aluminum chloride gas (9). A gas supply nozzle (10) leads the aluminum chloride gas (9) from the solid packed container (3) into the arc chamber (6). A supporting part (4) supports and fixes the solid packed container (3) on the vacuum partition (1). A thermal conductivity of the supporting part (4) is lower than thermal conductivities of the vacuum partition (1) and the solid packed container (3).

公开(公告)号：US10037863B2

公开(公告)日：2018-07-31

申请号：US15676926

申请日：2017-08-14

Applicant: Mark R. Amato ,  W. Davis Lee

Inventor： Mark R. Amato ,  W. Davis Lee

IPC: H01J37/08 ,  A61B6/03 ,  A61N5/10 ,  A61B6/00

CPC classification number: H01J37/08 ,  A61B6/032 ,  A61B6/037 ,  A61B6/4035 ,  A61B6/4085 ,  A61B6/4258 ,  A61B6/4266 ,  A61B6/4435 ,  A61B6/5205 ,  A61N5/1037 ,  A61N5/1039 ,  A61N5/1049 ,  A61N5/1067 ,  A61N5/1069 ,  A61N5/107 ,  A61N5/1077 ,  A61N5/1082 ,  A61N2005/1051 ,  A61N2005/1054 ,  A61N2005/1061 ,  A61N2005/1087 ,  A61N2005/1095 ,  A61N2005/1097 ,  G21K1/10 ,  G21K5/04 ,  H01J2237/004

Abstract: The invention comprises a method and apparatus for slowing positively charged particles, comprising the steps of: (1) transporting the positively charged particles from an accelerator, along a beam transport line, and into a nozzle system; (2) placing a first liquid in a first chamber in a beam path of the positively charged particles; (3) placing a second liquid in a second chamber in the beam path of the positively charged particles; (4) moving the first and second chamber with the nozzle system; (5) slowing the positively charged particles using the first liquid and the second liquid; (6) moving the first chamber in a first direction to yield a longer first pathlength of the positively charged particles through the first chamber; and (7) moving the second chamber opposite the first direction to yield a longer second pathlength of the positively charged particles through the second chamber.

公开(公告)号：US20180211807A1

公开(公告)日：2018-07-26

申请号：US15874798

申请日：2018-01-18

Applicant: FEI Company

Inventor： Gregory A. Schwind ,  Aurelien Philippe Jean Maclou Botman ,  Sean Kellogg ,  Leon van Kouwen ,  Luigi Mele

IPC: H01J27/20 ,  H01J37/08 ,  H01J37/26

CPC classification number: H01J27/20 ,  H01J27/205 ,  H01J37/08 ,  H01J37/26 ,  H01J2237/006 ,  H01J2237/061 ,  H01J2237/082

Abstract: A collision ionization source is disclosed herein. An example source includes an ionization region arranged to receive a gas and a charged particle beam, the charged particle beam to ionize at least some of the gas, and a supply duct arranged to provide the gas to the ionization region, the supply duct having a non-uniform height decreasing from an input orifice to an output orifice, the output orifice arranged adjacent to the ionization region.

公开(公告)号：US20180166249A1

公开(公告)日：2018-06-14

申请号：US15834939

申请日：2017-12-07

Applicant: APPLIED MATERIALS, INC.

Inventor： Leonid DORF ,  Travis KOH ,  Olivier LUERE ,  Olivier JOUBERT ,  Philip A. KRAUS ,  Rajinder DHINDSA ,  JAMES HUGH ROGERS

IPC: H01J37/08 ,  H01J37/248

CPC classification number: H01J37/08 ,  H01J37/248

Abstract: Systems and methods for creating arbitrarily-shaped ion energy distribution functions using shaped-pulse-bias. In an embodiment, a method includes applying a positive jump voltage to an electrode of a process chamber to neutralize a wafer surface, applying a negative jump voltage to the electrode to set a wafer voltage, and modulating the amplitude of the wafer voltage to produce a predetermined number of pulses to determine an ion energy distribution function. In another embodiment a method includes applying a positive jump voltage to an electrode of a process chamber to neutralize a wafer surface, applying a negative jump voltage to the electrode to set a wafer voltage, and applying a ramp voltage to the electrode that overcompensates for ion current on the wafer or applying a ramp voltage to the electrode that undercompensates for ion current on the wafer.

公开(公告)号：US09991095B2

公开(公告)日：2018-06-05

申请号：US13201188

申请日：2009-08-12

Applicant: Joseph D. Sweeney ,  Sharad N. Yedave ,  Oleg Byl ,  Robert Kaim ,  David Eldridge ,  Lin Feng ,  Steven E. Bishop ,  W. Karl Olander ,  Ying Tang

Inventor： Joseph D. Sweeney ,  Sharad N. Yedave ,  Oleg Byl ,  Robert Kaim ,  David Eldridge ,  Lin Feng ,  Steven E. Bishop ,  W. Karl Olander ,  Ying Tang

IPC: B05D5/12 ,  H01J37/317 ,  C23C14/48 ,  C23C14/54 ,  C23C14/56 ,  H01J37/08 ,  H01J37/16 ,  H01J37/18

CPC classification number: H01J37/3171 ,  C23C14/48 ,  C23C14/54 ,  C23C14/564 ,  H01J37/08 ,  H01J37/16 ,  H01J37/18 ,  H01J2237/082 ,  H01J2237/22

Abstract: Cleaning of an ion implantation system or components thereof, utilizing temperature and/or a reactive cleaning reagent enabling growth/etching of the cathode in an indirectly heated cathode for an ion implantation system by monitoring the cathode bias power and taking corrective action depending upon compared values to etch or regrow the cathode.

公开(公告)号：US09978556B2

公开(公告)日：2018-05-22

申请号：US14966227

申请日：2015-12-11

Applicant: Varian Semiconductor Equipment Associates, Inc.

Inventor： William Davis Lee ,  Frank Sinclair

IPC: H01J37/05 ,  H01J37/12 ,  H01J37/08 ,  H01J37/317 ,  H01J37/147

CPC classification number: H01J37/12 ,  H01J37/05 ,  H01J37/08 ,  H01J37/1477 ,  H01J37/3007 ,  H01J37/3171 ,  H01J2237/047 ,  H01J2237/04735 ,  H01J2237/04756 ,  H01J2237/04924 ,  H01J2237/121

Abstract: Provided herein are approaches for controlling a charged particle beam using a series of electrodes including a plurality of different shapes. In one approach, an electrostatic optical element includes a first set of electrodes having a first electrode shape for parallelizing and deflecting the charged particle beam using a first set of electrodes having a first electrode shape, such as a concave or convex profile. The electrostatic optical element further includes a second set of electrodes adjacent the first set of electrodes for accelerating or decelerating the charged particle beam along a beamline, wherein the second set of electrodes include a cylindrical shape. In one approach, a power supply is electrically connected to the first and second sets of electrodes, the power supply arranged to enable independent voltage/current control.

公开(公告)号：US20180139835A1

公开(公告)日：2018-05-17

申请号：US15795754

申请日：2017-10-27

Applicant: ELECTRONICS AND TELECOMMUNICATIONS RESEARCH INSTITUTE

Inventor： Moon Youn JUNG ,  Jinsun KIM

IPC: H05H1/54

CPC classification number: H01J27/24 ,  A61N2005/1088 ,  H01J27/02 ,  H01J37/08 ,  H05H1/54 ,  H05H2007/082

Abstract: Disclosed is an apparatus for generating charged particles. The apparatus comprises a light source that emits a laser, a target layer that receives the laser to generate charged particles, and a focusing structure that is between the light source and the target source and focuses the laser. The focusing structure comprises solid layers and pore sections alternately and repeatedly disposed along a first direction parallel to a top surface of the target layer. Each of the pore sections comprises a porous layer.