Abstract:
Antenna switching circuitry comprises a plurality of communication ports, an antenna port, a plurality of switches, and an ESD protection device. The plurality of switches are adapted to selectively couple one or more of the communication ports to the antenna port in order to transmit or receive a signal. The ESD protection device is coupled between one of the plurality of communication ports and ground, and is adapted to form a substantially low impedance path to ground during an ESD event. Upon the occurrence of an ESD event, a received electrostatic charge passes through one or more of the plurality of switches to the ESD protection device, where it is safely diverted to ground. By using only one ESD protection device, desensitization of the antenna switching circuitry due to the parasitic loading of the ESD protection device is avoided. Further, the area of the antenna switching circuitry is minimized.
Abstract:
An amplifying system with increased linearity is disclosed. The amplifying system includes a first gain stage with a first gain characteristic, a second gain stage with a second gain characteristic, and bias circuitry configured to substantially maintain alignment of distortion inflection points between the first gain characteristic and the second gain characteristic during operation. The bias circuitry is configured to further maintain alignment of the distortion inflection points between the first gain characteristic and the second gain characteristic over design corners by providing substantially constant headroom between quiescent bias voltage and turnoff of the first gain stage and the second gain stage. In some embodiments the first gain characteristic is expansive and the second gain characteristic is compressive. In other embodiments the first gain characteristic is compressive and the second gain characteristic is expansive. In some embodiments the first gain stage is configured to provide RF degeneration control of gain.
Abstract:
Envelope power supply circuitry includes power converter circuitry and envelope tracking circuitry. The power converter circuitry is configured to receive an envelope power converter control signal and a supply voltage and provide an envelope power supply signal for an amplifier from the supply voltage and based on the envelope power converter control signal. The envelope tracking circuitry is coupled to the power converter circuitry. In a first mode of operation, the envelope tracking circuitry is configured to provide the envelope power converter control signal such that a gain of the amplifier remains substantially constant over a range of input power provided to the amplifier. In a second mode of operation, the envelope tracking circuitry is configured to limit the dynamic range of the envelope power supply signal.
Abstract:
Disclosed is an integrated circuit module that includes a first die having a plurality of hot regions and at least one cool region when operating under normal conditions. The first die with a top surface includes at least one power amplifier that resides in the plurality of hot regions. The integrated circuit module also includes a second die. The second die has a bottom surface, which is adhered to the top surface of the first die, wherein any portion of the bottom surface of the second die that is adhered to the top surface of the first die resides exclusively on the at least one cool region. In at least one embodiment, the first die is an RF power amplifier die and the second die is a controller die having control circuitry configured to control the at least one power amplifier that is an RF power amplifier type.
Abstract:
A semiconductor device that does not produce nonlinearities attributed to a high resistivity silicon handle interfaced with a dielectric region of a buried oxide (BOX) layer is disclosed. The semiconductor device includes a semiconductor stack structure with a first surface and a second surface wherein the second surface is on an opposite side of the semiconductor stack structure from the first surface. At least one device terminal is included in the semiconductor stack structure and at least one electrical contact extends from the second surface and is electrically coupled to the at least one device terminal. The semiconductor stack is protected by a polymer disposed on the first surface of the semiconductor stack. The polymer has high thermal conductivity and high electrical resistivity.
Abstract:
A differential power amplifier has at least an input stage and an output stage. A first output stage amplifier is configured to receive a first portion of a differential signal from the input stage at a first output stage input and provide a first amplified signal at a first output stage output. The second output stage amplifier is configured to receive a second portion of the differential signal from the input stage at a second output stage input and provide a second amplified signal at a second output stage output. Power limiter circuitry is connected to the first and/or output stage inputs and is configured to limit a power level of the differential signal prior to being received at the output stage, such that the differential power amplifier and associated filters are not damaged, while the nominal performance of the differential power amplifier at rated power is not significantly affected.
Abstract:
A differential power amplifier comprises an envelope tracking power supply configured to provide an envelope power supply signal to the differential power amplifier. The differential power amplifier also comprises an input stage configured to provide a differential signal having a first portion and a second portion to a differential output stage. The differential output stage comprises a first output stage amplifier configured to receive the first portion of the differential signal at a first output stage input and provide a first amplified signal at a first output stage output, as well as a second output stage amplifier configured to receive the second portion of the differential signal at a second output stage input and provide a second amplified signal at a second output stage output. The envelope power supply signal provides power for amplification.
Abstract:
Embodiments of radio frequency (RF) filtering circuitry are disclosed. In one embodiment, the RF filtering circuitry includes a first port, a second port, a first RF filter path, and a second RF filter path. The first RF filter path is connected between the first port and the second port and includes at least a pair of weakly coupled resonators. The weakly coupled resonators are configured such that a first transfer response between the first port and the second port defines a first passband. The second RF filter path is coupled to the first RF filter path and is configured such that the first transfer response between the first port and the second port defines a stopband adjacent to the first passband without substantially increasing ripple variation of the first passband defined by the first transfer response.
Abstract:
A self-activated transfer switch is disclosed. The self-activated transfer switch includes a transmit (TX) switch coupled between a TX port and an antenna port. A receive (RX) switch is coupled between the antenna port and an RX port, and RF-to-bias generator circuitry is coupled to the TX port and the antenna port. The RF-to-bias generator circuitry is configured to generate a bias signal to turn off the RX switch and turn on the TX switch when either of a TX signal is provided at the TX port and a jammer signal is received at the antenna port. The bias signal is generated from energy of at least one of the TX signal and the jammer signal. The TX switch is turned off and the RX switch is turned on when the bias signal is not being generated.
Abstract:
The present disclosure relates to a silicon-on-insulator (SOI) substrate structure with a buried dielectric layer for radio frequency (RF) complementary metal-oxide semiconductor (CMOS) switch fabrications. The buried dielectric layer suppresses back-gate transistors in the RF CMOS switches fabricated on the SOI substrate structure. The SOI substrate structure includes a silicon handle layer, a silicon oxide layer over the silicon handle layer, a buried dielectric layer over the silicon oxide layer, and a silicon epitaxy layer directly over the buried dielectric layer.