公开(公告)号：US20210295213A1

公开(公告)日：2021-09-23

申请号：US17164756

申请日：2021-02-01

Applicant: Orbotech Ltd.

Inventor： Gonen Raveh

IPC: G06N20/00 ,  G06K9/62

Abstract: A method, a computerized apparatus and a computer program product for adaptive learning for image classification. The method comprises applying a set of classification models on a calibration dataset and on a production dataset, and calculating disagreement measurements over the predictions thereof on each dataset. Based on similarity measurement between the disagreement measurement of the calibration and the production datasets, being below a predetermined threshold, a data drift is indicated in the production dataset. The method further comprises determining a training dataset for training a classification model for the production dataset. The training dataset is selected over a plurality of sets of images ordered according to time intervals in which images therein are obtained. The selection is performed based on weights determined for the plurality of sets.

公开(公告)号：US10471538B2

公开(公告)日：2019-11-12

申请号：US15738134

申请日：2016-06-07

Applicant: Orbotech Ltd.

Inventor： Michael Zenou ,  Zvi Kotler

IPC: B23K26/064 ,  B23K26/067 ,  C23C14/22 ,  C23C14/28 ,  B23K26/34 ,  B23K26/342 ,  B23K26/0622 ,  B23K26/57 ,  B23K26/06 ,  G03F7/16 ,  B23K101/42

Abstract: An apparatus for material deposition on an acceptor surface includes a transparent donor substrate having opposing first and second surfaces, and a donor film on the second surface. The apparatus additionally includes an optical assembly, which is configured to direct a beam of radiation to pass through the first surface of the donor substrate and impinge on the donor film at a location on the second surface so as to induce ejection of droplets of molten material from the donor film at an angle that is not normal to the second surface at the location onto the acceptor surface.

公开(公告)号：US10015887B2

公开(公告)日：2018-07-03

申请号：US14766749

申请日：2014-02-18

Applicant: ORBOTECH LTD.

Inventor： Michael Zenou ,  Marc Altman ,  Claudio Rottman ,  Zvi Kotler

IPC: H05K3/12 ,  G03F7/40 ,  H05K3/02 ,  G03F7/039 ,  H05K3/22 ,  H05K1/09

CPC classification number: H05K3/12 ,  G03F7/039 ,  G03F7/40 ,  H05K1/097 ,  H05K3/02 ,  H05K3/027 ,  H05K3/1283 ,  H05K3/1291 ,  H05K3/227 ,  H05K2201/0257 ,  H05K2201/2054 ,  H05K2203/0514 ,  H05K2203/107 ,  H05K2203/108 ,  H05K2203/111 ,  H05K2203/1131 ,  H05K2203/1194 ,  H05K2203/1476 ,  H05K2203/1484

Abstract: A method for manufacturing includes coating a substrate (22) with a matrix (28) containing a material to be patterned on the substrate. A pattern (42) is fixed in the matrix by directing an energy beam to impinge on the coated substrate so as to fix the pattern in the matrix without fully sintering the pattern. The matrix remaining on the substrate outside the fixed pattern is removed, and after removing the matrix, the material in the pattern is sintered.

公开(公告)号：US20170365484A1

公开(公告)日：2017-12-21

申请号：US15537885

申请日：2016-01-14

Applicant: ORBOTECH LTD.

Inventor： Zvi Kotler ,  Michael Zenou

IPC: H01L21/3063 ,  H01L21/428 ,  C25F3/12 ,  C23C26/02 ,  C23C14/30 ,  H01L21/48 ,  C23C14/04

CPC classification number: H01L21/3063 ,  B22F3/1055 ,  B22F3/1103 ,  B22F5/10 ,  B22F2003/1056 ,  B22F2003/1058 ,  B22F2005/103 ,  B22F2999/00 ,  B33Y10/00 ,  B33Y30/00 ,  B33Y40/00 ,  B33Y80/00 ,  C23C14/048 ,  C23C14/28 ,  C23C14/30 ,  C23C26/00 ,  C23C26/02 ,  C25F3/12 ,  H01L21/428 ,  H01L21/4867 ,  Y02P10/295 ,  C23F1/00 ,  B22F2207/17

Abstract: A method for 3D printing includes printing a first metallic material on a substrate as a support structure (48). A second metallic material, which is less anodic than the first metallic material, is printed on the substrate as a target structure (46), in contact with the support structure. The support structure is chemically removed from the target structure by applying a galvanic effect to selectively corrode the first metallic material.

公开(公告)号：US09599572B2

公开(公告)日：2017-03-21

申请号：US14246790

申请日：2014-04-07

Applicant: ORBOTECH LTD.

Inventor： Ronen Levy ,  Ofer Saphier ,  Ariel Danan

IPC: G01N21/88

CPC classification number: G01N21/8806 ,  G01N2201/06113 ,  G01N2201/0697

Abstract: An optical inspection system including a first multiplicity of cameras operative to image a second multiplicity of regions on an object, a third multiplicity of illumination sources and at least one illumination manager operative to combine illumination from the third multiplicity of illumination sources and thereafter to direct illumination therefrom to the second multiplicity of regions, the at least one illumination manager including a beam distributor receiving a composite input beam of a multiplicity of non-mutually coherent, spatially concentrated laser pulses and directing a multiplicity of composite output beams of a plurality of the non-mutually coherent, spatially concentrated laser pulses to a corresponding plurality of spatially distinct locations corresponding to the second multiplicity of regions.

公开(公告)号：US20160094760A1

公开(公告)日：2016-03-31

申请号：US14964781

申请日：2015-12-10

Applicant: Orbotech Ltd.

Inventor： Yigal KATZIR ,  Itay GUR-ARIE ,  Yacov MALINOVICH

IPC: H04N3/14 ,  H04N5/3745 ,  H04N5/374

CPC classification number: H04N3/155 ,  G01N21/8851 ,  G01N21/8901 ,  G01N21/956 ,  H01L27/14645 ,  H04N5/3743 ,  H04N5/37455

Abstract: An inspection system includes a CMOS integrated circuit having integrally formed thereon an at least two dimensional array of photosensors and providing an inspection output representing an object to be inspected. A defect analyzer is operative to receive the inspection output and to provide a defect report.

公开(公告)号：US20150324968A1

公开(公告)日：2015-11-12

申请号：US14272745

申请日：2014-05-08

Applicant: ORBOTECH LTD.

Inventor： Uri GOLD ,  Ram ORON

IPC: G06T7/00

CPC classification number: G06T7/004 ,  G01N21/88 ,  G03F7/00 ,  G03F7/70383 ,  G03F7/70516 ,  G06T7/0004 ,  G06T7/521 ,  G06T7/80 ,  G06T2207/30164

Abstract: Optical apparatus includes a mount, which holds a workpiece. An array of optical heads project respective patterns of radiation onto the workpiece. A calibration assembly captures images of the respective patterns. A motion assembly, on which the calibration assembly is mounted, transports the calibration assembly among a plurality of different positions between the array of the optical heads and the mount so as to intercept and image, at each of the different positions, a respective pattern projected by a different one of the optical heads. A processor processes the images captured by the calibration assembly at the different positions so as to monitor operation of the apparatus.

Abstract translation: 光学装置包括保持工件的安装件。 光学头阵列将相应的辐射图案投影到工件上。 校准组件捕获相应图案的图像。 校准组件安装在其上的运动组件在光学头阵列与安装座之间的多个不同位置之间传送校准组件，以便在每个不同位置处截取和成像投影的相应图案 通过不同的一个光学头。 处理器处理由校准组件在不同位置拍摄的图像，以便监视设备的操作。

公开(公告)号：US20040248346A1

公开(公告)日：2004-12-09

申请号：US10857887

申请日：2004-06-02

Applicant: ORBOTECH LTD

Inventor： Peter Rusian ,  Arie Glazer ,  Mannie Dorfan ,  Yoel Raab

IPC: H01L021/00

CPC classification number: H01L21/02667 ,  H01L21/2022 ,  H01L21/2026 ,  H01L27/12 ,  H01L27/1281 ,  H01L29/66757 ,  H01L29/78603 ,  H01L29/78675

Abstract: A method for fabricating a semiconductor device includes providing a layer of a semiconductor material on at least a portion of a surface of a substrate, and forming along the surface a capillary structure, which is in communication with the semiconductor material but is at least partially empty of the semiconductor material. The semiconductor material is heated, so as to cause the semiconductor material to melt and flow into the capillary structure. Upon allowing the semiconductor material to cool, a crystal is seeded in the capillary structure and spreads from the capillary structure through an area of the semiconductor material.

Abstract translation: 一种制造半导体器件的方法包括在衬底的表面的至少一部分上提供半导体材料层，并且沿表面形成与半导体材料连通但至少部分为空的毛细结构 的半导体材料。 半导体材料被加热，以使半导体材料熔化并流入毛细结构。 在允许半导体材料冷却时，将晶体接种在毛细结构中并从毛细结构扩散通过半导体材料的区域。

公开(公告)号：US20040137731A1

公开(公告)日：2004-07-15

申请号：US10694392

申请日：2003-10-28

Applicant: ORBOTECH LTD

Inventor： Arie Glazer ,  Abraham Gross

IPC: H01L021/302 ,  H01L021/461

CPC classification number: H01L27/1285 ,  B23K26/067 ,  B23K26/0676 ,  B23K26/083 ,  B23K26/12 ,  B23K26/127 ,  B23K26/147 ,  B23K26/32 ,  B23K26/34 ,  B23K2103/50 ,  C23C14/5813 ,  C30B13/24 ,  C30B29/06 ,  H01L21/02532 ,  H01L21/02675 ,  H01L21/2026 ,  H01L21/268 ,  H01L27/1214 ,  H01L27/127

Abstract: A system and method for selectable area laser treatment of a substrate, such as thin film transistors, the system including a holder holding a substrate in proximity to reactant, and laser beams each addressing independently selectable mutually set apart locations on the substrate to induce a reaction between the substrate and the reactant.

Abstract translation: 用于可选区域激光处理衬底（例如薄膜晶体管）的系统和方法，该系统包括保持靠近反应物的衬底的保持器，以及激光束，每个激光束在衬底上独立地可选择地相互设置的分离位置以引起反应 在底物和反应物之间。

公开(公告)号：US20030024912A1

公开(公告)日：2003-02-06

申请号：US10265420

申请日：2002-10-07

Applicant: ORBOTECH LTD

Inventor： Abraham Gross ,  Zvi Kotler ,  Eliezer Lipman

IPC: B23K026/067 ,  B23K026/38

CPC classification number: B23K26/073 ,  B23K26/067 ,  B23K26/0676 ,  B23K26/082 ,  B23K26/382 ,  B23K26/40 ,  B23K2101/42 ,  B23K2103/16 ,  B23K2103/42 ,  B23K2103/50 ,  G02B26/0833 ,  G02B27/106 ,  G02B27/143 ,  G02B27/145 ,  H01S3/005 ,  H05K3/0026

Abstract: A system for delivering energy to a substrate including a dynamically directable source of radiant energy providing a plurality of beams of radiation, each propagating in a dynamically selectable direction. Independently positionable beam steering elements in a plurality of beam steering elements are operative to receive the beams and direct them to selectable locations on the substrate.