High current electron source
    42.
    发明授权
    High current electron source 失效
    大电流源

    公开(公告)号:US4393308A

    公开(公告)日:1983-07-12

    申请号:US240881

    申请日:1981-03-05

    CPC分类号: H01J37/06

    摘要: A high current electron source with a narrow energy band of the type employed in an electron beam printer has a beam generating system consisting of a cathode and focusing electrodes and an anode with at least one electrode functioning to astigmatically focus at least one electron crossover in the low velocity range. For varying the position and shape of the crossover in a simple manner for adaptation to particular use conditions of the high current electron source, the Wehnelt electrode of the electron source consists of one or more cylinder lenses or of an electrostatic multipole element, or an electromagnetic multipole element is disposed in the plane of a conventional non-ferromagnetic Wehnelt electrode with a circular aperture for the electron beam. By pole reversal of the Wehnelt voltage or of the coil current and by changing the size of the current, the shape and azimuth position of the first crossover in the cathode space can be varied to any configuration. By so doing, an energy spread of the electrons is prevented and an optimum illumination of surfaces to be imaged is achieved.

    摘要翻译: 具有在电子束打印机中使用的类型的窄能带的高电流电子源具有由阴极和聚焦电极组成的光束产生系统,以及具有至少一个电极的阳极,其功能是使至少一个电子交叉点在 低速范围 为了以简单的方式改变交叉的位置和形状以适应高电流电子源的特定使用条件,电子源的Wehnelt电极由一个或多个圆柱透镜或静电多极元件或电磁 多极元件设置在具有用于电子束的圆形孔的常规非铁磁Wehnelt电极的平面中。 通过Wehnelt电压或线圈电流的极点反转以及通过改变电流的大小,阴极空间中的第一交叉点的形状和方位角度可以变化到任何构造。 通过这样做,可以防止电子的能量扩散,并实现要成像的表面的最佳照明。

    Beam optical component having a charged particle lens
    43.
    发明授权
    Beam optical component having a charged particle lens 有权
    具有带电粒子透镜的光束组件

    公开(公告)号:US08445846B2

    公开(公告)日:2013-05-21

    申请号:US10587105

    申请日:2004-12-13

    申请人: Juergen Frosien

    发明人: Juergen Frosien

    IPC分类号: G01N23/00 G21K7/00

    摘要: The present invention relates to a beam optical component including a charged particle lens for focusing a charged particle beam, the charged particle lens comprising a first element having a first opening for focusing the charged particle beam; a second element having a second opening for focusing the charged particle beam and first driving means connected with at least one of the first element and the second element for aligning the first opening with respect to the second opening. With the first driving means, the first opening and the second opening can be aligned with respect to each other during beam operation to provide a superior alignment of the beam optical component for a better beam focusing. The present invention also relates to a charged particle beam device that uses said beam optical component for focusing the charged particle beam, and a method to align first opening and second opening with respect to each other.

    摘要翻译: 本发明涉及一种包括用于聚焦带电粒子束的带电粒子透镜的束光学部件,该带电粒子透镜包括具有用于聚焦带电粒子束的第一开口的第一元件; 第二元件具有用于聚焦带电粒子束的第二开口和与第一元件和第二元件中的至少一个连接的第一驱动装置,用于相对于第二开口对准第一开口。 利用第一驱动装置,第一开口和第二开口可以在光束操作期间相对于彼此对准,以提供光束光学部件的优良对准以获得更好的光束聚焦。 本发明还涉及使用所述光束光学部件来聚焦带电粒子束的带电粒子束装置,以及使第一开口和第二开口相对于彼此对准的方法。

    Dual mode gas field ion source
    44.
    发明授权
    Dual mode gas field ion source 有权
    双模气体离子源

    公开(公告)号:US07968855B2

    公开(公告)日:2011-06-28

    申请号:US12366390

    申请日:2009-02-05

    申请人: Juergen Frosien

    发明人: Juergen Frosien

    IPC分类号: H01J27/02

    摘要: A focused ion beam device is described. The focused ion beam device includes an ion beam column including an enclosure for housing a gas field ion source emitter with an emitter area for generating ions, an electrode for extracting ions from the gas field ion source emitter, one or more gas inlets adapted to introduce a first gas and a second gas to the emitter area, an objective lens for focusing the ion beam generated from the first gas or the second gas, a voltage supply for providing a voltage between the electrode and the gas field ion source emitter, and a controller for switching between a first voltage and a second voltage of the voltage supply for generating an ion beam of ions of the first gas or an ion beam of ions of the second gas.

    摘要翻译: 描述了聚焦离子束装置。 聚焦离子束装置包括离子束柱,其包括用于容纳具有用于产生离子的发射极区域的气体场离子源发射器的外壳,用于从气体离子源发射器提取离子的电极,适于引入离子源的一个或多个气体入口 将第一气体和第二气体输送到发射器区域,用于聚焦由第一气体或第二气体产生的离子束的物镜,用于在电极和气体离子源发射器之间提供电压的电压源,以及 控制器,用于在电压源的第一电压和第二电压之间切换,用于产生第一气体的离子离子束或第二气体的离子离子束。

    Arrangement and method for compensating emitter tip vibrations
    45.
    发明授权
    Arrangement and method for compensating emitter tip vibrations 有权
    用于补偿发射器尖端振动的布置和方法

    公开(公告)号:US07939800B2

    公开(公告)日:2011-05-10

    申请号:US12209079

    申请日:2008-09-11

    申请人: Juergen Frosien

    发明人: Juergen Frosien

    IPC分类号: H01J37/30 G02B21/00

    摘要: The present invention provides a charged particle beam apparatus with a charged particle beam source including an emitter with an emitter tip; and supporting member for supporting the emitter. Further, the apparatus includes an emitter location-measuring device for repeatedly measuring the location of the emitter; and a deflector system for compensating variations in the location of the emitter.

    摘要翻译: 本发明提供带电粒子束装置,带电粒子束源包括具有发射极尖端的发射极; 以及用于支撑发射器的支撑构件。 此外,该装置包括用于反复测量发射器的位置的发射器位置测量装置; 以及用于补偿发射器位置变化的偏转器系统。

    Method and apparatus for in-situ sample preparation
    47.
    发明授权
    Method and apparatus for in-situ sample preparation 有权
    用于原位样品制备的方法和装置

    公开(公告)号:US07829870B2

    公开(公告)日:2010-11-09

    申请号:US11925595

    申请日:2007-10-26

    申请人: Juergen Frosien

    发明人: Juergen Frosien

    摘要: An apparatus for in-situ specimen preparation is described. The apparatus includes an ion beam column 21 including at least: an liquid metal alloy ion source 56 including a first element for providing a light ion species with a mass of 10 g/mol to 60 g/mol and a second element for providing a heavy ions species with a mass of 150 g/mol or higher, a mass separator 58 for selectively separating the light ion species and the heavy ion species, and a focusing element for focusing the ion beam on a specimen. The apparatus further includes a specimen-beam-tilt unit for tilting the ion beam with respect to the specimen.

    摘要翻译: 描述了用于原位样品制备的装置。 该装置包括离子束柱21,其至少包括:液态金属合金离子源56,其包括用于提供质量为10g / mol至60g / mol的轻离子物质的第一元素和用于提供重的 质量为150g / mol以上的离子物质,用于选择性分离轻离子物质和重离子物质的质量分离器58,以及用于将离子束聚焦在样品上的聚焦元件。 该装置还包括用于相对于样本倾斜离子束的样本束倾斜单元。

    High current density particle beam system
    50.
    发明授权
    High current density particle beam system 有权
    高电流密度粒子束系统

    公开(公告)号:US07663102B2

    公开(公告)日:2010-02-16

    申请号:US10593246

    申请日:2005-02-17

    申请人: Juergen Frosien

    发明人: Juergen Frosien

    IPC分类号: H01J37/09

    摘要: The present invention relates to charged particle beam devices. The devices comprise an emitter for emitting charged particles; an aperture arrangement with at least two apertures for separating the emitted charged particles into at least two independent charged particle beams; and an objective lens for focusing the at least two independent charged particle beams, whereby the independent charged particle beams are focused onto the same location within the focal plane.

    摘要翻译: 本发明涉及带电粒子束装置。 这些装置包括用于发射带电粒子的发射器; 具有至少两个孔的孔布置,用于将发射的带电粒子分离成至少两个独立的带电粒子束; 以及用于聚焦至少两个独立带电粒子束的物镜,由此独立带电粒子束聚焦到焦平面内的相同位置上。