公开(公告)号：US20100294929A1

公开(公告)日：2010-11-25

申请号：US12710679

申请日：2010-02-23

申请人： Makoto Ezumi ,  Yoichi Ose ,  Akira Ikegami ,  Hideo Todokoro ,  Tatsuaki Ishijima ,  Takahiro Sato ,  Ritsuo Fukaya ,  Kazunari Asao

发明人： Makoto Ezumi ,  Yoichi Ose ,  Akira Ikegami ,  Hideo Todokoro ,  Tatsuaki Ishijima ,  Takahiro Sato ,  Ritsuo Fukaya ,  Kazunari Asao

IPC分类号： G21K7/00

CPC分类号： H01J37/265 ,  G01N23/2251 ,  H01J37/21 ,  H01J37/244 ,  H01J37/28 ,  H01J2237/0041 ,  H01J2237/216 ,  H01J2237/244 ,  H01J2237/24564 ,  H01J2237/24592 ,  H01J2237/2594 ,  H01J2237/2817

摘要： The present invention has the object of providing charged particle beam irradiation method ideal for reducing the focus offset, magnification fluctuation and measurement length error in charged particle beam devices. To achieve these objects, a method is disclosed in the invention for measuring the electrical potential distribution on the sample with a static electrometer while loaded by a loader mechanism. Another method is disclosed for measuring the local electrical charge at specified points on the sample, and isolating and measuring the wide area electrostatic charge quantity from those local electrostatic charges. Yet another method is disclosed for correcting the measurement length value or magnification based on fluctuations found by measuring the amount of electrostatic charge at the specified points under at least two charged particle optical conditions, and then using a charged particle beam to measure fluctuations in measurement dimensions occurring due to fluctuations in the electrostatic charge at the specified locations.

摘要翻译： 本发明的目的是提供一种理想的减少带电粒子束装置中的聚焦偏移，放大波动和测量长度误差的带电粒子束照射方法。 为了实现这些目的，在本发明中公开了一种用于在由装载机构加载的情况下用静电静电计测量样品上的电位分布的方法。 公开了另一种测量样品上特定点的局部电荷的方法，并且从这些局部静电电荷中分离和测量广域静电电荷量。 公开了另一种用于基于通过测量至少两个带电粒子光学条件下的指定点处的静电电荷量而发现的波动来校正测量长度值或放大倍率的方法，然后使用带电粒子束来测量测量尺寸的波动 由于在指定位置处的静电电荷的波动而发生。

公开(公告)号：US20100181478A1

公开(公告)日：2010-07-22

申请号：US12749271

申请日：2010-03-29

申请人： Hidetoshi Morokuma ,  Noriaki Arai ,  Takashi Doi ,  Fumihiro Sasajima ,  Yoshihiro Kimura

发明人： Hidetoshi Morokuma ,  Noriaki Arai ,  Takashi Doi ,  Fumihiro Sasajima ,  Yoshihiro Kimura

IPC分类号： H01J37/28 ,  H01J37/10 ,  H01J37/147

CPC分类号： H01J37/21 ,  H01J37/153 ,  H01J2237/216 ,  H01J2237/221

摘要： In an apparatus for obtaining an image by irradiating a charged particle beam on a specimen, a condition of the beam conditioned differently from vertical incidence as in the case of the beam being tilted is required to be adjusted. To this end, the apparatus has a controller for automatically controlling a stigmator, an objective lens and a deflector such that astigmatism is corrected, focus is adjusted and view filed shift is corrected. The controller has a selector for inhibiting at least one of the astigmatism correction, focus adjustment and FOV shift correction from being executed.

摘要翻译： 在用于通过将带电粒子束照射在样本上来获得图像的装置中，需要调整如在光束倾斜的情况下不同于垂直入射而调节的光束的条件。 为此，该装置具有用于自动控制瞄光器，物镜和偏转器的控制器，从而校正像散，调整焦点并校正视野移动。 控制器具有用于禁止执行散光校正，聚焦调整和FOV偏移校正中的至少一个的选择器。

公开(公告)号：US07705298B2

公开(公告)日：2010-04-27

申请号：US11939530

申请日：2007-11-13

申请人： Xuedong Liu ,  Zhonghua Dong ,  Wei Fang ,  Zhong-Wei Chen

发明人： Xuedong Liu ,  Zhonghua Dong ,  Wei Fang ,  Zhong-Wei Chen

IPC分类号： H01J37/28 ,  H01J37/21 ,  H01J3/14

CPC分类号： H01J37/28 ,  H01J37/21 ,  H01J2237/14 ,  H01J2237/216 ,  H01J2237/2817

摘要： This invention relates to apparatus and method to fast determine focus parameters in one pre-scan during an e-beam inspection practice. More specifically, embodiments of the present invention provide an apparatus and method that provide accurate focus tuning after primary focusing has been done.

摘要翻译： 本发明涉及在电子束检查实践期间快速确定一次预扫描中的焦点参数的装置和方法。 更具体地，本发明的实施例提供了一种在进行主要聚焦之后提供精确聚焦调谐的装置和方法。

公开(公告)号：US07692144B2

公开(公告)日：2010-04-06

申请号：US11925142

申请日：2007-10-26

申请人： Masahiro Watanabe ,  Takashi Hiroi ,  Maki Tanaka ,  Hiroyuki Shinada ,  Yasutsugu Usami

发明人： Masahiro Watanabe ,  Takashi Hiroi ,  Maki Tanaka ,  Hiroyuki Shinada ,  Yasutsugu Usami

IPC分类号： G01N23/00 ,  G21K7/00

CPC分类号： H01J37/3174 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/20 ,  H01J37/21 ,  H01J37/222 ,  H01J37/226 ,  H01J37/265 ,  H01J37/28 ,  H01J37/304 ,  H01J2237/20235 ,  H01J2237/20292 ,  H01J2237/216 ,  H01J2237/2445 ,  H01J2237/24578 ,  H01J2237/2482 ,  H01J2237/2487 ,  H01J2237/2814 ,  H01J2237/2817 ,  H01J2237/2826 ,  H01J2237/304 ,  H01J2237/3175

摘要： A method and apparatus for assessing a height of a specimen includes an electron beam unit having an electron beam source, lenses, a table for setting a specimen and controllable in a height direction, and a detector, and a height detection system for detecting height of the specimen set on the table while the specimen is irradiated by an electron beam. The height detection system further includes an illumination system, a collection system, first and second detectors, a device configured to receive output signals from the first and second detectors while the specimen is irradiated by the electron beam and to generate a comparison signal from the output signals, wherein the comparison signal is responsive to the height of the specimen.

摘要翻译： 用于评价试样的高度的方法和装置包括：电子束单元，具有电子束源，透镜，用于设置样本的台面并可在高度方向上控制;以及检测器，以及用于检测高度的高度检测系统 样本被放置在桌子上，而样品被电子束照射。 高度检测系统还包括照明系统，收集系统，第一和第二检测器，被配置为在样本被电子束照射的同时从第一和第二检测器接收输出信号并从输出产生比较信号的装置 信号，其中比较信号响应于样本的高度。

公开(公告)号：US20100051806A1

公开(公告)日：2010-03-04

申请号：US12615955

申请日：2009-11-10

申请人： Yuko Sasaki ,  Yasuhiro Gunji ,  Zhaohui Cheng

发明人： Yuko Sasaki ,  Yasuhiro Gunji ,  Zhaohui Cheng

IPC分类号： G01N23/225

CPC分类号： H01J37/28 ,  H01J37/153 ,  H01J37/21 ,  H01J37/222 ,  H01J37/265 ,  H01J2237/141 ,  H01J2237/1532 ,  H01J2237/21 ,  H01J2237/221 ,  H01J2237/2817

摘要： A charged particle beam apparatus is provided which has high resolving power and a wide scanning region (observation field of view). The apparatus has a unit for adjusting the focus, a unit for adjusting astigmatism, a unit for controlling and detecting scanning positions and a controller operative to control the focus adjustment and astigmatism adjustment at a time in interlocked relation to the scanning positions, thereby assuring compatibility between the high resolving power and the observation view field of a wide area.

摘要翻译： 提供具有高分辨率和宽扫描区域（观察视场）的带电粒子束装置。 该装置具有用于调节焦点的单元，用于调节散光的单元，用于控制和检测扫描位置的单元，以及控制器，用于与扫描位置互锁地控制焦点调节和像散调整，由此确保相容性 在高分辨率和广域的观察视野之间。

公开(公告)号：US07671332B2

公开(公告)日：2010-03-02

申请号：US12117819

申请日：2008-05-09

申请人： Masayuki Inokuchi

发明人： Masayuki Inokuchi

IPC分类号： H01J37/21

CPC分类号： H01J37/28 ,  H01J37/21 ,  H01J2237/216 ,  H01J2237/221 ,  H01J2237/28

摘要： An autofocus method for bringing an electron beam into focus on a specimen. Characteristics of the brightness at plural kinds of focus values are found for sets of data. The characteristics are accumulated creating a focus function. The focus function is approximated by a quadratic curve. The focus value at the peak point is found from the quadratic curve. Based on the focus value, the focal condition of the beam is set.

摘要翻译： 一种用于使电子束聚焦在样本上的自动聚焦方法。 针对数据集找到多种聚焦值的亮度特性。 积累的特征积累了焦点功能。 焦点函数用二次曲线近似。 峰值点的焦点值是从二次曲线中求出的。 基于焦点值，设置光束的焦点状态。

公开(公告)号：US07599076B2

公开(公告)日：2009-10-06

申请号：US11591563

申请日：2006-11-02

申请人： Keiya Saito ,  Masahiro Watanabe ,  Yasuhiro Yoshitake

发明人： Keiya Saito ,  Masahiro Watanabe ,  Yasuhiro Yoshitake

IPC分类号： G01B11/28

CPC分类号： G01B11/0608 ,  H01J37/20 ,  H01J37/21 ,  H01J37/265 ,  H01J37/28 ,  H01J2237/20292 ,  H01J2237/216 ,  H01J2237/2482 ,  H01J2237/2817

摘要： The present invention provides an optical height detection method and electron beam apparatus to which the method is applied, in which the focusing accuracy of the CD-SEM apparatus, a SEM inspection apparatus, and others is improved by reducing detection errors and improving detection accuracy so as to improve the accuracy of the optical height detection method, and throughput of a CD-SEM apparatus or others is improved by reducing the processing time of automatic focus control performed based on the detected height according to the optical height detection method. An optical detection optical system projects two-dimensional slit light to a measurement object from diagonally above it, detects the light reflected by the measurement object, converts a detected two-dimensional slit image into an electrical signal by a two-dimensional area sensor, eliminates slit parts having a large detection error from the electrical signal, and detects the height of the measurement object.

摘要翻译： 本发明提供了采用该方法的光学高度检测方法和电子束装置，其中通过降低检测误差并提高检测精度来提高CD-SEM装置，SEM检查装置等的聚焦精度 为了提高光学高度检测方法的精度，通过根据光学高度检测方法减少基于检测到的高度进行的自动聚焦控制的处理时间来提高CD-SEM装置等的生产量。 光学检测光学系统将二维狭缝光从对角线投射到测量对象上，检测由测量对象反射的光，通过二维区域传感器将检测到的二维狭缝图像转换为电信号，消除 狭缝部分具有来自电信号的大的检测误差，并且检测测量对象的高度。

公开(公告)号：US07476855B2

公开(公告)日：2009-01-13

申请号：US11523144

申请日：2006-09-19

申请人： Yongzhang Huang

发明人： Yongzhang Huang

IPC分类号： H01J37/137 ,  H01J37/30 ,  H01J49/20 ,  H01J49/30 ,  H01J37/304

CPC分类号： H01J49/30 ,  H01J37/026 ,  H01J37/05 ,  H01J37/21 ,  H01J37/304 ,  H01J37/3171 ,  H01J2237/024 ,  H01J2237/055 ,  H01J2237/057 ,  H01J2237/1502 ,  H01J2237/152 ,  H01J2237/2485 ,  H01J2237/3045 ,  H01J2237/30455 ,  H01J2237/31701

摘要： An ion implantation apparatus, system, and method for controlling an ion beam, wherein a mass analyzer generally positioned between an ion source and an end station is configured to selectively control a path of a desired ion beam. The mass analyzer comprises one or more of an entrance pole mechanism positionable proximate to an entrance of the mass analyzer and an exit pole mechanism positionable proximate to an exit of the mass analyzer, wherein the position of the entrance pole mechanism and exit pole mechanism generally determines the path and focal point of the desired ion beam. A controller is configured to selectively position one or more of the entrance pole mechanism and exit pole mechanism, therein generally controlling the path of the desired ion beam at the exit of the mass analyzer, wherein the control may be based on one or more detected characteristics of the desired ion beam.

摘要翻译： 用于控制离子束的离子注入装置，系统和方法，其中通常定位在离子源和终端站之间的质量分析器被配置为选择性地控制期望的离子束的路径。 质量分析器包括一个或多个可靠近质量分析器的入口定位的入口极机构和靠近质量分析器的出口定位的出口极机构，其中入口极机构和出口极机构的位置通常确定 所需离子束的路径和焦点。 控制器被配置为选择性地定位入口极机构和出口极机构中的一个或多个，其中通常控制质量分析器出口处的期望离子束的路径，其中控制可以基于一个或多个检测到的特性 的所需离子束。

公开(公告)号：US20080283744A1

公开(公告)日：2008-11-20

申请号：US12018898

申请日：2008-01-24

申请人： Satoshi TAKADA ,  Hiroyuki Ito

发明人： Satoshi TAKADA ,  Hiroyuki Ito

IPC分类号： G21K7/00

CPC分类号： H01J37/153 ,  H01J37/12 ,  H01J37/21 ,  H01J37/28 ,  H01J2237/1532 ,  H01J2237/1534 ,  H01J2237/216 ,  H01J2237/31749

摘要： A charged particle beam device of the present invention, which can correct astigmatism, off-axis aberration and out-of-focus state simultaneously at high speed, is provided with an electrostatic lens between an objective lens and a sample, which lens generates an electric field on a trajectory of a charged particle beam. The electrostatic lens is divided into a plurality of electrodes, and a voltage can be applied to the electrodes independently. By adjusting this voltage, any one of the astigmatism, the off-axis aberration and the out-of-focus state of the objective lens is corrected.

摘要翻译： 本发明的带电粒子束装置可以在物镜和样品之间设置静电透镜，该静电透镜能够高精度地同时校正散光，离轴像差和失焦状态，该透镜产生电 在带电粒子束的轨迹上。 静电透镜被分成多个电极，并且可以独立地向电极施加电压。 通过调整该电压，校正物镜的像散，离轴像差和失焦状态中的任何一个。

公开(公告)号：US20080210887A1

公开(公告)日：2008-09-04

申请号：US12090636

申请日：2006-10-20

申请人： Herbert Buschbeck ,  Elmar Platzgummer ,  Gerhard Stengl ,  Herbert Vonach

发明人： Herbert Buschbeck ,  Elmar Platzgummer ,  Gerhard Stengl ,  Herbert Vonach

IPC分类号： H01J37/147 ,  H01J37/21 ,  H01J37/317

CPC分类号： H01J37/3174 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/147 ,  H01J37/21 ,  H01J2237/0492 ,  H01J2237/24578

摘要： A charged particle system comprises a particle source for generating a beam of charged particles and a particle-optical projection system. The particle-optical projection system comprises a focusing first magnetic lens (403) comprising an outer pole piece (411) having a radial inner end (411′), and an inner pole piece (412) having a lowermost end (412′) disposed closest to the radial inner end of the outer pole piece, a gap being formed by those; a focusing electrostatic lens (450) having at least a first electrode (451) and a second electrode (450) disposed in a region of the gap; and a controller (C) configured to control a focusing power of the first electrostatic lens based on a signal indicative of a distance of a surface of a substrate from a portion of the first magnetic lens disposed closest to the substrate.

摘要翻译： 带电粒子系统包括用于产生带电粒子束的粒子源和粒子光学投影系统。 粒子光学投影系统包括聚焦第一磁性透镜（403），其包括具有径向内端（411'）的外极片（411）和设置有最下端（412'）的内极片（412） 最靠近外极片的径向内端的间隙由它们形成; 具有至少设置在所述间隙的区域中的第一电极（451）和第二电极（450）的聚焦静电透镜（450） 以及控制器（C），被配置为基于表示基板的表面距离最靠近基板设置的第一磁性透镜的部分的距离的信号来控制第一静电透镜的聚焦能力。