公开(公告)号：US20180269034A1

公开(公告)日：2018-09-20

申请号：US15888118

申请日：2018-02-05

Applicant: NuFlare Technology, Inc.

Inventor： Haruyuki NOMURA

IPC: H01J37/317 ,  H01J37/04 ,  H01J37/10 ,  H01J37/09 ,  H01J37/24

CPC classification number: H01J37/3175 ,  H01J37/045 ,  H01J37/09 ,  H01J37/10 ,  H01J37/243 ,  H01J37/3174 ,  H01J2237/043 ,  H01J2237/30433 ,  H01J2237/31776

Abstract: In one embodiment, a charged particle beam writing apparatus includes a current limiting aperture, a blanking deflector switching between beam ON and beam OFF so as to control an irradiation time by deflecting the charged particle beam having passed through the current limiting aperture, a blanking aperture blocking the charged particle beam deflected by the blanking deflector in such a manner that the beam OFF state is entered, and an electron lens disposed between the current limiting aperture and the blanking aperture. A lens value set for the electron lens is substituted into a given function to calculate an offset time. The offset time is added to an irradiation time for writing a pattern to correct the irradiation time. The blanking deflector switches between the beam ON and the beam OFF based on the corrected irradiation time.

公开(公告)号：US20180166252A1

公开(公告)日：2018-06-14

申请号：US15372536

申请日：2016-12-08

Applicant: JEOL Ltd.

Inventor： Hidetaka Sawada ,  Yu Jimbo ,  Masashi Shimizu

IPC: H01J37/153 ,  H01J37/26 ,  H01J37/22 ,  H01J37/10 ,  H01J37/147

CPC classification number: H01J37/153 ,  H01J37/10 ,  H01J37/1474 ,  H01J37/22 ,  H01J37/26 ,  H01J2237/1534 ,  H01J2237/182

Abstract: There is provided a liner tube capable of reducing the effects of magnetic field variations on an electron beam. The liner tube (10) is disposed inside the electron optical column (2) of an electron microscope (100). The interior of the tube (10) forms a path for the electron beam (EB). The liner tube (10) has a first cylindrical member (110) that is made of copper, gold, silver, or an alloy consisting principally of one of these metals.

公开(公告)号：US20180158647A1

公开(公告)日：2018-06-07

申请号：US15464533

申请日：2017-03-21

Applicant: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.

Inventor： Bao-Hua Niu ,  Jung-Hsiang Chuang ,  David Hung-I Su

IPC: H01J37/22 ,  H01J37/16 ,  H01J37/20 ,  H01J37/06 ,  H01J37/10 ,  H01J37/244

CPC classification number: H01J37/226 ,  H01J37/06 ,  H01J37/10 ,  H01J37/16 ,  H01J37/20 ,  H01J37/244 ,  H01J2237/2445

Abstract: A wafer and DUT inspection apparatus and a wafer and DUT inspection method using thereof are provided. The apparatus includes a vacuum chamber, a stage, an electron gun, a lens system, an optical mirror and a detector. In the vacuum chamber, the stage is disposed near a first end, and the electron gun is disposed near a second end opposite to the first end. The lens system disposed between the stage and the electron gun is a total reflective achromatic lens system including a first lens and a second lens. The second lens having a second aperture is disposed between the electron gun and the first lens having a first aperture aligned with the second aperture. The optical mirror is disposed between the lens system and the electron gun. The detector is horizontally aligned with the optical mirror and configured to detect cathodoluminescence reflected from the optical mirror.

公开(公告)号：US09991089B2

公开(公告)日：2018-06-05

申请号：US15788338

申请日：2017-10-19

Applicant: Carl Zeiss Microscopy GmbH

Inventor： Ingo Mueller ,  Nicole Rauwolf ,  Christof Riedesel ,  Thomas Kemen ,  Joerg Jacobi ,  Arne Thoma ,  Markus Doering ,  Dirk Zeidler ,  Juergen Kynast ,  Gerd Benner

IPC: H01J37/21 ,  H01J37/28 ,  H01J37/10

CPC classification number: H01J37/21 ,  H01J37/10 ,  H01J37/28 ,  H01J2237/0435 ,  H01J2237/0492 ,  H01J2237/28 ,  H01J2237/31764 ,  H01J2237/31774

Abstract: A method for operating a multi-beam particle optical unit comprises includes providing a first setting of effects of particle-optical components, wherein a particle-optical imaging is characterizable by at least two parameters. The method also includes determining a matrix A, and determining a matrix S. The method further includes defining values of parameters which characterize a desired imaging, and providing a second setting of the effects of the components in such a way that the particle-optical imaging is characterizable by the parameters having the defined values.

公开(公告)号：US20180144905A1

公开(公告)日：2018-05-24

申请号：US15806872

申请日：2017-11-08

Applicant: NuFlare Technology, Inc.

Inventor： Osamu IIZUKA ,  Yukitaka SHIMIZU

IPC: H01J37/302 ,  H01J37/317 ,  H01J37/04 ,  H01J37/20 ,  H01J37/10 ,  H01J37/153 ,  H01J37/147 ,  H01J37/244

CPC classification number: H01J37/302 ,  H01J37/045 ,  H01J37/10 ,  H01J37/147 ,  H01J37/153 ,  H01J37/20 ,  H01J37/244 ,  H01J37/304 ,  H01J37/3177 ,  H01J2237/0435 ,  H01J2237/0453 ,  H01J2237/1532 ,  H01J2237/20221 ,  H01J2237/21 ,  H01J2237/24514 ,  H01J2237/24564 ,  H01J2237/24592 ,  H01J2237/31774 ,  H01J2237/31798

Abstract: According to one embodiment, a multi charged particle beam writing apparatus includes an objective lens adjusting a focus position of multiple beams, a coil correcting astigmatism of the multiple beams, an inspection aperture disposed in a stage and configured to allow one beam of the multiple beams to pass therethrough, a deflector deflecting the multiple beams, a current detector detecting a beam current of each beam of the multiple beams scanned over the inspection aperture in the XY direction and passed through the inspection aperture, and a controller generating a beam image on the basis of the detected beam current, calculating a feature quantity of the beam image, and controlling the objective lens or the coil on the basis of the feature quantity.

公开(公告)号：US09966230B1

公开(公告)日：2018-05-08

申请号：US15605308

申请日：2017-05-25

Applicant: KLA-Tencor Corporation

Inventor： Yung-Ho Chuang ,  Yinying Xiao-Li ,  Xuefeng Liu ,  John Fielden

IPC: H01J37/317 ,  H01J37/20 ,  H01J37/244 ,  H01J37/10 ,  H01J37/147 ,  H01J37/04 ,  H01J37/073

CPC classification number: H01J37/3177 ,  H01J37/045 ,  H01J37/073 ,  H01J37/10 ,  H01J37/147 ,  H01J37/20 ,  H01J37/244 ,  H01J2237/0435

Abstract: A multi-column electron beam device includes an electron source comprising multiple field emitters fabricated on a surface of a silicon substrate. To prevent oxidation of the silicon, a thin, contiguous boron layer is disposed directly on the output surface of the field emitters. The field emitters can take various shapes including a pyramid, a cone, or a rounded whisker. Optional gate layers may be placed on the output surface near the field emitters. The field emitter may be p-type or n-type doped. Circuits may be incorporated into the wafer to control the emission current. A light source may be configured to illuminate the electron source and control the emission current. The multi-column electron beam device may be a multi-column electron beam lithography system configured to write a pattern on a sample.

公开(公告)号：US09922799B2

公开(公告)日：2018-03-20

申请号：US15213781

申请日：2016-07-19

Applicant: Hermes Microvision, Inc.

Inventor： Shuai Li ,  Weiming Ren ,  Xuedong Liu ,  Juying Dou ,  Xuerang Hu ,  Zhongwei Chen

IPC: H01J37/28 ,  H01J37/10 ,  H01J37/20 ,  H01J37/244

CPC classification number: H01J37/28 ,  H01J37/10 ,  H01J37/20 ,  H01J37/244 ,  H01J2237/0453 ,  H01J2237/0492 ,  H01J2237/04924 ,  H01J2237/04926 ,  H01J2237/04928 ,  H01J2237/1205 ,  H01J2237/1501 ,  H01J2237/1502 ,  H01J2237/2446 ,  H01J2237/2448 ,  H01J2237/2806 ,  H01J2237/2817

Abstract: A multi-beam apparatus for observing a sample with high resolution and high throughput and in flexibly varying observing conditions is proposed. The apparatus uses a movable collimating lens to flexibly vary the currents of the plural probe spots without influencing the intervals thereof, a new source-conversion unit to form the plural images of the single electron source and compensate off-axis aberrations of the plural probe spots with respect to observing conditions, and a pre-beamlet-forming means to reduce the strong Coulomb effect due to the primary-electron beam.

公开(公告)号：US09892885B2

公开(公告)日：2018-02-13

申请号：US15269031

申请日：2016-09-19

Applicant: KLA-Tencor Corporation

Inventor： Frank Laske ,  Christopher Sears

IPC: G03F7/20 ,  G03F1/84 ,  H01J37/10 ,  H01J37/28 ,  H01J37/20 ,  H01J37/244

CPC classification number: H01J37/10 ,  H01J37/20 ,  H01J37/244 ,  H01J37/28 ,  H01J2237/1501

Abstract: A scanning electron microscopy system includes an electron beam source, a sample stage that includes a first alignment feature, an electron-optical column that includes electron-optical elements that include a lens having a second alignment feature, and an alignment plate having a third alignment feature. The system additionally includes a reference target, and a detector assembly. The electron-optical elements configurable to simultaneously focus on a substrate and the reference target. The system also includes a controller communicatively coupled to at least one or more portions of the electron-optical column and the sample stage, to make adjustments in order to align the electron beam to at least one of the first set of alignment features, the second set of alignment features, the third set of alignment features, the reference target or the substrate. The controller also makes adjustments to simultaneously focus the electron beam at a first and second high resolution plane.

公开(公告)号：US20170358421A1

公开(公告)日：2017-12-14

申请号：US15671472

申请日：2017-08-08

Applicant: Hitachi High-Technologies Corporation

Inventor： Tsunenori NOMAGUCHI ,  Toshihide AGEMURA

IPC: H01J37/28 ,  G01T1/20 ,  H01J37/30 ,  H01J37/244 ,  H01J37/22 ,  H01J37/24 ,  H01J37/147 ,  H01J37/10

CPC classification number: H01J37/28 ,  G01T1/20 ,  H01J37/10 ,  H01J37/147 ,  H01J37/22 ,  H01J37/24 ,  H01J37/244 ,  H01J37/30 ,  H01J37/3178

Abstract: A composite charged particle beam apparatus modulates an irradiation condition of a charged particle beam at high speed and detects a signal in synchronization with a modulation period to extract a signal arising from a particular charged particle beam when a sample is irradiated with a plurality of charged particle beams simultaneously. Light emitted from two or more kinds of scintillators having different light emitting properties is dispersed, signal strength is detected, and a signal is processed based on a ratio of first signal strength when the sample is irradiated with a first charged particle beam alone to second signal strength when the sample is irradiated with a second charged particle beam alone. The apparatus can extract only a signal arising from a desired charged particle beam even when the sample is irradiated with the plurality of charged particle beams simultaneously.

公开(公告)号：US20170309443A1

公开(公告)日：2017-10-26

申请号：US15490934

申请日：2017-04-19

Applicant: Carl Zeiss Microscopy GmbH

Inventor： Luyang Han

IPC: H01J37/22 ,  H01J37/10 ,  H01J37/244 ,  H01J37/28

CPC classification number: H01J37/222 ,  G06T3/4038 ,  G06T7/33 ,  G06T2207/10061 ,  H01J2237/226

Abstract: The system described herein relates to a method for generating a composite image of an object using, for example, a particle beam device such as an electron beam device and/or an ion beam device. A composite image is generated by relatively arranging a first sub image to a second sub image such that the first sub image overlaps the second sub image in the entire common region, a calculated first image position of a first marking in the first sub image is arranged on the first image position of the first marking in the second sub image, and a calculated second image position of a second marking in the first sub image is arranged on the second image position of the second marking in the second sub image.