THREE DIMENSIONAL VERTICAL E-FUSE STRUCTURES AND METHODS OF MANUFACTURING THE SAME
    63.
    发明申请
    THREE DIMENSIONAL VERTICAL E-FUSE STRUCTURES AND METHODS OF MANUFACTURING THE SAME 失效
    三维垂直电子熔断器结构及其制造方法

    公开(公告)号:US20090085152A1

    公开(公告)日:2009-04-02

    申请号:US11865079

    申请日:2007-10-01

    IPC分类号: H01L23/62 H01L21/44

    摘要: Three dimensional vertical e-fuse structures and methods of manufacturing the same are provided herein. The method of forming a fuse structure comprises providing a substrate including an insulator layer and forming an opening in the insulator layer. The method further comprises forming a conductive layer along a sidewall of the opening and filling the opening with an insulator material. The vertical e-fuse structure comprises a first contact layer and a second contact layer. The structure further includes a conductive material lined within a via and in electrical contact with the first contact layer and the second contact layer. The conductive material has an increased resistance as a current is applied thereto.

    摘要翻译: 本文提供三维垂直电子熔丝结构及其制造方法。 形成熔丝结构的方法包括提供包括绝缘体层并在绝缘体层中形成开口的衬底。 该方法还包括沿着开口的侧壁形成导电层并用绝缘体材料填充开口。 垂直e熔丝结构包括第一接触层和第二接触层。 该结构还包括衬里在通孔内并与第一接触层和第二接触层电接触的导电材料。 当施加电流时,导电材料具有增加的电阻。

    Light shield for CMOS imager
    68.
    发明授权
    Light shield for CMOS imager 有权
    CMOS成像器的屏蔽

    公开(公告)号:US07633106B2

    公开(公告)日:2009-12-15

    申请号:US11164072

    申请日:2005-11-09

    IPC分类号: H01L31/00

    CPC分类号: H01L27/14623 H01L27/14685

    摘要: The present invention provides a light shield for shielding the floating diffusion of a complementary metal-oxide semiconductor (CMOS) imager. In accordance with an embodiment of the present invention, there is provided a pixel sensor cell including: a device region formed on a substrate; and a first layer of material forming a sidewall adjacent to a side of the device region for blocking electromagnetic radiation from the device region.

    摘要翻译: 本发明提供一种用于屏蔽互补金属氧化物半导体(CMOS)成像器的浮动扩散的遮光罩。 根据本发明的实施例,提供了一种像素传感器单元,包括:形成在基板上的器件区域; 以及形成与所述器件区域的一侧相邻的侧壁的第一材料层,用于阻挡来自所述器件区域的电磁辐射。