公开(公告)号：US20180087214A1

公开(公告)日：2018-03-29

申请号：US15718206

申请日：2017-09-28

Applicant: FREE FORM FIBERS, LLC

Inventor： Shay L. HARRISON ,  Marvin KESHNER ,  Joseph PEGNA ,  Erik G. VAALER ,  John L. SCHNEITER ,  Ram K. GODUGUCHINTA ,  Kirk L. WILLIAMS

IPC: D06M11/36 ,  C23C16/48 ,  C23C16/46 ,  C23C16/40

CPC classification number: D06M11/36 ,  C04B35/62847 ,  C04B35/62889 ,  C04B2235/3205 ,  C04B2235/665 ,  C04B2235/767 ,  C23C16/40 ,  C23C16/46 ,  C23C16/483

Abstract: A refractory oxide coated fiber is provided including a primary fiber material and a refractory oxide coating over the primary fiber material. Further, a method of making a refractory oxide coated fiber is provided, which includes: providing a first precursor-laden environment, the first precursor-laden environment including a primary precursor; promoting fiber growth within the first precursor-laden environment using laser heating; and providing a second precursor-laden environment to promote coating of the fiber, the second precursor-laden environment comprising a refractory oxide precursor, and the coating producing a refractory oxide coating over the fiber with a hexagonal microstructure.

公开(公告)号：US09588416B2

公开(公告)日：2017-03-07

申请号：US14537304

申请日：2014-11-10

Applicant: Dirk Robert Englund ,  Igal Bayn ,  Luozhou Li

Inventor： Dirk Robert Englund ,  Igal Bayn ,  Luozhou Li

IPC: G03F1/62 ,  C09K13/00 ,  C23C14/58 ,  C01B31/06 ,  G01Q80/00 ,  C23C16/48 ,  C23C16/50 ,  H01J37/317

CPC classification number: G03F1/62 ,  C01B32/28 ,  C09K13/00 ,  C23C14/58 ,  C23C16/483 ,  C23C16/486 ,  C23C16/487 ,  C23C16/50 ,  H01J37/3171 ,  H01J2237/31706

Abstract: Apparatus for nanofabrication on an unconventional substrate including a patterned pliable membrane mechanically coupled to a membrane support structure, a substrate support structure to receive a substrate for processing, and an actuator to adjust the distance between the pliable membrane and the substrate. Nanofabrication on conventional and unconventional substrates can be achieved by transferring a pre-formed patterned pliable membrane onto the substrate using a transfer probe or non-stick sheet, followed by irradiating the substrate through the patterned pliable membrane so as to transfer the pattern on the pliable membrane into or out of the substrate. The apparatus and methods allow fabrication of diamond photonic crystals, fiber-integrated photonic devices and Nitrogen Vacancy (NV) centers in diamonds.

Abstract translation: 用于在非常规基材上纳米加工的装置，包括机械耦合到膜支撑结构的图案化的柔性膜，用于接收用于处理的基底的基底支撑结构以及调节柔性膜与基底之间的距离的致动器。 通过使用转移探针或不粘片将预先形成的图案化的柔韧膜转移到基底上，然后通过图案化的柔性膜照射基底，以便将图案转移到柔韧的方式上，可以实现常规和非常规基底上的纳米制造 膜进入或离开基底。 该装置和方法允许在钻石中制造金刚石光子晶体，光纤集成光子器件和氮空位（NV）中心。

公开(公告)号：US09580807B2

公开(公告)日：2017-02-28

申请号：US14003985

申请日：2012-03-07

Applicant: Matthieu Bilaine ,  Li-Ya Yeh

Inventor： Matthieu Bilaine ,  Li-Ya Yeh

IPC: C23C14/58 ,  C23C16/48 ,  B23K26/06 ,  C03C17/00 ,  C03C17/34 ,  C03C17/36 ,  C23C16/56

CPC classification number: C23C16/483 ,  B23K26/0608 ,  B23K26/064 ,  B23K2101/34 ,  C03C17/002 ,  C03C17/3417 ,  C03C17/366 ,  C03C2218/156 ,  C03C2218/32 ,  C23C14/5813 ,  C23C16/56

Abstract: The subject of the invention is a process for obtaining a substrate (1) provided on at least one of its sides with a coating (2), comprising a step of depositing said coating (2) then a step of heat treatment of said coating using a main laser radiation (4), said process being characterized in that at least one portion (5, 14) of the main laser radiation (4) transmitted through said substrate (1) and/or reflected by said coating (2) is redirected in the direction of said substrate in order to form at least one secondary laser radiation (6, 7, 18).

Abstract translation: 本发明的主题是一种用于获得在其至少一侧上设置有涂层（2）的基底（1）的方法，包括以下步骤：沉积所述涂层（2），然后使用以下步骤对所述涂层进行热处理：使用 主激光辐射（4），所述方法的特征在于通过所述基底（1）传播和/或被所述涂层（2）反射的主激光辐射（4）的至少一部分（5,14）被重定向 在所述衬底的方向上，以便形成至少一个次级激光辐射（6,7,18）。

公开(公告)号：US09499909B2

公开(公告)日：2016-11-22

申请号：US14186837

申请日：2014-02-21

Applicant: Applied Materials, Inc.

Inventor： Stephen Moffatt

IPC: H01L21/00 ,  C23C16/48 ,  C30B25/02 ,  C23C16/28 ,  C23C16/455 ,  C30B25/16 ,  C30B30/00 ,  H01L21/02

CPC classification number: C23C16/483 ,  C23C16/28 ,  C23C16/45504 ,  C30B25/02 ,  C30B25/165 ,  C30B30/00 ,  H01L21/02521 ,  H01L21/0262

Abstract: Embodiments of the invention provide a method and apparatus for depositing a layer on a substrate. In one embodiment, the method includes exposing a surface of the substrate disposed within a processing chamber to a fluid precursor, directing an electromagnetic radiation generated from a radiation source to a light scanning unit such that the electromagnetic radiation is deflected and scanned across the surface of the substrate upon which a material layer is to be formed, and initiating a deposition process with the electromagnetic radiation having a wavelength selected for photolytic dissociation of the fluid precursor to deposit the material layer onto the surface of the substrate. The radiation source may comprise a laser source, a bright light emitting diode (LED) source, or a thermal source. In one example, the radiation source is a fiber laser producing output in the ultraviolet (UV) wavelength range.

Abstract translation: 本发明的实施例提供了一种用于在衬底上沉积层的方法和装置。 在一个实施例中，该方法包括将设置在处理室内的衬底的表面暴露于流体前体，将从辐射源产生的电磁辐射引导到光扫描单元，使得电磁辐射被偏转并扫描横过表面 要在其上形成材料层的衬底，并且开始沉积过程，其中电磁辐射具有选择用于光解离流体前体的波长，以将材料层沉积到衬底的表面上。 辐射源可以包括激光源，亮发光二极管（LED）源或热源。 在一个示例中，辐射源是在紫外（UV）波长范围内产生输出的光纤激光器。

公开(公告)号：US20160222502A1

公开(公告)日：2016-08-04

申请号：US14990174

申请日：2016-01-07

Applicant: KING FAHD UNIVERSITY OF PETROLEUM AND MINERALS

Inventor： Mohammed Ashraf GONDAL ,  Radek FAJGAR ,  Zain Hassan Abdallah YAMANI ,  Xiaofeng CHANG

IPC: C23C14/28 ,  C23C14/06 ,  B01J21/18 ,  C23C14/22 ,  B01J35/00 ,  A61L31/08

CPC classification number: C23C14/28 ,  A61L31/084 ,  A61L31/088 ,  A61L31/16 ,  A61L2300/104 ,  A61L2400/12 ,  A61L2420/04 ,  B01J21/18 ,  B01J23/50 ,  B01J35/0013 ,  B01J35/004 ,  B22F1/0018 ,  B22F1/02 ,  B22F9/04 ,  B22F2201/30 ,  B22F2202/11 ,  B32B15/01 ,  C22C5/06 ,  C23C14/06 ,  C23C14/22 ,  C23C16/26 ,  C23C16/44 ,  C23C16/4417 ,  C23C16/483

Abstract: Ag/C crystalline nanocomposite films and a method of forming the films with controllable Ag/C molar ratios using a concurrent excimer laser-induced ablation of a silver target and a hydrocarbon gas under a vacuum atmosphere. Metal/Carbon nanocomposites prepared by concurrent irradiation of a metal target, in the presence of a hydrocarbon gas, during an excimer laser induced process.

Abstract translation: Ag / C结晶纳米复合材料薄膜和使用在真空气氛下使用同时受激准分子激光诱导的银靶和烃气体的烧蚀来形成具有可控的Ag / C摩尔比的膜的方法。 金属/碳纳米复合材料在准分子激光诱导过程中在烃气体存在下同时照射金属靶材制备。

公开(公告)号：US09406761B2

公开(公告)日：2016-08-02

申请号：US14479646

申请日：2014-09-08

Applicant: Semiconductor Energy Laboratory Co., Ltd.

Inventor： Shunpei Yamazaki

IPC: H01L29/26 ,  H01L29/66 ,  H01L29/786

CPC classification number: H01L29/78696 ,  C23C16/45525 ,  C23C16/483 ,  G02F1/134309 ,  G02F1/136213 ,  G02F1/136286 ,  G02F1/1368 ,  G02F2201/123 ,  G06K19/0723 ,  H01L27/1052 ,  H01L27/1225 ,  H01L27/3262 ,  H01L29/24 ,  H01L29/26 ,  H01L29/66075 ,  H01L29/66969 ,  H01L29/78648 ,  H01L29/7869

Abstract: A transistor having high field-effect mobility is provided. A transistor having stable electrical characteristics is provided. A transistor having low off-state current (current in an off state) is provided. Alternatively, a semiconductor device including the transistor is provided. The semiconductor device includes a first insulating film, an oxide semiconductor film over the first insulating film, a second insulating film over the oxide semiconductor film, and a conductive film overlapping with the oxide semiconductor film with the first insulating film or the second insulating film provided between the oxide semiconductor film and the conductive film. The composition of the oxide semiconductor film changes continuously between the first insulating film and the second insulating film.

Abstract translation: 提供具有高场效应迁移率的晶体管。 提供具有稳定电特性的晶体管。 提供具有低截止电流（处于断开状态的电流）的晶体管。 或者，提供包括晶体管的半导体器件。 半导体器件包括第一绝缘膜，第一绝缘膜上的氧化物半导体膜，氧化物半导体膜上的第二绝缘膜，以及与第一绝缘膜或第二绝缘膜与氧化物半导体膜重叠的导电膜 在氧化物半导体膜和导电膜之间。 氧化物半导体膜的组成在第一绝缘膜和第二绝缘膜之间连续变化。

公开(公告)号：US20150247236A1

公开(公告)日：2015-09-03

申请号：US14699830

申请日：2015-04-29

Applicant: Micron Technology, Inc.

Inventor： Ross S. Dando ,  F. Daniel Gealy

IPC: C23C16/04 ,  C23C16/455 ,  C23C16/48 ,  C23C16/52

CPC classification number: C23C16/047 ,  C23C16/45525 ,  C23C16/483 ,  C23C16/52

Abstract: Methods for depositing material onto microfeature workpieces in reaction chambers and systems for depositing materials onto microfeature workpieces are disclosed herein. In one embodiment, a method includes depositing molecules of a gas onto a microfeature workpiece in the reaction chamber and selectively irradiating a first portion of the molecules on the microfeature workpiece in the reaction chamber with a selected radiation without irradiating a second portion of the molecules on the workpiece with the selected radiation. The first portion of the molecules can be irradiated to activate the portion of the molecules or desorb the portion of the molecules from the workpiece. The first portion of the molecules can be selectively irradiated by impinging the first portion of the molecules with a laser beam or other energy source.

Abstract translation: 本文公开了在反应室中的微型工件上沉积材料的方法和用于将材料沉积到微特征工件上的系统。 在一个实施方案中，一种方法包括将气体的分子沉积到反应室中的微特征工件上，并用选定的辐射选择性地照射反应室中的微特征工件上的分子的第一部分，而不会将分子的第二部分 工件与选定的辐射。 可以照射分子的第一部分以激活分子的一部分或从工件解吸部分分子。 分子的第一部分可以通过用激光束或其他能量源撞击分子的第一部分来选择性地照射。

公开(公告)号：US20150064363A1

公开(公告)日：2015-03-05

申请号：US14389709

申请日：2013-04-19

Applicant: LAWRENCE LIVERMORE NATIONAL SECURITY, LLC

Inventor： Manyalibo Joseph Matthews ,  Selim Elhadj

IPC: C23C16/04 ,  C23C16/52 ,  C23C16/46 ,  C23C16/448 ,  H01L21/268 ,  C23C16/48

CPC classification number: C23C16/047 ,  C03C17/245 ,  C03C2217/213 ,  C03C2218/152 ,  C23C16/0263 ,  C23C16/4488 ,  C23C16/46 ,  C23C16/483 ,  C23C16/52 ,  H01L21/268

Abstract: An atmospheric, Laser-based Chemical Vapor Deposition (LCVD) technique provides highly localized deposition of material to mitigate damage sites on an optical component. The same laser beam can be used to deposit material as well as for in-situ annealing of the deposited material. The net result of the LCVD process is in-filling and planarization of a treated site, which produces optically more damage resistant surfaces. Several deposition and annealing steps can be interleaved during a single cycle for more precise control on amount of deposited material as well as for increasing the damage threshold for the deposited material.

Abstract translation: 大气，基于激光的化学气相沉积（LCVD）技术提供高度局部化的材料沉积，以减轻光学部件上的损伤部位。 相同的激光束可用于沉积材料以及沉积材料的原位退火。 LCVD过程的最终结果是处理部位的填充和平坦化，其产生光学上更耐损伤的表面。 可以在单个循环期间交错几个沉积和退火步骤，以更精确地控制沉积材料的量以及增加沉积材料的损伤阈值。

公开(公告)号：US20140273416A1

公开(公告)日：2014-09-18

申请号：US14186837

申请日：2014-02-21

Applicant: Applied Materials, Inc.

Inventor： STEPHEN MOFFATT

IPC: H01L21/02 ,  C23C16/48

CPC classification number: C23C16/483 ,  C23C16/28 ,  C23C16/45504 ,  C30B25/02 ,  C30B25/165 ,  C30B30/00 ,  H01L21/02521 ,  H01L21/0262

Abstract: Embodiments of the invention provide a method and apparatus for depositing a layer on a substrate. In one embodiment, the method includes exposing a surface of the substrate disposed within a processing chamber to a fluid precursor, directing an electromagnetic radiation generated from a radiation source to a light scanning unit such that the electromagnetic radiation is deflected and scanned across the surface of the substrate upon which a material layer is to be formed, and initiating a deposition process with the electromagnetic radiation having a wavelength selected for photolytic dissociation of the fluid precursor to deposit the material layer onto the surface of the substrate. The radiation source may comprise a laser source, a bright light emitting diode (LED) source, or a thermal source. In one example, the radiation source is a fiber laser producing output in the ultraviolet (UV) wavelength range.

Abstract translation: 本发明的实施例提供了一种用于在衬底上沉积层的方法和装置。 在一个实施例中，该方法包括将设置在处理室内的衬底的表面暴露于流体前体，将从辐射源产生的电磁辐射引导到光扫描单元，使得电磁辐射被偏转并扫描横过表面 要在其上形成材料层的衬底，并且开始沉积过程，其中电磁辐射具有选择用于光解离流体前体的波长，以将材料层沉积到衬底的表面上。 辐射源可以包括激光源，亮发光二极管（LED）源或热源。 在一个示例中，辐射源是在紫外（UV）波长范围内产生输出的光纤激光器。

公开(公告)号：US20140093654A1

公开(公告)日：2014-04-03

申请号：US13915468

申请日：2013-06-11

Applicant: Honda Patents & Technologies North America, LLC ,  The Board of Trustees of the Leland Stanford Junior University

Inventor： Timothy P. Holme ,  Andrei Iancu ,  Hee Joon Jung ,  Michael C. Langston ,  Munekazu Motoyama ,  Friedrich B. Prinz ,  Takane Usui ,  Hitoshi Iwadate ,  Neil Dasgupta ,  Cheng-Chieh Chao

IPC: C23C16/48

CPC classification number: C23C16/482 ,  B82Y10/00 ,  B82Y20/00 ,  C23C16/48 ,  C23C16/483 ,  C23C16/486 ,  C23C16/487 ,  H01L21/02532 ,  H01L21/02568 ,  H01L21/02601 ,  H01L21/02603 ,  H01L21/0262 ,  H01L31/035209 ,  H01L31/035218 ,  H01L31/035227 ,  H01L31/035236 ,  H01L31/18 ,  Y10S977/762 ,  Y10S977/773 ,  Y10S977/774

Abstract: A method of fabricating quantum confinements is provided. The method includes depositing, using a deposition apparatus, a material layer on a substrate, where the depositing includes irradiating the layer, before a cycle, during a cycle, and/or after a cycle of the deposition to alter nucleation of quantum confinements in the material layer to control a size and/or a shape of the quantum confinements. The quantum confinements can include quantum wells, nanowires, or quantum dots. The irradiation can be in-situ or ex-situ with respect to the deposition apparatus. The irradiation can include irradiation by photons, electrons, or ions. The deposition is can include atomic layer deposition, chemical vapor deposition, MOCVD, molecular beam epitaxy, evaporation, sputtering, or pulsed-laser deposition.

Abstract translation: 提供了一种制造量子限制的方法。 该方法包括使用沉积设备沉积衬底上的材料层，其中沉积包括在循环之前，循环期间和/或在沉积循环之后照射该层，以改变在该沉积中的量子限制的成核 材料层以控制量子限制的尺寸和/或形状。 量子限制可以包括量子阱，纳米线或量子点。 相对于沉积设备，照射可以就地或离位。 照射可以包括光子，电子或离子的照射。 沉积可以包括原子层沉积，化学气相沉积，MOCVD，分子束外延，蒸发，溅射或脉冲激光沉积。