VARYING THICKNESS INDUCTOR
    72.
    发明申请
    VARYING THICKNESS INDUCTOR 审中-公开
    变化厚度电感器

    公开(公告)号:US20160358709A1

    公开(公告)日:2016-12-08

    申请号:US15242007

    申请日:2016-08-19

    Abstract: A method includes forming a first conductive spiral and a second conductive spiral of a spiral inductor coupled to a substrate. The second conductive spiral overlays the first conductive spiral. A first portion of an innermost turn of the spiral inductor has a first thickness in a direction perpendicular to the substrate. The first portion of the innermost turn includes a first portion of the first conductive spiral and does not include the second conductive spiral. A second portion of the innermost turn includes a first portion of the second conductive spiral. A portion of an outermost turn of the spiral inductor has a second thickness in the direction perpendicular to the substrate. The second thickness is greater than the first thickness. The portion of the outermost turn includes a second portion of the first conductive spiral and a second portion of the second conductive spiral.

    Abstract translation: 一种方法包括形成耦合到衬底的螺旋电感器的第一导电螺旋和第二导电螺旋。 第二导电螺旋覆盖第一导电螺旋。 螺旋电感器的最内圈的第一部分在垂直于衬底的方向上具有第一厚度。 最内圈的第一部分包括第一导电螺旋的第一部分,并且不包括第二导电螺旋。 最内圈的第二部分包括第二导电螺旋的第一部分。 螺旋电感器的最外圈的一部分在垂直于衬底的方向上具有第二厚度。 第二厚度大于第一厚度。 最外圈的部分包括第一导电螺旋的第二部分和第二导电螺旋的第二部分。

    Metal-semiconductor wafer bonding for high-Q devices
    73.
    发明授权
    Metal-semiconductor wafer bonding for high-Q devices 有权
    用于高Q器件的金属半导体晶片接合

    公开(公告)号:US09431510B2

    公开(公告)日:2016-08-30

    申请号:US14554718

    申请日:2014-11-26

    CPC classification number: H01L29/66174 H01G4/1272 H01G4/33 H01L28/40 H01L28/75

    Abstract: Methods and apparatus for metal semiconductor wafer bonding for high-Q devices are provided. An exemplary capacitor includes a first plate formed on a glass substrate, a second plate, and a dielectric layer. No organic bonding agent is used between the first plate and the glass substrate, and the dielectric layer can be an intrinsic semiconductor. A extrinsic semiconductor layer that is heavily doped contacts the dielectric layer. The dielectric and extrinsic semiconductor layers are sandwiched between the first and second plates. An intermetallic layer is formed between the first plate and the dielectric layer. The intermetallic layer is thermo compression bonded to the first plate and the dielectric layer. The capacitor can be coupled in a circuit as a high-Q capacitor and/or a varactor, and can be integrated with a mobile device.

    Abstract translation: 提供了用于高Q装置的金属半导体晶片接合的方法和装置。 示例性电容器包括形成在玻璃基板,第二板和介电层上的第一板。 在第一板和玻璃基板之间不使用有机粘合剂,并且电介质层可以是本征半导体。 重掺杂的非本征半导体层接触电介质层。 电介质和非本征半导体层夹在第一和第二板之间。 在第一板和电介质层之间形成金属间层。 金属间化合物层被热压接合到第一板和电介质层。 电容器可以作为高Q电容器和/或变容二极管耦合在电路中,并且可以与移动设备集成。

    Integrated passive device (IPD) on substrate
    74.
    发明授权
    Integrated passive device (IPD) on substrate 有权
    集成无源器件(IPD)在基板上

    公开(公告)号:US09362218B2

    公开(公告)日:2016-06-07

    申请号:US13968627

    申请日:2013-08-16

    Abstract: Some novel features pertain to a semiconductor device that includes a substrate, a first cavity that traverses the substrate. The first cavity is configured to be occupied by a interconnect material (e.g., solder ball). The substrate also includes a first metal layer coupled to a first side wall of the first cavity. The substrate further includes a first integrated passive device (IPD) on a first surface of the substrate, the first IPD coupled to the first metal layer. In some implementations, the substrate is a glass substrate. In some implementations, the first IPD is one of at least a capacitor, an inductor and/or a resistor. In some implementations, the semiconductor device further includes a second integrated passive device (IPD) on a second surface of the substrate. The second IPD is coupled to the first metal layer.

    Abstract translation: 一些新颖的特征涉及一种半导体器件,其包括衬底,穿过衬底的第一腔体。 第一腔被配置为被互连材料(例如,焊球)占据。 衬底还包括耦合到第一腔的第一侧壁的第一金属层。 衬底还包括在衬底的第一表面上的第一集成无源器件(IPD),第一IPD耦合到第一金属层。 在一些实施方案中,基底是玻璃基底。 在一些实现中,第一IPD是至少一个电容器,电感器和/或电阻器中的一个。 在一些实施方式中,半导体器件还包括在衬底的第二表面上的第二集成无源器件(IPD)。 第二IPD耦合到第一金属层。

    MULTI SPIRAL INDUCTOR
    80.
    发明申请
    MULTI SPIRAL INDUCTOR 审中-公开
    多螺旋电感器

    公开(公告)号:US20150130579A1

    公开(公告)日:2015-05-14

    申请号:US14078174

    申请日:2013-11-12

    Abstract: An apparatus includes a multi spiral inductor that includes a first spiral and a second spiral. The first spiral includes a first turn, a second turn, and a third turn. The first turn is adjacent to and separated from the second turn by first spacing. The second turn is adjacent to and separated from the third turn by second spacing. The first spacing is different from the second spacing.

    Abstract translation: 一种装置包括多螺旋电感器,其包括第一螺旋和第二螺旋。 第一个螺旋包括第一回合,第二回合和第三回合。 第一匝与第二匝相邻并且与第二匝分开。 第二匝与第三匝相邻并且与第三匝分开第二个间距。 第一间距与第二间距不同。

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