Spin chuck for thin wafer cleaning
    84.
    发明授权
    Spin chuck for thin wafer cleaning 有权
    旋转夹头用于薄晶圆清洗

    公开(公告)号:US09153462B2

    公开(公告)日:2015-10-06

    申请号:US12964097

    申请日:2010-12-09

    IPC分类号: H01L21/687 H01L21/67

    CPC分类号: H01L21/67051 H01L21/68728

    摘要: A device and system for thin wafer cleaning is disclosed. A preferred embodiment comprises a spin chuck having at least three holding clamps. A thin wafer with a wafer frame is mounted on the spin chuck through a tape layer. When the holding clamps are unlocked, there is no interference with the removal and placement of the wafer frame. On the other hand, when the holding clamps are locked, the holding clamps are brought into contact with the outer edge of the wafer frame so as to prevent the wafer frame from moving laterally. Furthermore, the shape of the holding clamps in a locked position is capable of preventing the wafer frame from moving vertically.

    摘要翻译: 公开了用于薄晶片清洁的装置和系统。 优选实施例包括具有至少三个保持夹具的旋转卡盘。 具有晶片框架的薄晶片通过带层安装在旋转卡盘上。 当保持夹具解锁时,不会干扰晶片框架的移除和放置。 另一方面,当保持夹具被锁定时,保持夹具与晶片框架的外边缘接触,以防止晶片框架横向移动。 此外,保持夹具处于锁定位置的形状能够防止晶片框架垂直移动。

    Controlling defects in thin wafer handling
    85.
    发明授权
    Controlling defects in thin wafer handling 有权
    控制薄晶片处理中的缺陷

    公开(公告)号:US08722540B2

    公开(公告)日:2014-05-13

    申请号:US12841874

    申请日:2010-07-22

    IPC分类号: H01L21/302 H01L21/461

    摘要: A method includes bonding a wafer on a carrier through an adhesive, and performing a thinning process on the wafer. After the step of performing the thinning process, a portion of the adhesive not covered by the wafer is removed, while the portion of the adhesive covered by the wafer is not removed.

    摘要翻译: 一种方法包括通过粘合剂将晶片接合在载体上,并在晶片上进行稀化处理。 在进行稀化处理的步骤之后,去除未被晶片覆盖的粘合剂的一部分,同时由晶片覆盖的粘合剂部分未被除去。

    Spin Chuck for Thin Wafer Cleaning
    86.
    发明申请
    Spin Chuck for Thin Wafer Cleaning 有权
    旋转夹头用于薄膜清洁

    公开(公告)号:US20120145204A1

    公开(公告)日:2012-06-14

    申请号:US12964097

    申请日:2010-12-09

    IPC分类号: B08B3/08 B08B3/02

    CPC分类号: H01L21/67051 H01L21/68728

    摘要: A device and system for thin wafer cleaning is disclosed. A preferred embodiment comprises a spin chuck having at least three holding clamps. A thin wafer with a wafer frame is mounted on the spin chuck through a tape layer. When the holding clamps are unlocked, there is no interference with the removal and placement of the wafer frame. On the other hand, when the holding clamps are locked, the holding clamps are brought into contact with the outer edge of the wafer frame so as to prevent the wafer frame from moving laterally. Furthermore, the shape of the holding clamps in a locked position is capable of preventing the wafer frame from moving vertically.

    摘要翻译: 公开了用于薄晶片清洁的装置和系统。 优选实施例包括具有至少三个保持夹具的旋转卡盘。 具有晶片框架的薄晶片通过带层安装在旋转卡盘上。 当保持夹具解锁时,不会干扰晶片框架的移除和放置。 另一方面,当保持夹具被锁定时,保持夹具与晶片框架的外边缘接触,以防止晶片框架横向移动。 此外,保持夹具处于锁定位置的形状能够防止晶片框架垂直移动。

    System and method for through silicon via yield
    89.
    发明授权
    System and method for through silicon via yield 有权
    通过硅产量的系统和方法

    公开(公告)号:US09153506B2

    公开(公告)日:2015-10-06

    申请号:US13542896

    申请日:2012-07-06

    摘要: The present disclosure provides one embodiment of an integrated circuit (IC) fabrication method to form an IC structure having one or more through silicon via (TSV) features. The IC fabrication method includes performing a plurality of processing steps; collecting physical metrology data from the plurality of processing steps; collecting virtual metrology data from the plurality of processing steps based on the physical metrology data; generating a yield prediction to the IC structure based on the physical metrology data and the virtual metrology data; and identifying an action at an earlier processing step based on the yield prediction.

    摘要翻译: 本公开提供了用于形成具有一个或多个贯穿硅通孔(TSV)特征的IC结构的集成电路(IC)制造方法的一个实施例。 IC制作方法包括执行多个处理步骤; 从多个处理步骤收集物理计量数据; 基于所述物理测量数据从所述多个处理步骤收集虚拟测量数据; 基于物理测量数据和虚拟测量数据,为IC结构生成产量预测; 以及基于所述产量预测在较早的处理步骤中识别动作。