公开(公告)号：US08653437B2

公开(公告)日：2014-02-18

申请号：US13157233

申请日：2011-06-09

申请人： William N. Partlo ,  Richard L. Sandstrom ,  Daniel J. W. Brown ,  Igor V. Fomenkov

发明人： William N. Partlo ,  Richard L. Sandstrom ,  Daniel J. W. Brown ,  Igor V. Fomenkov

IPC分类号： H05G2/00

CPC分类号： G21K5/00 ,  G03F7/70033 ,  H01S3/117 ,  H01S3/2232 ,  H01S3/2308 ,  H05G2/008

摘要： A device is disclosed herein which may comprise a droplet generator producing droplets of target material; a sensor providing an intercept time signal when a droplet reaches a preselected location; a delay circuit coupled with said sensor, the delay circuit generating a trigger signal delayed from the intercept time signal; a laser source responsive to a trigger signal to produce a laser pulse; and a system controlling said delay circuit to provide a trigger signal delayed from the intercept time by a first delay time to generate a light pulse that is focused on a droplet and a trigger signal delayed from the intercept time by a second delay time to generate a light pulse which is not focused on a droplet.

摘要翻译： 本文公开的装置可包括产生目标材料的液滴的液滴发生器; 当液滴到达预选位置时提供拦截时间信号的传感器; 与所述传感器耦合的延迟电路，所述延迟电路产生从截取时间信号延迟的触发信号; 响应于触发信号产生激光脉冲的激光源; 以及控制所述延迟电路的系统，以提供从截取时间延迟第一延迟时间的触发信号，以产生聚焦在液滴上的光脉冲和从截取时间延迟第二延迟时间的触发信号，以产生 不聚焦在液滴上的光脉冲。

公开(公告)号：US06566668B2

公开(公告)日：2003-05-20

申请号：US09875721

申请日：2001-06-06

申请人： John E. Rauch ,  William N. Partlo ,  Igor V. Fomenkov ,  Richard M. Ness ,  Daniel L. Birx ,  Richard L. Sandstrom ,  Stephan T. Melnychuk

发明人： John E. Rauch ,  William N. Partlo ,  Igor V. Fomenkov ,  Richard M. Ness ,  Daniel L. Birx ,  Richard L. Sandstrom ,  Stephan T. Melnychuk

IPC分类号： H05H104

CPC分类号： H05G2/003 ,  B82Y10/00 ,  G03F7/70033 ,  G03F7/70166 ,  G03F7/70916 ,  H05G2/005 ,  H05H1/06

摘要： A high energy photon source. A pair of plasma pinch electrodes are located in a vacuum chamber. The chamber contains a working gas which includes a noble buffer gas and an active gas chosen to provide a desired spectral line. A pulse power source provides electrical pulses at repetition rates of 1000 Hz or greater and at voltages high enough to create electrical discharges between the electrodes to produce very high temperature, high density plasma pinches in the working gas providing radiation at the spectral line of the source or active gas. A fourth generation unit is described which produces 20 mJ, 13.5 nm pulses into 2 &pgr; steradians at repetition rates of 2000 Hz with xenon as the active gas. This unit includes a pulse power system having a resonant charger charging a charging capacitor bank, and a magnetic compression circuit comprising a pulse transformer for generating the high voltage electrical pulses at repetition rates of 2000 Hz or greater.

公开(公告)号：US06650666B2

公开(公告)日：2003-11-18

申请号：US10027210

申请日：2001-12-21

申请人： Ronald L. Spangler ,  Robert N. Jacques ,  John A. Rule ,  Frederick A. Palenschat ,  Igor V. Fomenkov ,  John M. Algots ,  Jacob P. Lipcon ,  Richard L. Sandstrom

发明人： Ronald L. Spangler ,  Robert N. Jacques ,  John A. Rule ,  Frederick A. Palenschat ,  Igor V. Fomenkov ,  John M. Algots ,  Jacob P. Lipcon ,  Richard L. Sandstrom

IPC分类号： H01S310

CPC分类号： G03F7/70575 ,  G03F7/70025 ,  G03F7/70041 ,  G03F7/70333 ,  G03F7/70933 ,  H01S3/02 ,  H01S3/036 ,  H01S3/038 ,  H01S3/0385 ,  H01S3/0404 ,  H01S3/041 ,  H01S3/08036 ,  H01S3/097 ,  H01S3/0971 ,  H01S3/0975 ,  H01S3/104 ,  H01S3/105 ,  H01S3/1055 ,  H01S3/1305 ,  H01S3/1312 ,  H01S3/134 ,  H01S3/137 ,  H01S3/22 ,  H01S3/2207 ,  H01S3/225

摘要： An electric discharge laser with fast wavelength correction. Fast wavelength correction equipment includes at least one piezoelectric drive and a fast wavelength measurement system and fast feedback response times. In a preferred embodiment, equipment is provided to control wavelength on a slow time frame of several milliseconds, on a intermediate time from of about one to five milliseconds and on a very fast time frame of a few microseconds. Preferred techniques include a combination of a relatively slow stepper motor and a very fast piezoelectric driver for tuning the laser wavelength using a tuning mirror. A preferred control technique is described (utilizing a very fast wavelength monitor) to provide the slow and intermediate wavelength control with the combination of a stepper motor and a piezoelectric driver. Very fast wavelength control is provided with a piezoelectric load cell in combination with the piezoelectric driver. Preferred embodiments provide (1) fast feedback control based on wavelength measurements, (2) fast vibration control, (3) active damping using the load cell and an active damping module, (4) transient inversion using feed forward algorithms based on historical burst data. A preferred embodiment adapts the feed forward algorithms to current conditions. Another preferred embodiment measures tuning mirror position to permit wavelength pretuning and active wavelength tuning.

公开(公告)号：US06466602B1

公开(公告)日：2002-10-15

申请号：US09590961

申请日：2000-06-09

申请人： Vladimir B. Fleurov ,  Michael C. Cates ,  Michael Du'Lyea ,  Igor V. Fomenkov ,  Dmitri V. Gaidarenko ,  Jean-Marc Hueber ,  Richard G. Morton ,  Eckehard D. Onkels ,  Robert A. Shannon ,  Ross H. Winnick

发明人： Vladimir B. Fleurov ,  Michael C. Cates ,  Michael Du'Lyea ,  Igor V. Fomenkov ,  Dmitri V. Gaidarenko ,  Jean-Marc Hueber ,  Richard G. Morton ,  Eckehard D. Onkels ,  Robert A. Shannon ,  Ross H. Winnick

IPC分类号： H01S3097

CPC分类号： G03F7/70025 ,  G03F7/70041 ,  G03F7/70575 ,  G03F7/70933 ,  H01S3/036 ,  H01S3/038 ,  H01S3/0381 ,  H01S3/0385 ,  H01S3/0387 ,  H01S3/041 ,  H01S3/0979 ,  H01S3/22 ,  H01S3/2207 ,  H01S3/223 ,  H01S3/225

摘要： A gas discharge laser having a laser chamber with two elongated erodable electrode elements, each having an erodable section and an electrode with support configured to minimize discharge region laser gas turbulence and with the electrode elements being configured to permit gradual erosion over more than 8 billion pulses without causing substantial changes in the shape of electrical discharges between the electrode elements. A pulse power system provides electrical pulses of at least 2J at rates of at least 2 KHz. A blower circulates laser gas between the electrodes at speeds of at least 2 m/s and a heat exchanger is provided to remove heat produced by the blower and the discharges.

摘要翻译： 一种气体放电激光器，其具有具有两个细长可蚀电极元件的激光室，每个具有可蚀刻部分和具有支撑件的电极，其配置为使放电区域激光气体湍流最小化，并且电极元件被配置为允许在超过80亿个脉冲 而不会引起电极元件之间放电形状的显着变化。 脉冲功率系统以至少2KHz的速率提供至少2J的电脉冲。 鼓风机以至少2m / s的速度在电极之间循环激光气体，并且提供热交换器以去除由鼓风机和排出物产生的热量。

公开(公告)号：US08035092B2

公开(公告)日：2011-10-11

申请号：US12655987

申请日：2010-01-11

申请人： Alexander N. Bykanov ,  Norbert Bowering ,  Igor V. Fomenkov ,  Alexander I. Ershov ,  Oleh Khodykin

发明人： Alexander N. Bykanov ,  Norbert Bowering ,  Igor V. Fomenkov ,  Alexander I. Ershov ,  Oleh Khodykin

IPC分类号： H04H1/04

CPC分类号： G03F7/70916 ,  B82Y10/00 ,  G03F7/70033 ,  G03F7/70908 ,  G03F7/70983 ,  H05G2/003 ,  H05G2/008

摘要： A device is disclosed which may comprise a system generating a plasma at a plasma site, the plasma producing EUV radiation and ions exiting the plasma. The device may also include an optic, e.g., a multi-layer mirror, distanced from the site by a distance, d, and a flowing gas disposed between the plasma and optic, the gas establishing a gas pressure sufficient to operate over the distance, d, to reduce ion energy below a pre-selected value before the ions reach the optic. In one embodiment, the gas may comprise hydrogen and in a particular embodiment, the gas may comprise greater than 50 percent hydrogen by volume.

摘要翻译： 公开了一种可以包括在等离子体位置处产生等离子体的系统，等离子体产生EUV辐射和离开等离子体的离子的装置。 该装置还可以包括一个光学元件，例如多个远离现场的多层反射镜，以及设置在等离子体和光学元件之间的流动气体，该气体建立足以在该距离上操作的气体压力， d，在离子到达光学器件之前，将离子能量降低到预先选定的值以下。 在一个实施方案中，气体可以包含氢气，并且在一个具体实施方案中，气体可以包含大于50体积％的氢气。

公开(公告)号：US20110058588A1

公开(公告)日：2011-03-10

申请号：US12927012

申请日：2010-11-03

申请人： Alexander I. Ershov ,  Igor V. Fomenkov ,  Norbert R. Bowering ,  Jerzy R. Hoffman

发明人： Alexander I. Ershov ,  Igor V. Fomenkov ,  Norbert R. Bowering ,  Jerzy R. Hoffman

IPC分类号： H01S3/22 ,  H01S3/00

CPC分类号： H01S3/105 ,  G03F7/70033 ,  H01S3/005 ,  H01S3/115 ,  H01S3/2232 ,  H01S3/225 ,  H01S3/2325 ,  H01S2301/02 ,  H05G2/003 ,  H05G2/008

摘要： A device is described herein which may comprise an oscillator having an oscillator cavity length, L0, and defining an oscillator path; and a multi-pass optical amplifier coupled with the oscillator to establish a combined optical cavity including the oscillator path, the combined cavity having a length, Lcombined, where Lcombined=(N+x)*L0, where “N” is an integer and “x” is a number between 0.4 and 0.6.

摘要翻译： 本文描述了一种器件，其可以包括具有振荡器腔长度L0并且限定振荡器路径的振荡器; 和与所述振荡器耦合的多通光放大器以建立包括所述振荡器路径的组合光腔，所述组合腔具有长度L组合，其中L组合=（N + x）* L0，其中“N”是整数， “x”是介于0.4和0.6之间的数字。

公开(公告)号：US07732793B2

公开(公告)日：2010-06-08

申请号：US11705954

申请日：2007-02-13

申请人： Alexander I. Ershov ,  William F. Marx ,  Norbert Bowering ,  Bjorn A. M. Hansson ,  Oleh Khodykin ,  Igor V. Fomenkov

发明人： Alexander I. Ershov ,  William F. Marx ,  Norbert Bowering ,  Bjorn A. M. Hansson ,  Oleh Khodykin ,  Igor V. Fomenkov

IPC分类号： C25F1/00

CPC分类号： B82Y10/00 ,  G03F7/70033 ,  G03F7/70175 ,  G03F7/7085 ,  G03F7/70916 ,  G21K1/06 ,  G21K2201/06 ,  H05G2/001

摘要： Systems and methods are disclosed for reducing the influence of plasma generated debris on internal components of an EUV light source. In one aspect, an EUV metrology monitor is provided which may have a heater to heat an internal multi-layer filtering mirror to a temperature sufficient to remove deposited debris from the mirror. In another aspect, a device is disclosed for removing plasma generated debris from an EUV light source collector mirror having a different debris deposition rate at different zones on the collector mirror. In a particular aspect, an EUV collector mirror system may comprise a source of hydrogen to combine with Li debris to create LiH on a collector surface; and a sputtering system to sputter LiH from the collector surface. In another aspect, an apparatus for etching debris from a surface of a EUV light source collector mirror with a controlled plasma etch rate is disclosed.

摘要翻译： 公开了用于减少等离子体产生的碎片对EUV光源的内部部件的影响的系统和方法。 在一个方面，提供了一种EUV计量监测器，其可以具有加热器以将内部多层过滤镜加热到足以从反射镜去除沉积的碎屑的温度。 在另一方面，公开了一种用于从收集器反射镜上的不同区域处具有不同碎屑沉积速率的EUV光源收集镜去除等离子体产生的碎屑的装置。 在特定方面，EUV收集器镜系统可以包括氢源以与Li碎片结合以在收集器表面上产生LiH; 以及从收集器表面溅射LiH的溅射系统。 在另一方面，公开了一种用于从具有受控等离子体蚀刻速率的EUV光源收集镜的表面蚀刻碎片的装置。

公开(公告)号：US20090267005A1

公开(公告)日：2009-10-29

申请号：US12322669

申请日：2009-02-04

申请人： Alexander N. Bykanov ,  Igor V. Fomenkov ,  Oleh Khodykin ,  Alexander I. Ershov

发明人： Alexander N. Bykanov ,  Igor V. Fomenkov ,  Oleh Khodykin ,  Alexander I. Ershov

IPC分类号： G01J3/10

CPC分类号： H05G2/003 ,  G03F7/70033 ,  H01S3/0064 ,  H01S3/073 ,  H01S3/0805 ,  H01S3/08054 ,  H01S3/08059 ,  H01S3/083 ,  H01S3/10092 ,  H01S3/105 ,  H01S3/1066 ,  H01S3/115 ,  H01S3/121 ,  H01S3/127 ,  H01S3/2232 ,  H01S3/2316 ,  H01S3/2325 ,  H01S3/2383 ,  H05G2/008

摘要： An LPP EUV light source is disclosed having an optic positioned in the plasma chamber for reflecting EUV light generated therein and a laser input window. For this aspect, the EUV light source may be configured to expose the optic to a gaseous etchant pressure for optic cleaning while the window is exposed to a lower gaseous etchant pressure to avoid window coating deterioration. In another aspect, an EUV light source may comprise a target material positionable along a beam path to participate in a first interaction with light on the beam path; an optical amplifier; and at least one optic directing photons scattered from the first interaction into the optical amplifier to produce a laser beam on the beam path for a subsequent interaction with the target material to produce an EUV light emitting plasma.

摘要翻译： 公开了一种LPP EUV光源，其具有位于等离子体室中的光学器件，用于反射在其中产生的EUV光和激光输入窗口。 对于该方面，EUV光源可以被配置为将窗口暴露于更低的气体蚀刻剂压力以将窗口暴露于气体蚀刻剂压力以进行光学清洁，以避免窗口涂层变质。 在另一方面，EUV光源可以包括沿着光束路径定位以参与与光束路径上的光的第一相互作用的目标材料; 光放大器; 以及至少一个光导向光子从第一相互作用散射到光放大器中以在光束路径上产生激光束，用于随后与目标材料的相互作用以产生EUV发光等离子体。

公开(公告)号：US20170097572A1

公开(公告)日：2017-04-06

申请号：US15374533

申请日：2016-12-09

申请人： David C. Brandt ,  Alexander I. Ershov ,  Igor V. Fomenkov

发明人： David C. Brandt ,  Alexander I. Ershov ,  Igor V. Fomenkov

IPC分类号： G03F7/20 ,  H05G2/00 ,  G02B19/00 ,  G21K1/06 ,  G02B5/08 ,  G02B5/09

CPC分类号： G03F7/7015 ,  G02B5/0891 ,  G02B5/09 ,  G02B19/0019 ,  G02B19/0095 ,  G03F7/70033 ,  G03F7/70175 ,  G03F7/70916 ,  G03F7/70933 ,  G21K1/062 ,  G21K2201/067 ,  H05G2/003 ,  H05G2/005 ,  H05G2/008

摘要： A reflective EUV optic such as a collector mirror configured as an array of facets that are spaced apart to form respective gaps between adjacent facets. The gaps are used as inlets for gas flow across one of the facets such that flow is introduced parallel to the optic surface. The facets can be made with offsets such that loss of reflective area of the EUV optic can be minimized. The gas facilitates removal of target material from the surface of the facets.

公开(公告)号：US08785892B2

公开(公告)日：2014-07-22

申请号：US13493871

申请日：2012-06-11

申请人： Alexander I. Ershov ,  Igor V. Fomenkov

发明人： Alexander I. Ershov ,  Igor V. Fomenkov

IPC分类号： H05H1/00 ,  H05H1/24 ,  G21K5/04

CPC分类号： H05G2/003 ,  G03F7/70033 ,  G03F7/70175 ,  G03F7/70916 ,  H05G2/005 ,  H05G2/008 ,  Y10S422/906

摘要： Devices and corresponding methods of use are described herein that may include an enclosing structure defining a closed loop flow path and a system generating a plasma at a plasma site, e.g. laser produced plasma system, where the plasma site may be in fluid communication with the flow path. For the device, a gas may be disposed in the enclosing structure which may include an ion-stopping buffer gas and/or an etchant. A pump may be provided to force the gas through the closed loop flow path. One or more heat exchangers removing heat from gas flowing in the flow path may be provided. In some arrangements, a filter may be used to remove at least a portion of a target species from gas flowing in the flow path.

摘要翻译： 本文描述了设备和相应的使用方法，其可以包括限定闭环流动路径的封闭结构和在等离子体位置处产生等离子体的系统，例如， 激光产生的等离子体系统，其中等离子体位置可以与流动路径流体连通。 对于该装置，气体可以设置在封闭结构中，其可以包括离子停止缓冲气体和/或蚀刻剂。 可以提供泵以迫使气体通过闭环流动路径。 可以提供一种或多种热交换器来从流动路径中流动的气体中除去热量。 在一些布置中，可以使用过滤器来从在流动路径中流动的气体中去除至少一部分目标物种。