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    Resonant radiofrequency wave plasma generating apparatus with improved stage
    2.
    发明授权
    Resonant radiofrequency wave plasma generating apparatus with improved stage 失效
    共振射频波等离子体发生装置，具有改进的阶段

    公开(公告)号：US5736818A

    公开(公告)日：1998-04-07

    申请号：US616349

    申请日：1996-03-15

    申请人： Michael J. Ulczynski ,  Donnie K. Reinhard ,  Jes Asmussen

    发明人： Michael J. Ulczynski ,  Donnie K. Reinhard ,  Jes Asmussen

    IPC分类号： H01J37/32 ,  H05H1/46

    CPC分类号： H01J37/32532 ,  H01J37/32192 ,  H01J37/32834

    摘要： A plasma (56, 333) generating apparatus (10, 320, 450) wherein a stage (250, 300, 300A, 350, 400, 425) is constructed to keep the plasma on the substrate (S). A pair of electrically, non-conductive tubes (252, 252A, 303, 305, 303A, 305A 403, 405) are mounted on a conductive base plate (253,306,406) having holes (255, 306B) for gas flow and one of the tubes supports a conductive support plate (251, 301, 351, 401) for a substrate (S). An electrically conductive disk (304, 404) between the tubes is provided. An outer conductive tube (307, 418) is preferably used with larger diameter chambers. The stage is designed to prevent the plasma from falling below conductive support plate which preferably mounts a graphite insert (302, 352, 402) which supports the substrate.

    摘要翻译： 一种等离子体（56,333）发生装置（10,320,450），其中构造了用于将等离子体保持在衬底（S）上的级（250,3300,300,400,450）。 一对电不导电管（252,252A，303,305,303A，305A，403,405）安装在具有用于气流的孔（255,306B）的导电基板（253,306,406）上，并且其中一个管 支撑用于衬底（S）的导电支撑板（251,301,351,401）。 提供了管之间的导电盘（304,404）。 外导电管（307,418）优选用于较大直径的腔室。 该台被设计成防止等离子体落在导电支撑板之下，其优选地安装支撑衬底的石墨插入件（302,352,402）。

    Microwave plasma reactors
    6.
    发明申请
    Microwave plasma reactors 有权
    微波等离子体反应器

    公开(公告)号：US20100034984A1

    公开(公告)日：2010-02-11

    申请号：US12456388

    申请日：2009-06-16

    申请人： Jes Asmussen ,  Timothy Grotjohn ,  Donnie K. Reinhard ,  Thomas Schuelke ,  M. Kagan Yaran ,  Kadek W. Hemawan ,  Michael Becker ,  David King ,  Yajun Gu ,  Jing Lu

    发明人： Jes Asmussen ,  Timothy Grotjohn ,  Donnie K. Reinhard ,  Thomas Schuelke ,  M. Kagan Yaran ,  Kadek W. Hemawan ,  Michael Becker ,  David King ,  Yajun Gu ,  Jing Lu

    IPC分类号： C23C16/511 ,  C23C16/00

    CPC分类号： C23C16/511 ,  C23C16/274 ,  C23C16/279 ,  C30B25/105 ,  C30B25/16 ,  C30B29/04 ,  C30B35/00 ,  H01J37/32256 ,  H05H1/46

    摘要： New and improved microwave plasma assisted reactors, for example chemical vapor deposition (MPCVD) reactors, are disclosed. The disclosed microwave plasma assisted reactors operate at pressures ranging from about 10 Torr to about 760 Torr. The disclosed microwave plasma assisted reactors include a movable lower sliding short and/or a reduced diameter conductive stage in a coaxial cavity of a plasma chamber. For a particular application, the lower sliding short position and/or the conductive stage diameter can be variably selected such that, relative to conventional reactors, the reactors can be tuned to operate over larger substrate areas, operate at higher pressures, and discharge absorbed power densities with increased diamond synthesis rates (carats per hour) and increased deposition uniformity.

    摘要翻译： 公开了新的和改进的微波等离子体辅助反应器，例如化学气相沉积（MPCVD）反应器。 所公开的微波等离子体辅助反应器在约10托至约760托的压力下工作。 所公开的微波等离子体辅助反应器包括在等离子体室的同轴空腔中的可移动的下滑动短路径和/或直径减小的导电平台。 对于特定应用，可以可变地选择较低的滑动短位置和/或导电平台直径，使得相对于常规的反应器，可以将反应器调整为在更大的衬底区域上操作，在更高的压力下操作，并且放电吸收的功率 具有增加的金刚石合成速率（克拉每小时）和增加的沉积均匀性的密度。

    Plasma generating apparatus using magnets and method
    7.
    发明授权
    Plasma generating apparatus using magnets and method 失效
    使用磁体的等离子体发生装置及方法

    公开(公告)号：US4727293A

    公开(公告)日：1988-02-23

    申请号：US849052

    申请日：1986-04-07

    申请人： Jes Asmussen ,  Donnie K. Reinhard ,  Mahmoud Dahimene

    发明人： Jes Asmussen ,  Donnie K. Reinhard ,  Mahmoud Dahimene

    IPC分类号： H01J27/16 ,  H01J37/32 ,  H01J7/24 ,  H05B31/26

    CPC分类号： H01J37/32256 ,  H01J27/16 ,  H01J37/32192 ,  H01J37/32284 ,  H01J37/32678

    摘要： An improved ion generating apparatus for producing a plasma disk using magnets 34 and 35 around a region 16 in a chamber 15 positioned in a microwave cavity is described. The apparatus is particularly operated at a microwave frequency such that electron cyclotron resonance is produced in the plasma to create an accelerating surface for the electrons around and inside of the plasma. The apparatus can be operated to treat an article 100 in the plasma or a holder 39, with a grid 51 to withdraw particles or with a magnets 47 around an opening 48 forming a nozzle which with electron cyclotron resonance produces a neutral beam of charged particles. The apparatus is particularly useful as a plasma source especially for oxidation, etching and deposition.

    摘要翻译： 描述了一种改进的离子产生装置，用于使用位于微波腔中的腔室15中的区域16周围的磁体34和35来产生等离子体盘。 该装置特别地以微波频率操作，使得在等离子体中产生电子回旋共振以产生等离子体周围和内部的电子的加速表面。 该装置可以操作以处理等离子体中的物品100或保持器39，栅格51用于取出颗粒或围绕形成喷嘴的开口48周围的磁体47，电子回旋共振产生带电粒子的中性束。 该装置特别用作等离子体源，特别用于氧化，蚀刻和沉积。

    Dual plasma microwave apparatus and method for treating a surface
    8.
    发明授权
    Dual plasma microwave apparatus and method for treating a surface 失效
    双等离子体微波装置和处理表面的方法

    公开(公告)号：US4691662A

    公开(公告)日：1987-09-08

    申请号：US873694

    申请日：1986-06-12

    申请人： Thaddeus A. Roppel ,  Jes Asmussen ,  Donnie K. Reinhard

    发明人： Thaddeus A. Roppel ,  Jes Asmussen ,  Donnie K. Reinhard

    IPC分类号： C23C14/02 ,  H01J27/16 ,  H01J27/18 ,  H01J37/32 ,  C23C14/00 ,  B05D3/06

    CPC分类号： H01J37/32357 ,  H01J27/16 ,  H01J27/18 ,  H01J37/32256 ,  H01J37/32284 ,  H01J37/32678

    摘要： A plasma apparatus which generates a radio frequency (UHF or microwave) disk plasma 16 and a hybrid plasma 45 derived from the disk plasma. The microwave plasma acts as a source of excited ion and free radical species and electrons for the second plasma which is hybrid in that it contains species from both microwave and dc (or rf depending on bias) excitation. The hybrid plasma can be used to treat an article 43 with different species than are present in the disk plasma and provides more control in this regard than a single plasma.

    摘要翻译： 一种产生射频（UHF或微波）盘等离子体16的等离子体装置和衍生自盘等离子体的混合等离子体45。 微波等离子体作为第二等离子体的激发离子和自由基物质和电子的来源，其混合在一起，因为它包含来自微波和直流（或rf取决于偏置）激发的物质。 混合等离子体可用于处理具有不同于盘等离子体中的物质的物品43，并且在这方面提供比单个等离子体更多的控制。

    Microwave plasma reactors
    9.
    发明授权
    Microwave plasma reactors 有权
    微波等离子体反应器

    公开(公告)号：US08316797B2

    公开(公告)日：2012-11-27

    申请号：US12456388

    申请日：2009-06-16

    申请人： Jes Asmussen ,  Timothy Grotjohn ,  Donnie K. Reinhard ,  Thomas Schuelke ,  M. Kagan Yaran ,  Kadek W. Hemawan ,  Michael Becker ,  David King ,  Yajun Gu ,  Jing Lu

    发明人： Jes Asmussen ,  Timothy Grotjohn ,  Donnie K. Reinhard ,  Thomas Schuelke ,  M. Kagan Yaran ,  Kadek W. Hemawan ,  Michael Becker ,  David King ,  Yajun Gu ,  Jing Lu

    IPC分类号： C23C16/00 ,  C23F1/00 ,  H01L21/306

    CPC分类号： C23C16/511 ,  C23C16/274 ,  C23C16/279 ,  C30B25/105 ,  C30B25/16 ,  C30B29/04 ,  C30B35/00 ,  H01J37/32256 ,  H05H1/46

    摘要： New and improved microwave plasma assisted reactors, for example chemical vapor deposition (MPCVD) reactors, are disclosed. The disclosed microwave plasma assisted reactors operate at pressures ranging from about 10 Torr to about 760 Torr. The disclosed microwave plasma assisted reactors include a movable lower sliding short and/or a reduced diameter conductive stage in a coaxial cavity of a plasma chamber. For a particular application, the lower sliding short position and/or the conductive stage diameter can be variably selected such that, relative to conventional reactors, the reactors can be tuned to operate over larger substrate areas, operate at higher pressures, and discharge absorbed power densities with increased diamond synthesis rates (carats per hour) and increased deposition uniformity.

    摘要翻译： 公开了新的和改进的微波等离子体辅助反应器，例如化学气相沉积（MPCVD）反应器。 所公开的微波等离子体辅助反应器在约10托至约760托的压力下工作。 所公开的微波等离子体辅助反应器包括在等离子体室的同轴空腔中的可移动的较低滑动短路径和/或直径减小的导电平台。 对于特定应用，可以可变地选择较低的滑动短位置和/或导电平台直径，使得相对于常规的反应器，可以将反应器调整为在更大的衬底区域上操作，在更高的压力下操作，并且放电吸收的功率 具有增加的金刚石合成速率（克拉每小时）和增加的沉积均匀性的密度。