SEMICONDUCTOR DEVICE
    3.
    发明申请
    SEMICONDUCTOR DEVICE 有权
    半导体器件

    公开(公告)号:US20100289151A1

    公开(公告)日:2010-11-18

    申请号:US12753628

    申请日:2010-04-02

    IPC分类号: H01L23/522

    摘要: A semiconductor device includes a lower-layer wire, an upper-layer wire including a wire portion and a first wide portion whose wire width is greater than the wire portion, and a contact formation portion in which a contact portion for connecting the lower-layer wire and the first wide portion with each other is provided. The contact formation portion has a planar shape of which a length L1 in a direction parallel to a wire width direction of the first wide portion is greater than a length L2 in a direction parallel to a wire length direction of the first wide portion.

    摘要翻译: 半导体器件包括下层布线,包括导线部分的上层布线和布线宽度大于布线部分的第一宽部分;以及接触形成部分,其中用于连接下层布线的接触部分 并且提供彼此的第一宽的部分。 接触形成部具有与第一宽部的线宽度方向平行的方向的长度L1大于平行于第一宽部的线长度方向的长度L2的平面形状。