公开(公告)号：US11056593B2

公开(公告)日：2021-07-06

申请号：US16631059

申请日：2017-09-12

Applicant: INTEL CORPORATION

Inventor： Sasikanth Manipatruni ,  Dmitri E. Nikonov ,  Uygar E. Avci ,  Christopher J. Wiegand ,  Anurag Chaudhry ,  Jasmeet S. Chawla ,  Ian A Young

IPC: H01L29/78 ,  H01L21/28 ,  H01L29/08 ,  H01L29/10 ,  H01L29/417 ,  H01L29/49 ,  H01L29/51 ,  H01L29/66 ,  H01L29/18 ,  H01L21/3105 ,  H01L21/8252

Abstract: Techniques are disclosed for forming semiconductor integrated circuits including one or more of source and drain contacts and gate electrodes comprising crystalline alloys including a transition metal. The crystalline alloys help to reduce contact resistance to the semiconductor devices. In some embodiments of the present disclosure, this reduction in contact resistance is accomplished by aligning the work function of the crystalline alloy with the work function of the source and drain regions such that a Schottky barrier height associated with an interface between the crystalline alloys and the source and drain regions is in a range of 0.3 eV or less.

公开(公告)号：US09947805B2

公开(公告)日：2018-04-17

申请号：US15151381

申请日：2016-05-10

Applicant: Intel Corporation

Inventor： Chytra Pawashe ,  Kevin Lin ,  Anurag Chaudhry ,  Raseong Kim ,  Seiyon Kim ,  Kelin Kuhn ,  Sasikanth Manipatruni ,  Rafael Rios ,  Ian A. Young

IPC: H01H51/22 ,  H01L29/84 ,  H01H59/00 ,  B82Y10/00 ,  H01H1/00 ,  H01L29/04 ,  H01L29/06 ,  H01L29/161 ,  H01H9/02

CPC classification number: H01L29/84 ,  B82Y10/00 ,  H01H1/0094 ,  H01H9/0271 ,  H01H59/0009 ,  H01L29/045 ,  H01L29/0673 ,  H01L29/161

Abstract: Nanowire-based mechanical switching devices are described. For example, a nanowire relay includes a nanowire disposed in a void disposed above a substrate. The nanowire has an anchored portion and a suspended portion. A first gate electrode is disposed adjacent the void, and is spaced apart from the nanowire. A first conductive region is disposed adjacent the first gate electrode and adjacent the void, and is spaced apart from the nanowire.

公开(公告)号：US11990899B2

公开(公告)日：2024-05-21

申请号：US17152552

申请日：2021-01-19

Applicant: Intel Corporation

Inventor： Sasikanth Manipatruni ,  Ian A. Young ,  Dmitri E. Nikonov ,  Uygar E. Avci ,  Patrick Morrow ,  Anurag Chaudhry

IPC: H03K19/173 ,  H03K19/00 ,  H03K19/18 ,  H10N50/85 ,  H10N52/00 ,  H10N52/80

CPC classification number: H03K19/0002 ,  H03K19/18 ,  H10N50/85 ,  H10N52/00 ,  H10N52/80

Abstract: Described is an apparatus which comprises: a 4-state input magnet; a first spin channel region adjacent to the 4-state input magnet; a 4-state output magnet; a second spin channel region adjacent to the 4-state input and output magnets; and a third spin channel region adjacent to the 4-state output magnet. Described in an apparatus which comprises: a 4-state input magnet; a first filter layer adjacent to the 4-state input magnet; a first spin channel region adjacent to the first filter layer; a 4-state output magnet; a second filter layer adjacent to the 4-state output magnet; a second spin channel region adjacent to the first and second filter layers; and a third spin channel region adjacent to the second filter layer.

公开(公告)号：US20210143819A1

公开(公告)日：2021-05-13

申请号：US17152552

申请日：2021-01-19

Applicant: Intel Corporation

Inventor： Sasikanth Manipatruni ,  Ian A. Young ,  Dmitri E. Nikonov ,  Uygar E. Avci ,  Patrick Morrow ,  Anurag Chaudhry

IPC: H03K19/00 ,  H01L43/04 ,  H01L43/06 ,  H01L43/10 ,  H03K19/18

Abstract: Described is an apparatus which comprises: a 4-state input magnet; a first spin channel region adjacent to the 4-state input magnet; a 4-state output magnet; a second spin channel region adjacent to the 4-state input and output magnets; and a third spin channel region adjacent to the 4-state output magnet. Described in an apparatus which comprises: a 4-state input magnet; a first filter layer adjacent to the 4-state input magnet; a first spin channel region adjacent to the first filter layer; a 4-state output magnet; a second filter layer adjacent to the 4-state output magnet; a second spin channel region adjacent to the first and second filter layers; and a third spin channel region adjacent to the second filter layer.

公开(公告)号：US10944399B2

公开(公告)日：2021-03-09

申请号：US15779074

申请日：2016-12-23

Applicant: Intel Corporation

Inventor： Sasikanth Manipatruni ,  Ian A. Young ,  Dmitri E. Nikonov ,  Uygar E. Avci ,  Patrick Morrow ,  Anurag Chaudhry

IPC: H03K19/00 ,  H01L43/04 ,  H01L43/06 ,  H01L43/10 ,  H03K19/18

Abstract: Described is an apparatus which comprises: a 4-state input magnet; a first spin channel region adjacent to the 4-state input magnet; a 4-state output magnet; a second spin channel region adjacent to the 4-state input and output magnets; and a third spin channel region adjacent to the 4-state output magnet. Described in an apparatus which comprises: a 4-state input magnet; a first filter layer adjacent to the 4-state input magnet; a first spin channel region adjacent to the first filter layer; a 4-state output magnet; a second filter layer adjacent to the 4-state output magnet; a second spin channel region adjacent to the first and second filter layers; and a third spin channel region adjacent to the second filter layer.

公开(公告)号：US20170133493A1

公开(公告)日：2017-05-11

申请号：US15410548

申请日：2017-01-19

Applicant: Intel Corporation

Inventor： Roza Kotlyar ,  Stephen M. Cea ,  Gilbert Dewey ,  Benjamin Chu-Kung ,  Uygar E. Avci ,  Rafael Rios ,  Anurag Chaudhry ,  Thomas D. Linton, JR. ,  Ian A. Young ,  Kelin J. Kuhn

IPC: H01L29/66 ,  H01L27/092 ,  H01L29/06 ,  H01L29/20 ,  H01L29/423 ,  H01L29/161 ,  H01L29/10 ,  H01L29/786 ,  H01L29/165

CPC classification number: H01L29/66977 ,  H01L27/092 ,  H01L29/045 ,  H01L29/0676 ,  H01L29/068 ,  H01L29/1054 ,  H01L29/16 ,  H01L29/161 ,  H01L29/165 ,  H01L29/20 ,  H01L29/24 ,  H01L29/267 ,  H01L29/42392 ,  H01L29/7391 ,  H01L29/7842 ,  H01L29/785 ,  H01L29/78603 ,  H01L29/78642 ,  H01L29/78684 ,  H01L29/78696

Abstract: Tunneling field effect transistors (TFETs) for CMOS architectures and approaches to fabricating N-type and P-type TFETs are described. For example, a tunneling field effect transistor (TFET) includes a homojunction active region disposed above a substrate. The homojunction active region includes a relaxed Ge or GeSn body having an undoped channel region therein. The homojunction active region also includes doped source and drain regions disposed in the relaxed Ge or GeSn body, on either side of the channel region. The TFET also includes a gate stack disposed on the channel region, between the source and drain regions. The gate stack includes a gate dielectric portion and gate electrode portion.

公开(公告)号：US20200152781A1

公开(公告)日：2020-05-14

申请号：US16631059

申请日：2017-09-12

Applicant: INTEL CORPORATION

Inventor： Sasikanth Manipatruni ,  Dmitri E. Nikonov ,  Uygar E. Avci ,  Christopher J. Wiegand ,  Anurag Chaudhry ,  Jasmeet S. Chawla ,  Ian A. Young

IPC: H01L29/78 ,  H01L29/10 ,  H01L29/49 ,  H01L29/08 ,  H01L29/51 ,  H01L29/66 ,  H01L21/28 ,  H01L29/417

Abstract: Techniques are disclosed for forming semiconductor integrated circuits including one or more of source and drain contacts and gate electrodes comprising crystalline alloys including a transition metal. The crystalline alloys help to reduce contact resistance to the semiconductor devices. In some embodiments of the present disclosure, this reduction in contact resistance is accomplished by aligning the work function of the crystalline alloy with the work function of the source and drain regions such that a Schottky barrier height associated with an interface between the crystalline alloys and the source and drain regions is in a range of 0.3 eV or less.

公开(公告)号：US20190386661A1

公开(公告)日：2019-12-19

申请号：US15779074

申请日：2016-12-23

Applicant: Intel Corporation

Inventor： Sasikanth Manipatruni ,  Ian A. Young ,  Dmitri E. Nikonov ,  Uygar E. Avci ,  Patrick Morrow ,  Anurag Chaudhry

IPC: H03K19/00 ,  H03K19/18 ,  H01L43/04 ,  H01L43/06 ,  H01L43/10

Abstract: Described is an apparatus which comprises: a 4-state input magnet; a first spin channel region adjacent to the 4-state input magnet; a 4-state output magnet; a second spin channel region adjacent to the 4-state input and output magnets; and a third spin channel region adjacent to the 4-state output magnet. Described in an apparatus which comprises: a 4-state input magnet; a first filter layer adjacent to the 4-state input magnet; a first spin channel region adjacent to the first filter layer; a 4-state output magnet; a second filter layer adjacent to the 4-state output magnet; a second spin channel region adjacent to the first and second filter layers; and a third spin channel region adjacent to the second filter layer.

公开(公告)号：US20170263853A1

公开(公告)日：2017-09-14

申请号：US15329987

申请日：2014-09-03

Applicant: INTEL CORPORATION

Inventor： Sasikanth Manipatruni ,  Anurag Chaudhry ,  Dmitri Nikonov ,  David Michalak ,  Stephen Cea ,  Ian Young

IPC: H01L43/02 ,  H01L27/22 ,  H01F41/30 ,  H01L43/10 ,  H01F10/16 ,  H01F10/32 ,  G11C11/16 ,  H01L43/08

CPC classification number: H01L43/02 ,  G11C11/161 ,  G11C11/1675 ,  H01F10/16 ,  H01F10/3222 ,  H01F41/302 ,  H01L27/228 ,  H01L43/08 ,  H01L43/10

Abstract: The present disclosure relates to the fabrication of spin transfer torque memory devices and spin logic devices, wherein a strain engineered interface is formed within at least one magnet within these devices. In one embodiment, the spin transfer torque memory devices may include a free magnetic layer stack comprising a crystalline magnetic layer abutting a crystalline stressor layer. In another embodiment, the spin logic devices may include an input magnet, an output magnet; wherein at least one of the input magnet and the output magnet comprises a crystalline magnetic layer abutting crystalline stressor layer and/or the crystalline magnetic layer abutting a crystalline spin-coherent channel extending between the input magnet and the output magnet.

公开(公告)号：US09412872B2

公开(公告)日：2016-08-09

申请号：US14521200

申请日：2014-10-22

Applicant: Intel Corporation

Inventor： Roza Kotlyar ,  Stephen M. Cea ,  Gilbert Dewey ,  Benjamin Chu-Kung ,  Uygar E. Avci ,  Rafael Rios ,  Anurag Chaudhry ,  Thomas D. Linton, Jr. ,  Ian A. Young ,  Kelin J. Kuhn

IPC: H01L29/78 ,  H01L29/739 ,  H01L29/16 ,  H01L29/161 ,  H01L29/06 ,  H01L29/24 ,  H01L29/267

CPC classification number: H01L29/66977 ,  H01L27/092 ,  H01L29/045 ,  H01L29/0676 ,  H01L29/068 ,  H01L29/1054 ,  H01L29/16 ,  H01L29/161 ,  H01L29/165 ,  H01L29/20 ,  H01L29/24 ,  H01L29/267 ,  H01L29/42392 ,  H01L29/7391 ,  H01L29/7842 ,  H01L29/785 ,  H01L29/78603 ,  H01L29/78642 ,  H01L29/78684 ,  H01L29/78696

Abstract: Tunneling field effect transistors (TFETs) for CMOS architectures and approaches to fabricating N-type and P-type TFETs are described. For example, a tunneling field effect transistor (TFET) includes a homojunction active region disposed above a substrate. The homojunction active region includes a relaxed Ge or GeSn body having an undoped channel region therein. The homojunction active region also includes doped source and drain regions disposed in the relaxed Ge or GeSn body, on either side of the channel region. The TFET also includes a gate stack disposed on the channel region, between the source and drain regions. The gate stack includes a gate dielectric portion and gate electrode portion.

Abstract translation: 描述了用于CMOS架构的隧道场效应晶体管（TFET）和制造N型和P型TFET的方法。 例如，隧道场效应晶体管（TFET）包括设置在衬底上方的均质有源区。 同质结有源区包括其中具有未掺杂沟道区的松弛Ge或GeSn体。 同质结有源区还包括设置在放大的Ge或GeSn体中，在沟道区两侧的掺杂源极和漏极区。 TFET还包括设置在沟道区域之间的源极和漏极区域之间的栅极堆叠。 栅极堆叠包括栅极电介质部分和栅极电极部分。