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    Electroless deposition apparatus
    1.
    发明申请
    Electroless deposition apparatus 审中-公开
    无电沉积装置

    公开(公告)号：US20050199489A1

    公开(公告)日：2005-09-15

    申请号：US11090919

    申请日：2005-03-25

    申请人： Joseph Stevens ,  Dmitry Lubomirsky ,  Ian Pancham ,  Donald Olgado ,  Howard Grunes ,  Yeuk-Fai Mok

    发明人： Joseph Stevens ,  Dmitry Lubomirsky ,  Ian Pancham ,  Donald Olgado ,  Howard Grunes ,  Yeuk-Fai Mok

    IPC分类号： C23C18/18 ,  C23C18/16 ,  C25D7/12 ,  H01L21/00 ,  H01L21/28 ,  H01L21/288 ,  C25C7/00

    CPC分类号： H01L21/67126 ,  C23C18/1607 ,  C23C18/1619 ,  C23C18/1628 ,  C23C18/165 ,  C23C18/1653 ,  C23C18/1678 ,  C25D7/123 ,  C25D17/001

    摘要： An apparatus and a method of depositing a catalytic layer comprising at least one metal selected from the group consisting of noble metals, semi-noble metals, alloys thereof, and combinations thereof in sub-micron features formed on a substrate. Examples of noble metals include palladium and platinum. Examples of semi-noble metals include cobalt, nickel, and tungsten. The catalytic layer may be deposited by electroless deposition, electroplating, or chemical vapor deposition. In one embodiment, the catalytic layer may be deposited in the feature to act as a barrier layer to a subsequently deposited conductive material. In another embodiment, the catalytic layer may be deposited over a barrier layer. In yet another embodiment, the catalytic layer may be deposited over a seed layer deposited over the barrier layer to act as a “patch” of any discontinuities in the seed layer. Once the catalytic layer has been deposited, a conductive material, such as copper, may be deposited over the catalytic layer. In one embodiment, the conductive material is deposited over the catalytic layer by electroless deposition. In another embodiment, the conductive material is deposited over the catalytic layer by electroless deposition followed by electroplating or followed by chemical vapor deposition. In still another embodiment, the conductive material is deposited over the catalytic layer by electroplating or by chemical vapor deposition.

    摘要翻译： 一种沉积包含至少一种选自贵金属，半贵金属，其合金及其组合的金属的催化剂层的装置和方法，其形成在基板上形成的亚微米特征。 贵金属的实例包括钯和铂。 半贵金属的实例包括钴，镍和钨。 可通过无电沉积，电镀或化学气相沉积来沉积催化层。 在一个实施方案中，催化层可以沉积在特征中以用作随后沉积的导电材料的阻挡层。 在另一个实施方案中，催化剂层可以沉积在阻挡层上。 在另一个实施方案中，催化层可以沉积在沉积在阻挡层上的种子层上，以充当种子层中任何不连续性的“贴片”。 一旦沉积了催化层，可以在催化剂层上沉积诸如铜的导电材料。 在一个实施例中，导电材料通过无电沉积沉积在催化剂层上。 在另一个实施方案中，导电材料通过无电沉积然后电镀或随后进行化学气相沉积沉积在催化剂层上。 在另一个实施例中，导电材料通过电镀或化学气相沉积沉积在催化层上。

    Patterned wafer thickness detection system
    2.
    发明申请
    Patterned wafer thickness detection system 审中-公开
    图案化晶圆厚度检测系统

    公开(公告)号：US20060062897A1

    公开(公告)日：2006-03-23

    申请号：US11034349

    申请日：2005-01-11

    申请人： Yuping Gu ,  Manoocher Birang ,  Arulkumar Shanmugasundram ,  Dmitry Lubomirsky ,  Joseph Stevens

    发明人： Yuping Gu ,  Manoocher Birang ,  Arulkumar Shanmugasundram ,  Dmitry Lubomirsky ,  Joseph Stevens

    IPC分类号： B05D3/12

    CPC分类号： G01B11/0683 ,  C23C18/1632 ,  C23C18/1675 ,  G01N21/55 ,  G01N21/9501

    摘要： An apparatus and a method of controlling an electroless deposition process by directing electromagnetic radiation towards the surface of a substrate and detecting the change in intensity of the electromagnetic radiation at one or more wavelengths reflected off features on the surface of the substrate is provided. In one embodiment, the detected end of an electroless deposition process step is measured while the substrate is rotated relative to the detection mechanism. In another embodiment, a detection mechanism, which is proximate to the processing region, directs electromagnetic radiation onto a substrate surface, which is then reflected by features on the substrate surface and is detected by the detection mechanism. In one aspect, the angle of the directed electromagnetic radiation is perpendicular to the surface of the substrate and the shape of the directed electromagnetic radiation spot is substantially circular in shape. In another aspect, the directed electromagnetic radiation spot is positioned at the center of rotation of the substrate. A controller can be used to monitor, store, and/or control the electroless deposition process by use of stored process values, comparison of data collected at different times, and various calculated time dependent data.

    摘要翻译： 提供了一种通过将电磁辐射引导到衬底的表面并检测在衬底的表面上被反射的特征的一个或多个波长处的电磁辐射的强度变化来控制无电沉积工艺的装置和方法。 在一个实施例中，在基板相对于检测机构旋转的同时测量无电沉积工艺步骤的检测结束。 在另一个实施例中，靠近处理区域的检测机构将电磁辐射引导到衬底表面上，然后其被衬底表面上的特征反射并被检测机构检测。 一方面，定向电磁辐射的角度垂直于衬底的表面，并且定向电磁辐射光斑的形状基本上是圆形的。 在另一方面，定向电磁辐射光斑位于基底的旋转中心。 控制器可用于通过使用存储的过程值，不同时间收集的数据的比较和各种计算的时间相关数据来监测，存储和/或控制无电沉积过程。

    Polyaluminum Chloride and Aluminum Chlorohydrate, Processes and Compositions: High-Basicity and Ultra High-Basicity Products
    5.
    发明申请
    Polyaluminum Chloride and Aluminum Chlorohydrate, Processes and Compositions: High-Basicity and Ultra High-Basicity Products 有权
    聚氯化铝和氯化铝铝，工艺和组成：高碱性和超高碱性产品

    公开(公告)号：US20070187256A1

    公开(公告)日：2007-08-16

    申请号：US11619483

    申请日：2007-01-03

    申请人： Willam Pratt ,  Joseph Stevens

    发明人： Willam Pratt ,  Joseph Stevens

    IPC分类号： C25B1/00

    CPC分类号： C01F7/56 ,  A61K8/26 ,  A61Q15/00 ,  B01D61/44 ,  C01B9/02 ,  C01G23/02 ,  C01G25/04 ,  C01G49/10

    摘要： The invention relates generally to processes for the production of high-basicity and ultr-high basicity polyaluminum chlorides including aluminum chlorohydrate. The processes can produce products of a wide range of basicities and are particularly useful in producing high basicity products. The process can produce a wide range of solution concentrations and are particularly useful in producing high solution concentrations. The processes described generate high purity products, which are free of by-product salt(s). The processes described herein can also be utilized to produce enhanced efficacy polyaluminum chlorides including aluminum chlorohydrate. When compared to conventional processes for manufacturing these compounds the processes disclosed herein are unique in so far as the disclosed processes do not require aluminum metal as a starting material. The products of the processes are suitable in applications including water purification, catalysts, and antiperspirants. In addition, the invention is directed to the products prepared by the processes described herein.

    摘要翻译： 本发明一般涉及生产包括氯化铝水合物在内的高碱性和超高碱性聚氯化铝的方法。 该工艺可生产各种碱性产品，特别适用于生产高碱度产品。 该方法可产生大范围的溶液浓度，特别适用于生产高溶液浓度。 所述方法产生不含副产物盐的高纯度产物。 本文所述的方法也可用于产生包括氯化铝水合物的增强效力的聚氯化铝。 与用于制造这些化合物的常规方法相比，本文公开的方法是独特的，只要所公开的方法不需要铝金属作为起始材料即可。 该方法的产品适用于包括水净化，催化剂和止汗剂在内的应用。 此外，本发明涉及通过本文所述方法制备的产品。

    RF electrode contact assembly for a detachable electrostatic chuck
    6.
    发明授权
    RF electrode contact assembly for a detachable electrostatic chuck 失效
    用于可拆卸静电卡盘的RF电极接触组件

    公开(公告)号：US06159055A

    公开(公告)日：2000-12-12

    申请号：US126895

    申请日：1998-07-31

    申请人： Peter Satitpunwaycha ,  Joseph Stevens

    发明人： Peter Satitpunwaycha ,  Joseph Stevens

    IPC分类号： H01R13/22 ,  H01L21/683 ,  H01R13/24 ,  H01R13/33

    CPC分类号： H01R13/33 ,  H01L21/6833 ,  H01R13/2421 ,  Y10S439/927

    摘要： An substrate support pedestal having an RF contact assembly that utilizes a canted spring to make electrical connection to the cathode. The canted spring has coils that are tilted in one direction and joined end to end to form a doughnut shape. Such a spring creates multiple parallel self-loading electrical connections via the turns of the spring. The turns act like electrical wires to ensure reliable RF electrical energy transfer. The canted spring contact of the present invention allows for flat contact between the pedestal and the chuck.

    摘要翻译： 具有RF接触组件的衬底支撑座，该接触组件利用倾斜弹簧与阴极电连接。 倾斜弹簧具有在一个方向上倾斜并且端对端连接以形成环形形状的线圈。 这种弹簧通过弹簧的转动产生多个并联的自负载电连接。 匝数像电线一样，以确保可靠的射频电能传输。 本发明的倾斜弹簧触点允许基座和卡盘之间的平坦接触。

    Duty-cycle correction circuit for differential clocking
    7.
    发明申请
    Duty-cycle correction circuit for differential clocking 审中-公开
    用于差分定时的占空比校正电路

    公开(公告)号：US20070159224A1

    公开(公告)日：2007-07-12

    申请号：US11314909

    申请日：2005-12-21

    申请人： Amar Dwarka ,  Joseph Stevens

    发明人： Amar Dwarka ,  Joseph Stevens

    IPC分类号： H03K3/017

    CPC分类号： H03K5/1565

    摘要： A completely differential approach to correcting duty-cycle distortions of a differential clock signal propagating through a differential amplifier. A duty-cycle distortion correction (DCDC) differential amplifier circuit/device is provided with a differential amplifier whose output wires are coupled to a correction circuit. The correction circuit comprises a differential low pass filter and a differential correction amplifier. The differential correction amplifier's output is dotted back into the output of the amplifier. The differential output of the amplifier is passed through the low pass filter, which provides differential DC output signals that triggers respective correction amplifier transistors to generate an inverted correction current that is added back to respective differential output pulse. The DCDC differential amplifier provides a completely differential approach to correction of duty-cycle distortions within the differential output.

    摘要翻译： 一种完全差分的方法来校正通过差分放大器传播的差分时钟信号的占空比失真。 一个占空比失真校正（DCDC）差分放大器电路/器件提供有一个差分放大器，其输出线耦合到校正电路。 校正电路包括差分低通滤波器和差分校正放大器。 差分校正放大器的输出点返回放大器的输出。 放大器的差分输出通过低通滤波器，其提供差分DC输出信号，其触发相应的校正放大器晶体管以产生反相校正电流，其被加回到相应的差分输出脉冲。 DCDC差分放大器提供了一种完全差分的方法来校正差分输出内的占空比失真。

    Apparatus with etchant mixing assembly for removal of unwanted electroplating deposits
    9.
    发明授权
    Apparatus with etchant mixing assembly for removal of unwanted electroplating deposits 失效
    具有用于去除不需要的电镀沉积物的蚀刻剂混合组件的装置

    公开(公告)号：US06494219B1

    公开(公告)日：2002-12-17

    申请号：US09614406

    申请日：2000-07-12

    申请人： Radha Nayak ,  Yezdi Dordi ,  Joseph Stevens ,  Peter Hey

    发明人： Radha Nayak ,  Yezdi Dordi ,  Joseph Stevens ,  Peter Hey

    IPC分类号： B08B308

    CPC分类号： H01L21/6708 ,  C23F1/08 ,  H01L21/02087 ,  H01L21/2885 ,  H01L21/32134 ,  H01L21/67051 ,  H01L21/67207 ,  Y10S134/902

    摘要： Embodiments of the invention generally provide an etchant mixing assembly for a semiconductor processing system. The etchant mixing assembly includes at least one acid source, at least one oxidizer source, a mixing tank selectively in fluid communication with the at least one acid source and the at least one oxidizer source, and a mixed etchant tank in fluid communication with the mixing tank. Additionally, a system controller configured to sense a low level of fluid in the mixed etchant tank, cause a fresh fluid solution to be mixed in the mixing tank, and cause the fresh fluid solution to the communicated to the mixed etchant tank is also provided in the etchant mixing assembly.

    摘要翻译： 本发明的实施例通常提供用于半导体处理系统的蚀刻剂混合组件。 蚀刻剂混合组件包括至少一个酸源，至少一个氧化剂源，选择性地与至少一个酸源和至少一个氧化剂源流体连通的混合罐，以及与混合物流体连通的混合蚀刻剂罐 坦克。 另外，系统控制器被配置为感测混合蚀刻剂槽中的低水平的流体，使得新鲜的流体溶液在混合罐中混合，并且使新鲜的流体溶液与混合的蚀刻剂槽相连，也提供在 蚀刻剂混合组件。