Semiconductor device and method of manufacture thereof
    4.
    发明授权
    Semiconductor device and method of manufacture thereof 失效
    半导体装置及其制造方法

    公开(公告)号:US5258644A

    公开(公告)日:1993-11-02

    申请号:US918133

    申请日:1992-07-23

    IPC分类号: H01L29/735 H01L29/00

    CPC分类号: H01L29/735

    摘要: An improved bipolar transistor is provided which can be formed using a number of process steps which are similar to those used for forming MOSFETs. As such, the bipolar transistor is particularly useful in BiCMOS device arrangements. In accordance with one embodiment, a bipolar transistor is formed so that at least one of the emitter and collector regions has a high impurity region and a low impurity region. The collector and emitter regions of the device are formed in the base region to be spaced apart from one another, and the base electrode is arranged to cover the area of the base region between them. In an alternative embodiment, two collector regions can be provided in a base region on opposite sides of an emitter which is also formed in the base region. Two base electrodes can then be respectively provided in the areas between the two collectors and the emitter region. The bipolar transistors are particularly useful for forming a horizontal bipolar transistor structure. Because the bipolar transistors can be formed using the same types of steps used in the manufacture of MOSFETs, the manufacturing costs of the device can be reduced without sacrificing operational capabilities. This is particularly true in the manufacture of BiCMOS devices because many simultaneous manufacturing steps can be used for manufacturing the bipolar transistors and the MOSFETs.

    摘要翻译: 提供了一种改进的双极晶体管,其可以使用与用于形成MOSFET的那些类似的多个工艺步骤形成。 因此,双极晶体管在BiCMOS器件布置中特别有用。 根据一个实施例,形成双极晶体管,使得发射极和集电极区域中的至少一个具有高杂质区域和低杂质区域。 器件的集电极和发射极区域形成在基极区域中以彼此间隔开,并且基极布置成覆盖它们之间的基极区域的区域。 在替代实施例中,两个集电极区域可以设置在也形成在基极区域中的发射极的相对侧上的基极区域中。 然后可以在两个集电极和发射极区域之间的区域中分别提供两个基极。 双极晶体管特别适用于形成水平双极晶体管结构。 因为可以使用与制造MOSFET相同类型的步骤来形成双极晶体管,所以可以降低器件的制造成本而不牺牲操作能力。 在BiCMOS器件的制造中尤其如此,因为许多同时的制造步骤可用于制造双极晶体管和MOSFET。