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公开(公告)号：US08303833B2
公开(公告)日：2012-11-06
申请号：US11766680
申请日：2007-06-21
申请人： Milos Toth , Noel Smith
发明人： Milos Toth , Noel Smith
CPC分类号： B05C21/005 , B81C1/00531 , B81C2201/0132 , B81C2201/0143 , H01J37/3053 , H01J37/317 , H01J2237/3174 , H01J2237/31744 , H01J2237/31749
摘要： A method for fabrication of microscopic structures that uses a beam process, such as beam-induced decomposition of a precursor, to deposit a mask in a precise pattern and then a selective, plasma beam is applied, comprising the steps of first creating a protective mask upon surface portions of a substrate using a beam process such as an electron beam, focused ion beam (FIB), or laser process, and secondly etching unmasked substrate portions using a selective plasma beam etch process. Optionally, a third step comprising the removal of the protective mask may be performed with a second, materially oppositely selective plasma beam process.
摘要翻译： 一种用于制造微结构的方法，其中使用诸如光束引发的前体分解的光束过程，以精确图案沉积掩模，然后选择性等离子体束，包括以下步骤：首先产生保护掩模 使用诸如电子束，聚焦离子束（FIB）或激光工艺的光束过程在衬底的表面部分上，并且其次使用选择性等离子体束蚀刻工艺来蚀刻未掩模的衬底部分。 可选地，包括去除保护掩模的第三步骤可以用第二种，实质上相对地选择的等离子体束工艺进行。
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公开(公告)号：US20080314871A1
公开(公告)日：2008-12-25
申请号：US11766680
申请日：2007-06-21
申请人： Milos Toth , Noel Smith
发明人： Milos Toth , Noel Smith
IPC分类号： H01L21/3065
CPC分类号： B05C21/005 , B81C1/00531 , B81C2201/0132 , B81C2201/0143 , H01J37/3053 , H01J37/317 , H01J2237/3174 , H01J2237/31744 , H01J2237/31749
摘要： A method for fabrication of microscopic structures that uses a beam process, such as beam-induced decomposition of a precursor, to deposit a mask in a precise pattern and then a selective, plasma beam is applied, comprising the steps of first creating a protective mask upon surface portions of a substrate using a beam process such as an electron beam, focused ion beam (FIB), or laser process, and secondly etching unmasked substrate portions using a selective plasma beam etch process. Optionally, a third step comprising the removal of the protective mask may be performed with a second, materially oppositely selective plasma beam process.
摘要翻译： 一种用于制造微结构的方法，其中使用诸如光束引发的前体分解的光束过程，以精确图案沉积掩模，然后选择性等离子体束，包括以下步骤：首先产生保护掩模 使用诸如电子束，聚焦离子束（FIB）或激光工艺的光束过程在衬底的表面部分上，并且其次使用选择性等离子体束蚀刻工艺来蚀刻未掩模的衬底部分。 可选地，包括去除保护掩模的第三步骤可以用第二种，实质上相对地选择的等离子体束工艺进行。
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公开(公告)号：US20130068611A1
公开(公告)日：2013-03-21
申请号：US13236587
申请日：2011-09-19
IPC分类号： C23C14/46
CPC分类号： H01J37/20 , C25D5/003 , C25D5/02 , C25D5/026 , C25D5/04 , C25D17/005 , C25D17/10 , C25D17/12 , C25D21/04 , C25D21/12 , H01J37/18 , H01J37/222 , H01J37/28 , H01J2237/182 , H01J2237/2003 , H01J2237/202 , H01J2237/2801
摘要： A charge transfer mechanism is used to locally deposit or remove material for a small structure. A local electrochemical cell is created without having to immerse the entire work piece in a bath. The charge transfer mechanism can be used together with a charged particle beam or laser system to modify small structures, such as integrated circuits or micro-electromechanical system. The charge transfer process can be performed in air or, in some embodiments, in a vacuum chamber.
摘要翻译： 电荷转移机构用于局部沉积或去除小结构的材料。 产生局部电化学电池，而不必将整个工件浸入浴中。 电荷转移机构可以与带电粒子束或激光系统一起使用以修改小结构，例如集成电路或微机电系统。 电荷转移过程可以在空气中或在一些实施方案中在真空室中进行。
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公开(公告)号：US08357894B2
公开(公告)日：2013-01-22
申请号：US12853998
申请日：2010-08-10
申请人： Milos Toth , Michael R. Scheinfein , Eric Silver , David Narum
发明人： Milos Toth , Michael R. Scheinfein , Eric Silver , David Narum
IPC分类号： G21K5/04
CPC分类号： G01N23/20033 , H01J37/244 , H01J37/256 , H01J2237/2442
摘要： An improved microcalorimeter-type energy dispersive x-ray spectrometer provides sufficient energy resolution and throughput for practical high spatial resolution x-ray mapping of a sample at low electron beam energies. When used with a dual beam system that provides the capability to etch a layer from the sample, the system can be used for three-dimensional x-ray mapping. A preferred system uses an x-ray optic having a wide-angle opening to increase the fraction of x-rays leaving the sample that impinge on the detector and multiple detectors to avoid pulse pile up.
摘要翻译： 改进的微量热计式能量色散X射线光谱仪为低电子束能量下样品的实际高空间分辨率X射线成像提供了足够的能量分辨率和通量。 当与提供从样品中蚀刻层的能力的双光束系统一起使用时，该系统可用于三维x射线映射。 优选的系统使用具有广角开口的x射线光学器件来增加离开检测器的样品的X射线的分数，以及多个检测器以避免脉冲堆积。
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公开(公告)号：US08299432B2
公开(公告)日：2012-10-30
申请号：US12264805
申请日：2008-11-04
发明人： Milos Toth , William Ralph Knowles
IPC分类号： G01N23/00
CPC分类号： H01J37/244 , H01J37/28 , H01J2237/2002 , H01J2237/2444 , H01J2237/24445 , H01J2237/2449 , H01J2237/2605 , H01J2237/2802
摘要： A scanning transmission electron microscope operated with the sample in a high pressure environment. A preferred detector uses gas amplification by converting either scattered or unscattered transmitted electrons to secondary electrons for efficient gas amplification.
摘要翻译： 扫描透射电子显微镜在高压环境下与样品一起操作。 优选的检测器通过将散射或未散射的透射电子转换成二次电子来进行气体放大，用于有效的气体放大。
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公开(公告)号：US20120196440A1
公开(公告)日：2012-08-02
申请号：US13017015
申请日：2011-01-30
IPC分类号： H01L21/285
CPC分类号： C23C16/0263 , C23C16/10 , C23C16/14 , C23C16/4488 , C23C16/48 , C23C16/486 , C23C16/52
摘要： Material is deposited in a desired pattern by spontaneous deposition of precursor gas at regions of a surface that are prepared using a beam to provide conditions to support the initiation of the spontaneous reaction. One the reaction is initiated, it continues in the absence of the beam at the regions of the surface at which the reaction was initiated.
摘要翻译： 通过在使用光束制备的表面的区域处自发沉积前体气体以提供支持自发反应开始的条件，将材料沉积成所需的图案。 一个反应开始，它在反应开始的表面区域没有光束的情况下继续。
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公开(公告)号：US08168961B2
公开(公告)日：2012-05-01
申请号：US12324296
申请日：2008-11-26
申请人： Marcus Straw , Milos Toth , Steven Randolph , Michael Lysaght , Mark Utlaut
发明人： Marcus Straw , Milos Toth , Steven Randolph , Michael Lysaght , Mark Utlaut
IPC分类号： G21G5/00
CPC分类号： G21G5/00 , B23K26/0624 , B23K26/0661 , B23K26/18 , B23K2101/40 , B23K2101/42 , G03F7/70383 , H01J37/228 , H01J2237/31749
摘要： An improved method for substrate micromachining. Preferred embodiments of the present invention provide improved methods for the utilization of charged particle beam masking and laser ablation. A combination of the advantages of charged particle beam mask fabrication and ultra short pulse laser ablation are used to significantly reduce substrate processing time and improve lateral resolution and aspect ratio of features machined by laser ablation to preferably smaller than the diffraction limit of the machining laser.
摘要翻译： 一种改进的衬底微加工方法。 本发明的优选实施例提供了利用带电粒子束掩蔽和激光烧蚀的改进方法。 使用带电粒子束掩模制造和超短脉冲激光烧蚀的优点的组合来显着地减少基板处理时间，并且提高通过激光烧蚀加工的特征的横向分辨率和纵横比，优选小于加工激光器的衍射极限。
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公开(公告)号：US20120200007A1
公开(公告)日：2012-08-09
申请号：US13449773
申请日：2012-04-18
申请人： Marcus Straw , Milos Toth , Steven Randolph , Michael Lysaght , Mark Utlaut
发明人： Marcus Straw , Milos Toth , Steven Randolph , Michael Lysaght , Mark Utlaut
IPC分类号： B29C59/16
CPC分类号： G21G5/00 , B23K26/0624 , B23K26/0661 , B23K26/18 , B23K2101/40 , B23K2101/42 , G03F7/70383 , H01J37/228 , H01J2237/31749
摘要： An improved method for substrate micromachining. Preferred embodiments of the present invention provide improved methods for the utilization of charged particle beam masking and laser ablation. A combination of the advantages of charged particle beam mask fabrication and ultra short pulse laser ablation are used to significantly reduce substrate processing time and improve lateral resolution and aspect ratio of features machined by laser ablation to preferably smaller than the diffraction limit of the machining laser.
摘要翻译： 一种改进的衬底微加工方法。 本发明的优选实施例提供了利用带电粒子束掩蔽和激光烧蚀的改进方法。 使用带电粒子束掩模制造和超短脉冲激光烧蚀的优点的组合来显着地减少基板处理时间，并且提高通过激光烧蚀加工的特征的横向分辨率和纵横比，优选小于加工激光器的衍射极限。
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公开(公告)号：US20120103945A1
公开(公告)日：2012-05-03
申请号：US13003513
申请日：2009-07-08
申请人： Marcus Straw , David H. Narum , Milos Toth , Mark Utlaut , Guido Knippels , Gerardus Nicolaas Van Veen
发明人： Marcus Straw , David H. Narum , Milos Toth , Mark Utlaut , Guido Knippels , Gerardus Nicolaas Van Veen
CPC分类号： B23K26/03 , B23K26/0622 , B23K26/0853 , B23K26/14 , B23K26/1423 , B23K26/348 , H01J2237/2813
摘要： Laser processing is enhanced by using endpointing or by using a charged particle beam together with a laser. End-pointing uses emissions, such as photons, electrons, ions, or neutral particles, from the substrate to determine when the material under the laser has changed or is about to change. Material removed from the sample can be deflected to avoid deposition onto the laser optics.
摘要翻译： 激光加工通过使用终点或通过与激光一起使用带电粒子束来增强。 端点使用来自衬底的发射，例如光子，电子，离子或中性粒子，以确定激光下的材料何时已经改变或将要改变。 从样品中除去的材料可以偏转，以避免沉积到激光光学器件上。
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公开(公告)号：US20110031394A1
公开(公告)日：2011-02-10
申请号：US12525908
申请日：2008-02-06
申请人： William Ralph Knowles , Rae Knowles , Milos Toth
发明人： William Ralph Knowles , Rae Knowles , Milos Toth
IPC分类号： G01N23/00
CPC分类号： H01J37/3056 , H01J37/301 , H01J2237/006 , H01J2237/188 , H01J2237/2003 , H01J2237/2605 , H01J2237/31732 , H01J2237/3174
摘要： The current invention includes methods and apparatuses for processing, that is, altering and imaging, a sample in a high pressure charged particle beam system. Embodiments of the invention include a cell in which the sample is positioned during high pressure charged particle beam processing. The cell reduces the amount of gas required for processing, thereby allowing rapid introduction, exhaustion, and switching between gases and between processing and imaging modes. Maintaining the processes gases within the cell protects the sample chamber and column from contact with the gases. In some embodiments, the temperature of the cell walls and the sample can be controlled.
摘要翻译： 本发明包括用于处理的方法和装置，即改变和成像高压带电粒子束系统中的样品。 本发明的实施例包括其中样品在高压带电粒子束处理期间被定位的单元。 电池减少处理所需的气体量，从而允许气体之间以及处理和成像模式之间的快速引入，耗尽和切换。 维持过程中的气体保护样品室和色谱柱不与气体接触。 在一些实施方案中，可以控制细胞壁和样品的温度。
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