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公开(公告)号：US07585800B2
公开(公告)日：2009-09-08
申请号：US11962936
申请日：2007-12-21
CPC分类号： C03C3/06 , C03C4/0085 , C03C2201/30 , C03C2201/42
摘要： It is to obtain a silica glass suitable as a material for an optical material constituting an optical system to be used for EUVL, which has a low coefficient of thermal expansion from 0 to 100° C., and on which formation of concave defects is suppressed in a polishing step to achieve a high level of flatness.A silica glass containing from 0.1 to 10 mass % of Sn calculated as SnO2 and from 3 to 10 mass % of Ti calculated as TiO2, which has a homogeneity of the coefficient of thermal expansion from 0 to 100° C. to the temperature of from 50 to 200 ppb/° C., a coefficient of thermal expansion from 0 to 100° C. of 0±250 ppb/° C., and a Vickers hardness of at most 650.
摘要翻译： 获得适合作为构成用于EUVL的光学系统的光学材料的石英玻璃，其具有0至100℃的低热膨胀系数，并且其中凹陷缺陷的形成被抑制 在抛光步骤中达到高水平的平整度。 含有0.1〜10质量％的以SnO 2计的Sn和3〜10质量％的作为TiO 2计算的Ti的二氧化硅玻璃，其具有0〜100℃的热膨胀系数的均匀性 50至200ppb /℃，0至100ppb /℃的0至100℃的热膨胀系数，以及至多650的维氏硬度。
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公开(公告)号：US20080103038A1
公开(公告)日：2008-05-01
申请号：US11962936
申请日：2007-12-21
CPC分类号： C03C3/06 , C03C4/0085 , C03C2201/30 , C03C2201/42
摘要： It is to obtain a silica glass suitable as a material for an optical material constituting an optical system to be used for EUVL, which has a low coefficient of thermal expansion from 0 to 100° C., and on which formation of concave defects is suppressed in a polishing step to achieve a high level of flatness. A silica glass containing from 0.1 to 10 mass % of Sn calculated as SnO2 and from 3 to 10 mass % of Ti calculated as TiO2, which has a homogeneity of the coefficient of thermal expansion from 0 to 100° C. to the temperature of from 50 to 200 ppb/° C., a coefficient of thermal expansion from 0 to 100° C. of 0±250 ppb/° C., and a Vickers hardness of at most 650.
摘要翻译： 获得适合作为构成用于EUVL的光学系统的光学材料的石英玻璃，其具有0至100℃的低热膨胀系数，并且其中凹陷缺陷的形成被抑制 在抛光步骤中达到高水平的平整度。 含有0.1〜10质量％的以SnO 2 2计的Sn和3〜10质量％的TiO 2计算的二氧化硅玻璃，其Ti均匀度为 热膨胀系数为0〜100℃，温度为50〜200ppb /℃，0〜100℃的热膨胀系数为0±250ppb /℃，Vickers 硬度至多650。
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公开(公告)号：US20080039310A1
公开(公告)日：2008-02-14
申请号：US11865289
申请日：2007-10-01
申请人： Hideaki HAYASHI , Akio Koike , Mitsuhiro Kawata , Naoki Sugimoto , Shinya Kikugawa , Kenji Yamada
发明人： Hideaki HAYASHI , Akio Koike , Mitsuhiro Kawata , Naoki Sugimoto , Shinya Kikugawa , Kenji Yamada
IPC分类号： C03B19/00
CPC分类号： C03C3/06 , C03B19/1415 , C03B19/1438 , C03B2201/32 , C03B2201/34 , C03B2201/40 , C03B2207/32 , C03B2207/34 , C03C23/0095 , C03C2201/24 , C03C2201/32 , C03C2201/3405 , C03C2201/3411 , C03C2201/3417 , C03C2201/40 , C03C2203/44 , C03C2203/54
摘要： To provide quartz-type glass for a microlithographic projection exposure apparatus, which contains at least 51 mass % of SiO2 and which further contains at least one member selected from the group consisting of lanthanum, aluminum, hafnium, nitrogen, scandium, yttrium and zirconium. It is a material which is useful for an illumination system for a microlithographic projection exposure apparatus or as a projection object lens and has a refractive index at 248 nm larger than 1.508 of quartz glass and a refractive index at 193 nm larger than 1.560 of quartz glass and which can be small-sized.
摘要翻译： 为了提供含有至少51质量％的SiO 2的微光刻投影曝光装置的石英型玻璃，还含有选自镧，铝，铪等的至少一种， 氮，钪，钇和锆。 它是一种用于微光刻投影曝光装置的照明系统或投影物镜并且具有大于1.508的石英玻璃的248nm的折射率和大于石英玻璃的1.560的193nm的折射率的材料 并且可以是小尺寸的。
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4.发明申请PROCESS FOR PRODUCING SILICA GLASS CONTAINING TIO2, AND OPTICAL MATERIAL FOR EUV LITHOGRAPHY EMPLOYING SILICA GLASS CONTAINING TIO2 审中-公开生产含有二氧化硅玻璃的工艺，含有二氧化硅的二氧化硅玻璃的光学材料和含有二氧化硅的二氧化硅玻璃的光学材料公开(公告)号：US20090242387A1
公开(公告)日：2009-10-01
申请号：US12466032
申请日：2009-05-14
IPC分类号： C23C14/34
CPC分类号： C03C3/06 , C03B19/1453 , C03B19/1484 , C03B2201/21 , C03B2201/42 , C03C17/40 , C03C2201/21 , C03C2201/42 , G03F7/70958
摘要： The claimed invention relates to a process for producing an optical material for EUV lithography, wherein the optical material contains a silica glass having a TiO2 concentration of from 3 to 12 mass % and a hydrogen molecule content of less than 5×1017 molecules/cm3 in the glass. The process including coating a multilayer film on the silica glass by ion beam sputtering.
摘要翻译： 所要求保护的发明涉及一种用于制造用于EUV光刻的光学材料的方法，其中所述光学材料包含玻璃中TiO 2浓度为3至12质量％且氢分子含量小于5×10 17分子/ cm 3的二氧化硅玻璃 。 该方法包括通过离子束溅射在二氧化硅玻璃上涂覆多层膜。
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5.发明申请PROCESS FOR PRODUCING SILICA GLASS CONTAINING TIO2, AND OPTICAL MATERIAL FOR EUV LITHOGRAPHY EMPLOYING SILICA GLASS CONTAINING TIO2 审中-公开生产含有二氧化硅玻璃的工艺，含有二氧化硅的二氧化硅玻璃的光学材料和含有二氧化硅的二氧化硅玻璃的光学材料公开(公告)号：US20070207911A1
公开(公告)日：2007-09-06
申请号：US11747698
申请日：2007-05-11
CPC分类号： C03C3/06 , C03B19/1453 , C03B19/1484 , C03B2201/21 , C03B2201/42 , C03C17/40 , C03C2201/21 , C03C2201/42 , G03F7/70958
摘要： Conventional TiO2—SiO2 glass contains hydrogen atoms substantially, and during deposition under ultrahigh vacuum condition, the hydrogen molecules will diffuse in the chamber, and H2 molecules will be taken into a film thereby formed. Hydrogen molecules will readily diffuse, and the optical characteristics of the multilayer film are likely to be thereby changed. In an optical material for EUV lithography, a multilayer film is coated by ion beam sputtering on a silica glass having a TiO2 concentration of from 3 to 12 mass % and a hydrogen molecule content of less than 5×1017 molecules/cm3 in the glass.
摘要翻译： 常规的TiO 2 -SiO 2 SiO 2玻璃基本上含有氢原子，并且在超高真空条件下沉积期间，氢分子将在室中扩散，并且H 2 < / SUB>分子将被吸收到由此形成的膜中。 氢分子将容易扩散，并且可能由此改变多层膜的光学特性。 在用于EUV光刻的光学材料中，通过离子束溅射在具有3至12质量％的TiO 2浓度和小于5×10 5质量％的氢分子含量的二氧化硅玻璃上涂覆多层膜， SUP> 17分子/ cm 3在玻璃中。
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公开(公告)号：US5631195A
公开(公告)日：1997-05-20
申请号：US528265
申请日：1995-09-14
申请人： Osamu Yanagisawa , Kenji Oda , Naoki Sugimoto , Yoshio Takegawa , Akira Takada , Hideyo Osada , Haruo Aizawa , Koji Miura
发明人： Osamu Yanagisawa , Kenji Oda , Naoki Sugimoto , Yoshio Takegawa , Akira Takada , Hideyo Osada , Haruo Aizawa , Koji Miura
摘要： A glass composition comprising from 45 to 66 wt % of SiO.sub.2, from 0 to 15 wt % of Al.sub.2 O.sub.3, from 10 to 24 wt % of Li.sub.2 O+Na.sub.2 O+K.sub.2 O, from 14 to 26 wt % of CaO+MgO+SrO+BaO+ZnO, and from 0 to 1 wt % of SO.sub.3 +Sb.sub.2 O.sub.3, said glass composition containing substantially no zirconia and having a strain point of at least 560.degree. C. and a linear thermal expansion coefficient of at least 80.times.10.sup.-7 /.degree.C. within a temperature range of from 50.degree. to 350.degree. C.
摘要翻译： 包含45至66重量％的SiO 2，0至15重量％的Al 2 O 3，10至24重量％的Li 2 O + Na 2 O + K 2 O，14至26重量％的CaO + MgO + SrO + BaO + ZnO和0〜1重量％的SO 3 + Sb 2 O 3，所述玻璃组合物基本上不含氧化锆，应变点至少为560℃，线性热膨胀系数为至少80×10 -7 /℃ 温度范围为50〜350℃
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公开(公告)号：US5780373A
公开(公告)日：1998-07-14
申请号：US777701
申请日：1996-12-20
申请人： Osamu Yanagisawa , Kenji Oda , Naoki Sugimoto , Yoshio Takegawa , Akira Takada , Hideyo Osada , Haruo Aizawa , Koji Miura
发明人： Osamu Yanagisawa , Kenji Oda , Naoki Sugimoto , Yoshio Takegawa , Akira Takada , Hideyo Osada , Haruo Aizawa , Koji Miura
摘要： A glass composition comprising from 45 to 66 wt % of SiO.sub.2, from 0 to 15 wt % of Al.sub.2 O.sub.3, from 10 to 24 wt % of Li.sub.2 O+Na.sub.2 O+K.sub.2 O, from 14 to 26 wt % of CaO+MgO+SrO+BaO+ZnO, and from 0 to 1 wt % of SO.sub.3 +Sb.sub.2 O.sub.3, said glass composition containing substantially no zirconia and having a strain point of at least 560.degree. C. and a linear thermal expansion coefficient of at least 80.times.10.sup.-7 /.degree.C. within a temperature range of from 50.degree. to 350.degree. C.
摘要翻译： 一种玻璃组合物，其包含45至66重量％的SiO 2，0至15重量％的Al 2 O 3，10至24重量％的Li 2 O + Na 2 O + K 2 O，14至26重量％的CaO + MgO + SrO + BaO + ZnO和0〜1重量％的SO 3 + Sb 2 O 3，所述玻璃组合物基本上不含氧化锆，应变点至少为560℃，线性热膨胀系数为至少80×10 -7 /℃ 温度范围为50〜350℃
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公开(公告)号：US06819860B2
公开(公告)日：2004-11-16
申请号：US10265248
申请日：2002-10-07
申请人： Seiki Ohara , Hideaki Hayashi , Naoki Sugimoto , Katsuhiro Ochiai , Yasuji Fukasawa , Takeshi Hirose , Manuel Reyes
发明人： Seiki Ohara , Hideaki Hayashi , Naoki Sugimoto , Katsuhiro Ochiai , Yasuji Fukasawa , Takeshi Hirose , Manuel Reyes
IPC分类号： G02B602
CPC分类号： C03C13/046 , C03C3/062 , C03C3/068 , C03C3/15 , C03C13/048 , Y10S501/90
摘要： An optical amplifying glass comprising 100 parts by mass of a matrix glass and from 0.1 to 10 parts by mass of Er doped to the matrix glass, wherein the matrix glass comprises Bi2O3, at least one of B2O3 and SiO2, at least one member selected from the group consisting of Ga2O3, WO3 and TeO2, and La2O3 in such a ratio that Bi2O3 is from 20 to 80 mol %, B2O3+SiO2 is from 5 to 75 mol %, Ga2O3+WO3+TeO2 is from 0.1 to 35 mol %, and La2O3 is from 0.01 to 15 mol %.
摘要翻译： 一种光学放大玻璃，其包含100质量份的基质玻璃和0.1〜10质量份的掺杂到基体玻璃中的铒，其中所述基质玻璃包含Bi 2 O 3，B 2 O 3和SiO 2中的至少一种，选自 由Ga2O3，WO3，TeO2组成的组和Bi2O3为20〜80mol％，B2O3 + SiO2的La2O3为5〜75mol％，Ga2O3 + WO3 + TeO2为0.1〜35mol％ La 2 O 3为0.01〜15摩尔％。
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9.发明申请公开(公告)号：US20110316143A1
公开(公告)日：2011-12-29
申请号：US13167144
申请日：2011-06-23
申请人： Chikage NORITAKE , Hiroaki Arai , Yoshiyuki Yamauchi , Yasuou Yamazaki , Naoki Sugimoto , Yasuyuki Sakai
发明人： Chikage NORITAKE , Hiroaki Arai , Yoshiyuki Yamauchi , Yasuou Yamazaki , Naoki Sugimoto , Yasuyuki Sakai
CPC分类号： H01L23/34 , H01L21/565 , H01L23/3107 , H01L23/4012 , H01L23/4093 , H01L23/4334 , H01L23/473 , H01L24/32 , H01L24/33 , H01L24/48 , H01L25/117 , H01L2224/32245 , H01L2224/33181 , H01L2224/48091 , H01L2224/48247 , H01L2224/73215 , H01L2224/73265 , H01L2924/00014 , H01L2924/01005 , H01L2924/01006 , H01L2924/01013 , H01L2924/01029 , H01L2924/01033 , H01L2924/01082 , H01L2924/014 , H01L2924/07802 , H01L2924/1305 , H01L2924/13055 , H01L2924/1306 , H01L2924/13091 , H01L2924/181 , H01L2924/351 , H01L2224/45099 , H01L2924/3512 , H01L2924/00 , H01L2924/00012
摘要： A semiconductor module is provided which includes a semiconductor unit which is made by a resin mold. The resin mold has formed therein a coolant path through which a coolant flows to cool a semiconductor chip embedded in the resin mold. The resin mold also includes heat spreaders, and electric terminals embedded therein. Each of the heat spreaders has a fin heat sink exposed to the flow of the coolant. The fin heat sink is welded to a surface of each of the heat spreaders through an insulator, thus minimizing an electrical leakage from the heat spreader to the coolant.
摘要翻译： 提供一种半导体模块，其包括由树脂模具制成的半导体单元。 树脂模具中形成有冷却剂流动的冷却剂路径，以冷却嵌入在树脂模具中的半导体芯片。 树脂模具还包括散热器和嵌入其中的电端子。 每个散热器具有暴露于冷却剂流动的翅片散热器。 翅片散热器通过绝缘体焊接到每个散热器的表面，从而最小化从散热器到冷却剂的电泄漏。
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公开(公告)号：US20100192634A1
公开(公告)日：2010-08-05
申请号：US12755709
申请日：2010-04-07
申请人： Toshihiko HIGUCHI , Motoi Kamba , Naoki Sugimoto , Satoshi Kondo
发明人： Toshihiko HIGUCHI , Motoi Kamba , Naoki Sugimoto , Satoshi Kondo
IPC分类号： C03C17/00
CPC分类号： C03B17/02 , B29B15/12 , B29B15/125 , B29B15/127 , B29C65/48 , B29C65/4815 , B29C65/4835 , B29C65/484 , B29C65/4845 , B29C66/1122 , B29C66/45 , B29C66/71 , B29C66/7212 , B29C66/73117 , B29C66/7465 , B29C66/83411 , B29C66/83413 , B29C66/9141 , B29C66/91411 , B29C66/91645 , B29C66/919 , B29C66/91931 , B29C66/91933 , B29C66/91935 , B29C66/91941 , B29C66/91943 , B29C2035/0827 , B29K2067/00 , B29K2079/08 , B29K2309/08 , B29L2009/00 , B32B17/064 , B32B37/04 , B32B37/1207 , B32B37/206 , B32B2037/1215 , B32B2037/243 , B32B2309/02 , B32B2309/105 , B32B2310/0831 , B32B2315/08 , B32B2367/00 , B32B2457/202 , B29K2069/00 , B29K2027/06 , B29K2081/06 , B29K2083/00 , B29K2077/00 , B29K2067/003 , B29K2033/12 , B29K2033/08 , B29K2029/04 , B29K2027/12 , B29K2025/06 , B29K2023/00
摘要： To provide a process for producing a glass/resin composite having a sufficient transportability, handling efficiency and processability, even though the thickness of the glass is very thin, without impairing excellent properties of glass.A process for producing a glass/resin composite, which comprises forming molten glass into a glass ribbon and forming a resin layer on at least one surface of the glass ribbon is provided. The resin layer is preferably formed by bonding to a glass ribbon, applying a heat melt resin or applying a curable resin. Further, a process for producing a glass/resin composite, wherein a cut glass substrate is bonded on a continuously supplied resin film is provided.
摘要翻译： 为了提供具有足够的输送性，处理效率和加工性的玻璃/树脂复合材料的制造方法，即使玻璃的厚度非常薄，也不会损害玻璃的优异性能。 提供一种玻璃/树脂复合体的制造方法，其包括在玻璃带中形成熔融玻璃并在玻璃带的至少一个表面上形成树脂层。 树脂层优选通过粘合到玻璃带，施加热熔树脂或施加可固化树脂来形成。 此外，提供了一种玻璃/树脂复合材料的制造方法，其中将切割的玻璃基板接合在连续供给的树脂膜上。
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