AIR GAP BETWEEN TUNGSTEN METAL LINES FOR INTERCONNECTS WITH REDUCED RC DELAY
    2.
    发明申请
    AIR GAP BETWEEN TUNGSTEN METAL LINES FOR INTERCONNECTS WITH REDUCED RC DELAY 有权
    用于具有减少RC延迟的互连的金属线之间的空气间隙

    公开(公告)号:US20160013133A1

    公开(公告)日:2016-01-14

    申请号:US14330950

    申请日:2014-07-14

    Abstract: Systems and methods are directed to a semiconductor device, which includes an integrated circuit, wherein the integrated circuit includes at least a first layer comprising two or more Tungsten lines and at least one air gap between at least two Tungsten lines, the air gaps to reduce capacitance. An interposer is coupled to the integrated circuit, to reduce stress on the two or more Tungsten lines and the at least one air gap. A laminated package substrate may be attached to the interposer such that the interposer is configured to absorb mechanical stress induced by mismatch in coefficient of thermal expansion (CTE) between the laminated package substrate and the interposer and protect the air gap from the mechanical stress.

    Abstract translation: 系统和方法涉及包括集成电路的半导体器件,其中集成电路至少包括包含两条或更多条钨线的至少一条第一层和至少两条钨线之间的至少一个气隙,所述气隙减少 电容。 插入器耦合到集成电路,以减少两个或多个钨线和至少一个气隙的应力。 层叠封装基板可以附接到插入件,使得插入件被构造成吸收由层压封装基板和插入件之间的热膨胀系数(CTE)失配引起的机械应力,并保护气隙免受机械应力。

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