Formation of multisegmented plated through holes
    1.
    发明授权
    Formation of multisegmented plated through holes 有权
    多段电镀通孔的形成

    公开(公告)号:US06426470B1

    公开(公告)日:2002-07-30

    申请号:US09764464

    申请日:2001-01-17

    IPC分类号: H05K111

    摘要: A method and structure relating to multisegmented plated through holes. A substrate includes a dielectric layer sandwiched between a first laminate layer and a second laminate layer. A through hole is formed through the substrate. The through hole passes through nonplatable dielectric material within the dielectric layer. As a result, subsequent seeding and electroplating of the through hole results in a conductive metal plating forming at a wall of the through hole on a segment of the first laminate layer and on a segment of the second laminate layer, but not on the nonplatable dielectric material of the dielectric layer. Thus, the conductive metal plating is not continuous from the first laminate layer to the second laminate layer.

    摘要翻译: 涉及多段电镀通孔的方法和结构。 基板包括夹在第一层叠层和第二层叠层之间的电介质层。 穿过基板形成通孔。 通孔穿过介电层内的不可电介质材料。 结果,随后的通孔的接种和电镀导致在第一层压层的段上的通孔的壁上和第二层压层的段上形成导电金属电镀,而不在不可电绝缘的电介质 电介质层的材料。 因此,导电金属电镀从第一层叠层到第二层叠层不是连续的。

    Multilayer capacitance structure and circuit board containing the same
    2.
    发明授权
    Multilayer capacitance structure and circuit board containing the same 失效
    包含多层电容结构和电路板

    公开(公告)号:US06343001B1

    公开(公告)日:2002-01-29

    申请号:US09655381

    申请日:2000-09-05

    IPC分类号: H01G4228

    摘要: A method of forming a capacitive core structure and of forming a circuitized printed wiring board from the core structure and the resulting structures are provided. The capacitive core structure is formed by providing a central conducting plane of a sheet of conductive material and forming at least one clearance hole in the central conducting plane. First and second external conducting planes are laminated to opposite sides of the ground plane with a film of dielectric material between each of the first and second external planes and the central conducting plane. At least one clearance hole is formed in each of the first and second external planes. A circuitized wiring board structure can be formed by laminating a capacitive core structure between two circuitized structures. The invention also relates to the structures formed by these methods.

    摘要翻译: 提供了一种从芯结构形成电容性芯结构和形成电路化印刷线路板的方法及其结构。 通过提供导电材料片的中心导电平面并在中心导电平面中形成至少一个间隙孔来形成电容芯结构。 第一和第二外部导电平面在第一和第二外部平面之间的介电材料膜和中心导电平面之间层压到接地平面的相对侧。 在第一和第二外部平面的每一个中形成至少一个间隙孔。 可以通过在两个电路化结构之间层叠电容性芯结构来形成电路化布线板结构。 本发明还涉及通过这些方法形成的结构。

    Multilayer capacitance structure and circuit board containing the same and method of forming the same
    4.
    发明授权
    Multilayer capacitance structure and circuit board containing the same and method of forming the same 有权
    多层电容结构和电路板含有相同的方法和其形成方法

    公开(公告)号:US06496356B2

    公开(公告)日:2002-12-17

    申请号:US10026873

    申请日:2001-12-21

    IPC分类号: H01G4228

    摘要: A method of forming a capacitive core structure and of forming a circuitized printed wiring board from the core structure and the resulting structures are provided. The capacitive core structure is formed by providing a central conducting plane of a sheet of conductive material and forming at least one clearance hole in the central conducting plane. First and second external conducting planes are laminated to opposite sides of the ground plane with a film of dielectric material between each of the first and second external planes and the central conducting plane. At least one clearance hole is formed in each of the first and second external planes. A circuitized wiring board structure can be formed by laminating a capacitive core structure between two circuitized structures. The invention also relates to the structures formed by these methods.

    摘要翻译: 提供了一种从芯结构形成电容性芯结构和形成电路化印刷线路板的方法及其结构。 通过提供导电材料片的中心导电平面并在中心导电平面中形成至少一个间隙孔来形成电容芯结构。 第一和第二外部导电平面在第一和第二外部平面之间的介电材料膜和中心导电平面之间层压到接地平面的相对侧。 在第一和第二外部平面的每一个中形成至少一个间隙孔。 可以通过在两个电路化结构之间层叠电容性芯结构来形成电路化布线板结构。 本发明还涉及通过这些方法形成的结构。

    Formation of multisegmented plated through holes
    5.
    发明授权
    Formation of multisegmented plated through holes 失效
    多段电镀通孔的形成

    公开(公告)号:US06700078B2

    公开(公告)日:2004-03-02

    申请号:US10176254

    申请日:2002-06-19

    IPC分类号: H05K116

    摘要: A method and structure relating to multisegmented plated through holes. A substrate includes a dielectric layer sandwiched between a first laminate layer and a second laminate layer. A through hole is formed through the substrate. The through hole passes through nonplatable dielectric material within the dielectric layer. As a result, subsequent seeding and electroplating of the through hole results in a conductive metal plating forming at a wall of the through hole on a segment of the first laminate layer and on a segment of the second laminate layer, but not on the nonplatable dielectric material of the dielectric layer. Thus, the conductive metal plating is not continuous from the first laminate layer to the second laminate layer.

    摘要翻译: 涉及多段电镀通孔的方法和结构。 基板包括夹在第一层叠层和第二层叠层之间的电介质层。 穿过基板形成通孔。 通孔穿过介电层内的不可电介质材料。 结果,随后的通孔的接种和电镀导致在第一层压层的段上的通孔的壁上和第二层压层的段上形成导电金属电镀,而不在不可电绝缘的电介质 电介质层的材料。 因此,导电金属电镀从第一层叠层到第二层叠层不是连续的。