Abstract:
A three-dimensional (3D) semiconductor memory device and a method for fabricating the same, the device including insulating layers stacked on a substrate; horizontal structures between the insulating layers, the horizontal structures including gate electrodes, respectively; vertical structures penetrating the insulating layers and the horizontal structures, the vertical structures including semiconductor pillars, respectively; and epitaxial patterns, each of the epitaxial patterns being between the substrate and each of the vertical structures, wherein a minimum width of the epitaxial pattern is less than a width of a corresponding one of the vertical structures.
Abstract:
Various embodiments of the present disclosure provide a method of operating a non-volatile memory and an electronic device adapted to the method. When the possibility that power will be cut off in the electronic device is low or almost zero, the provision operation (e.g., an LSB backup) is interrupted which is capable of preventing data from being erased against a situation where the power is cut off. The method of managing a storage device includes: transferring an initialization command to a non-volatile memory functionally connected to a storage device; transferring a command for interrupting or executing an LSB backup to the storage device controller included in the non-volatile memory; and interrupting or executing, by the storage device controller, the LSB backup according to the LSB backup interrupt or execute command. Other modifications are provided.
Abstract:
A three-dimensional (3D) semiconductor memory device and a method for fabricating the same, the device including insulating layers stacked on a substrate; horizontal structures between the insulating layers, the horizontal structures including gate electrodes, respectively; vertical structures penetrating the insulating layers and the horizontal structures, the vertical structures including semiconductor pillars, respectively; and epitaxial patterns, each of the epitaxial patterns being between the substrate and each of the vertical structures, wherein a minimum width of the epitaxial pattern is less than a width of a corresponding one of the vertical structures.
Abstract:
Disclosed is a three-dimensional semiconductor memory device including a carbon-containing layer on a substrate, a plurality of electrode interlayer dielectric layers and a plurality of electrode layers that are alternately stacked on the carbon-containing layer, a cell vertical pattern that penetrates at least some of the electrode interlayer dielectric layers and the electrode layers, and a semiconductor pattern between the cell vertical pattern and the carbon-containing layer. The substrate includes a plurality of first grains. The semiconductor pattern includes a plurality of second grains. An average size of the second grains is less than an average size of the first grains.
Abstract:
Semiconductor devices including a substrate including a cell array region and a through electrode region, an electrode stack on the substrate and including electrodes, vertical structures penetrating the electrode stack within the cell array region, vertical fence structures within an extension region and surrounding the through electrode region, and insulating layers being inside a perimeter defined by the vertical fence structures and being at the same level as the electrodes may be provided. The electrodes may include first protrusions protruding between the vertical fence structures in a plan view.
Abstract:
A memory system and storage device are provided, including: an auxiliary power device having at least one capacitor, wherein the at least one capacitor has a first path for leakage current; a charging circuit including a switch connected to the auxiliary power device; and a state determining circuit connected to the auxiliary power device, wherein the state determining circuit includes a path circuit connected in parallel with the at least one capacitor to form a second path having at least one of a resistance lower than a resistance of the first path or a current source.
Abstract:
In a method of fabricating a semiconductor device, sacrificial layer patterns are formed by leaving portions of sacrificial layers, instead of completely removing the sacrificial layers. Thus, the reliability of the semiconductor device may be increased, and the process of manufacturing the same may be simplified.
Abstract:
An electronic device is provided. The electronic device includes an antenna, a wireless communication module electrically connected to the antenna, a flexible printed circuit board (FPCB) including a first feeding element and a second feeding element which are electrically connected to the wireless communication module, a substrate disposed above the first feeding element and the second feeding element, a first conductive pattern including a first coupling hole and a second conductive pattern including a second coupling hole, which are formed on the upper surface of the substrate, a first coupling fastener configured to penetrate the first coupling hole and the first feeding element and electrically connect the first conductive pattern and the first feeding element, and a second coupling fastener configured to penetrate the second coupling hole and the second feeding element and electrically connect the second conductive pattern and the second feeding element.
Abstract:
A memory system and storage device are provided, including: an auxiliary power device having at least one capacitor, wherein the at least one capacitor has a first path for leakage current; a charging circuit including a switch connected to the auxiliary power device; and a state determining circuit connected to the auxiliary power device, wherein the state determining circuit includes a path circuit connected in parallel with the at least one capacitor to form a second path having at least one of a resistance lower than a resistance of the first path or a current source.
Abstract:
Various embodiments of the present disclosure provide a method of operating a non-volatile memory and an electronic device adapted to the method. When the possibility that power will be cut off in the electronic device is low or almost zero, the provision operation (e.g., an LSB backup) is interrupted which is capable of preventing data from being erased against a situation where the power is cut off. The method of managing a storage device includes: transferring an initialization command to a non-volatile memory functionally connected to a storage device; transferring a command for interrupting or executing an LSB backup to the storage device controller included in the non-volatile memory; and interrupting or executing, by the storage device controller, the LSB backup according to the LSB backup interrupt or execute command. Other modifications are provided.