公开(公告)号：US20100006965A1

公开(公告)日：2010-01-14

申请号：US12170857

申请日：2008-07-10

申请人： Shin-Chang Shiung ,  Tzu-Han Lin ,  Chieh-Yuan Cheng ,  Li-Hsin Tseng

发明人： Shin-Chang Shiung ,  Tzu-Han Lin ,  Chieh-Yuan Cheng ,  Li-Hsin Tseng

IPC分类号： H01L31/0203

CPC分类号： H01L27/14618 ,  H01L27/14625 ,  H01L2224/0554 ,  H01L2224/05548 ,  H01L2224/05573 ,  H01L2224/13 ,  H01L2924/00014 ,  H01L2224/05599 ,  H01L2224/0555 ,  H01L2224/0556

摘要： Electronic device packages with electromagnetic compatibility (EMC) coating thereon are presented. An electronic device package includes a chip scale package having a CMOS image sensor (CIS) array chip and a set of lenses configured with an aperture. An encapsulation is molded overlying the chip scale package. A shield is atop the encapsulation. A frame fixes the set of lenses to the encapsulation. An electromagnetic compatibility (EMC) coating is formed on the encapsulation to prevent electromagnetic interference.

摘要翻译： 提供了具有电磁兼容性（EMC）涂层的电子器件封装。 一种电子器件封装包括具有CMOS图像传感器（CIS）阵列芯片的芯片级封装以及配置有孔径的一组透镜。 将封装模制在芯片级封装上。 屏蔽是封装的顶部。 一个框架将该组透镜固定到封装。 在封装上形成电磁兼容（EMC）涂层，以防止电磁干扰。

公开(公告)号：US08355628B2

公开(公告)日：2013-01-15

申请号：US12399706

申请日：2009-03-06

申请人： Shin-Chang Shiung ,  Chieh-Yuan Cheng ,  Li-Hsin Tseng

发明人： Shin-Chang Shiung ,  Chieh-Yuan Cheng ,  Li-Hsin Tseng

IPC分类号： G03B17/02 ,  G03B13/34 ,  H01L31/0232

CPC分类号： G03B17/00 ,  H04N5/2253 ,  H04N5/2254 ,  H04N5/2257

摘要： The invention provides a compact camera module. The compact camera module includes an image sensing device, a set of optical elements, and a zooming device. The set of optical elements connects to the image sensing device, and comprises a lens set. The zooming device connects to the set of optical elements for adjusting a distance between the lens set and the image sensing device. The zooming device directly electrically joins with the image sensing device.

摘要翻译： 本发明提供了一种紧凑的相机模块。 紧凑型相机模块包括图像感测装置，一组光学元件和变焦装置。 该组光学元件连接到图像感测装置，并且包括透镜组。 变焦装置连接到一组光学元件，用于调整透镜组和图像感测装置之间的距离。 变焦装置与图像感测装置直接电连接。

公开(公告)号：US07964936B2

公开(公告)日：2011-06-21

申请号：US12170857

申请日：2008-07-10

申请人： Shin-Chang Shiung ,  Tzu-Han Lin ,  Chieh-Yuan Cheng ,  Li-Hsin Tseng

发明人： Shin-Chang Shiung ,  Tzu-Han Lin ,  Chieh-Yuan Cheng ,  Li-Hsin Tseng

IPC分类号： H01L23/552

CPC分类号： H01L27/14618 ,  H01L27/14625 ,  H01L2224/0554 ,  H01L2224/05548 ,  H01L2224/05573 ,  H01L2224/13 ,  H01L2924/00014 ,  H01L2224/05599 ,  H01L2224/0555 ,  H01L2224/0556

摘要： Electronic device packages with electromagnetic compatibility (EMC) coating thereon are presented. An electronic device package includes a chip scale package having a CMOS image sensor (CIS) array chip and a set of lenses configured with an aperture. An encapsulation is molded overlying the chip scale package. A shield is atop the encapsulation. A frame fixes the set of lenses to the encapsulation. An electromagnetic compatibility (EMC) coating is formed on the encapsulation to prevent electromagnetic interference.

摘要翻译： 提供了具有电磁兼容性（EMC）涂层的电子器件封装。 一种电子器件封装包括具有CMOS图像传感器（CIS）阵列芯片的芯片级封装以及配置有孔径的一组透镜。 将封装模制在芯片级封装上。 屏蔽是封装的顶部。 一个框架将该组透镜固定到封装。 在封装上形成电磁兼容（EMC）涂层，以防止电磁干扰。

公开(公告)号：US07187078B2

公开(公告)日：2007-03-06

申请号：US10938594

申请日：2004-09-13

申请人： Tzu-Han Lin ,  Huei-Mei Yu ,  Chia-Jen Cheng ,  Chun-Yen Lo ,  Li-Hsin Tseng ,  Boe Su ,  Simon Lu

发明人： Tzu-Han Lin ,  Huei-Mei Yu ,  Chia-Jen Cheng ,  Chun-Yen Lo ,  Li-Hsin Tseng ,  Boe Su ,  Simon Lu

IPC分类号： H01L29/40

CPC分类号： H01L24/13 ,  H01L24/05 ,  H01L2224/02125 ,  H01L2224/05001 ,  H01L2224/05007 ,  H01L2224/05022 ,  H01L2224/05026 ,  H01L2224/05027 ,  H01L2224/0508 ,  H01L2224/05124 ,  H01L2224/05147 ,  H01L2224/05562 ,  H01L2224/05572 ,  H01L2224/0558 ,  H01L2224/056 ,  H01L2224/13 ,  H01L2224/13099 ,  H01L2924/01006 ,  H01L2924/01013 ,  H01L2924/01029 ,  H01L2924/01033 ,  H01L2924/01078 ,  H01L2924/01082 ,  H01L2924/01084 ,  H01L2924/01322 ,  H01L2924/014 ,  H01L2924/14 ,  H01L2924/30105 ,  H01L2924/00 ,  H01L2924/00014 ,  H01L2924/00012

摘要： Solder bump structures for semiconductor device packaging is provided. In one embodiment, a solder bump structure comprises a semiconductor substrate, the substrate has at least one contact pad and an upper passivation layer having at least one opening formed therein exposing a portion of the contact pad. At least one patterned and etched polymer layer is formed on a portion of the contact pad. At least one patterned and etched conductive metal layer is formed above the polymer layer and is aligned therewith. And at least one layer of solder material having a solder height is provided above the conductive metal layer, the layer of solder is aligned with the conductive metal layer, the layer of solder is thereafter reflown thereby creating a solder ball.

摘要翻译： 提供了用于半导体器件封装的焊接凸块结构。 在一个实施例中，焊料凸块结构包括半导体衬底，所述衬底具有至少一个接触焊盘和具有形成在其中的至少一个开口的上钝化层，其暴露接触焊盘的一部分。 在接触垫的一部分上形成至少一个图案化和蚀刻的聚合物层。 在聚合物层之上形成至少一个图案化和蚀刻的导电金属层并与其对准。 并且在导电金属层的上方设置至少一层具有焊料高度的焊料材料，该焊料层与导电金属层对准，此后焊料层被回流，从而形成焊球。

公开(公告)号：US20060105560A1

公开(公告)日：2006-05-18

申请号：US10988528

申请日：2004-11-16

申请人： Li-Hsin Tseng ,  Gil Huang ,  Huei-Mei Yu ,  Chia-Jen Cheng ,  Ken Sun ,  Chien-Tung Yu ,  Blenny Chang ,  Chih Chan ,  Jian-Wen Luo ,  Owen Chen

发明人： Li-Hsin Tseng ,  Gil Huang ,  Huei-Mei Yu ,  Chia-Jen Cheng ,  Ken Sun ,  Chien-Tung Yu ,  Blenny Chang ,  Chih Chan ,  Jian-Wen Luo ,  Owen Chen

IPC分类号： H01L21/44

CPC分类号： H01L24/11 ,  H01L2224/0401 ,  H01L2224/05124 ,  H01L2224/05147 ,  H01L2224/05572 ,  H01L2224/13099 ,  H01L2924/0002 ,  H01L2924/01013 ,  H01L2924/01029 ,  H01L2924/01033 ,  H01L2924/01078 ,  H01L2924/01082 ,  H01L2924/014 ,  H01L2924/14 ,  H01L2924/30105 ,  H01L2224/05552 ,  H01L2924/00014 ,  H01L2924/013

摘要： A method for forming solder bumps (or solder balls after reflow) of improved height and reliability is provided. In one embodiment, a semiconductor substrate having at least one contact pad and an upper passivation layer having at least one opening formed therein exposing a portion of the contact pad is provided. A layer of under bump metal (UBM) is formed above the passivation layer and the contact pad. A first patterned and etched photoresist layer is provided above the UBM layer, the first patterned and etched photoresist layer defining at least one first opening therein. A second patterned and etched photoresist layer is provided above the first patterned and etched photoresist layer, the second patterned and etched photoresist layer defining at least one second opening therein, the second opening being wider than the first opening. A solder material is filled in the at least one first opening and substantially filled in the at least one second opening. The first and second photoresist layers are removed and the solder material is reflown to create a solder ball of increased height.

摘要翻译： 提供了一种改善高度和可靠性的形成焊料凸块（或回流焊球）的方法。 在一个实施例中，提供了具有至少一个接触焊盘和具有形成在其中的至少一个开口的上钝化层的半导体衬底，其暴露接触焊盘的一部分。 在钝化层和接触垫之上形成一层下凸块金属（UBM）。 第一图案化和蚀刻的光致抗蚀剂层设置在UBM层上方，第一图案化和蚀刻光刻胶层在其中限定至少一个第一开口。 第二图案化和蚀刻光刻胶层设置在第一图案化和蚀刻光刻胶层的上方，第二图案化和蚀刻光刻胶层在其中限定至少一个第二开口，第二开口比第一开口更宽。 焊料材料填充在至少一个第一开口中并且基本上填充在至少一个第二开口中。 去除第一和第二光致抗蚀剂层，并且焊料材料被重新喷射以产生增加的高度的焊球。

公开(公告)号：US07122458B2

公开(公告)日：2006-10-17

申请号：US10896831

申请日：2004-07-22

申请人： Chia-Jen Cheng ,  Hui-Mei Yu ,  Li-Hsin Tseng ,  Tzu-Han Lin ,  Ching-Chiang Wu ,  Chun-Yen Lo ,  Li-Chuan Huang ,  Boe Su

发明人： Chia-Jen Cheng ,  Hui-Mei Yu ,  Li-Hsin Tseng ,  Tzu-Han Lin ,  Ching-Chiang Wu ,  Chun-Yen Lo ,  Li-Chuan Huang ,  Boe Su

IPC分类号： H01L21/44

CPC分类号： H01L24/12 ,  H01L23/3114 ,  H01L23/525 ,  H01L23/53238 ,  H01L24/11 ,  H01L2224/0231 ,  H01L2224/0401 ,  H01L2224/05147 ,  H01L2224/05166 ,  H01L2224/05171 ,  H01L2224/13099 ,  H01L2924/01006 ,  H01L2924/01013 ,  H01L2924/01015 ,  H01L2924/01022 ,  H01L2924/01024 ,  H01L2924/01029 ,  H01L2924/01033 ,  H01L2924/01075 ,  H01L2924/01076 ,  H01L2924/01078 ,  H01L2924/01079 ,  H01L2924/014 ,  H01L2924/04941 ,  H01L2924/14 ,  H01L2924/00014

摘要： A method for fabricating a pad redistribution layer. First, at least one bonding pad exposed by a first passivation layer is provided. A diffusion barrier layer and a seed layer are then formed over the first passivation layer and the bonding pad. A patterned mask layer is then formed over the seed layer to expose a portion thereof over the bonding pad, and a metal layer is then formed thereon. A sacrificial layer is then formed over the substrate and the sacrificial layer over the patterned mask layer is removed. The conductive film exposed by the metal layer and the remaining sacrificial layer is then removed, leaving a pad redistribution layer for the bonding pad.

摘要翻译： 一种制造衬垫再分布层的方法。 首先，提供由第一钝化层暴露的至少一个接合焊盘。 然后在第一钝化层和接合焊盘上形成扩散阻挡层和种子层。 然后在种子层上形成图案化的掩模层，以将其部分暴露在焊盘上，然后在其上形成金属层。 然后在衬底上形成牺牲层，并去除图案化掩模层上的牺牲层。 然后去除由金属层和剩余的牺牲层暴露的导电膜，留下用于焊盘的焊盘再分布层。

公开(公告)号：US20060055035A1

公开(公告)日：2006-03-16

申请号：US10938594

申请日：2004-09-13

申请人： Tzu-Han Lin ,  Huei-Mei Yu ,  Chia-Jen Cheng ,  Chun-Yen Lo ,  Li-Hsin Tseng ,  Boe Su ,  Simon Lu

发明人： Tzu-Han Lin ,  Huei-Mei Yu ,  Chia-Jen Cheng ,  Chun-Yen Lo ,  Li-Hsin Tseng ,  Boe Su ,  Simon Lu

IPC分类号： H01L23/48

CPC分类号： H01L24/13 ,  H01L24/05 ,  H01L2224/02125 ,  H01L2224/05001 ,  H01L2224/05007 ,  H01L2224/05022 ,  H01L2224/05026 ,  H01L2224/05027 ,  H01L2224/0508 ,  H01L2224/05124 ,  H01L2224/05147 ,  H01L2224/05562 ,  H01L2224/05572 ,  H01L2224/0558 ,  H01L2224/056 ,  H01L2224/13 ,  H01L2224/13099 ,  H01L2924/01006 ,  H01L2924/01013 ,  H01L2924/01029 ,  H01L2924/01033 ,  H01L2924/01078 ,  H01L2924/01082 ,  H01L2924/01084 ,  H01L2924/01322 ,  H01L2924/014 ,  H01L2924/14 ,  H01L2924/30105 ,  H01L2924/00 ,  H01L2924/00014 ,  H01L2924/00012

摘要： Solder bump structures for semiconductor device packaging is provided. In one embodiment, a solder bump structure comprises a semiconductor substrate, the substrate has at least one contact pad and an upper passivation layer having at least one opening formed therein exposing a portion of the contact pad. At least one patterned and etched polymer layer is formed on a portion of the contact pad. At least one patterned and etched conductive metal layer is formed above the polymer layer and is aligned therewith. And at least one layer of solder material having a solder height is provided above the conductive metal layer, the layer of solder is aligned with the conductive metal layer, the layer of solder is thereafter reflown thereby creating a solder ball.

摘要翻译： 提供了用于半导体器件封装的焊接凸块结构。 在一个实施例中，焊料凸块结构包括半导体衬底，所述衬底具有至少一个接触焊盘和具有形成在其中的至少一个开口的上钝化层，其暴露接触焊盘的一部分。 在接触垫的一部分上形成至少一个图案化和蚀刻的聚合物层。 在聚合物层之上形成至少一个图案化和蚀刻的导电金属层并与其对准。 并且在导电金属层的上方设置至少一层具有焊料高度的焊料材料，该焊料层与导电金属层对准，此后焊料层被回流，从而形成焊球。

公开(公告)号：US08669658B2

公开(公告)日：2014-03-11

申请号：US11782384

申请日：2007-07-24

申请人： Mon-Chin Tsai ,  Hsiu-Mei Yo ,  Chien-Min Lin ,  Chia-Jen Cheng ,  Li-Hsin Tseng

发明人： Mon-Chin Tsai ,  Hsiu-Mei Yo ,  Chien-Min Lin ,  Chia-Jen Cheng ,  Li-Hsin Tseng

IPC分类号： H01L23/48

CPC分类号： H01L23/66 ,  H01L23/3114 ,  H01L24/03 ,  H01L24/05 ,  H01L24/13 ,  H01L2224/03462 ,  H01L2224/0401 ,  H01L2224/05559 ,  H01L2224/05647 ,  H01L2224/131 ,  H01L2224/94 ,  H01L2924/01013 ,  H01L2924/01023 ,  H01L2924/01029 ,  H01L2924/01033 ,  H01L2924/01078 ,  H01L2924/014 ,  H01L2924/10253 ,  H01L2924/14 ,  H01L2924/3025 ,  H01L2924/00014 ,  H01L2224/03 ,  H01L2924/01014 ,  H01L2924/00

摘要： A structure, a system, and a method for manufacture of crosstalk-free wafer level chip scale packaging (WLCSP) structure for high frequency applications is provided. An illustrative embodiment comprises a substrate on which various layers and structures form circuitry, a signal pin formed on the substrate and coupled with the circuitry, a ground ring encircling the signal pin, and a grounded solder bump coupled to the ground ring.

摘要翻译： 提供了用于高频应用的用于制造无串扰晶片级芯片级封装（WLCSP）结构的结构，系统和方法。 示例性实施例包括其上各种层和结构形成电路的衬底，形成在衬底上并与电路耦合的信号引脚，环绕信号引脚的接地环和耦合到接地环的接地焊料凸块。

公开(公告)号：US07459386B2

公开(公告)日：2008-12-02

申请号：US10988528

申请日：2004-11-16

申请人： Li-Hsin Tseng ,  Gil Huang ,  Huei-Mei Yu ,  Chia-Jen Cheng ,  Ken Sun ,  Chien-Tung Yu ,  Blenny Chang ,  Chih Yang Chan ,  Jian-Wen Luo ,  Owen Chen

发明人： Li-Hsin Tseng ,  Gil Huang ,  Huei-Mei Yu ,  Chia-Jen Cheng ,  Ken Sun ,  Chien-Tung Yu ,  Blenny Chang ,  Chih Yang Chan ,  Jian-Wen Luo ,  Owen Chen

IPC分类号： H01L21/44

CPC分类号： H01L24/11 ,  H01L2224/0401 ,  H01L2224/05124 ,  H01L2224/05147 ,  H01L2224/05572 ,  H01L2224/13099 ,  H01L2924/0002 ,  H01L2924/01013 ,  H01L2924/01029 ,  H01L2924/01033 ,  H01L2924/01078 ,  H01L2924/01082 ,  H01L2924/014 ,  H01L2924/14 ,  H01L2924/30105 ,  H01L2224/05552 ,  H01L2924/00014 ,  H01L2924/013

摘要： A method for forming solder bumps (or solder balls after reflow) of improved height and reliability is provided. In one embodiment, a semiconductor substrate having at least one contact pad and an upper passivation layer having at least one opening formed therein exposing a portion of the contact pad is provided. A layer of under bump metal (UBM) is formed above the passivation layer and the contact pad. A first patterned and etched photoresist layer is provided above the UBM layer, the first patterned and etched photoresist layer defining at least one first opening therein. A second patterned and etched photoresist layer is provided above the first patterned and etched photoresist layer, the second patterned and etched photoresist layer defining at least one second opening therein, the second opening being wider than the first opening. A solder material is filled in the at least one first opening and substantially filled in the at least one second opening. The first and second photoresist layers are removed and the solder material is reflown to create a solder ball of increased height.

摘要翻译： 提供了一种改善高度和可靠性的形成焊料凸块（或回流焊球）的方法。 在一个实施例中，提供了具有至少一个接触焊盘和具有形成在其中的至少一个开口的上钝化层的半导体衬底，其暴露接触焊盘的一部分。 在钝化层和接触垫之上形成一层下凸块金属（UBM）。 第一图案化和蚀刻的光致抗蚀剂层设置在UBM层上方，第一图案化和蚀刻光刻胶层在其中限定至少一个第一开口。 第二图案化和蚀刻光刻胶层设置在第一图案化和蚀刻光刻胶层的上方，第二图案化和蚀刻光刻胶层在其中限定至少一个第二开口，第二开口比第一开口更宽。 焊料材料填充在至少一个第一开口中并且基本上填充在至少一个第二开口中。 去除第一和第二光致抗蚀剂层，并且焊料材料被重新喷射以产生增加的高度的焊球。

公开(公告)号：US06696356B2

公开(公告)日：2004-02-24

申请号：US10038847

申请日：2001-12-31

申请人： Li-Hsin Tseng ,  Hsiu-Mei Yu ,  Ta-Yang Lin ,  Fang-Chung Liu ,  Kai-Ming Ching ,  Tung-Heng Shie

发明人： Li-Hsin Tseng ,  Hsiu-Mei Yu ,  Ta-Yang Lin ,  Fang-Chung Liu ,  Kai-Ming Ching ,  Tung-Heng Shie

IPC分类号： H01L2144

CPC分类号： H01L24/05 ,  H01L24/02 ,  H01L24/03 ,  H01L24/11 ,  H01L24/12 ,  H01L2224/03912 ,  H01L2224/0401 ,  H01L2224/05624 ,  H01L2224/05647 ,  H01L2224/1147 ,  H01L2224/13023 ,  H01L2224/13099 ,  H01L2924/01005 ,  H01L2924/01006 ,  H01L2924/01011 ,  H01L2924/01013 ,  H01L2924/01014 ,  H01L2924/01022 ,  H01L2924/01023 ,  H01L2924/01024 ,  H01L2924/01027 ,  H01L2924/01029 ,  H01L2924/01033 ,  H01L2924/01042 ,  H01L2924/0105 ,  H01L2924/01078 ,  H01L2924/01079 ,  H01L2924/01082 ,  H01L2924/01322 ,  H01L2924/014 ,  H01L2924/14 ,  H01L2924/30105 ,  H01L2924/30107 ,  H01L2924/00014

摘要： A method of forming a bump on a substrate such as a semiconductor wafer or flip chip without producing metal ribbon residue. The method includes the step of providing a semiconductor device having a contact pad and having an upper passivation layer and an opening formed in the upper passivation layer exposing a portion of the contact pad. An under bump metallurgy is deposited over the upper passivation layer and the contact pad. A photoresist layer is deposited over the under bump metallurgy. The photoresist layer is a dry film photoresist. The photoresist layer is patterned to provide an opening in the photoresist layers down to the under bump metallurgy and aligned with the contact pad. Additional energy is applied to the photoresist layer to improve the adhesion of the photoresist layer to the under bump metallurgy. An electrically conductive material is deposited into the opening formed in the photoresist layers and overlying the under bump metallurgy and aligned with contact pad. Thereafter the remaining portions of the photoresist layer are removed. The electrically conductive material is reflown to provide a bump on the semiconductor device.

摘要翻译： 在半导体晶片或倒装芯片等基板上形成凸块而不产生金属带残留物的方法。 该方法包括提供具有接触焊盘并具有上钝化层和形成在上钝化层中的开口的半导体器件的步骤，暴露接触焊盘的一部分。 在上钝化层和接触焊盘上沉积凸块下冶金。 光致抗蚀剂层沉积在凸块下的金属上。 光致抗蚀剂层是干膜光致抗蚀剂。 光致抗蚀剂层被图案化以在光致抗蚀剂层中提供直到下凸块冶金并且与接触垫对准的开口。 对光致抗蚀剂层施加额外的能量以提高光致抗蚀剂层对凸块下金属的粘合性。 将导电材料沉积在形成在光致抗蚀剂层中的开口中，并且覆盖凸块下方的金属并与接触焊盘对准。 此后，除去光致抗蚀剂层的其余部分。 导电材料被重熔以在半导体器件上提供凸块。