Electron gun
    2.
    发明授权
    Electron gun 有权
    电子枪

    公开(公告)号:US08669535B2

    公开(公告)日:2014-03-11

    申请号:US13322025

    申请日:2010-04-14

    IPC分类号: H01J1/50

    摘要: The present invention has an object to provide a cold cathode field-emission electron gun with low aberration, to thereby provide a high-brightness electron gun even in the case of a large current. The present invention provides a field-emission electron gun which extracts an electron beam from a cathode and converges the extracted electron beam, the field-emission electron gun including: a magnetic field lens which is provided such that the cathode is disposed inside of a magnetic field of the lens; and an extraction electrode for extracting electrons from the cathode, the extraction electrode being formed into a cylindrical shape without an aperture structure. The present invention can provide an electron gun having a function of converging an electron beam using a magnetic field, the electron gun which is capable of reducing an incidental electrostatic lens action and has small aberration and high brightness.

    摘要翻译: 本发明的目的是提供一种具有低像差的冷阴极场致发射电子枪,从而即使在大电流的情况下也提供高亮度电子枪。 本发明提供一种场致发射电子枪,其从阴极提取电子束并使所提取的电子束会聚,该场发射电子枪包括:磁场透镜,其被设置为使得阴极设置在磁性 镜头领域; 以及用于从阴极提取电子的引出电极,所述引出电极形成为没有孔结构的圆筒形状。 本发明可以提供一种电子枪,其具有使用磁场会聚电子束的功能,该电子枪能够减少偶然的静电透镜作用并且具有小的像差和高亮度。

    ELECTRON GUN
    3.
    发明申请
    ELECTRON GUN 有权
    电子枪

    公开(公告)号:US20120062094A1

    公开(公告)日:2012-03-15

    申请号:US13322025

    申请日:2010-04-14

    IPC分类号: H01J29/48 H01J29/00

    摘要: The present invention has an object to provide a cold cathode field-emission electron gun with low aberration, to thereby provide a high-brightness electron gun even in the case of a large current. The present invention provides a field-emission electron gun which extracts an electron beam from a cathode and converges the extracted electron beam, the field-emission electron gun including: a magnetic field lens which is provided such that the cathode is disposed inside of a magnetic field of the lens; and an extraction electrode for extracting electrons from the cathode, the extraction electrode being formed into a cylindrical shape without an aperture structure. The present invention can provide an electron gun having a function of converging an electron beam using a magnetic field, the electron gun which is capable of reducing an incidental electrostatic lens action and has small aberration and high brightness.

    摘要翻译: 本发明的目的是提供一种具有低像差的冷阴极场致发射电子枪,从而即使在大电流的情况下也提供高亮度电子枪。 本发明提供一种场致发射电子枪,其从阴极提取电子束并使所提取的电子束会聚,该场发射电子枪包括:磁场透镜,其被设置为使得阴极设置在磁性 镜头领域; 以及用于从阴极提取电子的引出电极,所述引出电极形成为没有孔结构的圆筒形状。 本发明可以提供一种电子枪,其具有使用磁场会聚电子束的功能,该电子枪能够减少偶然的静电透镜作用并且具有小的像差和高亮度。

    Beam irradiation device
    4.
    发明授权
    Beam irradiation device 失效
    光束照射装置

    公开(公告)号:US07351944B2

    公开(公告)日:2008-04-01

    申请号:US11283999

    申请日:2005-11-22

    摘要: In a beam irradiation device of the present invention, laser beams emitted from a semiconductor laser impinge on an irradiation lens supported by a lens actuator. The laser beams that have passed through the irradiation lens change in outgoing angle in the direction of a y-z plane as the lens actuator is driven. A laser beam scan in the target region is thus performed. A part of the laser beams that have passed through the irradiation lens is reflected and separated by a beam splitter. The separated beams are converged on a PSD through a converging lens. A DSP control circuit monitors a scan position of the laser beams that have passed through the irradiation lens based on a signal from the PSD. When an irradiation position has deviated from a scan trajectory, the DSP control circuit controls an actuator driving circuit to draw the irradiation position back onto the scan trajectory. This beam irradiation device can realize a smooth and stable beam scan operation with a simple construction.

    摘要翻译: 在本发明的光束照射装置中,从半导体激光器发射的激光束照射在由透镜致动器支撑的照射透镜上。 当透镜致动器被驱动时,穿过照射透镜的激光束在y-z平面的方向上以出射角度改变。 因此执行目标区域中的激光束扫描。 已经通过照射透镜的激光束的一部分被分束器反射和分离。 分离的光束通过会聚透镜会聚在PSD上。 DSP控制电路基于来自PSD的信号监视已经通过照射透镜的激光束的扫描位置。 当照射位置偏离扫描轨迹时,DSP控制电路控制致动器驱动电路将照射位置反射回扫描轨迹。 该光束照射装置能够以简单的结构实现平稳稳定的束扫描操作。

    Method and apparatus for scanning transmission electron microscopy
    6.
    发明授权
    Method and apparatus for scanning transmission electron microscopy 失效
    扫描透射电子显微镜的方法和装置

    公开(公告)号:US06531697B1

    公开(公告)日:2003-03-11

    申请号:US09259334

    申请日:1999-03-01

    IPC分类号: H01J3700

    摘要: A scanning transmission electron microscope (STEM) has an electron source for generating a primary electron beam and an electron illuminating lens system for converging the primary electron beam from the electron source onto a specimen for illumination. An electron deflecting system is provided for scanning the specimen with the primary electron beam. The STEM also has a scattered electron detector for detecting scattered electrons transmitted through the specimen. A projection lens system projects the scattered electrons onto a detection surface of the scattered electron detector. An image displaying device displays the scanning transmission electron microscope image of the specimen using a detection signal from the scattered electron detector. A detection angle changing device for establishes the range of the scattering angle of the scattered electrons detected by the scattered electron detector. This structure enhances the contrast of a desired portion of the specimen under observation for a scanning transmitted image by selective establishment of detection angle ranges for the scattered electron detector.

    摘要翻译: 扫描透射电子显微镜(STEM)具有用于产生一次电子束的电子源和用于将来自电子源的一次电子束聚焦到用于照明的样本上的电子照明透镜系统。 提供电子偏转系统用于用一次电子束扫描样本。 STEM还具有散射电子检测器,用于检测通过样品传播的散射电子。 投影透镜系统将散射的电子投射到散射电子检测器的检测表面上。 图像显示装置使用来自散射电子检测器的检测信号来显示样本的扫描透射电子显微镜图像。 一种用于确定由散射电子检测器检测的散射电子的散射角的范围的检测角度改变装置。 该结构通过选择性地建立散射电子检测器的检测角度范围,增强了扫描透射图像观察下的样本的期望部分的对比度。

    Apparatus for introducing oxygen gas
    8.
    发明授权
    Apparatus for introducing oxygen gas 失效
    用于引入氧气的设备

    公开(公告)号:US4772821A

    公开(公告)日:1988-09-20

    申请号:US911786

    申请日:1986-09-26

    CPC分类号: H01J37/073 B01J3/02 H01J37/18

    摘要: An oxygen gas introducing apparatus for introducing oxygen gas into a vacuum electron optical column of an electron beam apparatus having an electron beam source as a cathode that needs the oxygen gas is disclosed which comprises a silver cylinder having a closed end and provided on a side wall of the vacuum electron optical column so as to project from an outside atmospheric side to an interior of the vacuum electron optical column, and a heating member electrically insulated and disposed within an interior of the silver cylinder which interior is in communication with the atmosphere.

    摘要翻译: 公开了一种氧气引入装置,用于将氧气引入具有电子束装置的电子束装置的真空电子光学柱中,所述电子束装置具有需要氧气的阴极,该电子束装置包括具有闭合端的银圆筒并设置在侧壁 的真空电子光学柱从外部大气侧突出到真空电子光学柱的内部;以及加热构件,其电绝缘并设置在与气氛连通的银圆筒内部。

    Electron beam metrology system
    9.
    发明授权
    Electron beam metrology system 失效
    电子束计量系统

    公开(公告)号:US4751384A

    公开(公告)日:1988-06-14

    申请号:US13534

    申请日:1987-02-11

    IPC分类号: G01B15/00 H01J37/28 G01N23/00

    CPC分类号: H01J37/28 G01B15/00

    摘要: An electron beam metrology system for measuring the width of a pattern on a surface of a sample in such a manner that the surface of the sample is scanned with an electron beam, secondary electrons emitted from the surface are detected to obtain a detection signal, and the width of the pattern is measured by using the detection signal, is disclosed in which a pair of detectors are disposed symmetrically with respect to the optical axis of the electron beam in a scanning direction thereof, a ratio of one of the output signals of the detectors to the other output signal and a ratio of the other output signal to the one output signal are formed, and a sum signal indicative of the sum of two ratios is produced, to be used for measuring the width of the pattern correctly and accurately, without being affected by a change in pattern material.

    摘要翻译: 一种用于以样品表面用电子束扫描的方式测量样品表面上的图案的宽度的电子束计量系统,检测从表面发射的二次电子以获得检测信号,以及 通过使用检测信号测量图案的宽度,公开了一对检测器相对于电子束的光轴在其扫描方向上对称设置,其中一个检测器的输出信号 形成与其他输出信号的检测器和其他输出信号与一个输出信号的比率,并且产生指示两个比率之和的和信号,以用于正确且精确地测量图案的宽度, 而不受图案材料变化的影响。

    Electron beam pattern line width measurement system
    10.
    发明授权
    Electron beam pattern line width measurement system 失效
    电子束图案线宽测量系统

    公开(公告)号:US4740693A

    公开(公告)日:1988-04-26

    申请号:US807681

    申请日:1985-12-11

    CPC分类号: H01J37/28 G01B15/00 G01B7/02

    摘要: Disclosed is an electron beam pattern line width measurement system wherein an electron beam is converged to a fine spot, the electron beam is scanned on a sample formed with a pattern to-be-measured, secondary electrons generated from a surface of the sample by the projection of the electron beam are detected, and the detected signal is processed to determine a line width of the pattern to-be-measured, comprising a secondary electron detector which detects a signal corresponding to an amount of all secondary electrons generated by the scanning, and a secondary electron energy analyzer which selectively detects a signal corresponding to an amount of secondary electrons of specified energy. With the electron beam pattern line width measurement system, it becomes possible to precisely detect a pattern boundary region defined by different sorts of materials in a stepped structure of a small level difference not having been measurable with a prior-art electron beam pattern line width measurement system.

    摘要翻译: 公开了一种电子束图案线宽度测量系统,其中电子束会聚到细微点,电子束在形成有要测量图案的样品上扫描,从样品表面产生的二次电子被 检测电子束的投影,并且处理检测信号以确定要测量的图案的线宽,包括二次电子检测器,其检测对应于由扫描产生的所有二次电子的量的信号, 以及二次电子能量分析器,其选择性地检测与特定能量的二次电子量对应的信号。 利用电子束图案线宽度测量系统,可以精确地检测由现有技术的电子束图案线宽度测量不能测量的小电平差的阶梯式结构中由不同种类的材料限定的图案边界区域 系统。