利索-全球专利检索

  1. 登录
  2. 注册

搜索结果

15 条记录 (耗时 0.02 秒)

    Image pickup device integrated with lens, method and apparatus for manufacturing the same
    4.
    发明申请
    Image pickup device integrated with lens, method and apparatus for manufacturing the same 审中-公开
    与其制造的镜头，方法和装置集成的图像拾取装置

    公开(公告)号：US20050036057A1

    公开(公告)日：2005-02-17

    申请号：US10898522

    申请日：2004-07-23

    申请人： Kazuya Ushirokawa ,  Isamu Aokura ,  Koujirou Nakamura ,  Hidenobu Nishikawa ,  Tomonori Itoh

    发明人： Kazuya Ushirokawa ,  Isamu Aokura ,  Koujirou Nakamura ,  Hidenobu Nishikawa ,  Tomonori Itoh

    IPC分类号： H04N5/225

    CPC分类号： H04N5/2254

    摘要： The present invention of a manufacturing method and a apparatus for manufacturing an image pickup device integrated with lens in which a lens holding part having an optical lens is automatically adjusted with respect to a package on which an imaging chip is mounted so that an optical image from an optical axis adjusting pattern is formed on the image plane of the imaging chip and the lens holding part and the package are fixed to each other with an adhesive used therebetween as a position adjusting member at the adjusted position, and an image pickup device integrated with lens thus manufactured having excellent properties.

    摘要翻译： 本发明的一种制造方法和用于制造与透镜一体化的图像拾取装置的装置，其中具有光学透镜的透镜保持部分相对于其上安装有成像芯片的封装被自动调整，使得来自 在成像芯片的图像平面上形成光轴调整图案，并且透镜保持部分和包装件之间用粘合剂彼此固定，作为调节位置处的位置调整部件，并且将图像拾取装置与 由此制造的具有优异性能的透镜。

    Sputtering system
    6.
    发明授权
    Sputtering system 失效
    溅射系统

    公开(公告)号：US06342139B1

    公开(公告)日：2002-01-29

    申请号：US09495293

    申请日：2000-02-01

    申请人： Isamu Aokura ,  Tomohiro Okumura ,  Naoki Suzuki

    发明人： Isamu Aokura ,  Tomohiro Okumura ,  Naoki Suzuki

    IPC分类号： C23C1435

    CPC分类号： H01J37/321 ,  C23C14/358 ,  H01J37/3408

    摘要： A sputtering system includes a vacuum chamber, a sputtering electrode provided in the vacuum chamber, a target supported on the sputtering electrode with a front surface of the target and a substrate disposed in the vacuum chamber so as to be opposed to each other. A high-frequency or DC power source supplies a high-frequency or DC power to the sputtering electrode to generate plasma on the target, and an antenna is provided for generating an electromagnetic wave and is disposed outside the vacuum chamber and near the target. An electromagnetic-wave inlet window for introducing into the vacuum chamber an electromagnetic wave generated from the antenna is provided in a wall of the vacuum chamber.

    摘要翻译： 溅射系统包括真空室，设置在真空室中的溅射电极，具有靶的前表面的溅射电极上支撑的靶和设置在真空室中的基板以彼此相对。 高频或直流电源向溅射电极提供高频或直流电力，以在目标上产生等离子体，并且提供用于产生电磁波的天线，并设置在真空室外部和靶附近。 在真空室的壁上设置有用于将从天线产生的电磁波引入真空室的电磁波入口窗口。

    Laminated magnetic head core
    8.
    发明授权
    Laminated magnetic head core 失效
    层压磁头芯

    公开(公告)号：US5600520A

    公开(公告)日：1997-02-04

    申请号：US441947

    申请日：1995-05-16

    申请人： Isamu Aokura ,  Kumio Nago ,  Hitoshi Yamanishi ,  Hiroshi Sakakima ,  Youichi Ohnishi

    发明人： Isamu Aokura ,  Kumio Nago ,  Hitoshi Yamanishi ,  Hiroshi Sakakima ,  Youichi Ohnishi

    IPC分类号： G11B5/31 ,  G11B5/127 ,  G11B5/147 ,  H01F10/14

    CPC分类号： G11B5/147 ,  G11B5/3116 ,  Y10S428/90 ,  Y10T428/1129 ,  Y10T428/24975 ,  Y10T428/265

    摘要： In a laminated magnetic head core, Fe--M--N system soft magnetic thin films (M being at least one element selected from the group consisting of Ta, Nb, Zr, and Hf) and non-magnetic insulating films are alternately laminated. Each of the soft magnetic thin films is 0.2-10 .mu.m thick. Each of the non-magnetic insulating films is 10 through 1000 nm thick. One of the soft magnetic thin films shows high magnetic permeability in a different direction from that of an adjacent soft magnetic thin film via the non-magnetic insulating film within a film surface of the soft magnetic thin film.

    摘要翻译： 在层叠磁头芯中，交替层叠Fe-M-N系软磁薄膜（M为选自Ta，Nb，Zr和Hf中的至少一种元素）和非磁性绝缘膜。 每个软磁薄膜的厚度为0.2-10μm。 每个非磁性绝缘膜的厚度为10〜1000nm。 一个软磁性薄膜通过软磁性薄膜的膜表面内的非磁性绝缘膜，在与相邻的软磁性薄膜的方向不同的方向上表现出高的磁导率。

    Sputtering apparatus
    9.
    发明授权
    Sputtering apparatus 失效
    溅射装置

    公开(公告)号：US06217714B1

    公开(公告)日：2001-04-17

    申请号：US08672660

    申请日：1996-06-28

    申请人： Munekazu Nishihara ,  Teiichi Kimura ,  Isamu Aokura

    发明人： Munekazu Nishihara ,  Teiichi Kimura ,  Isamu Aokura

    IPC分类号： C23C1434

    CPC分类号： C23C14/352 ,  H01J37/3408

    摘要： In a sputtering apparatus, in a vacuum chamber having a gas supply and a gas discharge functions, a substrate is set to a supporting part therefor and a target is disposed at an electrode connected with a power source within a plane opposite to the substrate, so as to form a film while holding the substrate in a fixed state to the target. The electrode is divided into three or more electrode parts, the target is divided and disposed on the three or more electrode parts within the plane, and a magnet is arranged for each divided target at a position where a line of magnetic force on a surface of the each target is generated by each magnet.

    摘要翻译： 在溅射装置中，在具有气体供给和气体放电功能的真空室中，将基板设定为支撑部，并且在与基板相反的平面内的与电源连接的电极上设置靶，因此 以便在将固定状态的基板保持在目标上的同时形成膜。 电极被分为三个或更多个电极部分，目标被分割并设置在平面内的三个或更多个电极部分上，并且在每个分割的靶上布置磁体， 每个目标由每个磁体产生。