-
公开(公告)号：US06879393B2
公开(公告)日：2005-04-12
申请号：US09920450
申请日：2001-08-01
IPC分类号： G01B11/30 , G01N21/896 , G01N21/956 , G03F1/26 , G03F1/68 , G03F1/84 , G01N21/00
CPC分类号： G01N21/95607 , G01N2021/95676 , G03F1/26 , G03F1/30 , G03F1/84
摘要： The present invention relates to a defect inspection apparatus for a phase shift mask that is capable of detecting phase shifter defects that cannot be detected by conventional inspection techniques, by a simple method using an optical method and a comparison of electric signals. In a defect inspection apparatus for a phase shift mask having a phase shifter pattern provided on a mask transparent substrate 1, after the phase shifter pattern has been formed, a phase shifter defect inspection is performed from the mask transparent substrate 1 side of the phase shift mask 1. To perform the defect inspection, light 12 is applied to the phase shift mask 1 from the mask transparent substrate 1 side thereof, and reflection images of at least two different phase shifter pattern fabricated regions are captured by photoelectric conversion light-receiving elements 15a and 15b. The respective image signals 17 and 18 of the reflection images are compared with each other to detect a defect on the mask from the difference between the signals.
摘要翻译： 本发明涉及一种用于通过使用光学方法的简单方法和电信号的比较来检测常规检查技术无法检测的移相器缺陷的相移掩模的缺陷检查装置。 在具有设置在掩模透明基板1上的移相器图案的相移掩模的缺陷检查装置中，在形成移相器图案之后，从相移的掩模透明基板1侧进行移相器缺陷检查 掩模1.为了进行缺陷检查，从掩模透明基板1侧将光12施加到相移掩模1，并且通过光电转换光接收元件捕获至少两个不同的移相器图案制造区域的反射图像 15a和15b。 将反射图像的各图像信号17和18相互比较，以从信号之间的差异检测掩模上的缺陷。
-
2.发明授权Method and apparatus for observing or processing and analyzing using a charged beam 有权使用带电束观察或处理和分析的方法和装置公开(公告)号：US06476387B1
公开(公告)日：2002-11-05
申请号：US09311268
申请日：1999-05-14
申请人： Norimasa Nishimura , Akira Shimase , Junzou Azuma , Yuichi Hamamura , Michinobu Mizumura , Yasuhiro Koizumi , Hidemi Koike
发明人： Norimasa Nishimura , Akira Shimase , Junzou Azuma , Yuichi Hamamura , Michinobu Mizumura , Yasuhiro Koizumi , Hidemi Koike
IPC分类号： H01J3730
CPC分类号： H01J37/28 , H01J2237/0047 , H01J2237/2482
摘要： In a method for observing or processing and analyzing the surface of a sample by irradiating a charged beam on the sample covered at least partially by an insulator film, an ultraviolet light is irradiated possibly as pulse on the sample (substrate), thereby transforming the insulator into a conductive material due to the photoconductivity effect, thereby transforming the surface of the sample (substrate) into a conductive material, so that charged particles are grounded from a grounded portion in order to prevent the charged beam from being repulsed due to charged particles of the irradiated charged beam accumulated in the insulator formed on the surface of the sample (substrate).
摘要翻译： 在通过在至少部分地被绝缘体膜覆盖的样品上照射带电束的样品的表面的方法中，紫外光可能作为脉冲照射在样品（衬底）上，从而将绝缘体 由于光电导效应而成为导电材料，从而将样品（基板）的表面转变为导电材料，使得带电粒子从接地部分接地，以防止带电粒子由于带电粒子而被斥力 被照射的带电光束积聚在形成在样品（基板）表面上的绝缘体中。
-
3.发明授权Method of processing a sample using a charged beam and reactive gases and system employing the same 失效使用带电束和反应性气体处理样品的方法及采用该方法的系统
公开(公告)号：US5447614A
公开(公告)日：1995-09-05
申请号：US260907
申请日：1994-06-15
申请人： Yuuichi Hamamura , Satoshi Haraichi , Akira Shimase , Junzou Azuma , Fumikazu Itoh , Toshio Yamada , Yasuhiro Koizumi , Michinobu Mizumura
发明人： Yuuichi Hamamura , Satoshi Haraichi , Akira Shimase , Junzou Azuma , Fumikazu Itoh , Toshio Yamada , Yasuhiro Koizumi , Michinobu Mizumura
IPC分类号： H01J37/244 , H01J37/317 , C23C14/46 , B23K15/00
CPC分类号： H01J37/317 , H01J37/244 , H01J37/3056 , H01J2237/006 , H01J2237/2443 , H01J2237/24435 , H01J2237/304 , H01J2237/31744
摘要： A method of processing a sample using a charged beam and reactive gases and a system employing the same, the method and system being able to perform the reactive etching and the beam assisted deposition using a charged particle detector free from the degradation of the performance due to the reactive gas. The system is designed in such a way that a shutter mechanism is provided in the form of the charged particle detector, and a chamber for accommodating the charged particle detector can be evacuated. In the observation of the sample, the charged particle detector is turned on to open the shutter mechanism, and in the processing of the sample, the charged particle detector is turned off or left as it is to shut the shutter mechanism to evacuate the inside of the charged particle detector.
摘要翻译： 使用带电束和反应性气体处理样品的方法以及使用其的系统的方法和方法，所述方法和系统能够执行反应性蚀刻和使用带电粒子检测器进行的束辅助沉积，其不会由于 反应气体。 该系统设计成使得以带电粒子检测器的形式提供快门机构，并且可以抽出用于容纳带电粒子检测器的室。 在样品的观察中，带电粒子检测器被打开以打开快门机构，并且在样品的处理中，带电粒子检测器被关闭或离开以关闭快门机构以将内部 带电粒子检测器。
-
公开(公告)号：US20070039545A1
公开(公告)日：2007-02-22
申请号：US10554901
申请日：2004-05-25
CPC分类号： C23C14/205 , B05D1/62 , B05D5/068 , C23C14/0036 , C23C14/0089 , C23C14/352 , C23C14/562 , C23C16/45557 , C23C16/509
摘要： The present invention provides film formation systems and film formation methods. A high frequency (HF) electric power supply (11) applies a high frequency voltage to a cathode (5) which is provided, at its rear surface, with a permanent magnet (10), thereby to generate a reactive-mode plasma, and film formation by plasma polymerization is performed by the use of the generated reactive-mode plasma. The pressure of a plasma source gas in a vacuum chamber (1) is regulated, thereby to generate not a reactive-mode plasma but a metallic-mode plasma. The cathode (5) as a target is subjected to sputtering by the generated metallic-mode plasma, and film formation by magnetron sputtering is carried out.
摘要翻译： 本发明提供成膜体系和成膜方法。 高频（HF）电源（11）向在其后表面设置有永磁体（10）的阴极（5）施加高频电压，从而产生电抗等离子体，并且 通过使用所生成的反应型等离子体来进行通过等离子体聚合的膜形成。 调节真空室（1）中的等离子体源气体的压力，从而不产生反应型等离子体而是产生金属模式等离子体。 作为靶的阴极（5）通过所产生的金属模式等离子体进行溅射，并且通过磁控溅射进行成膜。
-
公开(公告)号：US06831413B2
公开(公告)日：2004-12-14
申请号：US10196267
申请日：2002-07-17
申请人： Hiroshi Kajiyama , Akira Katou , Kenichi Onisawa , Tetsuro Minemura , Kazuo Uetani , Yasushi Ihara , Shiro Takigawa , Kouichi Nose , Isao Tokomoto , Yasuhiro Koizumi
发明人： Hiroshi Kajiyama , Akira Katou , Kenichi Onisawa , Tetsuro Minemura , Kazuo Uetani , Yasushi Ihara , Shiro Takigawa , Kouichi Nose , Isao Tokomoto , Yasuhiro Koizumi
IPC分类号： H01J1749
摘要： A plasma display panel (PDP), consisting of a front panel (10) equipped with display electrodes (8) and a rear panel (4) equipped with address electrodes (3), that displays an image by causing discharge in a small discharge space formed between the two panels; wherein there are provided two layers of protective films (5, 6), made of metallic oxide, covering the dielectric layer (7) installed on the front panel (10); the outer, upper layer (6) being formed into a layer of material with a specific surface area of 20 m2/g or more and a film thickness of 1 &mgr;m or less, exhibiting a high discharge characteristic; and the inner, lower layer (5) being formed into a layer of material with a specific surface area of 10 m2/g or less and a film thickness of 1 &mgr;m or more, exhibiting a low water-adsorption characteristic.
摘要翻译： 一种等离子体显示面板（PDP），其由配备有显示电极（8）的前面板（10）和配备有寻址电极（3）的后面板（4）组成，其通过在小放电空间中放电而显示图像 两面板之间形成; 其中，设置有两层由金属氧化物制成的覆盖安装在前面板（10）上的电介质层（7）的保护膜（5,6）。 所述外层上层（6）形成比表面积为20m 2 / g以上且膜厚为1μm以下且呈现高放电特性的材料层; 并且所述内下层（5）形成为具有10m 2 / g以下的比表面积和1μm以上的膜厚的材料层，具有低的吸水特性。
-
公开(公告)号：US06579428B2
公开(公告)日：2003-06-17
申请号：US09963763
申请日：2001-09-26
申请人： Shirou Takigawa , Kouichi Nose , Yasuhiro Koizumi , Takanobu Hori , Yukio Miya
发明人： Shirou Takigawa , Kouichi Nose , Yasuhiro Koizumi , Takanobu Hori , Yukio Miya
IPC分类号： C23C1400
CPC分类号： C23C16/515 , C23C14/325 , C23C14/545 , C23C16/517
摘要： An arc evaporator comprises: an anode; an evaporation source electrode as a cathode; and a current control unit for supplying an AC square wave arcing current across the anode and the evaporation source electrode.
-
7.发明授权
公开(公告)号：US5342448A
公开(公告)日：1994-08-30
申请号：US40842
申请日：1993-03-31
申请人： Yuuichi Hamamura , Satoshi Haraichi , Akira Shimase , Junzou Azuma , Fumikazu Itoh , Toshio Yamada , Yasuhiro Koizumi , Michinobu Mizumura
发明人： Yuuichi Hamamura , Satoshi Haraichi , Akira Shimase , Junzou Azuma , Fumikazu Itoh , Toshio Yamada , Yasuhiro Koizumi , Michinobu Mizumura
IPC分类号： H01J37/244 , H01J37/317 , H01J37/30
CPC分类号： H01J37/317 , H01J37/244 , H01J37/3056 , H01J2237/006 , H01J2237/2443 , H01J2237/24435 , H01J2237/304 , H01J2237/31744
摘要： A method of processing a sample using a charged beam and reactive gases and a system employing the same, the method and system being able to perform the reactive etching and the beam assisted deposition using a charged particle detector free from the degradation of the performance due to the reactive gas. The system is designed in such a way that a shutter mechanism is provided in the form of the charged particle detector, and a chamber for accommodating the charged particle detector can be evacuated. In the observation of the sample, the charged particle detector is turned on to open the shutter mechanism, and in the processing of the sample, the charged particle detector is turned off or left as it is to shut the shutter mechanism to evacuate the inside of the charged particle detector.
摘要翻译： 使用带电束和反应性气体处理样品的方法以及使用其的系统的方法和方法，所述方法和系统能够执行反应性蚀刻和使用带电粒子检测器进行的束辅助沉积，其不会由于 反应气体。 该系统设计成使得以带电粒子检测器的形式提供快门机构，并且可以抽出用于容纳带电粒子检测器的室。 在样品的观察中，带电粒子检测器被打开以打开快门机构，并且在样品的处理中，带电粒子检测器被关闭或离开以关闭快门机构以将内部 带电粒子检测器。
-
公开(公告)号：US4704348A
公开(公告)日：1987-11-03
申请号：US779832
申请日：1985-09-25
CPC分类号： G03F7/2041 , G03F7/70866
摘要： Exposure of fine patterns on a photoresist is carried out by controlling the humidity and temperature of a gas to be supplied to an exposure apparatus separate from the ambient atmosphere.Temperature of the atmosphere at least in the vicinity of a photoresist is controlled in a predetermined range and air or gas to be supplied to the exposure space is humidified to a desired degree.Water content in the photoresist is kept uniform and constant by the specially controlled atmosphere and enables uniform pattern width of the exposed fine pattern all over the photoresist surface.
摘要翻译： 通过控制要提供给与环境大气分离的曝光设备的气体的湿度和温度来进行光刻胶上的精细图案的曝光。 将至少在光致抗蚀剂附近的气氛的温度控制在预定范围内，供给到曝光空间的空气或气体被加湿到期望的程度。 光致抗蚀剂中的含水量通过特殊控制的气氛保持均匀和恒定，并且能够在光致抗蚀剂表面的整个表面上均匀地曝露精细图案的图案宽度。
-
公开(公告)号：US4609566A
公开(公告)日：1986-09-02
申请号：US713860
申请日：1985-03-20
CPC分类号： G03F1/72 , Y10S430/146
摘要： A photo-mask is mounted on a repairing chamber, with its mask pattern forming surface being exposed to the interior of the chamber. Vaporized repairing material which includes a metallic element is introduced into the chamber, and a laser beam is projected from the exterior of the chamber onto a transparent defect of the mask pattern. The irradiated portion is heated and the vaporized repairing material at the heated portion is resolved, resulting in the metal resolved from the repairing material deposits and fills the transparent defect. Thus, transparent defects of a mask pattern can be repaired in a simplified process.
摘要翻译： 光掩模安装在修理室上，其掩模图案形成表面暴露于室的内部。 将包含金属元素的汽化修复材料引入室中，并且将激光束从腔室的外部突出到掩模图案的透明缺陷上。 照射部分被加热，并且在加热部分处的蒸发的修复材料被分解，导致从修复材料中分解的金属沉积并填充透明缺陷。 因此，可以在简化的过程中修复掩模图案的透明缺陷。
-
公开(公告)号：US20140246325A1
公开(公告)日：2014-09-04
申请号：US14234589
申请日：2012-05-22
CPC分类号： C23C28/02 , C23C14/046 , C23C14/14 , C23C14/165 , C23C14/34 , C23C14/3492 , C23C14/46 , H01J37/32055 , H01J37/32357 , H01J37/32669 , H01J37/34 , H01L21/2855 , H01L21/76873 , H01L21/76898 , H01L23/53238 , H01L2924/0002 , H01L2924/00
摘要： A film-forming apparatus (100) includes: a vacuum chamber (30) configured to store a substrate (34B) in which a through-hole is formed and a source of copper emission (35B); a vacuum pump (36) configured to decompress an interior of the vacuum chamber (30) to a predetermined degree of vacuum; a power supply (80) configured to generate electric power applied to the substrate (34B); and a driving mechanism for use in setting a distance between the substrate (34B) and the source of copper emission (35B). When a copper material emitted from the source of copper emission (35B) is deposited on one main surface of the substrate (34B) to block an opening of the through-hole in the one main surface by means of a deposited film formed of the copper material, a blocked state of the opening blocked by the deposited film is adjusted based on the distance and the electric power.
摘要翻译： 成膜装置（100）包括：真空室（30），其构造成存储形成有通孔的基板（34B）和铜排出源（35B）; 真空泵（36），被配置为将所述真空室（30）的内部减压到预定的真空度; 配置为产生施加到所述基板（34B）的电力的电源（80）; 以及用于设置基板（34B）和铜发射源（35B）之间的距离的驱动机构。 当从铜发射源（35B）发射的铜材料沉积在基板（34B）的一个主表面上以通过由铜形成的沉积膜阻挡在一个主表面中的通孔的开口 基于距离和电力来调整由沉积膜阻挡的开口的阻挡状态。
-
-
-
-
-
-
-
-
-
搜索结果
19 条记录 (耗时 0.023 秒)
