Abstract:
A semiconductor body holder includes a rigid refractory base having a plurality of flexible refractory arms extending from one end thereof. Each arm includes a finger extending therefrom, the fingers in cooperation with the arms, serving to resiliently hold a body of semiconductor material during processing. The holder of the present invention is particularly useful in the practice of temperature gradient zone melting on the semiconductor body.
Abstract:
LARGE SINGLE CRYSTALS OF IRON ARE GROWN FROM A WELL ANNEALED, UNIFORMLY FINE-GRAINED SPECIMEN WHICH HAS BEEN GIVEN A SMALL AMOUNT OF PLASTIC STRAIN AND THEN HEATED TO INDUCE RECRYSTALLIZATION AT ONE SITE IN THE SPECIMEN. THE RECRYSTALLIZATION NUCLEUS IS ENLARGED AT THE EXPENSE OF ADJACENT STRAINED, FINE-GRAINED CRYSTALS BY REPEATEDLY HEATING THE SPECIMENT TO A TEMPERATURE ABOVE ABOUT 750* C. BUT BELOW ABOUT 910*C, FOR A PERIOD OF MINUTES AND THEN COOLING BELWO 750*C. THE DURATION OF HEATING AT THE ELEVATED TEMPERATURE OF EACH CYCLE IS SUCH THAT SUBSTANTIAL CRYSTAL GROWTH ON THE ORIGINAL NUCLEUS OCCURS BUT ADDITIONAL NUCLEATION TAKES PLACE IN THE REST OF THE IRON SPECIMEN.
Abstract:
Method of zone melting a semiconductor rod includes displacing an end holder of the vertically held rod transversely to the rod axis, continuously displacing the other end holder vertically so as to feed a rod portion, having a diameter greater than the inner diameter of an annular heating device surrounding the rod and forming a melting zone therein, into the melting zone, forming a diametrical constriction in the melting zone, displacing the one end holder vertically and rotating it until the rod portion located between it and the melting zone is formed to a specific diameter larger than the inner diameter of the heating device and, after forming the rod portion to the specific cross section, vertically displacing the end holders elative to the heating device.
Abstract:
DISCLOSED HEREIN IS A NOVEL PROCESS FOR CRYSTALLIZING POTASSIUM SULFATE FROM AN AQUEOUS SOLUTION THEREOF. THE PROCESS COMPRISES INCORPORATING FROM ABOUT 0.02 TO ABOUT 0.2 PERCENT (BASED ON WEIGHT OF POTASSIUM SULFATE) OF A POLYIMINE INTO THE AQUEOUS CRYSTALLIZING SOLUTION. PRIOR TO CRYSTALLIZATION, THE PH OF THE SOLUTION IS ADJUSTED TO A LEVEL SUFFICIENT TO IMPORT A FORMAL CHARGE TO THE POLYIMINE. CRYSTALLIZATION IS ACCOMPLISHED BY COMMONLY EMPLOYED TECHNIQUES SUCH AS COOLING OR EVAPORATION. THE RESULTING CRYSTALS ARE APPROXIMATELY OF THE SAME SIZE AND ARE CONSISTENTLY HEXAGONAL IN SHAPE. IN THE ABSENCE OF THE POLYIMINE ADDITIVE, POTASSIUM SULFATE CRYSTALLIZES IN AN UNPREDICTABLE VARIETY OF FORMS WHICH HAVE POOR FILTERING AND WASHING CHARACTERISTICS.
Abstract:
A grown crystal structure comprises a single crystal of semiconductive material having a given lattice constant grown on a spinel crystal substrate having a different lattice constant. A substance is added to one or both of the crystals and has suitable properties relative to the crystals to effectively reduce lattice strains developed in the grown crystal structure due to mismatch of the lattice constants of both crystals.
Abstract:
Large bulk single crystals of lead tin telluride are synthesized by first mixing desired amounts of lead, tin and tellurium with, if desired, bismuth and reacting the mixture at 950.degree. C to form a source material. The source material is then converted into a single crystal by recrystallization and digestion in a uniform 850.degree. C to 860.degree. C temperature zone in order to prevent transport of material and, hence, variations in composition. Thereafter, these crystals, which are doped with bismuth, or crystals made by Bridgman or Czochralski growth, are cut into wafers and isothermally annealed at 600.degree. C to 650.degree. C under a metal-rich vapor pressure obtained from metal-rich lead tin telluride powder. Lowering of temperature to about 200.degree. C and further annealing is capable of converting p-type crystals to n-type crystals. The result of annealing, whether p-type, n-type, or intrinsic, is a low carrier concentration, high mobility crystal.
Abstract:
A process for the manufacture of silicon carbide whiskers comprises heating solid-phase carbon and solid-phase silicon at a temperature of at least 1,100*C, said heating being carried out in the presence of a substrate heated to a temperature of at least 1,000*C and in an atmosphere comprising hydrogen and chlorine, whereby silicon carbide whiskers are formed upon the substrate.
Abstract:
A PROCESS IF DISCLOSED FOR MANUFACTURING MERCURYDOPED GERMANIUM PHOTOCONDUCTOR MATEIAL HAVING A SHORT TIME CONSTANT AT LIQUID NEON TEMPERATURES. THE PROCESS INCLUDES REFINING THE GERMANIUM BY A NUMBER OF MOLTEN ZONE-REFINING PASSES TO REDUCE TH IMPURITIES WHICH ACT AS SHALLOW ACCEPTORS TO A LEVEL ON THE ORDER OF 10**12 ATOMS/CM.3 OR LESS AND THEN COMPENSATING THE REMAINING SHALLOW ACCEPTORS WITH SHALLOW DONORS SUCH AS ANTIMONY OR ARSENIC AND THEN DOPING THE GERMANIUM WITH MERCURY FROM THE VAPOR STATE TO A LEVEL ON THE ORDER OF 10**14 ATOMS/CM.3 OR GREATER.