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    METHOD FOR PRODUCING LAYERED PRODUCT
    1.
    发明公开
    METHOD FOR PRODUCING LAYERED PRODUCT 审中-公开

    公开(公告)号：US20240149337A1

    公开(公告)日：2024-05-09

    申请号：US18279660

    申请日：2022-07-20

    Applicant: SUMITOMO CHEMICAL COMPANY, LIMITED

    Inventor： Tomohiro FUKUURA

    IPC: B22F1/18 ,  C23C18/16 ,  C23C18/44 ,  C23C22/02

    CPC classification number: B22F1/18 ,  C23C18/1639 ,  C23C18/165 ,  C23C18/1658 ,  C23C18/44 ,  C23C22/02 ,  B22F2301/255 ,  B22F2302/256 ,  B22F2998/10

    Abstract: The present invention provides a novel method for producing a structure comprising an assembly of metal-based particles. Provided is a method for producing a layered product, the layered product comprising a substrate having a three-dimensional surface; and a metal-based particle assembly layer arranged on the three-dimensional surface and comprising a plurality of metal-based particles arranged apart from each other, the method comprising the step of forming the metal-based particle assembly layer on the three-dimensional surface by immersing the substrate in a plating solution containing a cation of a metal constituting the metal-based particles to reduce the cation, wherein a VS/VL ratio of volume VS [cm3] of the substrate to volume VL [cm3] of the plating solution is 0.03 or less.

    Device for electroless metallization of a target surface of at least one workpiece
    6.
    发明授权
    Device for electroless metallization of a target surface of at least one workpiece 有权

    公开(公告)号：US11566329B2

    公开(公告)日：2023-01-31

    申请号：US16768556

    申请日：2018-11-30

    Applicant: AP & S INTERNATIONAL GMBH

    Inventor： Jörg Hildebrand

    IPC: C23C18/16 ,  C23C18/44 ,  C23C18/34 ,  C23C18/40

    Abstract: An assembly for electroless metallization of a target surface (11) of at least one workpiece (10), comprising—a container (13) for receiving an electrolyte solution—an inlet for the electrolyte solution, said inlet arranged in the base (15) of the container (13), wherein the inlet (20) is designed as an inlet port (21) with a diffuser plate (24) comprising inlet openings (25) arranged in concentric circles—an outlet (30) which is arranged on an upper side of the container (13)—a receiving area for holding the at least one workpiece (10), wherein the diffuser plate (24) is formed as a first assembly (31) and a second assembly (32), which is identical to the first assembly, of a respective plurality of inlet openings (25), wherein the assemblies at least partially but not completely overlap, and the inlet (20) has at least two inlet ports (21, 22).

    Electroless palladium plating solution and palladium film
    7.
    发明授权
    Electroless palladium plating solution and palladium film 有权

    公开(公告)号：US11492706B2

    公开(公告)日：2022-11-08

    申请号：US16968981

    申请日：2019-02-15

    Applicant: C. Uyemura & Co., Ltd.

    Inventor： Tetsuya Sasamura ,  Tatsushi Someya ,  Katsuhisa Tanabe ,  Shinsuke Wada ,  Eriko Furuya

    IPC: C23C18/44 ,  C23C18/16 ,  B32B9/04

    Abstract: An electroless palladium plating liquid containing at least hydrazine or a salt thereof as a reducing agent, which has excellent bath stability in the vicinity of acidity to neutrality range, long-term stability, and is capable of suppressing the Pd film deposition rate decrease caused by elution of etching resist. An electroless palladium plating solution of the invention includes a palladium compound, hydrazine or its salt, at least one selected from a group consisting of a compound represented by the following formula (1) or its salt and a compound represented by the following formula (2) or its salt; and a pH of 8 or less, NH2NHCOR1 (1), (NH2NHCO)2(R2)n (2), wherein R1 represents H, NH2, an alkyl group having 1 to 10 carbon atoms, an alkoxy group having 1 to 10 carbon atoms, NHNH2, or an aromatic group, wherein each of these groups may have a substituent; R2 represents (CH2) or an aromatic group, wherein each of these groups may have a substituent; and n represents an integer of 0 to 10.

    Large scale manufacturing of hybrid nanostructured textile sensors
    10.
    发明授权
    Large scale manufacturing of hybrid nanostructured textile sensors 有权

    公开(公告)号：US11111593B2

    公开(公告)日：2021-09-07

    申请号：US14995334

    申请日：2016-01-14

    Applicant: Nanowear Inc.

    Inventor： Vijay K. Varadan ,  Pratyush Rai ,  Se Chang Oh

    IPC: C23C18/44 ,  C25D5/56 ,  C23C18/28 ,  C23C18/20 ,  C23C18/16 ,  B82Y15/00 ,  B82Y30/00 ,  B82Y40/00 ,  B82Y99/00

    Abstract: A process for the large scale manufacturing of vertically standing hybrid nanometer-scale structures of different geometries, including fractal architecture made of flexible materials, on a flexible substrate including textiles is disclosed. The nanometer-scale structures increase the surface area of the substrate. The nanometer-scale structures may be coated with materials that are sensitive to various physical parameters or chemicals such as but not limited to temperature, humidity, pressure, atmospheric pressure, electromagnetic signals originating from biological or non-biological sources, volatile gases, and pH. The increased surface area achieved through the disclosed process is intended to improve the sensitivity of the sensors formed by coating of the nanometer-scale structure and substrate with a material which can be used to sense physical parameters and chemicals as listed previously. An embodiment with nanometer-scale structures on a textile substrate coated with a conductive, malleable and bio-compatible sensing material for use as a biopotential measurement electrode is provided.

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