LIQUID CRYSTAL DISPLAY PANEL AND METHODS OF MANUFACTURING THE SAME
    5.
    发明申请
    LIQUID CRYSTAL DISPLAY PANEL AND METHODS OF MANUFACTURING THE SAME 有权
    液晶显示面板及其制造方法

    公开(公告)号:US20090002622A1

    公开(公告)日:2009-01-01

    申请号:US11768283

    申请日:2007-06-26

    Abstract: A liquid crystal cell article includes a layer of liquid crystal material disposed between a first polymeric substrate and a second polymeric substrate. The first polymeric substrate includes a plurality of first parallel conductive traces extending in a first direction and disposed between the layer of liquid crystal material and the first substrate, and a first release liner disposed on the first polymeric substrate. The second polymeric substrate includes a plurality of second parallel conductive traces extending in a second direction orthogonal to the first direction and disposed between the layer of liquid crystal material and the second substrate. The first polymeric substrate further includes a removable portion that is separable from the first polymeric substrate with the first release liner to expose a portion of the layer of liquid crystal material or second parallel conductive traces.

    Abstract translation: 液晶单元制品包括设置在第一聚合物基底和第二聚合物基底之间的液晶材料层。 第一聚合物基材包括沿第一方向延伸并且设置在液晶材料层和第一基材之间的多个第一平行导电迹线以及设置在第一聚合物基底上的第一释放衬垫。 第二聚合物基材包括沿垂直于第一方向的第二方向延伸并且设置在液晶材料层和第二基底之间的多个第二平行导电迹线。 第一聚合物基底还包括可移除部分,其可与具有第一释放衬垫的第一聚合物基底分离以暴露液晶材料层或第二平行导电迹线的一部分。

    APPARATUS AND METHODS FOR CONTINUOUSLY DEPOSITING A PATTERN OF MATERIAL ONTO A SUBSTRATE
    6.
    发明申请
    APPARATUS AND METHODS FOR CONTINUOUSLY DEPOSITING A PATTERN OF MATERIAL ONTO A SUBSTRATE 审中-公开
    将材料图案连续沉积到基材上的装置和方法

    公开(公告)号:US20080011225A1

    公开(公告)日:2008-01-17

    申请号:US11456687

    申请日:2006-07-11

    Abstract: A pattern of material is continuously deposited onto a substrate. The substrate and a mask are continuously brought together over a portion of a drum where a deposition source emits material. The mask includes apertures that form a pattern, and the material from the deposition source passes through the pattern of the mask and collects onto the substrate to form the pattern of material. The elongation and the transverse position of the substrate and the mask may be controlled. Pattern elements of the substrate and of the mask may be sensed in order to adjust the elongation and/or the transverse position of the substrate and/or mask to maintain a precise registration. Furthermore, the apertures may have a least dimension on the order of 100 microns or less to thereby create features on the substrate having least dimensions on the order of 100 microns or less.

    Abstract translation: 材料的图案被连续沉积到基底上。 衬底和掩模在沉积源发射材料的鼓的一部分上连续地接合在一起。 掩模包括形成图案的孔,并且来自沉积源的材料穿过掩模的图案并收集到基底上以形成材料图案。 可以控制衬底和掩模的伸长率和横向位置。 可以感测衬底和掩模的图案元件以调节衬底和/或掩模的伸长率和/或横向位置以保持精确的配准。 此外,孔可以具有大约100微米或更小的最小尺寸,从而在基底上产生具有小于或等于100微米的最小尺寸的特征。

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