Power and ground design for through-silicon via structure

    公开(公告)号:US10600759B2

    公开(公告)日:2020-03-24

    申请号:US15404093

    申请日:2017-01-11

    Abstract: In one or more embodiments, a semiconductor device includes a substrate, a first dielectric layer and a first conductive layer. The substrate includes a first surface and a second surface opposite the first surface. The first dielectric layer is on the first surface of the substrate. The first conductive layer is on the first surface of the substrate and includes a first portion on the first dielectric layer and a second portion surrounded by the first dielectric layer. The second portion of the first conductive layer extends from the first portion of the first conductive layer through the first dielectric layer to contact the first surface of the substrate.

    Semiconductor package structures and methods of manufacturing the same

    公开(公告)号:US11806710B2

    公开(公告)日:2023-11-07

    申请号:US16893150

    申请日:2020-06-04

    CPC classification number: B01L3/502738 H01L21/02 H01L23/5386

    Abstract: A semiconductor package structure includes a substrate, a die and a conductive structure. The die is disposed on or within the substrate. The die has a first surface facing away from the substrate and includes a sensing region and a pad at the first surface of the die. The first surface of the die has a first edge and a second edge opposite to the first edge. The sensing region is disposed adjacent to the first edge. The pad is disposed away from the first edge. The conductive structure electrically connects the pad and the substrate. The sensing region has a first end distal to the first edge of the first surface of the die. A distance from the first end of the sensing region to a center of the pad is equal to or greater than a distance from the first end of the sensing region to the first edge of the first surface of the die.

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