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    Chemical vapor deposition apparatus
    4.
    发明授权
    Chemical vapor deposition apparatus 失效
    化学气相沉积装置

    公开(公告)号：US6096133A

    公开(公告)日：2000-08-01

    申请号：US478362

    申请日：2000-01-06

    申请人： Akimasa Yuuki ,  Takaaki Kawahara ,  Tetsuro Makita ,  Mikio Yamamuka ,  Koichi Ono ,  Tomonori Okudaira

    发明人： Akimasa Yuuki ,  Takaaki Kawahara ,  Tetsuro Makita ,  Mikio Yamamuka ,  Koichi Ono ,  Tomonori Okudaira

    IPC分类号： C23C16/40 ,  C23C16/448 ,  C23C16/52 ,  C23C16/54 ,  C23C16/00

    CPC分类号： C23C16/409 ,  C23C16/4481 ,  C23C16/52 ,  C23C16/54

    摘要： An apparatus for depositing a thin film on a substrate by chemical vapor deposition (CVD) includes a material container for containing a liquid CVD source material; a material feeder for feeding the liquid CVD source material from the material container to a vaporizer while keeping the CVD source material liquid; a vaporizer for vaporizing the liquid CVD source material fed from the material feeder by heating the liquid CVD source material to a high temperature to form a CVD source material gas; a reaction chamber connected to the vaporizer by a pipe for forming a thin film on a substrate using the CVD source material gas; and a thermostatic box surrounding the reaction chamber, wherein both of the vaporizer and piping connecting the vaporizer to the reaction chamber are located within the thermostatic box.

    摘要翻译： 用于通过化学气相沉积（CVD）在衬底上沉积薄膜的装置包括用于容纳液体CVD源材料的材料容器; 用于将液体CVD源材料从所述材料容器供给到蒸发器并同时保持所述CVD源材料的材料供给器; 蒸发器，用于通过将液体CVD源材料加热至高温来蒸发从供料器供给的液体CVD源材料，以形成CVD源材料气体; 反应室，其通过用于使用所述CVD源材料气体在基板上形成薄膜的管连接到所述蒸发器; 以及围绕反应室的恒温箱，其中蒸发器和将蒸发器连接到反应室的管道都位于恒温箱内。

    Apparatus for and method of forming thin film by chemical vapor deposition
    5.
    发明授权
    Apparatus for and method of forming thin film by chemical vapor deposition 失效
    通过化学气相沉积法形成薄膜的方法和方法

    公开(公告)号：US06033732A

    公开(公告)日：2000-03-07

    申请号：US70009

    申请日：1998-04-30

    申请人： Akimasa Yuuki ,  Takaaki Kawahara ,  Tetsuro Makita ,  Mikio Yamamuka ,  Koichi Ono ,  Tomonori Okudaira

    发明人： Akimasa Yuuki ,  Takaaki Kawahara ,  Tetsuro Makita ,  Mikio Yamamuka ,  Koichi Ono ,  Tomonori Okudaira

    IPC分类号： C23C16/40 ,  C23C16/448 ,  C23C16/52 ,  C23C16/54 ,  C23C14/08

    CPC分类号： C23C16/409 ,  C23C16/4481 ,  C23C16/52 ,  C23C16/54

    摘要： A method of depositing a thin film on a substrate by chemical vapor deposition (CVD) including feeding a liquid CVD source material, including a solution in which at least one organometallic complex is dissolved in a solvent, at a constant flow rate to a vaporizer while keeping the CVD source material in a liquid state; vaporizing the liquid CVD source material by heating to form a CVD source material gas; and forming a thin film of a metal oxide on a substrate using the CVD material source gas in a reaction chamber, the thin film including at least titanium, including using TTIP and TiO(Dpm).sub.2 together as the organometallic complex.

    摘要翻译： 一种通过化学气相沉积（CVD）在衬底上沉积薄膜的方法，包括将恒定流速的液态CVD源材料（包括其中至少一种有机金属配合物溶解在溶剂中）的溶液进料到蒸发器，同时 保持CVD源材料处于液态; 通过加热蒸发液体CVD源材料以形成CVD源材料气体; 以及使用所述CVD材料源气体在反应室中在基板上形成金属氧化物薄膜，所述薄膜至少包括钛，包括使用TTIP和TiO（Dpm）2作为有机金属络合物。

    Apparatus for forming thin film by chemical vapor deposition
    6.
    发明授权
    Apparatus for forming thin film by chemical vapor deposition 失效
    通过化学气相沉积法形成薄膜的装置

    公开(公告)号：US5776254A

    公开(公告)日：1998-07-07

    申请号：US579495

    申请日：1995-12-27

    申请人： Akimasa Yuuki ,  Takaaki Kawahara ,  Tetsuro Makita ,  Mikio Yamamuka ,  Koichi Ono ,  Tomonori Okudaira

    发明人： Akimasa Yuuki ,  Takaaki Kawahara ,  Tetsuro Makita ,  Mikio Yamamuka ,  Koichi Ono ,  Tomonori Okudaira

    IPC分类号： C23C16/40 ,  C23C16/448 ,  C23C16/52 ,  C23C16/54 ,  C23C16/00

    CPC分类号： C23C16/409 ,  C23C16/4481 ,  C23C16/52 ,  C23C16/54

    摘要： A chemical vapor deposition (CVD) apparatus for depositing a thin film on a substrate by CVD has a material container for containing a liquid CVD source material, a material feeder for feeding the liquid CVD source material to a vaporizer for vaporizing the liquid CVD source material, and a reaction chamber for forming the thin film on the substrate using the CVD source material gas. Both the vaporizer and piping between the vaporizer and the reaction chamber are located in a thermostatic box surrounding the reaction chamber. Thus, the structure of the apparatus is simplified and also the heat efficiency of the apparatus is improved.

    摘要翻译： 用于通过CVD在基板上沉积薄膜的化学气相沉积（CVD）装置具有用于容纳液体CVD源材料的材料容器，用于将液体CVD源材料供给到用于使液体CVD源材料蒸发的蒸发器的材料供料器 以及用于使用CVD源材料气体在基板上形成薄膜的反应室。 蒸发器和反应室之间的蒸发器和管道都位于围绕反应室的恒温箱中。 因此，简化了装置的结构，提高了装置的热效率。

    FOLDING CIRCUIT AND ANALOG-TO-DIGITAL CONVERTER
    8.
    发明申请
    FOLDING CIRCUIT AND ANALOG-TO-DIGITAL CONVERTER 失效
    折叠电路和模拟数字转换器

    公开(公告)号：US20110001648A1

    公开(公告)日：2011-01-06

    申请号：US12439757

    申请日：2007-09-04

    申请人： Takeshi Ohkawa ,  Koichi Ono ,  Kouji Matsuura ,  Yukitosi Yamasita ,  Junji Toyomura ,  Shogo Nakamura ,  Norifimi Kanagawa

    发明人： Takeshi Ohkawa ,  Koichi Ono ,  Kouji Matsuura ,  Yukitosi Yamasita ,  Junji Toyomura ,  Shogo Nakamura ,  Norifimi Kanagawa

    IPC分类号： H03M1/12 ,  H03F3/68

    CPC分类号： H03M1/0863 ,  H03M1/0682 ,  H03M1/141 ,  H03M1/205 ,  H03M1/365

    摘要： A folding circuit and an analog-to-digital converter wherein a response to small signals is improved, a load on a clock signal can be reduced, and the increase of circuit area can be prevented. The circuit includes a reference voltage generating circuit that generates a plurality of differential voltages as reference voltages, and a plurality of amplification circuits that convert differential voltages between the plurality of reference voltages and an analog input voltage to differential currents, and output these differential currents. The output ends of the amplification circuits are alternately connected. Each of the amplification circuit is configured by a differential amplifier circuit having cascode output transistors (145, 146). A switch (144), which is turned on in synchronization with the control clock, is provided between the both sources of the cascode output transistors (145,146).

    摘要翻译： 折叠电路和模数转换器，其中对小信号的响应得到改善，可以减少对时钟信号的负担，并且可以防止电路面积的增加。 该电路包括产生多个差分电压作为参考电压的参考电压产生电路和将多个参考电压之间的差分电压与模拟输入电压转换成差分电流的多个放大电路，并输出这些差分电流。 放大电路的输出端交替连接。 每个放大电路由具有共源共栅输出晶体管（145,146）的差分放大器电路构成。 在共源共栅输出晶体管（145,146）的两个源之间提供与控制时钟同步导通的开关（144）。

    Fluid handling apparatus
    9.
    发明授权
    Fluid handling apparatus 有权
    流体处理设备

    公开(公告)号：US07748410B2

    公开(公告)日：2010-07-06

    申请号：US11710167

    申请日：2007-02-23

    申请人： Koichi Ono

    发明人： Koichi Ono

    IPC分类号： F15C1/04

    CPC分类号： B01L3/502746 ,  B01L2200/0684 ,  B01L2300/0816 ,  B01L2300/0861 ,  B01L2400/0406 ,  B01L2400/0688 ,  B01L2400/086 ,  Y10T137/218 ,  Y10T137/2224

    摘要： A first liquid fed into a first flow passage 6 of a fluid handling apparatus travels to the open end thereof on the side of a second flow passage 7 due to capillarity. The movement of the first liquid is uniformed on the cross section of the flow passage by the function of a capillarity promoting portion 220 or 230 of the bottom 21 of the first flow passage 6. Then, the movement of a second liquid fed into the second flow passage 7 is uniformed on the cross section of the flow passage by the function of the capillarity promoting portion 220 or 230 of the bottom 21 of the second flow passage 7. Thus, the movement of the front end of the second liquid is substantially uniformed to surely extrude gas from the second flow passage 7 to the outside via a fourth flow passage 10.

    摘要翻译： 进入流体处理装置的第一流动通道6的第一液体由于毛细作用而行进到第二流动通道7侧的开口端。 通过第一流动通道6的底部21的毛细作用促进部分220或230的作用，第一液体的运动在流动通道的横截面上是均匀的。然后，进入第二流体的第二液体的运动 通过第二流动通道7的底部21的毛细作用促进部分220或230的作用，流动通道7在流动通道的横截面上均匀。因此，第二液体的前端的运动基本上是均匀的 以确定地将第二流路7的气体经由第四流路10挤出到外部。

    Encode circuit and analog-digital converter comprising a digital average unit and a logical boundary detection unit
    10.
    发明授权
    Encode circuit and analog-digital converter comprising a digital average unit and a logical boundary detection unit 失效
    编码电路和模数转换器，包括数字平均单元和逻辑边界检测单元

    公开(公告)号：US07696917B2

    公开(公告)日：2010-04-13

    申请号：US11798098

    申请日：2007-05-10

    申请人： Kouji Matsuura ,  Koichi Ono ,  Kiyoshi Makigawa

    发明人： Kouji Matsuura ,  Koichi Ono ,  Kiyoshi Makigawa

    IPC分类号： H03M1/36

    CPC分类号： H03M7/165

    摘要： An encode circuit includes a digital average unit that receives cyclic thermometer codes or standard thermometer codes, and that reduces a bubble error in the received thermometer codes by a majority vote rule, a logical boundary detection unit that detects a logical boundary in the thermometer codes output from the digital average unit, and an encoder unit that generates output codes based on output signals from the logical boundary detection unit.

    摘要翻译： 编码电路包括接收循环温度计代码或标准温度计代码的数字平均单元，并且通过多数投票规则减少所接收的温度计代码中的气泡误差;逻辑边界检测单元，其检测温度计代码输出中的逻辑边界 以及编码器单元，其基于来自逻辑边界检测单元的输出信号生成输出代码。