Fabrication of three dimensional integrated circuit employing multiple die panels
    4.
    发明授权
    Fabrication of three dimensional integrated circuit employing multiple die panels 有权
    采用多个模板制作三维集成电路

    公开(公告)号:US07622313B2

    公开(公告)日:2009-11-24

    申请号:US11193926

    申请日:2005-07-29

    IPC分类号: H01L21/00 B29C65/00

    摘要: A method of assembling an electronic device includes testing a first wafer of first die to identify the location of functional first die and dividing the first wafer into a set of panels, wherein a panel includes an M×N array of first die. A panel is bonded to a panel site of a second wafer to form a panel stack wherein a panel site defines an M×N array of second die in the second wafer. The panel stack is sawed into a devices comprising a first die bonded to a second die. Dividing the first wafer into panels may be done according statically or dynamically (to maximize the number of panels having a yield exceeding a specified threshold). Binning of the panels and panel sites according to functional die patterns may be performed to preferentially bond panels to panel sites of the same bin.

    摘要翻译: 组装电子设备的方法包括测试第一晶片的第一晶片以识别功能第一裸片的位置并将第一晶片分成一组面板,其中面板包括第一裸片的MxN阵列。 面板结合到第二晶片的面板部位以形成面板堆叠,其中面板部位在第二晶片中限定第二模具的MxN阵列。 面板堆叠被锯成包括结合到第二模具的第一模具的装置。 可以将第一晶片划分成面板可以静态或动态地进行(以最大化具有超过特定阈值的产量的面板的数量)。 可以执行根据功能性模具图案的面板和面板位置的分层以优先地将面板粘合到同一箱的面板位置。

    Method of forming crack arrest features in embedded device build-up package and package thereof
    5.
    发明授权
    Method of forming crack arrest features in embedded device build-up package and package thereof 有权
    在嵌入式装置积层包装及其包装中形成破裂特征的方法

    公开(公告)号:US07553753B2

    公开(公告)日:2009-06-30

    申请号:US11469158

    申请日:2006-08-31

    IPC分类号: H01L21/44

    摘要: A method of forming an embedded device build-up package (10) includes forming a first plurality of features (22) over a packaging substrate (12,16,18), wherein the first plurality of features (22) comprises a first feature and a second feature, forming at least a first crack arrest feature (28) in a first crack arrest available region (26), wherein the first crack arrest available region is between the first feature and the second feature, forming a second plurality of features (32) over the first plurality of features (22) wherein the second plurality of features includes a third feature and a fourth feature, and forming at least a second crack arrest feature (36) in a second crack arrest available region (34), wherein the second crack arrest feature (36) is between the third feature and the fourth feature, and the second crack arrest feature (36) is substantially orthogonal to the first crack arrest feature (28).

    摘要翻译: 形成嵌入式装置积层包装(10)的方法包括在包装基材(12,16,18)上形成第一多个特征(22),其中第一多个特征(22)包括第一特征和 第二特征,在第一裂缝停止可用区域(26)中形成至少第一裂纹阻止特征(28),其中所述第一裂缝停止可用区域在所述第一特征和所述第二特征之间,形成第二多个特征( 32),其中所述第二多个特征包括第三特征和第四特征,并且在第二裂缝停止可用区域(34)中形成至少第二裂缝停止特征(36),其中, 第二裂缝停止特征(36)在第三特征和第四特征之间,并且第二裂缝阻塞特征(36)基本上垂直于第一裂缝停止特征(28)。

    Metal reduction in wafer scribe area
    7.
    发明授权
    Metal reduction in wafer scribe area 有权
    晶圆划片区金属还原

    公开(公告)号:US06951801B2

    公开(公告)日:2005-10-04

    申请号:US10351798

    申请日:2003-01-27

    摘要: A process for removing metal from a scribe area of a semiconductor wafer. The metal removed may include exposed metal in a saw path of the scribe area and the metal in a crack stop trench of the scribe area. In one example, copper is removed from the scribe area by wet etching the wafer. In one example, the wet etching process is performed after the removal of an exposed barrier adhesion layer on the wafer surface. Removal of the metal in the saw path may reduce the amount of metal buildup on a saw blade during singulation of the die areas of a wafer.

    摘要翻译: 一种用于从半导体晶片的划线区域去除金属的工艺。 去除的金属可以包括划线区域的锯路径中的暴露的金属和划线区域的裂纹停止槽中的金属。 在一个实例中,通过湿法蚀刻晶片从刻划区域去除铜。 在一个实例中,在去除晶片表面上的暴露的阻挡粘附层之后执行湿蚀刻工艺。 锯切路径中的金属的去除可以减少在晶片的模具区域的分割期间在锯片上的金属积累量。

    Semiconductor stacked die/wafer configuration and packaging and method thereof
    10.
    发明授权
    Semiconductor stacked die/wafer configuration and packaging and method thereof 有权
    半导体堆叠晶片/晶片配置及其封装及其方法

    公开(公告)号:US07358616B2

    公开(公告)日:2008-04-15

    申请号:US11226025

    申请日:2005-09-14

    IPC分类号: H01L23/48

    摘要: A reciprocal design symmetry allows stacked wafers or die on wafer to use identical designs or designs that vary only by a few layers (e.g. metal interconnect layers). Flipping or rotating one die or wafer allows the stacked die to have a reciprocal orientation with respect to each other which may be used to decrease the interconnect required between the vertically stacked die and or wafers. Flipping and/or rotating may also be used to improve heat dissipation when wafer and/or die are stacked. The stacked wafers or die may then be packaged.

    摘要翻译: 互易设计对称性允许晶片上的堆叠晶片或晶片使用仅仅几层(例如,金属互连层)变化的相同设计或设计。 翻转或旋转一个模具或晶片允许堆叠的模具相对于彼此具有相互的取向,其可用于减小垂直堆叠的模具和/或晶片之间所需的互连。 当晶片和/或管芯堆叠时,翻转和/或旋转也可用于改善散热。 然后可以包装堆叠的晶片或管芯。