公开(公告)号：US11913985B2

公开(公告)日：2024-02-27

申请号：US16978331

申请日：2019-03-01

Applicant: PHOENIX ELECTRIC CO., LTD.

Inventor： Tomihiko Ikeda

IPC: G01R31/24 ,  G03F7/20

CPC classification number: G01R31/245 ,  G03F7/2004 ,  G03F7/2008

Abstract: It is intended to provide an irradiation device that can achieve good starting performance even without encapsulating a starting performance promoting substance into the internal space of a luminous tube in a discharge lamp, and simultaneously, can distinguish whether the discharge lamp is a genuine product or not. An irradiation device (50) is composed of a discharge lamp (110) provided as a light source and an ultraviolet light source (200) irradiating ultraviolet light to the discharge lamp (110) to detect whether the discharge lamp (110) is a genuine product or not in activation of the discharge lamp (110).

公开(公告)号：US20230367230A1

公开(公告)日：2023-11-16

申请号：US18361066

申请日：2023-07-28

Applicant: NIKON CORPORATION

Inventor： Koichi MURAKAMI ,  Koutarou TAKIGAMI ,  Tetsuya ABE

IPC: G03F7/00 ,  G03F7/20

CPC classification number: G03F7/70491 ,  G03F7/70116 ,  G03F7/70625 ,  G03F7/2008

Abstract: An exposure apparatus includes: light source that emits exposure light; exposure pattern forming apparatus including a plurality of exposure elements and disposed on an optical path of at least part of exposure light; and control unit electrically connected to exposure pattern forming apparatus, in which control unit controls whether workpiece is irradiated with exposure light via each of exposure elements by switching each of exposure elements to a first or second state, and integrates exposure amount in predetermined region of scheduled exposure region by sequentially irradiating predetermined region with light of part of exposure light via a first exposure element in first state among plurality of exposure elements and light of part of exposure light via second exposure element in the first state different from the first exposure element among the plurality of exposure elements in accordance with a relative movement of the workpiece and the exposure pattern forming apparatus.

公开(公告)号：US11768362B2

公开(公告)日：2023-09-26

申请号：US16853611

申请日：2020-04-20

Applicant: Gigaphoton Inc.

Inventor： Akiyoshi Suzuki ,  Osamu Wakabayashi

IPC: G02B19/00 ,  G01J1/42 ,  G02B5/00 ,  G02B26/08 ,  G02B27/09 ,  G02B27/30 ,  G03F7/20 ,  H01L21/027 ,  H01S3/097

CPC classification number: G02B19/0019 ,  G01J1/4257 ,  G02B5/001 ,  G02B19/0047 ,  G02B26/0816 ,  G02B27/0927 ,  G02B27/0955 ,  G02B27/30 ,  G03F7/2006 ,  G03F7/2008 ,  H01L21/0275 ,  G01J2001/4261 ,  H01S3/097

Abstract: A laser radiation system according to a viewpoint of the present disclosure includes a first optical system configured to convert a first laser flux into a second laser flux, a multimirror device including mirrors, configured to be capable of controlling the angle of the attitude of each of the mirrors, and configured to divide the second laser flux into laser fluxes and reflect the laser fluxes in directions to produce the divided laser fluxes, a Fourier transform optical system configured to focus the divided laser fluxes, and a control section configured to control the angle of the attitude of each of the mirrors in such a way that the Fourier transform optical system superimposes the laser fluxes, which are divided by the mirrors separate from each other by at least a spatial coherence length of the second laser flux, on one another.

公开(公告)号：US20190235387A1

公开(公告)日：2019-08-01

申请号：US16114880

申请日：2018-08-28

Applicant: Samsung Electronics Co., Ltd.

Inventor： Ji Hoon Na ,  Dong Gun Lee ,  Hee Bom Kim

IPC: G03F7/20 ,  G03F1/22

CPC classification number: G03F7/2004 ,  G03F1/22 ,  G03F7/2008 ,  G03F7/70491

Abstract: A system includes a plate configured for mounting of a reflective extreme ultra-violet (EUV) mask thereon and a zone plate configured to divide EUV light into zero-order light and first-order light and to pass the zero-order light and the first-order light to the reflective EUV mask. The system further includes a detector configured to receive EUV light reflected by the EUV mask and including a zero-order light detection region configured to generate a first image signal and a first-order light detection region configured to generate a second image signal, and a calculator configured to generate a compensated third image signal from the first image signal and the second image signal. The third image signal may be used to determine a distance between mask patterns of the EUV mask.

公开(公告)号：US20180239252A1

公开(公告)日：2018-08-23

申请号：US15525626

申请日：2015-11-04

Applicant: ASML Netherlands B.V.

Inventor： Han-Kwang NIENHUYS ,  Sjoerd Nicolaas Lambertus DONDERS ,  Gosse Charles DE VRIES ,  Michael Josef Mathijs RENKENS ,  Erik Roelof LOOPSTRA

IPC: G03F7/20

CPC classification number: G03F7/70891 ,  G02B5/1838 ,  G02B5/1861 ,  G02B7/1815 ,  G03F7/2008 ,  G03F7/70266 ,  G03F7/7095

Abstract: A reflector (2) comprising a plate (4) supported by a substrate (8), wherein the plate has a reflective surface (5) and is secured to the substrate by adhesive free bonding, and wherein a cooling channel array (10) is provided in the reflector. The channels (16) of the cooling channel array may be formed from open channels in a surface of the substrate, the open channels being closed by the plate to create the channels.

公开(公告)号：US09983480B2

公开(公告)日：2018-05-29

申请号：US15270422

申请日：2016-09-20

Applicant: USHIO DENKI KABUSHIKI KAISHA

Inventor： Daisuke Yajima

IPC: G03H1/04 ,  G03F7/22 ,  G03F1/50 ,  G03F7/20 ,  G03H1/02 ,  G03F7/16 ,  G03F7/26

CPC classification number: G03F7/201 ,  G03F1/50 ,  G03F7/16 ,  G03F7/2006 ,  G03F7/2008 ,  G03F7/2022 ,  G03F7/22 ,  G03F7/26 ,  G03F7/70408 ,  G03H1/0244 ,  G03H1/0465

Abstract: A method includes dividing a single beam emitted from a coherent light source into at least two branch beams, and causing the branch beams to cross each other at a predetermined interference angle thereby generating interference pattern. The method also includes irradiating a target surface of a substrate with the interference pattern. The method also includes dividing the target surface of the substrate into a plurality of predetermined shapes, and repeating a first substep of irradiating each predetermined shape with every shot of the interference pattern, and a second substep of conveying the substrate in a stepwise manner such that the predetermined shapes overlap each other in the stepwise manner. The method also includes causing a line-to-line pitch of the interference fringes in one of the predetermined shapes to align with the line-to-line pitch of the interference fringes in a next predetermined shape upon repeating the first and second substeps.

公开(公告)号：US09977324B2

公开(公告)日：2018-05-22

申请号：US15464228

申请日：2017-03-20

Applicant: Samsung Display Co., Ltd.

Inventor： DongEon Lee ,  Min Kang ,  Bong Yeon Kim ,  Yong Son ,  Junhyuk Woo ,  Hyunjoo Lee ,  Jinho Ju

IPC: G03F1/30 ,  G03F7/20 ,  G03F9/00

CPC classification number: G03F1/30 ,  G03F1/26 ,  G03F7/2002 ,  G03F7/2008 ,  G03F7/70191 ,  G03F7/70283 ,  G03F9/7003 ,  G03F9/7007

Abstract: A method of forming a pattern includes: preparing a target substrate including a photoresist layer on a base substrate; aligning a phase shift mask to the target substrate, the phase shift mask including a mask substrate comparted into a first region including a first sub region and second sub regions at sides of the first sub region, and second regions at sides of the first region, the phase shift mask including a phase shift layer on the mask substrate corresponding to the first region; fully exposing the photoresist layer at the first sub region and the second regions by utilizing the phase shift mask; and removing the photoresist layer at the first sub region and the second regions to form first and second photoresist patterns corresponding to the second sub regions. Transmittance of the phase shift layer is selected to fully expose the photoresist layer in the first sub region.

公开(公告)号：US20180003952A1

公开(公告)日：2018-01-04

申请号：US15542281

申请日：2016-01-06

Applicant: V TECHNOLOGY CO., LTD.

Inventor： Michinobu Mizumura

IPC: G02B26/10 ,  G02B3/00 ,  G03F7/20

CPC classification number: G02B26/10 ,  G02B3/0037 ,  G02B3/0056 ,  G02B26/101 ,  G03F7/2008 ,  G03F7/70241 ,  G03F7/70275 ,  G03F7/70358 ,  H01L21/027

Abstract: A projection exposure device projects exposure light onto a substrate via a microlens array. The projection exposure device includes a scanning exposure unit that moves the microlens array along a scanning direction from one end toward another end of the substrate, and a microlens array shift unit that moves the microlens array in a shift direction intersecting with the scanning direction during movement of the microlens array caused by the scanning exposure unit.

公开(公告)号：US20170153551A1

公开(公告)日：2017-06-01

申请号：US15313232

申请日：2014-12-17

Applicant: HITACHI CHEMICAL COMPANY, LTD.

Inventor： Masakazu KUME ,  Momoko MUNAKATA

IPC: G03F7/20 ,  G03F7/031 ,  H05K3/18 ,  G03F7/16 ,  G03F7/32 ,  H05K3/06 ,  G03F7/11 ,  G03F7/033

CPC classification number: G03F7/2008 ,  G03F7/027 ,  G03F7/028 ,  G03F7/031 ,  G03F7/032 ,  G03F7/033 ,  G03F7/11 ,  G03F7/16 ,  G03F7/168 ,  G03F7/26 ,  G03F7/30 ,  G03F7/322 ,  H05K3/06 ,  H05K3/064 ,  H05K3/18 ,  H05K3/184

Abstract: An object is to provide a method for forming a resist pattern able to form a resist pattern, in which the resist shape is favorable, the occurrence of resist footing can be reduced, and the adherence and the aspect ratio are improved; and provided is a method for forming a resist pattern comprising a step of forming a photosensitive resin layer on a substrate using a photosensitive resin composition for projection exposure; a step of exposing the photosensitive resin layer to active light projecting an image of a photomask through a lens; and a step of removing an unexposed part of the photosensitive resin layer from the substrate by development, wherein the photosensitive resin composition for projection exposure comprises an (A) binder polymer, a (B) photopolymerizing compound having an ethylenically unsaturated bond, and a (C) photopolymerization initiator; and a light transmittance of the photosensitive resin layer at a wavelength of 365 nm is not less than 58.0% and not more than 95.0%.

公开(公告)号：US20170146793A1

公开(公告)日：2017-05-25

申请号：US15355461

申请日：2016-11-18

Applicant: Innovative Micro Technology

Inventor： Christopher S. GUDEMAN ,  Sangwoo Kim ,  Stuart Hutchinson ,  Marin SIGURDSON

IPC: G02B26/08 ,  G03F7/26 ,  G02B1/11 ,  G03F7/20 ,  B81B3/00 ,  B81C1/00

CPC classification number: G03F7/26 ,  B81B7/0067 ,  B81B2201/042 ,  B81B2201/047 ,  B81C2203/0109 ,  G02B1/11 ,  G02B27/0983 ,  G03F7/2004 ,  G03F7/2008 ,  G03F7/201

Abstract: A microfabricated optical apparatus that includes a light source or light detector in combination with an integrated turning surface to form a microfabricated optical subassembly. The integrated turning surface may be formed directly in the substrate material using gray scale lithography.