Method for biasing an embedded source plane of a non-volatile memory having vertical select gates
    93.
    发明授权
    Method for biasing an embedded source plane of a non-volatile memory having vertical select gates 有权
    用于偏置具有垂直选择门的非易失性存储器的嵌入式源平面的方法

    公开(公告)号:US09368215B2

    公开(公告)日:2016-06-14

    申请号:US14810283

    申请日:2015-07-27

    Abstract: A method controls a memory that includes twin memory cells formed in a semiconductor substrate. Each memory cell includes a floating-gate transistor including a state control gate, in series with a select transistor that includes a vertical select control gate, common to the twin memory cells, and a source connected to an embedded source line, common to the memory cells. The drains of the floating-gate transistors of the twin memory cells are connected to a same bit line. The method includes controlling a memory cell so as to turn it on to couple the source line to a bit line coupled to the ground, during a step of programming or reading another memory cell.

    Abstract translation: 一种方法控制包括形成在半导体衬底中的双存储单元的存储器。 每个存储单元包括一个浮动栅极晶体管,它包括状态控制栅极,与选择晶体管串联,该选择​​晶体管包括双存储单元共用的垂直选择控制栅极和连接到存储器共用的嵌入式源极线路的源极 细胞。 双存储单元的浮栅晶体管的漏极连接到相同的位线。 该方法包括在编程或读取另一个存储器单元的步骤期间控制存储器单元以将其导通以将源极线耦合到耦合到地的位线。

    Non-volatile memory with vertical selection transistors
    97.
    发明授权
    Non-volatile memory with vertical selection transistors 有权
    具有垂直选择晶体管的非易失性存储器

    公开(公告)号:US09076878B2

    公开(公告)日:2015-07-07

    申请号:US14043718

    申请日:2013-10-01

    Abstract: The present disclosure relates to a method for manufacturing a non-volatile memory on a semiconductive substrate, comprising the steps of implanting in the depth of the substrate a first doped region forming a source region of selection transistors, forming in the substrate a buried gate comprising deep parts extending between an upper face of the substrate and the first doped region, implanting between two adjacent deep parts of the buried gate, a second doped region forming a common drain region of common selection transistors of a pair of memory cells, the selection transistors of the pair of memory cells thus having channel regions extending between the first doped region and the second doped region, along faces opposite the two buried gate adjacent deep parts, and implanting along opposite upper edges of the buried gate, third doped regions forming source regions of charge accumulation transistors.

    Abstract translation: 本公开涉及一种用于在半导体衬底上制造非易失性存储器的方法,包括以下步骤:在衬底的深度中注入形成选择晶体管的源极区的第一掺杂区,在衬底中形成掩埋栅,包括 在衬底的上表面和第一掺杂区之间延伸的深部分,埋入掩埋栅的两个相邻深部之间,形成一对存储单元的公共选择晶体管的公共漏极区的第二掺杂区,选择晶体管 因此具有在第一掺杂区域和第二掺杂区域之间延伸的沟道区域的一对存储单元,沿着与相邻两个深部分的两个掩埋栅极相对的面以及沿掩埋栅极的相对的上边缘注入,形成源极区域的第三掺杂区域 的电荷累积晶体管。

    Device with synchronous output
    99.
    发明授权

    公开(公告)号:US12230357B2

    公开(公告)日:2025-02-18

    申请号:US17902171

    申请日:2022-09-02

    Abstract: The present description concerns an electronic device including: a first input configured to receive a clock signal, coupled by a first input buffer to a first circuit; and at least an output coupled by an output buffer to the first circuit, the output buffer being synchronized on first edges of the clock signal, wherein the first input buffer includes a data input coupled to the first input and is configured to maintain the value on its output constant whatever the value on its data input during a duration following each first edge of the clock signal.

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