公开(公告)号：US5070282A

公开(公告)日：1991-12-03

申请号：US451790

申请日：1989-12-18

Applicant: Bernard Epsztein

Inventor： Bernard Epsztein

IPC: H01J3/18 ,  H01J1/304 ,  H01J3/02 ,  H01J3/08

CPC classification number: H01J1/3042 ,  H01J3/022 ,  H01J2201/319

Abstract: An electron source is formed by at least one elementary electron emitter in which an emissive point having a very small radius of curvature operates on the field emission principle and produces an electron beam, the intensity of which is independent of any possible variations of electron emission. The emissive point cooperates with an extracting electrode, and a control electrode having a negative potential with respect to the extracting electrode is placed downstream of the extracting electrode with respect to the direction of propagation of the beam.

Abstract translation: 电子源由至少一个基本电子发射体形成，其中具有非常小的曲率半径的发射点对场发射原理进行操作，并产生电子束，其强度与电子发射的任何可能的变化无关。 发射点与提取电极配合，并且相对于提取电极具有负电位的控制电极相对于光束的传播方向设置在提取电极的下游。

公开(公告)号：US09093243B2

公开(公告)日：2015-07-28

申请号：US14284128

申请日：2014-05-21

Applicant: NATIONAL UNIVERSITY OF SINGAPORE

Inventor： Anjam Khursheed

IPC: H01J37/26 ,  H01J3/18 ,  H01J3/20 ,  H01J3/02

CPC classification number: H01J3/18 ,  H01J3/021 ,  H01J3/027 ,  H01J3/20 ,  H01J37/063 ,  H01J37/065 ,  H01J37/26 ,  H01J2237/06333 ,  H01J2237/0635 ,  H01J2237/1534

Abstract: A gun configured to generate charged particles, comprising a ring-cathode (200) electrically configured to generate a charged particle beam; a lens arranged to focus the charged particle beam on a specimen; and at least one correction focusing electrode (1406) arranged to generate at least one electrostatic/magnetic field to further divergently/convergently focus the charged particle beam for correcting in-plane geometric aberrations associated with the lens, the focusing being based on the in-plane geometric aberrations associated with the lens. A related method is also disclosed.

Abstract translation: 一种配置成产生带电粒子的枪，包括电气配置以产生带电粒子束的环形阴极（200）; 透镜，布置成将带电粒子束聚焦在样本上; 以及至少一个校正聚焦电极（1406），其布置成产生至少一个静电/磁场，以进一步发散/收敛地聚焦带电粒子束，用于校正与透镜相关联的面内几何像差， 与透镜相关的平面几何像差。 还公开了相关方法。

公开(公告)号：US09082577B1

公开(公告)日：2015-07-14

申请号：US14459497

申请日：2014-08-14

Applicant: SHIMADZU CORPORATION

Inventor： Shin Fujita

IPC: H01J3/18 ,  H01J3/14

CPC classification number: H01J3/18 ,  H01J35/14 ,  H01J37/04 ,  H01J37/265 ,  H01J37/3007 ,  H01J37/302 ,  H01J2235/087 ,  H01J2237/0492 ,  H01J2237/30472

Abstract: An electron beam device including an electron source which generates an electron beam; three lenses for controlling the characteristics of the electron beam, including a first lens, second lens and third lens arranged in sequence from the upstream side in relation to the emission direction of the electron beam; and a beam definition aperture arranged on the second lens. The position of the second lens is adjusted such that the total lens magnification ratio obtained under maximum beam current substantially matches the ideal lens magnification ratio defined on the basis of electro-optical characteristics.

Abstract translation: 一种电子束装置，包括产生电子束的电子源; 用于控制电子束特性的三个透镜，包括相对于电子束的发射方向从上游侧依次布置的第一透镜，第二透镜和第三透镜; 以及布置在第二透镜上的光束定义孔。 调整第二透镜的位置，使得在最大光束电流下获得的总透镜放大率基本上与基于电光特性定义的理想透镜放大倍数匹配。

公开(公告)号：US20140197325A1

公开(公告)日：2014-07-17

申请号：US14005078

申请日：2012-03-14

Applicant: Takahisa Kato ,  Yutaka Setomoto

Inventor： Takahisa Kato ,  Yutaka Setomoto

IPC: H01J37/12 ,  H01J3/18

CPC classification number: H01J37/12 ,  B82Y10/00 ,  B82Y40/00 ,  H01J3/18 ,  H01J37/3177 ,  H01J2237/04924 ,  H01J2237/1205 ,  H01J2237/1207

Abstract: An electrostatic charged particle beam lens includes an electrode including a flat plate having a first surface having a normal line extending in a direction of an optical axis and a second surface opposite to the first surface, the electrode having a through-hole extending from the first surface to the second surface. When an opening cross section is defined as a cross section of the through-hole taken along a plane perpendicular to the normal line and a representative diameter is defined as a diameter of a circle obtained by performing regression analysis of the opening cross section, a representative diameter of the opening cross section in a first region that is on the first surface side and a representative diameter of the opening cross section in a second region that is on the second surface side are each larger than a representative diameter of the opening cross section in a third region that is a region in the electrode disposed between the first surface and the second surface.

Abstract translation: 静电带电粒子束透镜包括：电极，其包括平板，该平板具有沿光轴方向延伸的法线的第一表面和与该第一表面相对的第二表面，该电极具有从第一表面延伸的通孔 表面到第二表面。 当开口横截面被定义为沿着垂直于法线的平面截取的通孔的横截面，并且代表性直径被定义为通过对开口横截面进行回归分析而获得的圆的直径时，代表 在第一表面侧的第一区域中的开口横截面的直径和位于第二表面侧的第二区域中的开口横截面的代表性直径分别大于开口横截面的代表性直径 第三区域，其是设置在第一表面和第二表面之间的电极中的区域。

公开(公告)号：US20140175301A1

公开(公告)日：2014-06-26

申请号：US14124408

申请日：2012-06-05

Applicant: Jacques Gierak ,  Nicolas Allemandou ,  Klaus Hasselbach ,  Jean-Paul Leggeri ,  Guillaume Donnier-Valentin ,  Stephen Purcell ,  Pauline Gavand

Inventor： Jacques Gierak ,  Nicolas Allemandou ,  Klaus Hasselbach ,  Jean-Paul Leggeri ,  Guillaume Donnier-Valentin ,  Stephen Purcell ,  Pauline Gavand

IPC: H01J37/08 ,  H01J37/317 ,  H01J37/05 ,  H01J3/18 ,  H01J27/02 ,  H01J3/26

CPC classification number: H01J37/08 ,  H01J3/18 ,  H01J3/26 ,  H01J27/022 ,  H01J27/024 ,  H01J27/22 ,  H01J37/05 ,  H01J37/317 ,  H01J37/3174 ,  H01J2237/0807 ,  H01J2237/0815 ,  H01J2237/0827

Abstract: A ion source comprises: a chamber (45), an injection to inject matter into the chamber, wherein said matter comprises at least a first species, a tip with an apex located in the chamber, wherein the apex has a surface made of a metallic second species, a generator to generate ions of said species, and a regulation system adapted to set operative conditions of the chamber to alternatively generate ions from the gaseous first species, and ions from the non-gaseous metallic second species.

Abstract translation: 离子源包括：室（45），用于将物质注入到室中的注入，其中所述物质包括至少第一种类，具有位于所述室中的顶点的尖端，其中所述顶点具有由金属 第二种类，用于产生所述物质的离子的发生器，以及调节系统，其适于设置所述室的操作条件以交替地从所述气态第一物质产生离子，以及从所述非气态金属第二物质产生离子。

公开(公告)号：US20130112891A1

公开(公告)日：2013-05-09

申请号：US13667337

申请日：2012-11-02

Applicant: CANON KABUSHIKI KAISHA

Inventor： Takahisa Kato

IPC: H01J3/14 ,  H01J3/18 ,  H01J3/26 ,  G21K5/04

CPC classification number: H01J37/045 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/3177 ,  H01J2237/03 ,  H01J2237/0435 ,  H01J2237/151

Abstract: A charged particle optical system includes: a member 112 likely deforming due to heat; and an electrostatic deflector 113 deflecting a charged particle beam 1 and fixed to the member 112. An electrode supporting portion 5 is placed on the fixing portion 7 so as to reduce a transmission of a deforming stress from the member 112 to the electrode supporting portion 5 in a direction of the electric field through the fixing portion 7. The transmission of the stress from the member that causes deformation to the electrode supporting portion of the electrostatic deflector is suppressed, and the dispersion of the deflections of a plurality of the charged particle beams is reduced.

Abstract translation: 带电粒子光学系统包括：构件112可能由于热而变形; 以及使带电粒子束1偏转并固定到构件112的静电偏转器113.电极支撑部分5放置在固定部分7上，以便减小变形应力从构件112向电极支撑部分5的传递 在通过固定部分7的电场的方向上。抑制了从导致变形的构件到静电偏转器的电极支撑部分的应力的传递，并且多个带电粒子束的偏转的分散 降低了。

公开(公告)号：US20130032729A1

公开(公告)日：2013-02-07

申请号：US13639491

申请日：2011-03-31

Applicant: Rainer Knippelmeyer

Inventor： Rainer Knippelmeyer

IPC: G01T1/00 ,  H01J3/18

CPC classification number: H01J37/244 ,  H01J37/09 ,  H01J2237/0437 ,  H01J2237/0453 ,  H01J2237/2446 ,  H01J2237/24592 ,  H01J2237/2817

Abstract: A charged particle detection system comprises plural detection elements and a multi-aperture plate in proximity of the detection elements. Charged particle beamlets can traverse the apertures of the multi-aperture plate to be incident on the detection elements. More than one multi-aperture plate can be provided to form a stack of multi-aperture plates in proximity of the detector. A suitable electric potential supplied to the multi-aperture plate can have an energy filtering property for the plural charged particle beamlets traversing the apertures of the plate.

Abstract translation: 带电粒子检测系统包括检测元件附近的多个检测元件和多孔板。 带电粒子子束可穿过多孔板的入射到检测元件上的孔。 可以提供多于一个的多孔板以在检测器附近形成多孔板的堆叠。 提供给多孔板的合适电位可以对穿过板的孔的多个带电粒子子束具有能量过滤特性。

公开(公告)号：US20120286149A1

公开(公告)日：2012-11-15

申请号：US13561761

申请日：2012-07-30

Applicant: Manuel Gamero-Castano ,  Mahesh Mahadevan ,  R. Mahadeva Sarma

Inventor： Manuel Gamero-Castano ,  Mahesh Mahadevan ,  R. Mahadeva Sarma

IPC: H01J3/18 ,  H01J49/10

CPC classification number: H01J37/08 ,  G01N23/2258 ,  H01J37/3053 ,  H01J49/0004 ,  H01J2237/0812 ,  H01J2237/31713 ,  H01J2237/31745

Abstract: A method for milling of a workpiece of inert material by nanodroplet beam sputtering includes the steps of providing aliquid; electrohydrodynamically atomizing the liquid to form charged nanodroplets; and directing the atomized charged nanodroplets onto the workpiece to selectively remove material. The method is used for broad-beam milling the workpiece of inert material, for precision micromachining and/or for three dimensionally profiling organic samples via secondary ion mass spectrometry. The liquid is electrosprayed in a cone-jet mode in a vacuum and average nanodroplet diameter, nanodroplet velocity, and molecular energy of the nanodroplets is adjusted by changing liquid flow rate and the acceleration voltage applied to the ionic liquid as it is atomized. Apparatus for performing the method are also included embodiments.

Abstract translation: 通过纳米质子束溅射法研磨惰性材料的工件的方法包括提供液体的步骤; 电液动力雾化液体以形成带电的纳米微滴; 并将雾化的带电纳米线引导到工件上以选择性地去除材料。 该方法用于通过二次离子质谱法对惰性材料的工件进行宽幅铣削，用于精密微加工和/或三维分析有机样品。 液体以真空中的锥形喷射模式电喷雾，并且通过改变液体流速和在其被雾化时施加到离子液体的加速电压来调节纳米滴的平均纳米滴定直径，纳米滴定速度和分子能量。 用于执行该方法的装置也包括实施例。

公开(公告)号：US20110079731A1

公开(公告)日：2011-04-07

申请号：US12994944

申请日：2009-05-27

Applicant: Ho Seob Kim

Inventor： Ho Seob Kim

IPC: H01J3/18

CPC classification number: H01J37/12 ,  H01J37/28 ,  H01J2237/1205 ,  H01J2237/121 ,  H01J2237/153 ,  H01J2237/1532 ,  H01J2237/1534 ,  H01J2237/1536

Abstract: The present invention relates to an electron lens for use in an microcolumn, and more particularly to a multipole electron lens wherein the electron lens includes two or more electrode layers, each of the electrode layers has a slit aperture extending across a central optical axis along which an electron beam passes, and the two electrode layers are aligned on an electron optical axis such that the slit apertures are staggered with each other. Further, the present invention relates to a microcolumn using the multipole lens. The multipole lens according to the present invention can be manufactured and controlled in a simple fashion, reduces the defocusing of the microcolumn, and increases an active deflection area.

Abstract translation: 本发明涉及一种用于微柱的电子透镜，更具体地说，涉及一种多极电子透镜，其中电子透镜包括两个或更多个电极层，每个电极层具有沿中心光轴延伸的狭缝孔， 电子束通过，并且两个电极层在电子光轴上对齐，使得狭缝孔彼此交错。 此外，本发明涉及使用多极透镜的微柱。 根据本发明的多极镜头可以以简单的方式制造和控制，减少了微柱的散焦，并增加了主动偏转面积。

公开(公告)号：US20110001056A1

公开(公告)日：2011-01-06

申请号：US12829207

申请日：2010-07-01

Applicant: Richard Stresau ,  Wayne Sheils ,  Kevin Hunter

Inventor： Richard Stresau ,  Wayne Sheils ,  Kevin Hunter

IPC: H01J3/18 ,  H01J3/26

CPC classification number: H01J37/147 ,  H01J49/403 ,  H01J2237/05 ,  H01J2237/12

Abstract: An apparatus for manipulating the trajectories of moving charged particles. The apparatus includes a grid of laterally spaced side by side elongate elements and means defining a path for charged particles to traverse the grid. The grid is supported and configured for application of a voltage gradient between and/or along the elongate elements, whereby to manipulate the trajectories of charged particles that traverse the grid. A method of manipulating the trajectories of moving charged particles is also disclosed.

Abstract translation: 一种用于操纵带电粒子移动轨迹的装置。 该装置包括横向间隔开的细长元件的网格和限定带电粒子穿过网格的路径的装置。 电网被支撑和配置用于在细长元件之间和/或沿着细长元件施加电压梯度，从而操纵穿过电网的带电粒子的轨迹。 还公开了一种操纵带电粒子移动轨迹的方法。