Electronic structure
    12.
    发明授权
    Electronic structure 有权
    电子结构

    公开(公告)号:US06826037B2

    公开(公告)日:2004-11-30

    申请号:US10157175

    申请日:2002-05-29

    IPC分类号: H05K500

    摘要: An electronic structure includes an electronic component, which is configured to be in electric contact with a base and has a mounting side configured for mounting onto the base. The structure also includes a raised elastic support positioned on the component and multiple contacts positioned on the component, with at least one contact also being positioned on the support.

    摘要翻译: 电子结构包括电子部件,其构造成与基座电接触,并且具有被配置为安装到基座上的安装侧。 该结构还包括定位在部件上的凸起弹性支撑件和位于部件上的多个触点,至少一个触点也位于支撑件上。

    High-pressure polysilicon encapsulated localized oxidation of silicon
    14.
    发明授权
    High-pressure polysilicon encapsulated localized oxidation of silicon 失效
    高压多晶硅封装了硅的局部氧化

    公开(公告)号:US5175123A

    公开(公告)日:1992-12-29

    申请号:US612174

    申请日:1990-11-13

    IPC分类号: H01L21/32 H01L21/762

    摘要: A reduction in defects and lateral encroachment is obtained by utilizing a high pressure oxidation in conjunction with an oxidizable layer conformally deposited over an oxidation mask. The use of high pressure oxidation provides for the formation of LOCOS oxide without the formation of defects. Any native oxide present on the substrate surface is removed by using a ramped temperature deposition process to form oxidizable layer and/or a high temperature anneal is performed to remove the native oxide at the substrate surface. In this embodiment, any oxide which can act as a pipe for oxygen diffusion is removed. Therefore, nominal or no lateral encroachment is exhibited.

    摘要翻译: 通过利用高压氧化与保形地沉积在氧化掩模上的可氧化层结合来获得缺陷和横向侵蚀的减少。 使用高压氧化提供形成LOCOS氧化物而不形成缺陷。 存在于衬底表面上的任何天然氧化物通过使用斜变温度沉积工艺以形成可氧化层而被去除,和/或进行高温退火以去除衬底表面处的自然氧化物。 在本实施例中,可以除去可充当氧扩散管的任何氧化物。 因此,表现为名义上或没有横向侵占。

    Non-homogeneous multi-elemental electron emitter
    15.
    发明授权
    Non-homogeneous multi-elemental electron emitter 失效
    非均匀多元素电子发射体

    公开(公告)号:US5156705A

    公开(公告)日:1992-10-20

    申请号:US580047

    申请日:1990-09-10

    IPC分类号: H01J9/02

    CPC分类号: H01J9/025

    摘要: A method for forming an electron emitter layer wherein the electron emitter layer comprises a plurality of elemental conductive materials that etch at dis-similar rates to provide a structure with an edge exhibiting a geometric discontinuity of small radius of curvature.

    摘要翻译: 一种用于形成电子发射器层的方法,其中电子发射极层包括以不相似的速率蚀刻的多个元素导电材料,以提供具有表现出小曲率半径的几何不连续的边缘的结构。