公开(公告)号：US09741532B1

公开(公告)日：2017-08-22

申请号：US15185920

申请日：2016-06-17

Applicant: International Business Machines Corporation

Inventor： Stephen W. Bedell ,  Kunal Mukherjee ,  John A. Ott ,  Devendra K. Sadana ,  Brent A. Wacaser

IPC: H01J37/28 ,  H01J37/26 ,  H01J37/20 ,  H01J37/244 ,  H01J37/06 ,  H01J37/21

CPC classification number: H01J37/28 ,  H01J37/023 ,  H01J37/265 ,  H01J37/292 ,  H01J2237/0245 ,  H01J2237/20207 ,  H01J2237/24592 ,  H01J2237/2804

Abstract: A multi-beam electron microscope for ECCI is provided. The electron microscope has a platform, on which a crystalline sample is placed. At least a first electron source and a second electron source of the electron microscope are mounted to a housing. The housing is tiltable with respect to a longitudinal direction through a pivot for forming a fulcrum, such that the first electron source and the second electron source are tilted simultaneously and are substantially equally distanced from the platform along a vertical axis when the housing is tilted. The electron microscope also has electron beam focusing assemblies for focusing the electron beams generated by the electron sources onto the crystalline sample to generate backscattered electrons. The electron microscope also has detectors for detecting the backscattered electrons.

公开(公告)号：US09741531B2

公开(公告)日：2017-08-22

申请号：US14905170

申请日：2014-05-21

Applicant: Hitachi High-Technologies Corporation

Inventor： Kazuyuki Takeda ,  Tohru Ando ,  Tsutomu Saito

IPC: H01J37/28 ,  H01J37/26 ,  H01J37/244

CPC classification number: H01J37/265 ,  H01J37/244 ,  H01J37/28 ,  H01J2237/20207 ,  H01J2237/20221 ,  H01J2237/24475 ,  H01J2237/2804

Abstract: A charged particle beam device allowing an analysis position in a sample analyzable with an EBSD detector to be acquired beforehand, and allowing a sample to be adjusted to a desired analysis position in a short time. A charged particle beam device is provided with a charged particle source (111), a charged particle optical system (115), an EBSD detector (101), a sample stage (116), an image display unit (117) for displaying a portion of the sample observable with the EBSD detector and a non-observable portion of the sample such that said portions are distinguished from each other, an operation input unit (121) where a position to be observed by the EBSD detector is entered, and a control unit (118) for controlling a planar movement, an inclination movement and a rotation movement of the sample stage so as to allow the observation position entered from the operation input unit to be observed with the EBSD detector.

公开(公告)号：US20170067800A1

公开(公告)日：2017-03-09

申请号：US15308522

申请日：2015-05-12

Applicant: The United States of America, as represented by the Secretary, Department of Health and Human Serv

Inventor： Kevin L. Briggman

IPC: G01N1/06 ,  H01J37/20 ,  H01J37/28 ,  G01N23/225 ,  H01J37/22

CPC classification number: G01N1/06 ,  G01N23/225 ,  G01N2001/061 ,  G01N2001/066 ,  H01J37/20 ,  H01J37/222 ,  H01J37/26 ,  H01J37/28 ,  H01J37/3178 ,  H01J2237/20207 ,  H01J2237/20214

Abstract: The present disclosure is directed to embodiments of microtome devices and methods of their use. In some embodiments, a microtome can be mounted on the built-in stage of a scanning electron microscope and used to perform serial block-face scanning electron microscopy. In some cases, a microtome installed in a scanning electron microscope can cut the sample at a location off the electron beam axis of the scanning electron microscope. In some cases, a microtome can include a capacitive sensor which can measure the location of a blade of the microtome, and the microtome can be computer-controlled by program implemented in MATLAB.

Abstract translation: 本公开涉及切片机设备的实施例及其使用方法。 在一些实施例中，切片机可以安装在扫描电子显微镜的内置台上，并用于执行串行块面扫描电子显微镜。 在一些情况下，安装在扫描电子显微镜中的切片机可以在扫描电子显微镜的电子束轴的位置处切割样品。 在某些情况下，切片机可以包括可以测量切片机刀片位置的电容式传感器，并且可以通过在MATLAB中实现的程序对切片机进行计算机控制。

公开(公告)号：US09543112B2

公开(公告)日：2017-01-10

申请号：US14410235

申请日：2013-06-04

Applicant: Hitachi High-Technologies Corporation

Inventor： Yasuhira Nagakubo ,  Takashi Mizuo

IPC: G21K5/10 ,  H01J37/20 ,  H01J37/26

CPC classification number: H01J37/20 ,  H01J37/26 ,  H01J2237/184 ,  H01J2237/2001 ,  H01J2237/2002 ,  H01J2237/20207

Abstract: In an existing specimen cryo holder, a change in the orientation of a specimen would lead to tilting of a dewar together with the specimen and hence to bubbling of a cooling source contained in the dewar. In view of this, a specimen cryo holder, including a mechanism capable of cooling a specimen while keeping the posture of a dewar in a fixed direction even when the specimen is tilted into a direction suitable for processing or observation thereof, is provided. Also provided is a dewar in which a vacuum maintenance mechanism is mounted to an outer vessel so that an inner vessel holding a cooling source therein is vacuum-insulated from the outside air.

Abstract translation: 在现有的样品冷冻保持器中，样品的取向的变化将导致杜瓦瓶与样品一起倾斜，并因此产生包含在杜瓦瓶中的冷却源的起泡。 鉴于此，提供了一种样本冷冻保持器，其包括即使当试样倾斜到适合于其加工或观察的方向时，也能够将保持在固定方向上的杜瓦的姿势的样品冷却的机构。 还提供了一种杜瓦瓶，其中真空维护机构安装到外部容器，使得其中容纳冷却源的内部容器与外部空气真空绝缘。

公开(公告)号：US09530611B2

公开(公告)日：2016-12-27

申请号：US14314219

申请日：2014-06-25

Applicant: Carl Zeiss Microscopy, LLC

Inventor： John A. Notte, IV ,  Alexander Groholski ,  Robert Conners ,  Mark D. DiManna ,  Raymond Hill

IPC: H01J37/18 ,  H01J37/08 ,  H01J27/26

CPC classification number: H01J37/18 ,  G21K5/04 ,  H01J27/26 ,  H01J37/08 ,  H01J2237/002 ,  H01J2237/0216 ,  H01J2237/032 ,  H01J2237/0653 ,  H01J2237/0807 ,  H01J2237/1501 ,  H01J2237/1502 ,  H01J2237/1825 ,  H01J2237/188 ,  H01J2237/20207 ,  H01J2237/20214 ,  H01J2237/20221 ,  H01J2237/20235

Abstract: The present disclosure relates to a charged particle beam system, comprising a noble gas field ion beam source, a charged particle beam column, and a housing defining a first vacuum region and a second vacuum region. A noble gas field ion beam source is arranged within the first vacuum region. A first mechanical vacuum pump is functionally attached to the first vacuum region, an ion getter pump is attached to the charged particle beam column, and a gas supply is attached to the first vacuum region configured to supply a noble gas to the noble gas field ion beam source.

Abstract translation: 本发明涉及带电粒子束系统，其包括惰性气体场离子束源，带电粒子束柱和限定第一真空区域和第二真空区域的壳体。 惰性气体场离子束源设置在第一真空区域内。 第一机械真空泵功能地附接到第一真空区域，离子吸气剂泵连接到带电粒子束柱，并且气体供应附着到构造成向惰性气体场离子供应惰性气体的第一真空区域 光束源。

公开(公告)号：US20160356729A1

公开(公告)日：2016-12-08

申请号：US15118042

申请日：2014-03-10

Applicant: OXFORD INSTRUMENTS NANOTECHNOLOGY TOOLS LIMITED

Inventor： Frank Willi BAUER

IPC: G01N23/20 ,  H01J37/295 ,  H01J37/20 ,  H01J37/252 ,  G01N23/203 ,  G01N23/205

CPC classification number: G01N23/20058 ,  G01N23/20025 ,  G01N23/203 ,  G01N23/2055 ,  H01J37/20 ,  H01J37/252 ,  H01J37/2955 ,  H01J37/3056 ,  H01J2237/20207 ,  H01J2237/20214 ,  H01J2237/20221 ,  H01J2237/24578 ,  H01J2237/2544 ,  H01J2237/31749

Abstract: A method is provided for performing electron diffraction pattern analysis upon a sample in a vacuum chamber of a microscope. Firstly a sample is isolated from part of a specimen using a focused particle beam. A manipulator end effector is then attached to the sample so as to effect a predetermined orientation between the end effector and the sample. With the sample detached, the manipulator end effector is rotated about a rotation axis to bring the sample into a predetermined geometry with respect to an electron beam and diffraction pattern imaging apparatus so as to enable an electron diffraction pattern to be obtained from the sample while the sample is still fixed to the manipulator end effector. An electron beam is caused to impinge upon the sample attached to the manipulator end effector so as to obtain an electron diffraction pattern.

Abstract translation: 提供了用于对显微镜的真空室中的样品进行电子衍射图案分析的方法。 首先，使用聚焦粒子束从样品的一部分中分离样品。 然后将机械手末端执行器附接到样品，以便实现末端执行器和样品之间的预定取向。 在样品分离的情况下，操纵器末端执行器围绕旋转轴线旋转以使样品相对于电子束和衍射图案成像装置成预定几何形状，以便能够从样品获得电子衍射图案，同时 样品仍然固定在机械手末端执行器上。 使电子束撞击附着在操纵器末端执行器上的样品，以获得电子衍射图。

公开(公告)号：US20160020065A1

公开(公告)日：2016-01-21

申请号：US14802119

申请日：2015-07-17

Applicant: FEI Company

Inventor： David Foord

IPC: H01J37/22 ,  H01J37/20 ,  H01J37/244 ,  H01J37/26

CPC classification number: H01J37/22 ,  H01J37/20 ,  H01J37/244 ,  H01J37/26 ,  H01J2237/20207 ,  H01J2237/20214 ,  H01J2237/226

Abstract: A system and method for transmission electron microscopy is provided. The sample can be examined from multiple directions using an electron beam in a transmission electron microscope. The sample has at least three observation faces that are not parallel to each other with the thickness of the sample orthogonal to each of the observation faces being less than 200 nm. The sample is mounted on a needle that is needle rotatable about more than one axis so the needle can orient at least three of the observation faces to be normal to the electron beam of the electron microscope for observation.

Abstract translation: 提供了一种用于透射电子显微镜的系统和方法。 可以在透射电子显微镜中使用电子束从多个方向检查样品。 样品具有至少三个不相互平行的观察面，其中每个观察面的样品的厚度小于200nm。 样品安装在针上，该针可以围绕多于一个轴线旋转，因此针可将至少三个观察面定向成垂直于电子显微镜的电子束观察。

公开(公告)号：US09190242B2

公开(公告)日：2015-11-17

申请号：US13239535

申请日：2011-09-22

Applicant: Josef Biberger ,  Ralph Pulwey

Inventor： Josef Biberger ,  Ralph Pulwey

IPC: H01J37/20 ,  H01J37/28

CPC classification number: H01J37/28 ,  H01J37/20 ,  H01J2237/201 ,  H01J2237/20207 ,  H01J2237/20214 ,  H01J2237/20221 ,  H01J2237/20285 ,  H01J2237/20292

Abstract: A particle beam device and a sample receptacle apparatus, which has a sample holder, are disclosed. The sample holder is arranged in a movable fashion along at least a first axis and along at least a second axis. Furthermore, the sample holder is arranged in a rotatable fashion about a first axis of rotation and about a second axis of rotation. A first sample holding device is arranged relative to the sample holder in a rotatable fashion about a third axis of rotation, in which the third axis of rotation and the second axis of rotation are at least in part arranged laterally offset with respect to one another. Furthermore, a control apparatus is provided, in which the first sample holding device is rotatable about the third axis of rotation into an analysis position and/or treating position using the control apparatus.

Abstract translation: 公开了一种具有样品保持器的粒子束装置和样品容器装置。 样品保持器沿着至少第一轴线和至少第二轴线以可移动的方式布置。 此外，样品保持器围绕第一旋转轴线和约第二旋转轴线可旋转地布置。 第一样品保持装置以关于第三旋转轴线的可旋转方式相对于样品保持器布置，其中第三旋转轴线和第二旋转轴线至少部分地相对于彼此横向偏移地布置。 此外，提供一种控制装置，其中第一样品保持装置可以使用控制装置绕第三旋转轴线旋转到分析位置和/或处理位置。

公开(公告)号：US20150170873A1

公开(公告)日：2015-06-18

申请号：US14414682

申请日：2013-07-12

Applicant: Mel-Build Corporation

Inventor： Hiroya Miyazaki

IPC: H01J37/20 ,  H01J37/26

CPC classification number: H01J37/20 ,  H01J37/185 ,  H01J37/261 ,  H01J2237/186 ,  H01J2237/2007 ,  H01J2237/20207 ,  H01J2237/20214 ,  H01J2237/26 ,  H01J2237/2802

Abstract: In at least one embodiment, a specimen holder tip part comprises a specimen setting seat, a specimen mesh for mounting a specimen, a specimen holding part for holding the specimen mesh and a clamping part that clamps the specimen holding part.

Abstract translation: 在至少一个实施例中，试样保持器顶端部分包括试样设置座，用于安装试样的试样网，用于保持试样网的试样保持部和夹持试样保持部的夹持部。

公开(公告)号：US09053899B2

公开(公告)日：2015-06-09

申请号：US14294772

申请日：2014-06-03

Applicant: FEI Company

Inventor： Bohuslav Sed'a ,  Lubomír T{dot over (u)}ma ,  Petr Hlavenka ,  Petr Syta{hacek over (r)}

IPC: H01J37/28 ,  H01J37/20 ,  H01J37/12 ,  H01J37/09 ,  H01J37/30

CPC classification number: H01J37/12 ,  H01J37/09 ,  H01J37/3005 ,  H01J2237/12 ,  H01J2237/20207

Abstract: The invention relates to a dual beam apparatus equipped with an ion beam column and an electron beam column having an electrostatic immersion lens. When tilting the sample, the electrostatic immersion field is distorted and the symmetry round the electron optical axis is lost. As a consequence tilting introduces detrimental effects such as traverse chromatic aberration and beam displacement. Also in-column detectors, detecting either secondary electrons or backscattered electrons in the non-tilted position of the sample, will, due to the loss of the symmetry of the immersion field, show a mix of these electrons when tilting the sample.The invention shows how, by biasing the stage with respect to the grounded electrodes closest to the sample, these disadvantages are eliminated, or at least reduced.

Abstract translation: 本发明涉及一种配备有离子束柱和具有静电浸没透镜的电子束柱的双光束装置。 当倾斜样品时，静电浸没场失真，并且电子光轴周围的对称性丧失。 因此，倾斜引入有害影响，例如横向色差和光束位移。 在样品的非倾斜位置检测二次电子或后向散射电子的柱内检测器也将由于浸没场的对称性的损失而在倾斜样品时显示这些电子的混合物。 本发明示出了如何通过相对于最接近样品的接地电极偏置级来消除或至少减少这些缺点。