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    Cathode arrangement, electron gun, and lithography system comprising such electron gun
    12.
    发明申请
    Cathode arrangement, electron gun, and lithography system comprising such electron gun 有权
    阴极装置，电子枪和包括这种电子枪的光刻系统

    公开(公告)号：US20150187533A1

    公开(公告)日：2015-07-02

    申请号：US14578533

    申请日：2014-12-22

    Applicant: MAPPER LITHOGRAPHY IP B.V

    Inventor： Laura DINU-GÜRTLER ,  Eric Petrus HOGERVORST

    IPC: H01J29/62 ,  G03F7/20 ,  H01J29/48

    CPC classification number: H01J37/3174 ,  G03F7/70058 ,  H01J1/15 ,  H01J1/28 ,  H01J3/027 ,  H01J3/029 ,  H01J37/075 ,  H01J37/3177 ,  H01J2229/481 ,  H01J2237/061

    Abstract: The invention relates to a cathode arrangement comprising: a cathode body housing an emission surface for emitting electrons in a longitudinal direction, wherein the emission surface is bounded by an emission perimeter; a focusing electrode at least partially enclosing the cathode body in a transversal direction and comprising an electron transmission aperture for focusing the electrons emitted by the emission surface, wherein the aperture is bounded by an aperture perimeter, wherein the cathode body is moveably arranged within the focusing electrode over a maximum transversal distance from an aligned position, and wherein the aperture perimeter transversally extends over the emission surface and beyond the emission perimeter over an overlap distance that exceeds the maximum transversal distance.

    Abstract translation: 本发明涉及一种阴极装置，其包括：阴极体，其容纳用于沿纵向发射电子的发射表面，其中所述发射表面由发射周界限定; 聚焦电极至少部分地沿着横向包围阴极体并且包括用于聚焦由发射表面发射的电子的电子传输孔，其中所述孔被孔周边界定，其中阴极体可移动地布置在聚焦 电极，其距离对准位置的最大横向距离，并且其中所述孔径周边在超过所述最大横向距离的重叠距离上在所述发射表面上横向延伸超过所述发射周界。

    Electron gun and electron beam device
    13.
    发明授权
    Electron gun and electron beam device 有权
    电子枪和电子束装置

    公开(公告)号：US09070527B2

    公开(公告)日：2015-06-30

    申请号：US14000988

    申请日：2011-02-25

    Applicant: Hiroshi Yasuda

    Inventor： Hiroshi Yasuda

    IPC: H01J29/48 ,  H01J1/148 ,  H01J1/26 ,  H01J37/075 ,  H01J37/317 ,  H01J37/065 ,  H01J37/07 ,  H01J37/26 ,  B82Y10/00 ,  B82Y40/00

    CPC classification number: H01J29/485 ,  B82Y10/00 ,  B82Y40/00 ,  H01J1/148 ,  H01J1/26 ,  H01J37/065 ,  H01J37/07 ,  H01J37/075 ,  H01J37/26 ,  H01J37/3174

    Abstract: An electron gun cathode (104) is column shaped, and emits electrons by being heated. A holder (103), which covers the bottom and sides of the electron gun cathode, has electrical conductivity and holds the electron gun cathode, and is composed of a material that does not easily react with the electron gun cathode when in a heated state, is provided. The tip of the electron gun cathode (104) protrudes from the holder (103) so as to be exposed, and electrons are emitted from the tip toward the front by applying an electric field to the tip.

    Abstract translation: 电子枪阴极（104）为柱状，通过加热发射电子。 覆盖电子枪阴极的底部和侧面的保持器（103）具有导电性并保持电子枪阴极，并且由处于加热状态时不易与电子枪阴极反应的材料构成， 被提供。 电子枪阴极（104）的尖端从保持器（103）突出以露出，并且通过向尖端施加电场，从尖端向前方发射电子。

    INSPECTION APPARATUS
    14.
    发明申请
    INSPECTION APPARATUS 审中-公开
    检查装置

    公开(公告)号：US20150097116A1

    公开(公告)日：2015-04-09

    申请号：US14571594

    申请日：2014-12-16

    Applicant: EBARA CORPORATION

    Inventor： Masahiro HATAKEYAMA ,  Yasushi TOMA ,  Shoji YOSHIKAWA ,  Kiwamu TSUKAMOTO

    IPC: H01J37/22 ,  H01J37/28

    CPC classification number: H01J37/22 ,  G01N23/2251 ,  G01N2223/204 ,  G01N2223/611 ,  H01J3/024 ,  H01J37/075 ,  H01J37/28 ,  H01J2237/063 ,  H01J2237/2448 ,  H01J2237/2806

    Abstract: An inspection apparatus includes: beam generation means for generating any of charged particles and electromagnetic waves as a beam; a primary optical system that guides the beam into an inspection object held in a working chamber and irradiates the inspection object with the beam; a secondary optical system that detects secondary charged particles occurring from the inspection object; and an image processing system that forms an image on the basis of the detected secondary charged particles. The primary optical system includes a photoelectron generator having a photoelectronic surface. The base material of the photoelectronic surface is made of material having a higher thermal conductivity than the thermal conductivity of quartz.

    Abstract translation: 检查装置包括：用于产生任何带电粒子和电磁波作为光束的光束产生装置; 主光学系统，其将光束引导到保持在工作室中的检查对象中，并用该光束照射检查对象; 第二光学系统，其检测从检查对象发生的次级带电粒子; 以及基于检测到的二次带电粒子形成图像的图像处理系统。 主光学系统包括具有光电子表面的光电子发生器。 光电子表面的基材由具有比石英热导率更高的导热性的材料制成。

    DEVICE FOR PRODUCING AN ELECTRON BEAM
    16.
    发明申请
    DEVICE FOR PRODUCING AN ELECTRON BEAM 有权
    用于生产电子束的装置

    公开(公告)号：US20130162134A1

    公开(公告)日：2013-06-27

    申请号：US13821887

    申请日：2011-09-08

    Applicant: Goesta Mattausch ,  Peter Feinaeugle ,  Volker Kirchhoff ,  Dieter Weiske ,  Henrik Flaske ,  Rainer Zeibe

    Inventor： Goesta Mattausch ,  Peter Feinaeugle ,  Volker Kirchhoff ,  Dieter Weiske ,  Henrik Flaske ,  Rainer Zeibe

    IPC: H01J29/56 ,  H01J29/00

    CPC classification number: H01J37/075 ,  H01J3/025 ,  H01J37/077 ,  H01J2237/3104 ,  H01J2237/3128 ,  H01J2237/3132

    Abstract: The invention relates to a device for producing an electron beam, comprising a housing (12), which delimits a space (13) that can be evacuated and has an electron beam outlet opening; an inlet (16) for feeding a process gas into the space (13) that can be evacuated; a planar cathode (14) and an anode (15), which are arranged in the space (13) that can be evacuated and between which a glow-discharge plasma can be produced by means of an applied electrical voltage, wherein ions can be accelerated from the glow-discharge plasma onto the surface of the cathode (14). The cathode has a first part (14a) made of a first material, which forms a centrally arranged first surface region of the cathode (14), and a second part (14b) made of a second material, which forms a second surface region of the cathode (14) that encloses the first surface region. The first material can be heated by the impingement with accelerated ions to a temperature at which electrons escape the first material predominantly due to thermionic emission.

    Abstract translation: 本发明涉及一种用于制造电子束的装置，包括：外壳（12），其限定可抽真空并具有电子束出口的空间（13）; 用于将处理气体进料到可以抽空的空间（13）中的入口（16）; 平面阴极（14）和阳极（15），其布置在可以抽真空的空间（13）中，并且可以通过施加的电压产生辉光放电等离子体，其中可以加速离子 从辉光放电等离子体到阴极（14）的表面。 阴极具有由第一材料制成的第一部分（14a），其形成阴极（14）的居中布置的第一表面区域和由第二材料制成的第二部分（14b），第二部分形成第二表面区域 封闭第一表面区域的阴极（14）。 主要由于热离子发射，第一种材料可以通过加速离子的冲击加热至电子逸出第一种材料的温度。

    Voltage regulator circuit for an electron microscope
    20.
    发明授权
    Voltage regulator circuit for an electron microscope 失效
    用于电子显微镜的电压调节器电路

    公开(公告)号：US4066971A

    公开(公告)日：1978-01-03

    申请号：US744865

    申请日：1976-11-24

    Applicant: Siemer Siems

    Inventor： Siemer Siems

    IPC: H01J37/075 ,  H01J21/00

    CPC classification number: H01J37/075

    Abstract: A voltage regulator circuit for an electron microscope incorporates step-down and step-up transformers connected between the filament supply and the filament of a regulator triode. The triode has a cathode separate from the filament, the cathode being connected to the center-tapped primary of the step-up transformer. A magnification-reducing resistor may be connected across the grid and cathode of the triode.

    Abstract translation: 用于电子显微镜的电压调节器电路包括连接在灯丝供应器和调节器三极管灯丝之间的降压和升压变压器。 三极管具有与灯丝分离的阴极，阴极连接到升压变压器的中心抽头初级。 放大倍率减小电阻器可以连接在三极管的栅极和阴极之间。

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