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公开(公告)号：US20150322398A1
公开(公告)日：2015-11-12
申请号：US14409404
申请日：2013-03-27
Applicant: TSUKISHIMA KIKAI CO., LTD.
Inventor： Tomoki HAYAKAWA , Hideaki MIZUNO
CPC classification number: C12M23/58 , C12M21/18 , C12M29/18 , C12M37/00 , C12M41/44 , C12M45/06 , C12M45/20 , C12P7/10 , C12P7/46 , C12P7/56 , C12P19/02 , C12P19/14 , C12P2201/00 , C12P2203/00 , Y02E50/16
Abstract: A biomass treatment device and a biomass treatment method, in which contamination is prevented and a final product can be highly concentrated. The biomass treatment device includes a pretreatment device for pretreating a biomass, a slurrying device for slurrying the pretreated biomass, and a saccharification device for saccharifying the slurried biomass with a saccharifying enzyme. A return line for returning a part of an internal fluid in the saccharification device to the slurrying device is provided, and the pretreated biomass from the pretreatment device and the internal fluid returned through the return line are mixed in the slurrying device so as to generate biomass slurry.
Abstract translation: 一种生物质处理装置和生物处理方法，其中防止污染并且最终产品可以高度浓缩。 生物质处理装置包括用于预处理生物质的预处理装置，用于使预处理的生物质浆化的制浆装置，以及用糖化酶对浆化的生物质进行糖化的糖化装置。 提供了用于将糖化装置中的一部分内部流体返回到浆料装置的返回管线，并且将来自预处理装置的预处理生物质和通过返回管线返回的内部流体在制浆装置中混合以产生生物质 泥浆。
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公开(公告)号：US20150217264A1
公开(公告)日：2015-08-06
申请号：US14423045
申请日：2013-02-25
Applicant: TSUKISHIMA KIKAI CO., LTD.
Inventor： Yo Doya , Hidenori Goto
CPC classification number: B01J19/24 , B01F3/0853 , B01F3/0865 , B01F5/0065 , B01F5/0071 , B01F5/10 , B01F7/18 , B01F13/1016 , B01F13/1022 , B01F15/065 , B01J19/1862 , B01J19/2405 , B01J19/242 , B01J19/2435 , B01J2219/2401 , C01G53/006 , C01P2004/03
Abstract: To provide a processing device which is small but which can exhibits a sufficient processing amount and a uniform contact processing property. In the processing vessel 10, a liquid flow is set to a spiral flow, and in a contact processing field, the injection liquid A, B are injected at a center-side position with respect to an inner surface of the processing vessel so as to perform contact processing.
Abstract translation: 为了提供一种处理装置，其处理量小，并具有均匀的接触处理性能。 在处理容器10中，液流被设定为螺旋流，在接触处理场中，喷射液A，B相对于处理容器的内表面在中心侧位置喷射， 执行联系处理。
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23.发明申请METHOD OF MANUFACTURING REACTION AGGLOMERATED PARTICLES, METHOD OF MANUFACTURING CATHODE ACTIVE MATERIAL FOR LITHIUM ION BATTERY, METHOD OF MANUFACTURING LITHIUM ION BATTERY, LITHIUM ION BATTERY, AND DEVICE OF MANUFACTURING REACTION AGGLOMERATED PARTICLES 审中-公开制造反应聚集颗粒的方法，制造用于锂离子电池的阴极活性材料的方法，制造锂离子电池的方法，锂离子电池以及制造反应聚集颗粒的装置公开(公告)号：US20150188133A1
公开(公告)日：2015-07-02
申请号：US14409347
申请日：2013-02-15
Applicant: TSUKISHIMA KIKAI CO., LTD.
Inventor： Yo Doya , Hidenori Goto
CPC classification number: H01M4/505 , B01D9/0009 , B01D9/0036 , B01D9/004 , B01J8/14 , B01J19/18 , B01J19/1806 , B01J19/2405 , B01J19/245 , B01J19/2465 , B01J2208/003 , B01J2219/0011 , B01J2219/00114 , B01J2219/00164 , B01J2219/24 , C01G53/006 , C01G53/04 , C01G53/06 , C01P2004/03 , H01M4/525 , H01M4/5825 , H01M10/0525 , H01M2004/028
Abstract: Liquid flow in a reaction processing vessel 10 is set to a spiral flow, a liquid A and B as an additional liquid containing an inorganic substance to be added is injected at a center-side position with respect to an inner surface of the reaction processing vessel 10 in a reaction field of the reaction processing vessel 10 so as to perform reaction processing.
Abstract translation: 将反应处理容器10中的液体流量设定为螺旋流量，将作为附加液体的液体A和B作为附加液体注入相对于反应处理容器的内表面的中心位置 10在反应处理容器10的反应场中进行反应处理。
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24.发明授权公开(公告)号：US10279287B2
公开(公告)日：2019-05-07
申请号：US15110538
申请日：2014-12-22
Applicant: TSUKISHIMA KIKAI CO., LTD.
Inventor： Yoichi Nakata , Tomonori Watarai , Sumito Sato , Satoshi Suwa , Tomoki Homma
Abstract: Prevention of contamination of a dried product, deformation of particles, and a change of particle size distribution. The system includes: a solid-liquid separator in which a processing material is supplied between a pair of endless separation filter cloths wound around an outer periphery of a separation roll, and is dehydrated by being squeezed therebetween and also by ventilation gas passing from a ventilation port formed in an outer peripheral surface of the separation roll; and a horizontal rotary dryer provided on a subsequent stage of the solid-liquid separator, wherein carrier gas is made to flow in a rotating shell of the dryer in a cocurrent manner in the same direction as a conveyance direction of the processing material.
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公开(公告)号：US20180187974A1
公开(公告)日：2018-07-05
申请号：US15123561
申请日：2015-12-09
Applicant: TSUKISHIMA KIKAI CO., LTD.
Inventor： Yoichi NAKATA , Yuichi ONO , Satoshi SUWA , Sumito SATO
IPC: F26B17/32
Abstract: To provide a drying method for terephthalic acid and a horizontal rotary dryer allowing easy performance of mass processing of the terephthalic acid and enabling size reduction by improving drying performance of the dryer. In a method of drying terephthalic acid by using a horizontal rotary dryer, a rotating shell is rotated to make a critical speed ratio α defined by expression 1 and expression 2 become 17 to less than 80% to dry the processing material, Vc=2.21D1/2 Expression 1 α=V/V c·100 Expression 2 wherein Vc indicates a critical speed (m/s) of the rotating shell, D indicates an inside diameter (m) of the rotating shell, α indicates the critical speed ratio (%) of the rotating shell, and V indicates a rotation speed (m/s) of the rotating shell.
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Patent Agency Ranking
公开(公告)号：US10001277B2
公开(公告)日：2018-06-19
申请号：US14386736
申请日：2013-03-22
Applicant: TSUKISHIMA KIKAI CO., LTD. , SANKI ENGINEERING CO., LTD.
Inventor： Takamitsu Kanno , Kazuyoshi Terakoshi , Takafumi Yamamoto , Kunihiko Koga , Tomokazu Suyama , Isamu Orito
CPC classification number: F23J15/022 , F23C10/002 , F23C10/08 , F23C10/16 , F23G5/30 , F23G5/44 , F23G2203/50 , F23G2203/501 , F23G2209/30 , F23J3/00 , F23J15/027
Abstract: A method for efficiently conveying impurities in a pressurized fluidized incinerator system is provided. Cleaning gas is supplied to an upper valve, and thereafter, the upper valve is driven so as to communicate an upper discharge device and a tank. The upper discharge device is driven so as to convey the impurities from the dust collector to the tank, and thereafter, the upper discharge device is stopped and the upper valve is driven so as not to communicate the upper discharge device and the tank. Thereafter, the supply of the cleaning gas to the upper valve is stopped.
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公开(公告)号：US09933156B2
公开(公告)日：2018-04-03
申请号：US14777797
申请日：2014-02-14
Applicant: Tsukishima Kikai Co., Ltd.
Inventor： Toshiki Kobayashi , Takafumi Yamamoto , Kazuyoshi Terakoshi
CPC classification number: F23C10/16 , F23G5/30 , F23G2202/30 , F23G2209/12 , F23J15/006 , F23J15/06 , F23J2217/101 , F23J2217/103 , F23J2217/104 , F23J2219/40 , F23J2900/15004 , F23L15/04 , F23L2900/05021 , Y02E20/348
Abstract: Pressurized fluidized furnace equipment includes a fluidized bed furnace (1) that pressurizes combustion air (B) and combusts a material to be treated (A) while fluidizing the same; an air preheater (3) that exchanges heat between a combustion exhaust gas (C) discharged from the fluidized bed furnace (1) and the combustion air (B); a dust collector (4) that removes dust from the combustion exhaust gas (C); and first and second superchargers (5, 6) to which the combustion exhaust gas (C), having undergone the heat exchange in the air preheater (3) and the dust removal in the dust collector (4), is supplied to generate compressed air (D, E). The first compressed air (D) generated in the first supercharger (5) is supplied as the combustion air (B) to the fluidized bed furnace (1) by way of the air preheater (3), and the second compressed air (E) generated in the second supercharger (6) is made to have a higher pressure than that of the first compressed air (D). Accordingly, it is possible to prevent the equipment from having more superchargers than is necessary for normal use although a plurality of first and second superchargers are provided, and to efficiently use the surplus combustion exhaust gas.
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28.发明授权公开(公告)号：US09758630B2
公开(公告)日：2017-09-12
申请号：US15127035
申请日：2015-03-27
Applicant: TEIJIN LIMITED , TSUKISHIMA KIKAI CO., LTD.
Inventor： Tatsuichirou Kon , Tatsuya Ekinaka , Hiroshi Kishimoto , Yume Morita , Takehiro Suga , Satoshi Ogata , Masato Nakagomi
CPC classification number: C08J7/045 , B05D3/0254 , B05D7/02 , C08J7/047 , C08J7/123 , C08J2369/00 , C08J2433/08 , C08J2483/04 , C09D183/04 , C23C16/02 , C23C16/0254 , C23C16/0272 , C23C16/401 , C23C16/402 , C23C16/45565 , C23C16/45572 , C23C16/50 , C23C16/5096 , C23C16/56 , C23C18/122 , C23C18/1233 , C23C18/1254 , H01J37/32091 , C08K3/36
Abstract: The present invention realizes a polymer substrate with hard coating layer comprising a high level of environmental resistance and a high level of abrasion resistance.A polymer substrate with hard coating layer is provided that comprises a polymer substrate (60) having a thickness of 1 mm to 20 mm and a hard coating layer (70,80) on the surface thereof. Here, in this polymer substrate with hard coating layer, the hard coating layer (70,80) is laminated on the surface of the polymer substrate, contains as a main component thereof a hydrolysis-condensation product of an organic silicon compound, has a thickness of 0.1 μm to 20 μm, makes direct contact with a cured underlayer on the opposite side of the polymer substrate, is formed from an organic silicon compound by PE-CVD, and satisfies all of the following requirements (a) to (c): (a) film thickness of the silicon oxide layer is within the range of 3.5 μm to 9.0 μm, (b) maximum indentation depth of the surface of the silicon oxide layer as determined by measuring nanoindentation under conditions of a maximum load of 1 mN is 150 nm or less, and (c) the value of critical compression ratio K of the silicon oxide layer, as defined by formula (1) in a 3-point bending test of the polymer substrate with hard coating layer that imparts indentation displacement in which the surface laminated with the silicon oxide layer becomes concave, is 0.975 or less.
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29.发明申请公开(公告)号：US20170107345A1
公开(公告)日：2017-04-20
申请号：US15127035
申请日：2015-03-27
Applicant: TEIJIN LIMITED , TSUKISHIMA KIKAI CO., LTD.
Inventor： Tatsuichirou KON , Tatsuya EKINAKA , Hiroshi KISHIMOTO , Yume MORITA , Takehiro SUGA , Satoshi OGATA , Masato NAKAGOMI
CPC classification number: C08J7/045 , B05D3/0254 , B05D7/02 , C08J7/047 , C08J7/123 , C08J2369/00 , C08J2433/08 , C08J2483/04 , C09D183/04 , C23C16/02 , C23C16/0254 , C23C16/0272 , C23C16/401 , C23C16/402 , C23C16/45565 , C23C16/45572 , C23C16/50 , C23C16/5096 , C23C16/56 , C23C18/122 , C23C18/1233 , C23C18/1254 , H01J37/32091 , C08K3/36
Abstract: The present invention realizes a polymer substrate with hard coating layer comprising a high level of environmental resistance and a high level of abrasion resistance.A polymer substrate with hard coating layer is provided that comprises a polymer substrate (60) having a thickness of 1 mm to 20 mm and a hard coating layer (70,80) on the surface thereof. Here, in this polymer substrate with hard coating layer, the hard coating layer (70,80) is laminated on the surface of the polymer substrate, contains as a main component thereof a hydrolysis-condensation product of an organic silicon compound, has a thickness of 0.1 μm to 20 μm, makes direct contact with a cured underlayer on the opposite side of the polymer substrate, is formed from an organic silicon compound by PE-CVD, and satisfies all of the following requirements (a) to (c): (a) film thickness of the silicon oxide layer is within the range of 3.5 μm to 9.0 μm, (b) maximum indentation depth of the surface of the silicon oxide layer as determined by measuring nanoindentation under conditions of a maximum load of 1 mN is 150 nm or less, and (c) the value of critical compression ratio K of the silicon oxide layer, as defined by formula (1) in a 3-point bending test of the polymer substrate with hard coating layer that imparts indentation displacement in which the surface laminated with the silicon oxide layer becomes concave, is 0.975 or less.
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公开(公告)号：US20150306559A1
公开(公告)日：2015-10-29
申请号：US14409380
申请日：2013-03-27
Applicant: TSUKISHIMA KIKAI CO., LTD.
Inventor： Tomoki HAYAKAWA
CPC classification number: B01J19/0006 , B01J19/0013 , B01J19/24 , B01J2219/00049 , B01J2219/00056 , B01J2219/00177 , B01J2219/24 , C12M21/18 , C12M41/00 , C12M41/26 , C12M41/32 , C12M45/09 , C12P7/10 , C12P2201/00 , Y02E50/16
Abstract: A system and a method by which the high yield of a final product produced through a pretreatment and a saccharification and fermentation step can be stably obtained, even if a property of the biomass fed to a pretreatment device or the amount of a contained acid component in the biomass may be variable. The biomass is pretreated by a pretreatment device. At least one of pH, acidity, alkalinity, and ultraviolet absorbance of the pretreated biomass is measured by a measurement unit. The amount of a generated decomposition product or a generated undecomposed substance in the pretreatment is obtained on the basis of a measurement result, and an operation condition of the pretreatment device or a property of the biomass before the pretreatment are controlled on the basis of the calculated result.
Abstract translation: 可以稳定地获得通过预处理和糖化发酵步骤产生的最终产物的高产率的系统和方法，即使进料到预处理装置的生物质的质量或所含的酸成分的量 生物量可能是可变的。 生物质由预处理装置预处理。 通过测量单位测量预处理的生物质的pH，酸度，碱度和紫外吸收率中的至少一种。 基于测定结果得到预处理中产生的分解产物或生成的未分解物质的量，根据计算出的预处理装置的预处理装置的运转状况或预处理前的生物量的特性进行控制 结果。
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