Chemical mechanical polishing slurry and method for polishing metal/oxide layers
    22.
    发明授权
    Chemical mechanical polishing slurry and method for polishing metal/oxide layers 失效
    化学机械抛光浆料和抛光金属/氧化物层的方法

    公开(公告)号:US06294105B1

    公开(公告)日:2001-09-25

    申请号:US08997290

    申请日:1997-12-23

    IPC分类号: C09K1300

    摘要: A ferric nitrate-alumina based slurry useful for Chemical-Mechanical-Polishing of tungsten metallurgy and silica based oxides on semiconductor substrates in which the suspension and stability of abrasive material in the slurry is essentially stable. The slurry formulation is balanced to provide low residue of foreign material after polishing and due to its reduced ferric nitrate concentration will be less corrosive than prior art slurries. The recipe for the slurry includes of a 30% wt silica suspension, about 800 ml of 40% by wt ferric nonahydrate and enough 70% wt nitric acid to adjust the pH of the slurry to about 1.2 to 1.4.

    摘要翻译: 用于半导体衬底上的钨冶金和二氧化硅基氧化物的化学机械抛光的硝酸铁 - 氧化铝基浆料,其中在浆料中研磨材料的悬浮液和稳定性基本上是稳定的。 浆料配方是平衡的,在抛光后提供低的异物残留,并且由于其降低的硝酸铁浓度将比现有技术的浆料腐蚀性更小。 该浆料的配方包括30重量%的二氧化硅悬浮液,约800毫升40重量%的三水合九水合物和足够的70重量%的硝酸以将浆料的pH调节至约1.2至1.4。

    Chemical mechanical polishing slurry for tungsten
    23.
    发明授权
    Chemical mechanical polishing slurry for tungsten 失效
    钨化学机械抛光浆

    公开(公告)号:US06284151B1

    公开(公告)日:2001-09-04

    申请号:US08997289

    申请日:1997-12-23

    IPC分类号: C09K1304

    摘要: A ferric nitrate-alumina based slurry useful for Chemical-Mechanical-Polishing of tungsten metallurgy on semiconductor substrates in which the suspension and stability of abrasive material in the slurry is essentially stable. The slurry formulation is balanced to provide low residue of foreign material after polishing and due to its reduced ferric nitrate concentration will be less corrosive than prior art slurries. The recipe for the slurry includes 375 ml of a 9% wt alumina suspension, about 200 grams ferric nonahydrate, water to dilute to about 4.5 liters and enough 70% wt nitric acid to adjust the pH of the slurry to about 1.0 to 1.5.

    摘要翻译: 用于半导体衬底上的钨冶金的化学机械抛光的硝酸铁 - 氧化铝基浆料,其中研磨材料在浆料中的悬浮和稳定性基本上是稳定的。 浆料配方是平衡的,在抛光后提供低的异物残留,并且由于其降低的硝酸铁浓度将比现有技术的浆料腐蚀性更小。 该浆料的配方包括375ml的9%wt的氧化铝悬浮液,约200克的三水合九水合物,稀释至约4.5升的水和足够的70%重量的硝酸以将浆料的pH调节至约1.0至1.5。

    Process for making a compliant thermally conductive compound
    25.
    发明授权
    Process for making a compliant thermally conductive compound 失效
    制备柔性导热性化合物的方法

    公开(公告)号:US5213704A

    公开(公告)日:1993-05-25

    申请号:US760045

    申请日:1991-09-13

    IPC分类号: C09K5/08

    CPC分类号: C09K5/08

    摘要: A process for making a compliant thermally conductive, preferably dielectric, compound that enhances the power dissipation capability of high-powered electrical components such as bipolar VLSI semiconductor chips. The compound has chemically stable thermal conduction and viscosity properties; is not subject to phase separation during use and may be applied in small gaps to maximize thermal conduction. The compound preferably comprises a liquid carrier having thermal filler particles dispersed therein and a coupling agent having a functionality which is reactive with the calcined surface of the thermal filler particles, and a functionality having preferential wetting of the thermal filler particles over self-condensation. Additional additives such as fumed silica and polyisobutylene enhance the phase stability and resistance to thermo-mechanical shear force degradation of the thermally conductive compound encountered during functional usage, e.g., fluctuating power cycles.

    摘要翻译: 制造兼容导热的,优选介电的化合物的方法,其增强诸如双极型VLSI半导体芯片的大功率电气部件的功率耗散能力。 该化合物具有化学稳定的热传导和粘度特性; 在使用过程中不会进行相分离,可以以小的间隙施加,以使热传导最大化。 该化合物优选包括其中分散有热填料颗粒的液体载体和具有与热填料颗粒的煅烧表面反应的官能团的偶联剂,以及具有自缩合优先润湿热填料颗粒的官能团。 另外的添加剂如热解二氧化硅和聚异丁烯增强了在功能使用期间遇到的导热化合物的热 - 机械剪切力降解的相稳定性和抗性,例如波动的功率循环。

    Method of producing microsized amorphous particles of metal phosphate
    30.
    发明授权
    Method of producing microsized amorphous particles of metal phosphate 失效
    生产金属磷酸盐微晶化无定形颗粒的方法

    公开(公告)号:US4701314A

    公开(公告)日:1987-10-20

    申请号:US924703

    申请日:1986-10-29

    申请人: Lawrence D. David

    发明人: Lawrence D. David

    摘要: The process for producing microsized amorphous particles of a metal phosphate incorporates the steps offorming a solution of a metal alkoxide in an organic solvent,forming an aqueous phosphoric acid solution,introducing the alkoxide and the phosphoric acid solutions into a reactor vessel wherein the solutions are immiscible and forming two separate liquid phases with an interface,applying agitation to at least the region of the interface to promote a reaction between the metal alkoxide and said phosphoric acid at the interface,collecting the reaction product, andfiring it in an oxygen containing environment at a temperature sufficiently high to drive off the organic residue.