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公开(公告)号：US4471465A
公开(公告)日：1984-09-11
申请号：US495314
申请日：1983-05-16
CPC分类号： G06F3/04845 , A63F13/00 , G06T15/005 , G09G5/024 , G09G5/42 , A63F2300/203
摘要： A microprocessor based data processing system including a microprocessor, a memory unit, and a display unit is provided with a programmable graphics generator that transfers graphics information from the memory unit to the display unit in response to and control of a set of display instructions also stored in the memory unit. The graphics generator includes a first addressing unit for sequentially accessing the display instructions from the memory unit; a control unit for receiving, storing and decoding such instruction and for issuing supervisory and control signals in response to the binary state of each instruction; a second addressing unit for accessing graphics information from the memory unit in response to the supervisory signals from the control unit; and a third addressing unit for accessing movable object graphics stored in the memory unit.
摘要翻译： 包括微处理器，存储器单元和显示单元的基于微处理器的数据处理系统设置有可编程图形生成器，其响应于并且控制也存储的一组显示指令将图形信息从存储器单元传送到显示单元 在内存单元中。 图形生成器包括用于从存储器单元顺序访问显示指令的第一寻址单元; 控制单元，用于接收，存储和解码这样的指令，并响应于每条指令的二进制状态发出监控信号; 第二寻址单元，用于响应于来自控制单元的监控信号从存储器单元访问图形信息; 以及用于访问存储在存储器单元中的可移动对象图形的第三寻址单元。
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公开(公告)号：US4471464A
公开(公告)日：1984-09-11
申请号：US489961
申请日：1983-04-29
CPC分类号： G06F3/04845 , A63F13/00 , G06T15/005 , G09G5/024 , G09G5/42 , A63F2300/203
摘要： A microprocessor based data processing system including a microprocessor, a memory unit, and a display unit is provided with a programmable graphics generator that transfers graphics information from the memory unit to the display unit in response to and control of a set of display instructions also stored in the memory unit. The graphics generator includes a first addressing unit for sequentially accessing the display instructions from the memory unit; a control unit for receiving, storing and decoding such instruction and for issuing supervisory and control signals in response to the binary state of each instruction; a second addressing unit for accessing graphics information from the memory unit in response to the supervisory signals from the control unit; and a third addressing unit for accessing movable object graphics stored in the memory unit.
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23.发明授权Method and apparatus for generating moving objects on a video display screen 失效用于在视频显示屏上产生移动物体的方法和装置
公开(公告)号：US4112422A
公开(公告)日：1978-09-05
申请号：US749725
申请日：1976-12-13
申请人： Steven T. Mayer , Ronald E. Milner
发明人： Steven T. Mayer , Ronald E. Milner
CPC分类号： A63F13/55 , A63F13/00 , G06T13/00 , A63F2300/203
摘要： A method and apparatus for generating moving objects for a video game display. Common apparatus including a microprocessor with RAM provides vertical motion for all objects and separate horizontal position counting hardware horizontal motion for each object. The microprocessor operating on a horizontal line pair basis drives a parallel to serial converter which stores one eight bit line portion of the object to be displayed which in turn is connected to a shift register. When the converted data is read out to the video display by action of the appropriate horizontal position hardware, it is recirculated to provide a repeat on the next horizontal line of the identical data. An effective one line moving resolution is obtained by utilizing another shift register for a one line delay by means of a switch which is set by a latch driven by the microprocessor.
摘要翻译： 一种用于产生用于视频游戏显示的移动物体的方法和装置。 包括具有RAM的微处理器的通用设备为所有物体提供垂直运动，并且为每个物体分开水平位置计数硬件水平运动。 以水平线对为单位的微处理器驱动一个并行到串行转换器，该串行转换器存储待显示对象的一个八位线部分，后者又连接到移位寄存器。 当通过适当的水平位置硬件的动作将转换的数据读出到视频显示器时，它被再循环以在相同数据的下一个水平行上提供重复。 通过利用由微处理器驱动的锁存器设置的开关来利用用于一行延迟的另一移位寄存器来获得有效的一行移动分辨率。
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24.发明授权Apparatus for continuous variation of object size on a raster type video screen 失效用于在光栅类型视频屏幕上连续变化物体大小的装置
公开(公告)号：US4107665A
公开(公告)日：1978-08-15
申请号：US809314
申请日：1977-06-23
申请人： Steven T. Mayer , Ronald E. Milner
发明人： Steven T. Mayer , Ronald E. Milner
摘要： Apparatus for continuous variation of object size on a raster type video screen in a television game. The input of a voltage controlled oscillator is varied by a game controller. The output of the oscillator drives horizontal and vertical counters at rates corresponding to the object size. These counters provide respectively horizontal and vertical addresses to a picture generator read only memory. The faster the counters are incremented the smaller the object; and with regard to the vertical address, horizontal lines of the picture are actually skipped in order to reduce the size of the object.
摘要翻译： 用于在电视游戏中的光栅型视频屏幕上连续变化物体大小的装置。 压控振荡器的输入由游戏控制器改变。 振荡器的输出以与对象大小相对应的速率驱动水平和垂直计数器。 这些计数器分别为图像发生器只读存储器提供水平和垂直地址。 计数器增加越快对象越小; 并且关于垂直地址，实际上跳过图片的水平线以减小对象的大小。
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公开(公告)号：US09404194B2
公开(公告)日：2016-08-02
申请号：US13305384
申请日：2011-11-28
申请人： Steven T. Mayer , David W. Porter
发明人： Steven T. Mayer , David W. Porter
IPC分类号： C25D21/12 , C25D21/14 , C25D21/18 , C25D7/12 , C25D3/60 , C25D17/00 , C25D3/56 , C25D5/02 , C25C1/20 , C25C7/00
CPC分类号： C25D3/60 , C25C1/20 , C25C7/00 , C25D3/56 , C25D5/022 , C25D5/48 , C25D7/123 , C25D17/001 , C25D17/002 , C25D21/12 , C25D21/14 , C25D21/18
摘要： An apparatus for continuous simultaneous electroplating of two metals having substantially different standard electrodeposition potentials (e.g., for deposition of Sn—Ag alloys) comprises an anode chamber for containing an anolyte comprising ions of a first, less noble metal, (e.g., tin), but not of a second, more noble, metal (e.g., silver) and an active anode; a cathode chamber for containing catholyte including ions of a first metal (e.g., tin), ions of a second, more noble, metal (e.g., silver), and the substrate; a separation structure positioned between the anode chamber and the cathode chamber, where the separation structure substantially prevents transfer of more noble metal from catholyte to the anolyte; and fluidic features and an associated controller coupled to the apparatus and configured to perform continuous electroplating, while maintaining substantially constant concentrations of plating bath components for extended periods of use.
摘要翻译： 用于连续同时电镀具有基本上不同的标准电沉积电位（例如，用于沉积Sn-Ag合金）的两种金属的装置包括阳极室，用于容纳包含第一少量贵金属（例如锡）的离子的阳极电解液， 但不是第二个，更高贵的金属（例如银）和活性阳极; 阴极室，用于容纳包含第一金属（例如锡）的离子，第二，更贵金属（例如银）的离子和底物的阴极电解液; 位于阳极室和阴极室之间的分离结构，其中分离结构基本上防止更贵族金属从阴极电解液转移到阳极电解液; 流体特征和相关联的控制器，其耦合到所述装置并且被配置为执行连续电镀，同时在延长的使用期限内保持基本恒定的电镀浴组分的浓度。
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公开(公告)号：US09221081B1
公开(公告)日：2015-12-29
申请号：US13563619
申请日：2012-07-31
CPC分类号： C25D21/08 , B08B1/006 , B08B1/04 , B08B3/00 , C23G1/02 , C25D21/00 , C25D21/12 , G01N21/9501 , H01L21/67028 , H01L21/67046 , H01L21/6723
摘要： Disclosed herein are cleaning discs for cleaning one or more elements of a semiconductor processing apparatus. In some embodiments, the disc may have a substantially circular upper surface, a substantially circular lower surface, a substantially circular edge joining the upper and lower surfaces, and a plurality of pores opening at the edge and having an interior extending into the interior of the disc. In some embodiments, the pores are dimensioned such that a cleaning agent may be retained in the interior of the pores by an adhesive force between the cleaning agent and the interior surface of the pores. Also disclosed herein are cleaning methods involving loading a cleaning agent into a plurality of pores of a cleaning disc, positioning the cleaning disc within a semiconductor processing apparatus, and releasing cleaning agent from the plurality of pores such that elements of the apparatus are contacted by the released cleaning agent.
摘要翻译： 这里公开了用于清洁半导体处理装置的一个或多个元件的清洁盘。 在一些实施例中，盘可以具有基本上圆形的上表面，基本上圆形的下表面，连接上表面和下表面的基本圆形的边缘，以及在边缘处开口的多个孔，并且具有延伸到内侧的内部 光盘。 在一些实施例中，孔的尺寸使得清洁剂可以通过清洁剂和孔的内表面之间的粘合力保持在孔的内部。 本文还公开了一种清洁方法，其包括将清洁剂装载到清洁盘的多个孔中，将清洁盘定位在半导体处理装置内，以及从多个孔释放清洁剂，使得装置的元件与 释放清洁剂。
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公开(公告)号：US08962085B2
公开(公告)日：2015-02-24
申请号：US12684787
申请日：2010-01-08
申请人： Steven T. Mayer , David W. Porter , Mark J. Willey
发明人： Steven T. Mayer , David W. Porter , Mark J. Willey
IPC分类号： C25D5/34 , B05D5/12 , H05K3/00 , B05D3/00 , C25D5/02 , B05D1/02 , B05D1/18 , B23H3/00 , C25D7/12 , H01L21/288 , H01L21/768 , C25D17/00 , C25D21/04 , C25D5/00 , C25D3/38
CPC分类号： H01L21/2885 , C25D3/38 , C25D5/003 , C25D5/02 , C25D5/34 , C25D7/123 , C25D17/001 , C25D21/04 , H01L21/76861 , H01L21/76898
摘要： Disclosed are pre-wetting apparatus designs and methods. These apparatus designs and methods are used to pre-wet a wafer prior to plating a metal on the surface of the wafer. Disclosed compositions of the pre-wetting fluid prevent corrosion of a seed layer on the wafer and also improve the filling rates of features on the wafer.
摘要翻译： 公开了预润湿装置的设计和方法。 这些设备的设计和方法用于在将晶片上的金属镀覆在晶片表面之前预先浸湿晶片。 公开的预润湿流体的组合物防止晶片上种子层的腐蚀，并且还改善晶片上特征的填充率。
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28.发明申请公开(公告)号：US20140199497A1
公开(公告)日：2014-07-17
申请号：US13741151
申请日：2013-01-14
IPC分类号： B05D3/10
CPC分类号： C23C18/1882 , C23C18/1653 , C25D5/34 , C25D21/12 , H01L21/76861 , H01L21/76873
摘要： Method and apparatus for reducing metal oxide surfaces to modified metal surfaces are disclosed. Metal oxide surfaces are reduced to form a film integrated with a metal seed layer by contacting a solution with a reducing agent with the metal oxide surfaces. The solution with the reducing agent can contact the metal oxide surfaces under conditions that form an integrated film with the metal seed layer, and that reduces reoxidation from exposure the ambient environment. In some embodiments, an additive can be included with the reducing agent to form a surface protecting layer on the metal seed layer. In some embodiments, the metal is copper used in damascene copper structures.
摘要翻译： 公开了将金属氧化物表面还原成改性金属表面的方法和装置。 通过使溶液与还原剂与金属氧化物表面接触，还原金属氧化物表面以形成与金属种子层一体化的膜。 具有还原剂的溶液可以在与金属种子层形成集成膜的条件下接触金属氧化物表面，并且减少暴露于周围环境中的再氧化。 在一些实施方案中，还原剂可以包含添加剂以在金属种子层上形成表面保护层。 在一些实施例中，金属是铜镶嵌铜结构中使用的铜。
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29.发明申请TREATMENT METHOD OF ELECTRODEPOSITED COPPER FOR WAFER-LEVEL-PACKAGING PROCESS FLOW 有权用于水平包装工艺流程的电沉积铜处理方法公开(公告)号：US20140197037A1
公开(公告)日：2014-07-17
申请号：US13744335
申请日：2013-01-17
IPC分类号： H05K3/00
CPC分类号： H01L24/11 , C25D3/38 , C25D3/60 , C25D5/10 , C25D5/50 , C25D17/00 , H01L21/2885 , H01L21/6723 , H01L24/03 , H01L24/05 , H01L24/13 , H01L2224/03462 , H01L2224/03848 , H01L2224/0401 , H01L2224/05548 , H01L2224/05647 , H01L2224/11334 , H01L2224/11849 , H01L2224/13111 , H01L2224/16503 , H01L2224/94 , H01L2924/01322 , H01L2924/12044 , H01L2924/3656 , H01L2224/03 , H01L2224/11 , H01L2924/00014 , H01L2924/00012 , H01L2924/01047 , H01L2924/01029 , H01L2924/00
摘要： A method of treating a copper containing structure on a substrate is disclosed. The method includes electrodepositing the copper containing structure on a substrate, annealing the copper containing structure, and forming an interface between a pad of the copper containing structure and a solder structure after anneal. The interface can have improved resistance to interfacial voiding. The copper containing structure is configured to deliver current between one or more ports and one or more solder structures in the integrated circuit package. Annealing the copper containing structure can move impurities and vacancies to the surface of the copper containing structure for subsequent removal.
摘要翻译： 公开了一种在衬底上处理含铜结构的方法。 该方法包括在基板上电沉积含铜结构，退火含铜结构，并在退火后形成含铜结构的焊盘和焊料结构之间的界面。 界面可以改善对界面空隙的抵抗力。 含铜结构被配置为在集成电路封装中的一个或多个端口与一个或多个焊料结构之间输送电流。 退火含铜结构可以将杂质和空位移动到含铜结构的表面以便随后除去。
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公开(公告)号：US08597461B2
公开(公告)日：2013-12-03
申请号：US12871662
申请日：2010-08-30
申请人： Steven T. Mayer , David W. Porter
发明人： Steven T. Mayer , David W. Porter
CPC分类号： C23F1/46 , C23F1/08 , C23F1/34 , C25C7/00 , H01L21/30604 , H01L21/32134 , H01L21/67017 , H01L21/67051
摘要： Methods and apparatus for isotropically etching a metal from a work piece, while recovering and reconstituting the chemical etchant are described. Various embodiments include apparatus and methods for etching where the recovered and reconstituted etchant is reused in a continuous loop recirculation scheme. Steady state conditions can be achieved where these processes are repeated over and over with occasional bleed and feed to replenish reagents and/or adjust parameters such as pH, ionic strength, salinity and the like.
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