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343 条记录 (耗时 0.049 秒)

    Lithographic apparatus and a method to compensate for the effect of disturbances on the projection system of a lithographic apparatus
    31.
    发明授权
    Lithographic apparatus and a method to compensate for the effect of disturbances on the projection system of a lithographic apparatus 有权
    平版印刷设备和补偿光刻设备投影系统上的干扰影响的方法

    公开(公告)号：US08300208B2

    公开(公告)日：2012-10-30

    申请号：US12616312

    申请日：2009-11-11

    申请人： Erik Roelof Loopstra ,  Maurice Willem Jozef Etiënne Wijckmans ,  Robertus Leonardus Tousain ,  Adrianus Hendrik Koevoets

    发明人： Erik Roelof Loopstra ,  Maurice Willem Jozef Etiënne Wijckmans ,  Robertus Leonardus Tousain ,  Adrianus Hendrik Koevoets

    IPC分类号： G03B27/42 ,  G03B27/58 ,  G03B27/62

    CPC分类号： G03F7/709 ,  G03F7/70525 ,  G03F7/70758 ,  G03F7/70766

    摘要： Embodiments of the invention provide a lithographic apparatus including an illumination system configured to condition a radiation beam, a patterning device support constructed to support a patterning device, the patterning device being capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam, a substrate table constructed to hold a substrate, a projection system configured to project the patterned radiation beam onto a target portion of the substrate, an active air mount to support the projection system, the active air mount including at least one actuator, and a feed-forward device, the feed-forward device being configured to provide on the basis of a set-point signal of a movable object, a feed-forward signal to the at least one actuator, wherein the feed-forward signal is designed to decrease a disturbance effect on the projection system due to movement of the movable object.

    摘要翻译： 本发明的实施例提供了一种光刻设备，其包括配置成调节辐射束的照明系统，构造成支撑图案形成装置的图案形成装置支撑件，所述图案形成装置能够在其横截面中赋予辐射束图案以形成 图案化的辐射束，被构造成保持衬底的衬底台，配置成将图案化的辐射束投影到衬底的目标部分上的投影系统，用于支撑投影系统的主动空气支架，主动空气支架包括至少一个 致动器和前馈装置，所述前馈装置被配置为基于可移动物体的设定点信号提供到所述至少一个致动器的前馈信号，其中所述前馈信号 被设计成由于可移动物体的移动而减小对投影系统的干扰效应。

    Radiation sources and methods of generating radiation
    33.
    发明授权
    Radiation sources and methods of generating radiation 有权
    辐射源和产生辐射的方法

    公开(公告)号：US08278636B2

    公开(公告)日：2012-10-02

    申请号：US12540596

    申请日：2009-08-13

    申请人： Erik Roelof Loopstra ,  Hendrikus Gijsbertus Schimmel

    发明人： Erik Roelof Loopstra ,  Hendrikus Gijsbertus Schimmel

    IPC分类号： G21K1/00

    CPC分类号： G03F7/70175 ,  G03F7/70033 ,  G21K1/06 ,  G21K2201/064 ,  G21K2201/067 ,  H05G2/003 ,  H05G2/005 ,  H05G2/006 ,  H05G2/008

    摘要： A radiation source is configured to generate radiation. The radiation source includes a fuel droplet generator constructed and arranged to generate a stream of droplets of fuel that are directed to a plasma generation site; a laser constructed and arranged to generate a laser beam that is directed to the plasma generation site, an angle between the direction of movement of the stream of droplets and the direction of the laser beam being less than about 90°; and a collector constructed and arranged to collect radiation generated by a plasma formed at the plasma formation site when the beam of radiation and a droplet collide. The collector is configured to reflect the radiation substantially along an optical axis of the radiation source. The laser beam is directed to the plasma generation site through an aperture provided in the collector.

    摘要翻译： 辐射源被配置成产生辐射。 辐射源包括燃料液滴发生器，其被构造和布置成产生引导到等离子体产生位置的燃料液滴流; 激光器被构造和布置成产生被引导到等离子体产生位置的激光束，液滴流的移动方向与激光束的方向之间的角度小于约90°; 以及收集器，其被构造和布置成当辐射束和液滴碰撞时收集由等离子体形成部位形成的等离子体产生的辐射。 收集器被配置为基本上沿辐射源的光轴反射辐射。 激光束通过设置在收集器中的孔引导到等离子体产生位置。

    Lithographic apparatus and device manufacturing method
    37.
    发明授权
    Lithographic apparatus and device manufacturing method 有权
    光刻设备和器件制造方法

    公开(公告)号：US08013978B2

    公开(公告)日：2011-09-06

    申请号：US12213543

    申请日：2008-06-20

    申请人： Tammo Uitterdijk ,  Erik Roelof Loopstra ,  Laurens Anthony Sanderse

    发明人： Tammo Uitterdijk ,  Erik Roelof Loopstra ,  Laurens Anthony Sanderse

    IPC分类号： G03B27/42 ,  G03B27/52

    CPC分类号： G03F7/70341 ,  G03F7/70958

    摘要： In an immersion lithographic apparatus, a final element is disclosed having, on a surface nearest the substrate, a layer bonded to the surface and having an edge barrier, of the same material as the layer, extending from the layer away from the substrate to shield the final element from a liquid. In an embodiment, the final element is attached to the apparatus via the layer and/or edge barrier, which may be made of a material with a coefficient of thermal expansion lower than the coefficient of thermal expansion of the final element.

    摘要翻译： 在浸没式光刻设备中，公开了一种最终元件，其在最接近衬底的表面上具有与该层相同的材料结合到该表面并具有与层相同的材料的层，该层从该层延伸离开该衬底至该屏蔽层 来自液体的最终元素。 在一个实施例中，最终元件经由层和/或边缘屏障附接到设备，该层和/或边缘屏障可以由热膨胀系数低于最终元件的热膨胀系数的材料制成。